IL261616B - Method and system for charge control for imaging floating metal structures on non-conducting substrates" - Google Patents

Method and system for charge control for imaging floating metal structures on non-conducting substrates"

Info

Publication number
IL261616B
IL261616B IL261616A IL26161618A IL261616B IL 261616 B IL261616 B IL 261616B IL 261616 A IL261616 A IL 261616A IL 26161618 A IL26161618 A IL 26161618A IL 261616 B IL261616 B IL 261616B
Authority
IL
Israel
Prior art keywords
imaging
charge control
metal structures
floating metal
conducting substrates
Prior art date
Application number
IL261616A
Other languages
English (en)
Hebrew (he)
Other versions
IL261616A (en
Original Assignee
Kla Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kla Corp filed Critical Kla Corp
Publication of IL261616A publication Critical patent/IL261616A/en
Publication of IL261616B publication Critical patent/IL261616B/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1471—Arrangements for directing or deflecting the discharge along a desired path for centering, aligning or positioning of ray or beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10—Lenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261—Details
    • H01J37/265—Controlling the tube; circuit arrangements adapted to a particular application not otherwise provided, e.g. bright-field-dark-field illumination
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/004—Charge control of objects or beams
    • H01J2237/0041—Neutralising arrangements
    • H01J2237/0044—Neutralising arrangements of objects being observed or treated
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/004—Charge control of objects or beams
    • H01J2237/0048—Charging arrangements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/10—Lenses
    • H01J2237/103—Lenses characterised by lens type
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/202—Movement
    • H01J2237/20278—Motorised movement
    • H01J2237/20285—Motorised movement computer-controlled
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/22—Treatment of data
    • H01J2237/221—Image processing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24592—Inspection and quality control of devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2802—Transmission microscopes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2809—Scanning microscopes characterised by the imaging problems involved

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Electron Sources, Ion Sources (AREA)
IL261616A 2016-04-04 2018-09-05 Method and system for charge control for imaging floating metal structures on non-conducting substrates" IL261616B (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201662318078P 2016-04-04 2016-04-04
US15/387,388 US10460903B2 (en) 2016-04-04 2016-12-21 Method and system for charge control for imaging floating metal structures on non-conducting substrates
PCT/US2017/025595 WO2017176595A1 (en) 2016-04-04 2017-03-31 Method and system for charge control for imaging floating metal structures on non-conducting substrates

Publications (2)

Publication Number Publication Date
IL261616A IL261616A (en) 2019-03-31
IL261616B true IL261616B (en) 2022-04-01

Family

ID=59959718

Family Applications (1)

Application Number Title Priority Date Filing Date
IL261616A IL261616B (en) 2016-04-04 2018-09-05 Method and system for charge control for imaging floating metal structures on non-conducting substrates"

Country Status (9)

Country Link
US (1) US10460903B2 (enExample)
EP (1) EP3443577A4 (enExample)
JP (1) JP7041666B2 (enExample)
KR (1) KR102215496B1 (enExample)
CN (1) CN109075001B (enExample)
IL (1) IL261616B (enExample)
SG (1) SG11201807248UA (enExample)
TW (1) TWI716575B (enExample)
WO (1) WO2017176595A1 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10338013B1 (en) * 2018-01-25 2019-07-02 Kla-Tencor Corporation Position feedback for multi-beam particle detector
US12165838B2 (en) * 2018-12-14 2024-12-10 Kla Corporation Joint electron-optical columns for flood-charging and image-forming in voltage contrast wafer inspections
TWI743626B (zh) * 2019-01-24 2021-10-21 德商卡爾蔡司多重掃描電子顯微鏡有限公司 包含多束粒子顯微鏡的系統、對3d樣本逐層成像之方法及電腦程式產品
DE102019218315B3 (de) 2019-11-27 2020-10-01 Carl Zeiss Microscopy Gmbh Verfahren zur Spannungskontrastbildgebung mit einem Korpuskularvielstrahlmikroskop, Korpuskularvielstrahlmikroskop für Spannungskontrastbildgebung und Halbleiterstrukturen zur Spannungskontrastbildgebung mit einem Korpuskularvielstrahlmikroskop
US11239048B2 (en) * 2020-03-09 2022-02-01 Kla Corporation Arrayed column detector
EP4060714A1 (en) * 2021-03-18 2022-09-21 ASML Netherlands B.V. Flood column and charged particleapparatus
WO2024184078A2 (en) * 2023-03-03 2024-09-12 Carl Zeiss Smt Gmbh Method and systems for balancing charges on a surface of an object comprising integrated circuit patterns in a scanning electron microscope
WO2025098639A1 (en) * 2023-11-07 2025-05-15 Carl Zeiss Multisem Gmbh Multi-beam charged particle microscope for inspection with reduced charging effects

