JP2019504467A5 - - Google Patents

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Publication number
JP2019504467A5
JP2019504467A5 JP2018523021A JP2018523021A JP2019504467A5 JP 2019504467 A5 JP2019504467 A5 JP 2019504467A5 JP 2018523021 A JP2018523021 A JP 2018523021A JP 2018523021 A JP2018523021 A JP 2018523021A JP 2019504467 A5 JP2019504467 A5 JP 2019504467A5
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JP
Japan
Prior art keywords
nanowires
surface layer
oxidized
microwave plasma
gas
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JP2018523021A
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English (en)
Japanese (ja)
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JP2019504467A (ja
JP6928763B2 (ja
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Priority claimed from PCT/US2016/060378 external-priority patent/WO2017079470A1/en
Publication of JP2019504467A publication Critical patent/JP2019504467A/ja
Publication of JP2019504467A5 publication Critical patent/JP2019504467A5/ja
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Publication of JP6928763B2 publication Critical patent/JP6928763B2/ja
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JP2018523021A 2015-11-03 2016-11-03 マイクロ波プラズマによりナノワイヤの角を丸め、調整する方法 Active JP6928763B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201562250395P 2015-11-03 2015-11-03
US62/250,395 2015-11-03
PCT/US2016/060378 WO2017079470A1 (en) 2015-11-03 2016-11-03 Method of corner rounding and trimming of nanowires by microwave plasma

Publications (3)

Publication Number Publication Date
JP2019504467A JP2019504467A (ja) 2019-02-14
JP2019504467A5 true JP2019504467A5 (enExample) 2019-11-21
JP6928763B2 JP6928763B2 (ja) 2021-09-01

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ID=58635828

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2018523021A Active JP6928763B2 (ja) 2015-11-03 2016-11-03 マイクロ波プラズマによりナノワイヤの角を丸め、調整する方法

Country Status (4)

Country Link
US (1) US10008564B2 (enExample)
JP (1) JP6928763B2 (enExample)
KR (1) KR102396835B1 (enExample)
WO (1) WO2017079470A1 (enExample)

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TWI845516B (zh) * 2018-06-22 2024-06-21 日商東京威力科創股份有限公司 奈米線裝置的形成方法
US11810761B2 (en) 2018-07-27 2023-11-07 Eagle Harbor Technologies, Inc. Nanosecond pulser ADC system
KR102499709B1 (ko) * 2018-08-10 2023-02-16 이글 하버 테크놀로지스, 인코포레이티드 RF 플라즈마 반응기용 플라즈마 시스(sheath) 제어
JP7072477B2 (ja) * 2018-09-20 2022-05-20 東京エレクトロン株式会社 プラズマ処理方法およびプラズマ処理装置
JP7414593B2 (ja) * 2020-03-10 2024-01-16 東京エレクトロン株式会社 基板処理方法及び基板処理装置
US11967484B2 (en) 2020-07-09 2024-04-23 Eagle Harbor Technologies, Inc. Ion current droop compensation
US11824542B1 (en) 2022-06-29 2023-11-21 Eagle Harbor Technologies, Inc. Bipolar high voltage pulser
KR20250084155A (ko) 2022-09-29 2025-06-10 이글 하버 테크놀로지스, 인코포레이티드 고전압 플라즈마 제어
JP2024079879A (ja) * 2022-12-01 2024-06-13 東京エレクトロン株式会社 プラズマ処理装置

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