JP2019126749A - Processing device and production method of product - Google Patents

Abstract

To suppress adhesion of a processed waste to a washing roller immersed in a washing fluid.SOLUTION: A processing device comprises: processing mechanisms 6A, 6B for processing a workpiece W; and a washing mechanism 8 for washing the workpiece W which has been processed. The washing mechanism 8 comprises: a liquid storage tank 81 for storing a washing fluid; and a washing roller 82 which rotates with a part thereof being immersed in the washing fluid in the liquid storage tank 81 and makes contact with the workpiece W which has been processed and which is located above the liquid storage tank 81. A liquid supply port 83 for supplying the washing fluid to the liquid storage tank 81 and a liquid discharge port 84 for discharging the washing fluid from the liquid storage tank 81 are arranged across the washing roller 82.SELECTED DRAWING: Figure 2

Description

  The present invention relates to a processing apparatus and a product manufacturing method.

  Conventionally, as shown in Patent Document 1, after cutting a workpiece, which is a workpiece, into pieces, a cutting roller attached to the workpiece by bringing a cleaning roller such as a rotating brush into contact with the cut workpiece, etc. The processing waste is removed and cleaned.

Unexamined-Japanese-Patent No. 2002-28583

  However, there is a case in which machining debris adheres to the cleaning roller during cleaning, and the machining debris can not be removed. In this case, the work is to be cleaned by the cleaning roller with the swarf, which may reduce the cleaning ability.

  Accordingly, the present invention has been made to solve the above-mentioned problems, and its main object is to efficiently remove the processing waste adhering to the cleaning roller.

  That is, a processing apparatus according to the present invention includes a processing mechanism that processes a workpiece, and a cleaning mechanism that cleans the processed workpiece, and the cleaning mechanism stores a cleaning liquid. And a cleaning roller that rotates in a state of being partially immersed in the cleaning liquid in the liquid storage tank and is in contact with the processed workpiece that is positioned above the liquid storage tank. A liquid supply port for supplying a cleaning liquid into the liquid tank and a liquid discharge port for discharging the cleaning liquid from the liquid storage tank are arranged with the cleaning roller interposed therebetween.

  According to the present invention configured as described above, machining debris attached to the cleaning roller can be efficiently removed.

It is a top view which shows typically the structure of the cutting device of this embodiment. It is a top view which shows typically the structure of the washing | cleaning mechanism of the embodiment. It is sectional drawing which shows typically the structure of the washing | cleaning mechanism of the embodiment. It is sectional drawing which shows typically the structure of the washing | cleaning mechanism of deformation | transformation embodiment. It is sectional drawing which shows the structure of the washing | cleaning mechanism of modification embodiment typically, and a partial top view of an example of a removal member.

  Next, the present invention will be described in more detail with reference to examples. However, the present invention is not limited by the following description.

As described above, the processing apparatus of the present invention includes the processing mechanism for processing the workpiece and the cleaning mechanism for cleaning the workpiece subjected to the processing, and the cleaning mechanism stores the cleaning liquid. A liquid tank, and a cleaning roller which rotates in a state in which a part of the liquid tank is immersed in the cleaning liquid in the liquid storage tank, and which is in contact with the processed object located above the liquid storage tank; A liquid supply port for supplying a cleaning liquid into the liquid storage tank and a liquid discharge port for discharging the cleaning liquid from the liquid storage tank are disposed sandwiching the cleaning roller.
In this processing device, the cleaning roller rotates in a state where the cleaning roller is partially immersed in the cleaning solution in the liquid storage tank, and contacts the workpiece to be cleaned, so that the processing debris attached to the cleaning roller is removed by the cleaning solution Is done.
Here, there is a possibility that the machining debris removed from the cleaning roller in the liquid storage tank may stagnate in the liquid storage tank and adhere to the cleaning roller. In the present invention, since the liquid supply port and the liquid discharge port are disposed to sandwich the cleaning roller, the flow of the cleaning liquid is formed from the liquid supply port to the liquid discharge port with respect to the cleaning roller. As a result, the cleaning liquid strikes the cleaning roller from one direction, and thereafter, the cleaning liquid is discharged from the liquid discharge port to the outside, so that the scrap removed from the cleaning roller in the storage tank is discharged together with the cleaning liquid. Will be. Thereby, it is possible to make it difficult for the processing waste in the liquid storage tank to adhere to the cleaning roller.