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU4055297A (en) * 1996-08-08 1998-02-25 William Marsh Rice University Macroscopically manipulable nanoscale devices made from nanotube assemblies
US5869833A (en) * 1997-01-16 1999-02-09 Kla-Tencor Corporation Electron beam dose control for scanning electron microscopy and critical dimension measurement instruments
US6066849A (en) 1997-01-16 2000-05-23 Kla Tencor Scanning electron beam microscope
US6344750B1 (en) * 1999-01-08 2002-02-05 Schlumberger Technologies, Inc. Voltage contrast method for semiconductor inspection using low voltage particle beam
US6232787B1 (en) * 1999-01-08 2001-05-15 Schlumberger Technologies, Inc. Microstructure defect detection
US6586733B1 (en) * 1999-05-25 2003-07-01 Kla-Tencor Apparatus and methods for secondary electron emission microscope with dual beam
JP4066078B2 (ja) 1999-05-27 2008-03-26 株式会社ニコン 写像型電子顕微鏡
US6445199B1 (en) * 1999-12-14 2002-09-03 Kla-Tencor Corporation Methods and apparatus for generating spatially resolved voltage contrast maps of semiconductor test structures
US6627884B2 (en) 2001-03-19 2003-09-30 Kla-Tencor Technologies Corporation Simultaneous flooding and inspection for charge control in an electron beam inspection machine
DE60237952D1 (de) * 2001-10-10 2010-11-25 Applied Materials Israel Ltd Verfahren und Vorrichtung zur Ausrichtung einer Säule für Strahlen geladener Teilchen
GB2411763B (en) 2004-03-05 2009-02-18 Thermo Electron Corp Flood gun for charge neutralization
US7230240B2 (en) 2004-08-31 2007-06-12 Credence Systems Corporation Enhanced scanning control of charged particle beam systems
US7183546B2 (en) * 2004-09-16 2007-02-27 Applied Materials, Israel, Ltd. System and method for voltage contrast analysis of a wafer
US7205542B1 (en) * 2005-11-14 2007-04-17 Kla-Tencor Technologies Corporation Scanning electron microscope with curved axes
WO2008010777A1 (en) * 2006-07-21 2008-01-24 National University Of Singapore A multi-beam ion/electron spectra-microscope
US7488938B1 (en) * 2006-08-23 2009-02-10 Kla-Tencor Technologies Corporation Charge-control method and apparatus for electron beam imaging
JP2010027743A (ja) * 2008-07-16 2010-02-04 Ebara Corp インプリント用ガラス基板、レジストパターン形成方法、インプリント用ガラス基板の検査方法及び検査装置
WO2010082451A1 (ja) 2009-01-15 2010-07-22 株式会社日立ハイテクノロジーズ 荷電粒子線応用装置
JP5695917B2 (ja) 2011-01-26 2015-04-08 株式会社日立ハイテクノロジーズ 荷電粒子線装置
JP6121651B2 (ja) 2012-04-04 2017-04-26 株式会社日立ハイテクノロジーズ 電子顕微鏡、電子顕微鏡の観察条件の設定方法、および電子顕微鏡による観察方法
DE112014000306B4 (de) * 2013-01-31 2020-03-26 Hitachi High-Technologies Corporation Kombinierte Ladungsteilchenstrahlvorrichtung
US9257260B2 (en) * 2013-04-27 2016-02-09 Kla-Tencor Corporation Method and system for adaptively scanning a sample during electron beam inspection
JP6316578B2 (ja) * 2013-12-02 2018-04-25 株式会社日立ハイテクノロジーズ 走査電子顕微鏡システム及びそれを用いたパターン計測方法並びに走査電子顕微鏡
US9767986B2 (en) * 2014-08-29 2017-09-19 Kla-Tencor Corporation Scanning electron microscope and methods of inspecting and reviewing samples
US9165742B1 (en) * 2014-10-10 2015-10-20 Kla-Tencor Corporation Inspection site preparation
KR102387776B1 (ko) 2015-05-08 2022-04-15 케이엘에이 코포레이션 전자빔 시스템의 수차 보정 방법 및 시스템

Also Published As

Publication number Publication date
US20170287675A1 (en) 2017-10-05
US10460903B2 (en) 2019-10-29
CN109075001A (zh) 2018-12-21
SG11201807248UA (en) 2018-10-30
EP3443577A4 (en) 2019-12-18
KR20180123171A (ko) 2018-11-14
EP3443577A1 (en) 2019-02-20
KR102215496B1 (ko) 2021-02-10
IL261616A (en) 2019-03-31
TWI716575B (zh) 2021-01-21
TW201801123A (zh) 2018-01-01
WO2017176595A1 (en) 2017-10-12
JP2019511107A (ja) 2019-04-18
JP7041666B2 (ja) 2022-03-24
CN109075001B (zh) 2021-12-21

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