KR102099033B1 - Rf 생성기에서의 주파수 튜닝을 위한 장치 - Google Patents

Rf 생성기에서의 주파수 튜닝을 위한 장치 Download PDF

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KR102099033B1
KR102099033B1 KR1020187033349A KR20187033349A KR102099033B1 KR 102099033 B1 KR102099033 B1 KR 102099033B1 KR 1020187033349 A KR1020187033349 A KR 1020187033349A KR 20187033349 A KR20187033349 A KR 20187033349A KR 102099033 B1 KR102099033 B1 KR 102099033B1
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frequency
reflection coefficient
impedance
generate
complex reflection
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KR20180132901A (ko
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명열 최
데니스 쇼
마이크 뮬러
제프리 로버그
스티브 조던
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에이이에스 글로벌 홀딩스 피티이 리미티드
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H01J37/32183—Matching circuits
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
    • H01J37/32155—Frequency modulation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/3299—Feedback systems

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
KR1020187033349A 2016-04-20 2017-04-13 Rf 생성기에서의 주파수 튜닝을 위한 장치 Active KR102099033B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US15/133,461 2016-04-20
US15/133,461 US9748076B1 (en) 2016-04-20 2016-04-20 Apparatus for frequency tuning in a RF generator
PCT/US2017/027385 WO2017184425A1 (en) 2016-04-20 2017-04-13 Apparatus for frequency tuning in a rf generator

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KR20180132901A KR20180132901A (ko) 2018-12-12
KR102099033B1 true KR102099033B1 (ko) 2020-04-08

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US (2) US9748076B1 (enExample)
JP (1) JP6666470B2 (enExample)
KR (1) KR102099033B1 (enExample)
CN (1) CN109156075B (enExample)
TW (1) TWI677265B (enExample)
WO (1) WO2017184425A1 (enExample)

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Also Published As

Publication number Publication date
CN109156075B (zh) 2020-08-07
CN109156075A (zh) 2019-01-04
KR20180132901A (ko) 2018-12-12
US20170323771A1 (en) 2017-11-09
TWI677265B (zh) 2019-11-11
TW201801574A (zh) 2018-01-01
JP6666470B2 (ja) 2020-03-13
JP2019515429A (ja) 2019-06-06
US9748076B1 (en) 2017-08-29
WO2017184425A1 (en) 2017-10-26
US10026595B2 (en) 2018-07-17

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