JP2019511107A5 - - Google Patents

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Publication number
JP2019511107A5
JP2019511107A5 JP2019502537A JP2019502537A JP2019511107A5 JP 2019511107 A5 JP2019511107 A5 JP 2019511107A5 JP 2019502537 A JP2019502537 A JP 2019502537A JP 2019502537 A JP2019502537 A JP 2019502537A JP 2019511107 A5 JP2019511107 A5 JP 2019511107A5
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Japan
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electron
exposures
sample
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series
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JP2019502537A
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Japanese (ja)
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JP2019511107A (ja
JP7041666B2 (ja
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Priority claimed from US15/387,388 external-priority patent/US10460903B2/en
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JP2019502537A 2016-04-04 2017-03-31 走査電子顕微鏡検査装置および方法 Active JP7041666B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201662318078P 2016-04-04 2016-04-04
US62/318,078 2016-04-04
US15/387,388 US10460903B2 (en) 2016-04-04 2016-12-21 Method and system for charge control for imaging floating metal structures on non-conducting substrates
US15/387,388 2016-12-21
PCT/US2017/025595 WO2017176595A1 (en) 2016-04-04 2017-03-31 Method and system for charge control for imaging floating metal structures on non-conducting substrates

Publications (3)

Publication Number Publication Date
JP2019511107A JP2019511107A (ja) 2019-04-18
JP2019511107A5 true JP2019511107A5 (enExample) 2020-05-14
JP7041666B2 JP7041666B2 (ja) 2022-03-24

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JP2019502537A Active JP7041666B2 (ja) 2016-04-04 2017-03-31 走査電子顕微鏡検査装置および方法

Country Status (9)

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US (1) US10460903B2 (enExample)
EP (1) EP3443577A4 (enExample)
JP (1) JP7041666B2 (enExample)
KR (1) KR102215496B1 (enExample)
CN (1) CN109075001B (enExample)
IL (1) IL261616B (enExample)
SG (1) SG11201807248UA (enExample)
TW (1) TWI716575B (enExample)
WO (1) WO2017176595A1 (enExample)

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US10338013B1 (en) * 2018-01-25 2019-07-02 Kla-Tencor Corporation Position feedback for multi-beam particle detector
US12165838B2 (en) * 2018-12-14 2024-12-10 Kla Corporation Joint electron-optical columns for flood-charging and image-forming in voltage contrast wafer inspections
DE102019218315B3 (de) 2019-11-27 2020-10-01 Carl Zeiss Microscopy Gmbh Verfahren zur Spannungskontrastbildgebung mit einem Korpuskularvielstrahlmikroskop, Korpuskularvielstrahlmikroskop für Spannungskontrastbildgebung und Halbleiterstrukturen zur Spannungskontrastbildgebung mit einem Korpuskularvielstrahlmikroskop
US11239048B2 (en) * 2020-03-09 2022-02-01 Kla Corporation Arrayed column detector
KR20250154503A (ko) * 2023-03-03 2025-10-28 칼 짜이스 에스엠테 게엠베하 주사 전자 현미경에서 집적 회로 패턴을 포함하는 물체의 표면 상의 전하를 균형화하기 위한 방법 및 시스템
WO2025098639A1 (en) * 2023-11-07 2025-05-15 Carl Zeiss Multisem Gmbh Multi-beam charged particle microscope for inspection with reduced charging effects

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US5869833A (en) 1997-01-16 1999-02-09 Kla-Tencor Corporation Electron beam dose control for scanning electron microscopy and critical dimension measurement instruments
US6066849A (en) * 1997-01-16 2000-05-23 Kla Tencor Scanning electron beam microscope
US6232787B1 (en) * 1999-01-08 2001-05-15 Schlumberger Technologies, Inc. Microstructure defect detection
US6344750B1 (en) 1999-01-08 2002-02-05 Schlumberger Technologies, Inc. Voltage contrast method for semiconductor inspection using low voltage particle beam
US6586733B1 (en) * 1999-05-25 2003-07-01 Kla-Tencor Apparatus and methods for secondary electron emission microscope with dual beam
JP4066078B2 (ja) * 1999-05-27 2008-03-26 株式会社ニコン 写像型電子顕微鏡
US6445199B1 (en) * 1999-12-14 2002-09-03 Kla-Tencor Corporation Methods and apparatus for generating spatially resolved voltage contrast maps of semiconductor test structures
US6627884B2 (en) 2001-03-19 2003-09-30 Kla-Tencor Technologies Corporation Simultaneous flooding and inspection for charge control in an electron beam inspection machine
DE60237952D1 (de) * 2001-10-10 2010-11-25 Applied Materials Israel Ltd Verfahren und Vorrichtung zur Ausrichtung einer Säule für Strahlen geladener Teilchen
GB2411763B (en) 2004-03-05 2009-02-18 Thermo Electron Corp Flood gun for charge neutralization
US7230240B2 (en) 2004-08-31 2007-06-12 Credence Systems Corporation Enhanced scanning control of charged particle beam systems
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JP5292412B2 (ja) * 2009-01-15 2013-09-18 株式会社日立ハイテクノロジーズ 荷電粒子線応用装置
JP5695917B2 (ja) * 2011-01-26 2015-04-08 株式会社日立ハイテクノロジーズ 荷電粒子線装置
JP6121651B2 (ja) * 2012-04-04 2017-04-26 株式会社日立ハイテクノロジーズ 電子顕微鏡、電子顕微鏡の観察条件の設定方法、および電子顕微鏡による観察方法
JP6014688B2 (ja) * 2013-01-31 2016-10-25 株式会社日立ハイテクノロジーズ 複合荷電粒子線装置
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US9165742B1 (en) * 2014-10-10 2015-10-20 Kla-Tencor Corporation Inspection site preparation
KR102387776B1 (ko) 2015-05-08 2022-04-15 케이엘에이 코포레이션 전자빔 시스템의 수차 보정 방법 및 시스템

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