Heavy processing waste tends to sink and stay at the bottom of the liquid storage tank. There is a possibility that the sunken work pieces are stirred by the rotation of the washing roller, move to the water surface side, and reattach to the washing roller.
In order to solve this problem suitably, it is desirable that the liquid outlet be formed at the bottom of the liquid storage tank.
With this configuration, the processing waste that has sunk to the bottom of the liquid storage tank can be efficiently discharged, and re-adhesion to the cleaning roller can be reduced.

  In order to reduce the installation area of the cleaning mechanism, the liquid supply port is preferably formed at the bottom of the liquid storage tank. In this case, the liquid supply pipe connected to the liquid supply port is connected to the bottom of the storage tank. In this configuration, it is preferable that the cleaning mechanism further includes a cover member provided so as to cover the liquid supply port in order to prevent the cleaning liquid from being spouted from the liquid supply port.

When the workpiece is a singulated cut substrate or the like, the washing roller has a cylindrical shape and rotates around its central axis in order to wash the cut substrate at once. Is desirable.
In the case of this configuration, it is desirable that the liquid supply port and the liquid discharge port be disposed sandwiching the central axis of the cleaning roller.

  In order to uniformly remove the processing waste adhering to the cleaning roller by making the cleaning liquid flowing to the cleaning roller more uniform, the liquid storage tank is provided between the cleaning roller and the liquid supply port, A partition plate that divides into a first liquid storage chamber on the liquid supply port side and a second liquid storage chamber on the cleaning roller side, and causes the cleaning liquid to overflow from the first liquid storage chamber to the second liquid storage chamber; Is desirable. By making the flow of the cleaning solution even more uniform, it is possible to evenly discharge the processing debris remaining in the storage tank.

  In order to make it easy to generate the flow to the cleaning roller and the liquid discharge port, and to make it easier for the processing waste sinking to the bottom of the liquid storage tank to flow to the liquid discharge port, the bottom of the liquid storage tank has the liquid supply port It is desirable to include an inclined portion which descends from the side toward the liquid outlet side.

  There is a possibility that the cutting waste can not be sufficiently removed only by bringing the cleaning solution into contact with the cleaning roller. For this reason, it is desirable that the cleaning mechanism further includes a removing member that contacts the cleaning roller above the liquid storage tank and removes processing waste adhering to the cleaning roller.

  The product manufacturing method according to the present invention includes a processing step of processing a workpiece and a cleaning step of cleaning the workpiece subjected to the processing, and the cleaning step uses a cleaning mechanism. The cleaning mechanism rotates in a state in which the cleaning liquid is stored in the liquid storage tank and the cleaning liquid in the liquid storage tank is partially immersed in the cleaning mechanism, and the processing is performed above the liquid storage tank. A liquid supply port for supplying a cleaning liquid into the liquid storage tank, and a liquid discharge port for discharging the cleaning liquid from the liquid storage tank, with the cleaning roller interposed therebetween. It is characterized by being arranged.

<One Embodiment of the Present Invention>
Hereinafter, an embodiment of a processing apparatus according to the present invention will be described with reference to the drawings. In addition, also about any figure shown below, in order to make it intelligible, it abbreviate | omits or exaggerates suitably and is schematically drawn. About the same component, the same numerals are attached and explanation is omitted suitably.

<Overall configuration of processing equipment>
The processing apparatus 100 according to the present embodiment is a cutting apparatus that singulates into a plurality of products P (cut articles) by cutting a sealed plate-like member W, which is a workpiece, as shown in FIG. 1. . The cutting device 100 includes a plate-like member supply unit A, a plate-like member cutting unit B, an inspection unit C, and a receiving unit D as components. Each component (each unit A to D) is detachable and replaceable with respect to other components.

