JP2019191016A5 - - Google Patents

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JP2019191016A5
JP2019191016A5 JP2018084600A JP2018084600A JP2019191016A5 JP 2019191016 A5 JP2019191016 A5 JP 2019191016A5 JP 2018084600 A JP2018084600 A JP 2018084600A JP 2018084600 A JP2018084600 A JP 2018084600A JP 2019191016 A5 JP2019191016 A5 JP 2019191016A5
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Japan
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magnetic
asic
detection element
magnetic field
substrate film
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JP2018084600A
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Japanese (ja)
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JP7062216B2 (ja
JP2019191016A (ja
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Publication of JP2019191016A5 publication Critical patent/JP2019191016A5/ja
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JP2018084600A 2018-04-25 2018-04-25 超薄型高感度磁気センサ Active JP7062216B2 (ja)

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JP2018084600A JP7062216B2 (ja) 2018-04-25 2018-04-25 超薄型高感度磁気センサ

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Application Number Priority Date Filing Date Title
JP2018084600A JP7062216B2 (ja) 2018-04-25 2018-04-25 超薄型高感度磁気センサ

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JP2019191016A JP2019191016A (ja) 2019-10-31
JP2019191016A5 true JP2019191016A5 (enExample) 2021-04-01
JP7062216B2 JP7062216B2 (ja) 2022-05-06

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JP2018084600A Active JP7062216B2 (ja) 2018-04-25 2018-04-25 超薄型高感度磁気センサ

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Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6924453B1 (ja) * 2020-08-26 2021-08-25 マグネデザイン株式会社 Ｇｓｒセンサ素子の製造方法
JP6839399B1 (ja) * 2020-09-29 2021-03-10 マグネデザイン株式会社 磁界検出素子
FR3116896B1 (fr) * 2020-11-27 2022-11-18 Ntn Snr Roulements Capteur apte à détecter le champ magnétique d’un codeur à distance d’entrefer
JP7215702B1 (ja) 2022-06-15 2023-01-31 マグネデザイン株式会社 磁界ベクトルセンサ
WO2024085098A1 (ja) * 2022-10-17 2024-04-25 マグネデザイン株式会社 Ｇｓｒ素子の製造方法
JP7329782B1 (ja) 2022-12-09 2023-08-21 マグネデザイン株式会社 Ｇｓｒ素子の製造方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3603406B2 (ja) * 1995-09-11 2004-12-22 株式会社デンソー 磁気検出センサおよびその製造方法
JPH1130657A (ja) * 1997-07-14 1999-02-02 Alps Electric Co Ltd 磁気センサ
JP2000238280A (ja) * 1999-02-25 2000-09-05 Casio Comput Co Ltd インクジェットプリンタの製造方法
JP2005109037A (ja) * 2003-09-29 2005-04-21 Sanyo Electric Co Ltd 半導体装置
JP4425072B2 (ja) * 2004-06-29 2010-03-03 三洋電機株式会社 回路装置およびその製造方法
JP2006319094A (ja) * 2005-05-12 2006-11-24 Fujikura Ltd 半導体装置およびその製造方法
KR100629359B1 (ko) * 2005-08-09 2006-10-02 삼성전자주식회사 감광성 폴리이미드막을 사용하여 반도체소자를 제조하는방법들 및 그에 의해 제조된 반도체소자들
JP2007281230A (ja) * 2006-04-07 2007-10-25 Fujikura Ltd 半導体装置およびその製造方法
US7750627B2 (en) * 2006-10-24 2010-07-06 Headway Technologies, Inc. Magnetic film sensor having a magnetic film for generating a magnetostriction and a depressed insulating layer
DE102015202871A1 (de) 2015-02-18 2016-08-18 Robert Bosch Gmbh Hallsensor
JP6302613B1 (ja) * 2017-03-01 2018-03-28 ナノコイル株式会社 ナノコイル型ｇｓｒセンサ素子の製造方法

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