JP2019186306A5 - - Google Patents
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- JP2019186306A5 JP2019186306A5 JP2018072625A JP2018072625A JP2019186306A5 JP 2019186306 A5 JP2019186306 A5 JP 2019186306A5 JP 2018072625 A JP2018072625 A JP 2018072625A JP 2018072625 A JP2018072625 A JP 2018072625A JP 2019186306 A5 JP2019186306 A5 JP 2019186306A5
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- JP
- Japan
- Prior art keywords
- gas
- chamber
- control unit
- time
- plasma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 7
- 229910052796 boron Inorganic materials 0.000 description 7
- 238000000034 method Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2018072625A JP7049894B2 (ja) | 2018-04-04 | 2018-04-04 | ボロン系膜の成膜方法および成膜装置 |
| US17/041,767 US11615957B2 (en) | 2018-04-04 | 2019-02-26 | Method for forming boron-based film, formation apparatus |
| PCT/JP2019/007273 WO2019193872A1 (ja) | 2018-04-04 | 2019-02-26 | ボロン系膜の成膜方法および成膜装置 |
| KR1020207030966A KR102493031B1 (ko) | 2018-04-04 | 2019-02-26 | 보론계 막의 성막 방법 및 성막 장치 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2018072625A JP7049894B2 (ja) | 2018-04-04 | 2018-04-04 | ボロン系膜の成膜方法および成膜装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2019186306A JP2019186306A (ja) | 2019-10-24 |
| JP2019186306A5 true JP2019186306A5 (enrdf_load_stackoverflow) | 2021-03-04 |
| JP7049894B2 JP7049894B2 (ja) | 2022-04-07 |
Family
ID=68341965
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018072625A Active JP7049894B2 (ja) | 2018-04-04 | 2018-04-04 | ボロン系膜の成膜方法および成膜装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP7049894B2 (enrdf_load_stackoverflow) |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05213695A (ja) * | 1992-02-03 | 1993-08-24 | Matsushita Electric Ind Co Ltd | ダイヤモンド薄膜の堆積方法 |
| JPH07300665A (ja) * | 1994-05-02 | 1995-11-14 | Yuken Kogyo Kk | 金属基材のホウ素拡散浸透層・ホウ素膜形成方法 |
| JP3605634B2 (ja) | 1999-12-27 | 2004-12-22 | 独立行政法人物質・材料研究機構 | 立方晶窒化ホウ素の気相合成法 |
| JP4358765B2 (ja) | 2005-02-28 | 2009-11-04 | 三菱重工業株式会社 | 窒化ホウ素膜の成膜方法及び成膜装置 |
| JP4960193B2 (ja) | 2007-10-12 | 2012-06-27 | 株式会社アルバック | 半導体装置の製造方法及び半導体装置の製造装置 |
| WO2011083869A1 (ja) | 2010-01-11 | 2011-07-14 | 国立大学法人九州大学 | 立方晶窒化ホウ素コーティング法およびそれにより得られる材料 |
-
2018
- 2018-04-04 JP JP2018072625A patent/JP7049894B2/ja active Active
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