  Here, the sealed plate-like member W virtually divides a plate-like member such as a printed board or a lead frame into a plurality of lattice-like regions, and chip-like elements (for example, semiconductor chips) in each region. A part of or the whole of the plate-like member is resin-sealed. The sealed plate member W has a surface on the substrate side and a surface on the resin side. The sealed substrate is cut by a cutting mechanism (machining mechanism) using a rotary blade or the like, and the product P is obtained by singulating each area unit. In addition, below, the example which cut | disconnects a sealed substrate as the sealed plate-shaped member W is shown.

  The plate member supply unit A is provided with a plate member supply mechanism 2. A sealed substrate W corresponding to an object to be cut is carried out from the plate-like member supply mechanism 2 and transferred to the plate-like member cutting unit B by a transfer mechanism (not shown). The sealed substrate W may be transported with the surface on the substrate side up and may be transported with the surface on the resin side up. For example, a sealed substrate W of the BGA (Ball Grid Array Package) method is transferred with the surface on the substrate side up. On the other hand, a sealed substrate W resin-sealed using a transparent resin material such as an LED is often transported with the surface on the resin side up. In FIG. 1, the case of cutting the sealed substrate W of the BGA method will be described. Therefore, the sealed substrate W is transferred with the substrate side surface up.

  A cutting device 100 shown in FIG. 1 is a single-cut table type cutting device. Therefore, the plate-like member cutting unit B is provided with one cutting table 3. The cutting table 3 is movable in the Y direction in FIG. 1 by the moving mechanism 4 and is rotatable in the θ direction by the rotation mechanism 5. The sealed substrate W is placed on the cutting table 3 and adsorbed. In addition, a ceramic substrate (ceramic substrate) and a printed wiring board (printed wiring) each having a plurality of contact image sensors, a plurality of thermal print heads (Thermal Print Head), etc., each having an elongated row shape. In the case of singulating the board or the like, the rotation mechanism 5 may be omitted.

  The plate-like member cutting unit B is provided with two spindles 6A and 6B as a cutting mechanism (processing mechanism). The cutting device 100 is a twin-spindle cutting device in which two spindles 6A and 6B are provided. The two spindles 6A, 6B are independently movable in the X direction. Rotary blades 61A and 61B are provided on the two spindles 6A and 6B, respectively. The rotary blades 61A and 61B cut the sealed substrate W by rotating in the plane including the Y direction and the Z direction.

  Each spindle 6A, 6B is provided with a cutting water supply nozzle (not shown) for injecting cutting water toward the workpiece point in order to suppress frictional heat generated by the rotary blades 61A, 61B rotating at high speed, for example. . The sealed substrate W is cut by relatively moving the cutting table 3 and the spindles 6A and 6B. FIG. 1 shows a case where the sealed substrate W is cut by fixing the spindles 6A and 6B and moving the cutting table 3 in the Y direction.

  The plate-like member cutting unit B has an assembly of a plurality of products P cut into pieces by cutting the sealed substrate W, that is, one surface of a cut substrate (cut plate-like member) W ′. A cleaning mechanism 7 for cleaning (the surface on the substrate side in FIG. 1) and a cleaning mechanism 8 for cleaning the other surface (the surface on the resin side in FIG. 1) are provided.

  In the cleaning mechanism 7, a jet cleaning mechanism 71 and a drying mechanism 72 are integrally provided. The cutting table 3 linearly reciprocates along the Y direction below the cleaning mechanism 7 by the moving mechanism 4. As the cutting table 3 linearly reciprocates below the cleaning mechanism 7, the substrate-side surface of the cut substrate W ′ is cleaned by the jet cleaning mechanism 71 and dried by the drying mechanism 72. The cleaning mechanism 7 having the jet cleaning mechanism 71 and the drying mechanism 72 may move integrally or may be fixed.

  The cleaning mechanism 8 is provided with a cleaning roller 82 which is rotatable with the Y direction as a rotation axis. The cut substrate W 'is disposed above the cleaning mechanism 8 that cleans the surface on the resin side. The cut substrate W ′ is fixed by suction by the transport mechanism 9 on the substrate side surface. In other words, the cut substrate W 'is fixed to the transport mechanism 9 with the resin side surface down. The transport mechanism 9 is movable in the X direction and the Z direction. As the transport mechanism 9 descends and reciprocates in the X direction, the cleaning roller 82 cleans the resin-side surface of the cut substrate W ′. A drying unit for drying the resin-side surface of the cut substrate W 'after cleaning may be provided in the cleaning mechanism 8 or may be provided outside the cleaning mechanism. The drying unit may be air blow or the like.

