JP2008097902A5 - - Google Patents
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- Publication number
- JP2008097902A5 JP2008097902A5 JP2006276058A JP2006276058A JP2008097902A5 JP 2008097902 A5 JP2008097902 A5 JP 2008097902A5 JP 2006276058 A JP2006276058 A JP 2006276058A JP 2006276058 A JP2006276058 A JP 2006276058A JP 2008097902 A5 JP2008097902 A5 JP 2008097902A5
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- focus
- astigmatism
- adjusting
- sample
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 238000010894 electron beam technology Methods 0.000 claims description 83
- 201000009310 astigmatism Diseases 0.000 claims description 78
- 238000012937 correction Methods 0.000 claims description 25
- 238000000034 method Methods 0.000 claims description 24
- 230000003287 optical effect Effects 0.000 claims description 20
- 230000005405 multipole Effects 0.000 claims description 8
- 230000001678 irradiating effect Effects 0.000 claims description 5
- 235000012431 wafers Nutrition 0.000 description 20
- 238000012545 processing Methods 0.000 description 15
- 238000011156 evaluation Methods 0.000 description 7
- 238000010586 diagram Methods 0.000 description 5
- 238000001514 detection method Methods 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 230000004075 alteration Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000013507 mapping Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
Priority Applications (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006276058A JP4283839B2 (ja) | 2006-10-10 | 2006-10-10 | 電子ビーム装置を用いた非点収差調整方法 |
| KR1020070092115A KR101364672B1 (ko) | 2006-09-12 | 2007-09-11 | 하전입자선장치, 그 장치를 이용한 비점수차 조정방법 및그 장치를 이용한 디바이스제조방법 |
| TW096133807A TWI443704B (zh) | 2006-09-12 | 2007-09-11 | 荷電粒子束裝置及使用該裝置之元件製造方法 |
| TW103100024A TWI485742B (zh) | 2006-09-12 | 2007-09-11 | 荷電粒子束裝置及使用該裝置之半導體元件製造方法 |
| US11/898,358 US8013315B2 (en) | 2006-09-12 | 2007-09-11 | Charged particle beam apparatus, method of adjusting astigmatism using same and method of manufacturing device using same |
| KR1020130136867A KR101507476B1 (ko) | 2006-09-12 | 2013-11-12 | 하전입자선장치, 그 장치를 이용한 비점수차 조정방법 및 그 장치를 이용한 디바이스제조방법 |
| KR1020140088521A KR101564047B1 (ko) | 2006-09-12 | 2014-07-14 | 하전입자선장치, 그 장치를 이용한 비점수차 조정방법 및 그 장치를 이용한 디바이스제조방법 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006276058A JP4283839B2 (ja) | 2006-10-10 | 2006-10-10 | 電子ビーム装置を用いた非点収差調整方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2008097902A JP2008097902A (ja) | 2008-04-24 |
| JP2008097902A5 true JP2008097902A5 (enExample) | 2008-08-14 |
| JP4283839B2 JP4283839B2 (ja) | 2009-06-24 |
Family
ID=39380542
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006276058A Active JP4283839B2 (ja) | 2006-09-12 | 2006-10-10 | 電子ビーム装置を用いた非点収差調整方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4283839B2 (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7187384B2 (ja) * | 2019-05-17 | 2022-12-12 | 株式会社日立製作所 | 検査装置 |
| WO2023248320A1 (ja) * | 2022-06-21 | 2023-12-28 | 株式会社日立ハイテク | 荷電粒子線装置 |
-
2006
- 2006-10-10 JP JP2006276058A patent/JP4283839B2/ja active Active
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