JP2019216230A5 - - Google Patents
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- JP2019216230A5 JP2019216230A5 JP2018221716A JP2018221716A JP2019216230A5 JP 2019216230 A5 JP2019216230 A5 JP 2019216230A5 JP 2018221716 A JP2018221716 A JP 2018221716A JP 2018221716 A JP2018221716 A JP 2018221716A JP 2019216230 A5 JP2019216230 A5 JP 2019216230A5
- Authority
- JP
- Japan
- Prior art keywords
- potential difference
- electrostatic chuck
- electrode portion
- sub
- adsorbing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
- 238000000034 method Methods 0.000 claims description 26
- 239000000758 substrate Substances 0.000 claims description 19
- 238000001179 sorption measurement Methods 0.000 claims description 8
- 239000000463 material Substances 0.000 claims description 6
- 238000001704 evaporation Methods 0.000 claims description 2
- 244000126211 Hericium coralloides Species 0.000 claims 2
- 230000015572 biosynthetic process Effects 0.000 claims 2
- 230000005611 electricity Effects 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 2
- 230000003068 static effect Effects 0.000 claims 2
- 230000008021 deposition Effects 0.000 claims 1
- 238000007740 vapor deposition Methods 0.000 description 3
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR10-2018-0066582 | 2018-06-11 | ||
| KR1020180066582A KR102427823B1 (ko) | 2018-06-11 | 2018-06-11 | 정전척 시스템, 성막장치, 흡착방법, 성막방법 및 전자 디바이스의 제조방법 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2019216230A JP2019216230A (ja) | 2019-12-19 |
| JP2019216230A5 true JP2019216230A5 (cg-RX-API-DMAC7.html) | 2022-01-06 |
| JP7278541B2 JP7278541B2 (ja) | 2023-05-22 |
Family
ID=68810467
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018221716A Active JP7278541B2 (ja) | 2018-06-11 | 2018-11-27 | 静電チャックシステム、成膜装置、吸着方法、成膜方法及び電子デバイスの製造方法 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP7278541B2 (cg-RX-API-DMAC7.html) |
| KR (1) | KR102427823B1 (cg-RX-API-DMAC7.html) |
| CN (1) | CN110578118A (cg-RX-API-DMAC7.html) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102411995B1 (ko) * | 2018-09-21 | 2022-06-21 | 캐논 톡키 가부시키가이샤 | 정전척 시스템, 성막장치, 흡착 및 분리방법, 성막방법 및 전자 디바이스의 제조방법 |
| CN113005403B (zh) * | 2019-12-20 | 2023-06-20 | 佳能特机株式会社 | 成膜装置、使用其的成膜方法及电子器件的制造方法 |
| KR102501609B1 (ko) * | 2019-12-20 | 2023-02-17 | 캐논 톡키 가부시키가이샤 | 성막 장치, 이를 사용한 성막 방법, 및 전자 디바이스의 제조방법 |
| CN113005398B (zh) * | 2019-12-20 | 2023-04-07 | 佳能特机株式会社 | 成膜装置、成膜方法及电子器件的制造方法 |
| KR102788970B1 (ko) * | 2019-12-23 | 2025-03-28 | 캐논 톡키 가부시키가이샤 | 성막 장치, 성막 방법, 및 전자 디바이스의 제조방법 |
| KR20210081589A (ko) * | 2019-12-24 | 2021-07-02 | 캐논 톡키 가부시키가이샤 | 성막장치, 전자 디바이스 제조장치, 성막방법, 및 전자 디바이스 제조방법 |
| CN113093416B (zh) * | 2021-04-02 | 2024-04-12 | 曲面超精密光电(深圳)有限公司 | 一种超长宽比平面全贴合方法及其设备 |
| CN119411099A (zh) * | 2024-11-15 | 2025-02-11 | 京东方科技集团股份有限公司 | 气相沉积设备 |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06204325A (ja) * | 1992-12-28 | 1994-07-22 | Hitachi Ltd | 静電吸着装置およびその吸着方法 |
| JP3805134B2 (ja) * | 1999-05-25 | 2006-08-02 | 東陶機器株式会社 | 絶縁性基板吸着用静電チャック |
| JP4647122B2 (ja) * | 2001-03-19 | 2011-03-09 | 株式会社アルバック | 真空処理方法 |
| EP1359466A1 (en) * | 2002-05-01 | 2003-11-05 | ASML Netherlands B.V. | Chuck, lithographic projection apparatus, method of manufacturing a chuck and device manufacturing method |
| JP2005116849A (ja) | 2003-10-09 | 2005-04-28 | Canon Inc | 静電吸着装置及び方法、露光装置、デバイスの製造方法 |
| JP4884811B2 (ja) | 2006-03-20 | 2012-02-29 | 三菱重工業株式会社 | ガラス基板の静電吸着装置及びその吸着離脱方法 |
| DE102008037387A1 (de) * | 2008-09-24 | 2010-03-25 | Aixtron Ag | Verfahren sowie Vorrichtung zum Abscheiden lateral strukturierter Schichten mittels einer magnetisch auf einem Substrathalter gehaltenen Schattenmaske |
| JP2011195907A (ja) * | 2010-03-19 | 2011-10-06 | Tokyo Electron Ltd | マスク保持装置及び薄膜形成装置 |
| JP2014065959A (ja) | 2012-09-27 | 2014-04-17 | Hitachi High-Technologies Corp | 蒸着装置、および、蒸着装置における基板設置方法 |
| WO2015042302A1 (en) * | 2013-09-20 | 2015-03-26 | Applied Materials, Inc. | Substrate carrier with integrated electrostatic chuck |
| WO2015171207A1 (en) | 2014-05-09 | 2015-11-12 | Applied Materials, Inc. | Substrate carrier system and method for using the same |
| US9463543B2 (en) * | 2014-06-02 | 2016-10-11 | Applied Materials, Inc. | Electromagnetic chuck for OLED mask chucking |
| KR102235605B1 (ko) * | 2014-10-08 | 2021-04-06 | 삼성디스플레이 주식회사 | 증착 장치 및 이를 이용한 증착 방법 |
| JP6526795B2 (ja) * | 2015-04-15 | 2019-06-05 | 株式会社アルバック | 基板の保持方法 |
| KR102586049B1 (ko) * | 2015-11-13 | 2023-10-10 | 삼성디스플레이 주식회사 | 마스크 프레임 조립체, 표시 장치의 제조 장치 및 표시 장치의 제조 방법 |
| KR102490641B1 (ko) * | 2015-11-25 | 2023-01-20 | 삼성디스플레이 주식회사 | 증착 장치 및 증착 방법 |
| KR102520693B1 (ko) | 2016-03-03 | 2023-04-11 | 엘지디스플레이 주식회사 | 유기발광소자의 증착장치 |
| JP6351918B2 (ja) * | 2016-06-24 | 2018-07-04 | キヤノントッキ株式会社 | 基板載置方法、成膜方法、電子デバイスの製造方法 |
| CN107856041B (zh) * | 2016-09-22 | 2021-04-20 | 欣兴电子股份有限公司 | 吸盘装置以及元件转移方法 |
-
2018
- 2018-06-11 KR KR1020180066582A patent/KR102427823B1/ko active Active
- 2018-11-27 JP JP2018221716A patent/JP7278541B2/ja active Active
- 2018-12-20 CN CN201811560378.1A patent/CN110578118A/zh active Pending
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