  The inspection unit C is provided with an inspection stage 10. The cut substrate W ′ is transferred onto the inspection stage 10. The inspection stage 10 is configured to be movable in the X direction and to be rotatable about the Y direction. The plurality of separated products P are inspected by the inspection camera 11 on the resin side surface and the substrate side surface, and are classified into non-defective products and defective products. The inspected cut substrate W ′ is transferred to the index table 12. The inspection unit C is provided with a plurality of transfer mechanisms 13 for transferring a plurality of products P arranged on the index table 12 to the tray.

  The accommodation unit D is provided with a non-defective product tray 14 for containing non-defective products and a defective product tray 15 for containing defective products. The products P sorted into the non-defective product and the non-defective product by the transfer mechanism 13 are accommodated in the respective trays 14 and 15. Although only one each of the trays 14 and 15 is shown in FIG. 1, a plurality of the trays 14 and 15 are provided in the accommodation unit D. Further, the storage unit D includes a non-defective product tray storage unit that stores the non-defective product tray 14 that has stored the non-defective product, a defective product tray storage unit that stores the defective product tray 15 that has already stored the defective product, and the storage unit D. An empty tray (pre-accommodating tray) supply unit may be provided to supply the front empty tray.

  In the present embodiment, a control unit CTL that sets and controls the operation of the cutting apparatus 100, cutting conditions, cleaning conditions, and the like is provided in the plate-like member supply unit A. Not limited to this, the control unit CTL may be provided in other units B to D.

<Specific configuration of cleaning mechanism 8>
Next, the specific configuration of the cleaning mechanism 8 will be described.

  As shown in FIGS. 2 and 3 in particular, the cleaning mechanism 8 contacts a liquid storage tank 81 that stores water as a cleaning liquid, and a resin-side surface of the cut substrate W ′ that is positioned above the liquid storage tank 81. And a cleaning roller 82.

  The liquid storage tank 81 has a box shape having an opening 81 H on the top surface, and stores water for cleaning the cleaning roller 82. The liquid storage tank 81 of the present embodiment has a substantially rectangular bottom 81a having a flat plate shape, and side walls 81b provided on each side of the bottom 81a. In the liquid storage tank 81, a part of the cleaning roller 82 is provided so as to be immersed in water from the opening 81H on the upper surface.

  Further, the liquid storage tank 81 is formed with a liquid supply port 83 for supplying water into the tank 81 and a liquid discharge port 84 for discharging water from the tank. To the liquid supply port 83, a supply pipe 85 for supplying water from the outside to the liquid storage tank 81 is connected. The amount of water supplied from the supply pipe 85 is adjusted so that the water level in the liquid storage tank 81 is substantially constant by a flow rate adjusting mechanism (not shown). Further, the water discharged from the liquid discharge port 84 is stored in a waste liquid container (not shown) provided below. Note that a discharge pipe may be connected to the liquid discharge port 84.

  The cleaning roller 82 has a cylindrical shape and rotates around its central axis 82x. The central axis 82x of the cleaning roller 82 is provided horizontally along the Y direction above the liquid storage tank 81. The cleaning roller 82 of the present embodiment is a cylindrical rotating brush in which brush bristles 82 b are radially provided on the outer peripheral surface of the shaft portion 82 a.

  The cleaning roller 82 is configured to rotate in a state where a part of the water in the liquid storage tank 81 (specifically, a part of the bristles 82b in the circumferential direction) is immersed. Specifically, the cleaning roller 82 is rotatably supported at both ends in the axial direction of the shaft portion 82a by the support 80, and is driven to rotate by a motor (not shown) connected to one end portion in the axial direction. In addition, although the support body 80 is provided separately from the liquid storage tank 81, you may comprise using the side wall part 81b of the liquid storage tank 81. As shown in FIG.

  The cleaning mechanism 8 also includes a drainage member 86 for draining the water contained in the cleaning roller 82. The draining member 86 has a rod shape provided along the central axis 82x of the cleaning roller 82, and contacts the cleaning roller 82 that rotates during cleaning. The draining member 86 contacts the brush bristles 82b which go out of the water and go to the cut substrate W 'to drain the water.

