JP2019502802A5 - - Google Patents
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- JP2019502802A5 JP2019502802A5 JP2018533238A JP2018533238A JP2019502802A5 JP 2019502802 A5 JP2019502802 A5 JP 2019502802A5 JP 2018533238 A JP2018533238 A JP 2018533238A JP 2018533238 A JP2018533238 A JP 2018533238A JP 2019502802 A5 JP2019502802 A5 JP 2019502802A5
- Authority
- JP
- Japan
- Prior art keywords
- range
- composition
- composition according
- cobalt
- mol
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP15201935.2 | 2015-12-22 | ||
| EP15201935 | 2015-12-22 | ||
| PCT/EP2016/081856 WO2017108748A2 (en) | 2015-12-22 | 2016-12-20 | Composition for post chemical-mechanical-polishing cleaning |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2019502802A JP2019502802A (ja) | 2019-01-31 |
| JP2019502802A5 true JP2019502802A5 (https=) | 2020-02-06 |
| JP6886469B2 JP6886469B2 (ja) | 2021-06-16 |
Family
ID=54883958
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018533238A Active JP6886469B2 (ja) | 2015-12-22 | 2016-12-20 | 化学機械研磨後の洗浄組成物 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US10844333B2 (https=) |
| EP (1) | EP3394879A2 (https=) |
| JP (1) | JP6886469B2 (https=) |
| KR (1) | KR102773140B1 (https=) |
| CN (1) | CN108431931B (https=) |
| SG (1) | SG11201804636YA (https=) |
| TW (1) | TWI736567B (https=) |
| WO (1) | WO2017108748A2 (https=) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP3469049B1 (en) * | 2016-06-10 | 2020-07-22 | Basf Se | Composition for post chemical-mechanical-polishing cleaning |
| WO2018168207A1 (ja) * | 2017-03-14 | 2018-09-20 | 株式会社フジミインコーポレーテッド | 表面処理組成物、その製造方法、およびこれを用いた表面処理方法 |
| IL283786B2 (en) * | 2018-12-12 | 2025-08-01 | Basf Se | Chemical mechanical polishing of substrates containing copper and ruthenium |
| WO2020120641A1 (en) * | 2018-12-12 | 2020-06-18 | Basf Se | Chemical mechanical polishing of substrates containing copper and ruthenium |
| US12012575B2 (en) * | 2019-03-26 | 2024-06-18 | Fujimi Incorporated | Composition for surface treatment, method for producing the same, surface treatment method, and method for producing semiconductor substrate |
| MX2023011631A (es) | 2021-04-01 | 2023-12-15 | Sterilex LLC | Desinfectante/higienizante en polvo sin compuesto de amonio cuaternario (quat). |
| WO2023232682A1 (en) | 2022-05-31 | 2023-12-07 | Basf Se | Composition, its use and a process for cleaning substrates comprising cobalt and copper |
| CN121399239A (zh) | 2023-06-20 | 2026-01-23 | 巴斯夫欧洲公司 | 用于清洁包含钴和铜的衬底的碱性组合物、其用途及方法 |
| WO2024260813A1 (en) | 2023-06-20 | 2024-12-26 | Basf Se | Alkaline composition, its use and a process for cleaning substrates comprising cobalt and copper |
| WO2026057376A1 (en) | 2024-09-11 | 2026-03-19 | Basf Se | Alkaline composition, its use and a process for cleaning substrates comprising cobalt and copper |
| WO2026074880A1 (ja) * | 2024-10-02 | 2026-04-09 | 富士フイルム株式会社 | 組成物、洗浄済み被処理物の製造方法、電子デバイスの製造方法 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004319759A (ja) * | 2003-04-16 | 2004-11-11 | Hitachi Chem Co Ltd | 金属用研磨液及び研磨方法 |
| US20070210278A1 (en) * | 2006-03-08 | 2007-09-13 | Lane Sarah J | Compositions for chemical mechanical polishing silicon dioxide and silicon nitride |
| JP4777197B2 (ja) | 2006-09-11 | 2011-09-21 | 富士フイルム株式会社 | 洗浄液及びそれを用いた洗浄方法 |
| US8685909B2 (en) | 2006-09-21 | 2014-04-01 | Advanced Technology Materials, Inc. | Antioxidants for post-CMP cleaning formulations |
| US20090056744A1 (en) | 2007-08-29 | 2009-03-05 | Micron Technology, Inc. | Wafer cleaning compositions and methods |
| JP2009069505A (ja) | 2007-09-13 | 2009-04-02 | Tosoh Corp | レジスト除去用洗浄液及び洗浄方法 |
| US8084406B2 (en) | 2007-12-14 | 2011-12-27 | Lam Research Corporation | Apparatus for particle removal by single-phase and two-phase media |
| JP6231017B2 (ja) * | 2012-02-06 | 2017-11-15 | ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ | 特定の硫黄含有化合物および糖アルコールまたはポリカルボン酸を含む、ポスト化学機械研磨（ポストｃｍｐ）洗浄組成物 |
| SG11201404930SA (en) | 2012-02-15 | 2014-09-26 | Advanced Tech Materials | Post-cmp removal using compositions and method of use |
| TWI573864B (zh) * | 2012-03-14 | 2017-03-11 | 卡博特微電子公司 | 具有高移除率及低缺陷率之對氧化物及氮化物有選擇性之ｃｍｐ組成物 |
| KR20150143676A (ko) | 2013-04-22 | 2015-12-23 | 어드밴스드 테크놀러지 머티리얼즈, 인코포레이티드 | 구리 세정 및 보호 제형 |
| TWI636131B (zh) * | 2014-05-20 | 2018-09-21 | 日商Ｊｓｒ股份有限公司 | 清洗用組成物及清洗方法 |
| SG11201804637UA (en) * | 2015-12-22 | 2018-07-30 | Basf Se | Composition for post chemical-mechanical-polishing cleaning |
| EP3469049B1 (en) * | 2016-06-10 | 2020-07-22 | Basf Se | Composition for post chemical-mechanical-polishing cleaning |
-
2016
- 2016-12-20 EP EP16819532.9A patent/EP3394879A2/en active Pending
- 2016-12-20 SG SG11201804636YA patent/SG11201804636YA/en unknown
- 2016-12-20 JP JP2018533238A patent/JP6886469B2/ja active Active
- 2016-12-20 CN CN201680075204.9A patent/CN108431931B/zh active Active
- 2016-12-20 WO PCT/EP2016/081856 patent/WO2017108748A2/en not_active Ceased
- 2016-12-20 KR KR1020187021128A patent/KR102773140B1/ko active Active
- 2016-12-20 US US16/064,686 patent/US10844333B2/en active Active
- 2016-12-21 TW TW105142443A patent/TWI736567B/zh active
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