  In the cleaning mechanism 8 of this embodiment, the liquid supply port 83 and the liquid discharge port 84 formed in the liquid storage tank 81 are arranged with the cleaning roller 82 interposed therebetween. The liquid supply port 83 and the liquid discharge port 84 are both formed in the bottom 81 a of the liquid storage tank 81.

  Two liquid supply ports 83 of the present embodiment are formed. The two liquid supply ports 83 are preferably provided at positions substantially equidistant from the central axis 82x of the cleaning roller 82, that is, at positions aligned in the Y direction. Moreover, it is preferable that the two liquid supply ports 83 be provided at substantially symmetrical positions in the Y direction at the bottom 81 a of the liquid storage tank 81. The number of the liquid supply ports 83 is not limited to two, and may be one or three or more. When three or more liquid supply ports 83 are formed, it is desirable to provide them at substantially equal intervals in the Y direction in order to make the flow of water uniform.

  On the other hand, the liquid discharge port 84 has a linear slit shape extending in the Y direction. The liquid discharge port 84 is preferably provided so that the direction extending in a straight slit shape is substantially parallel to the central axis 82x of the cleaning roller 82, that is, along the Y direction. A plurality of liquid discharge ports 84 may be formed in the same manner as the liquid supply port 83.

  Further, the liquid storage tank 81 has a partition plate 87 that partitions the inside of the tank 81 into a first liquid storage chamber S1 on the liquid supply port 83 side and a second liquid storage chamber S2 on the cleaning roller 82 side.

  The partition plate 87 is provided between the cleaning roller 82 and the liquid supply port 83 so as to be substantially parallel to the central axis 82 x of the cleaning roller 82. The height dimension of the partition plate 87 is substantially the same in the longitudinal direction in plan view. The height of the partition plate 87 is set lower than the height of the side wall 81 b of the liquid storage tank 81. Thereby, it is comprised so that water may not overflow from the side wall part 81b of the liquid storage tank 81. FIG.

  In the bottom 81a of the liquid storage tank 81, a liquid supply port 83 is positioned on the first liquid storage chamber S1 side, and a liquid discharge port 84 is positioned on the second liquid storage chamber S2 side. Then, the water stored in the first liquid storage chamber S1 from the liquid supply port 83 overflows the partition plate 87 and flows into the second liquid storage chamber S2. Here, the water that has flowed into the first liquid storage chamber S1 from the liquid supply port 83 is stored in the first liquid storage chamber S1, so that unevenness in the flow velocity in the width direction (Y direction in FIG. 2) is alleviated. Further, the water flowing into the second liquid storage chamber S2 from the first liquid storage chamber S1 overflows the partition plate 87, whereby the flow velocity in the width direction is made more uniform. Thus, the flow of water flowing toward the cleaning roller 82 in the second liquid storage chamber S2 is made more uniform in the axial direction of the cleaning roller 82.

  In the present embodiment, the rotation direction of the cleaning roller 82 is opposite to the flow direction of water (see FIG. 3). As a result, the movement direction of the brush bristles 82b of the cleaning roller 82 in water and the flow direction of water are reversed, so that the force received from the water when the immersion part (brush bristles 82b) of the cleaning roller 82 comes into contact with water As a result, machining debris attached to the cleaning roller 82 is easily removed.

  Furthermore, the cleaning mechanism 8 further includes a cover member 88 provided to cover the liquid supply port 83. Since the liquid supply port 83 of the present embodiment is formed at the bottom 81 a of the liquid storage tank 81, the cover member 88 is also provided at the bottom 81 a of the liquid storage tank 81. A cover member 88 is provided for each liquid supply port 83.

The cover member 88 is spaced apart from the liquid supply port 83 in the liquid storage tank 81 (specifically, in the first liquid storage chamber S1), and is provided above the liquid supply port 83. In the present embodiment, the cover member 88 is a liquid supply port 83. The water that flows in upward from the side is dispersed in the horizontal direction (Y direction). In FIG. 2, it is configured to disperse in two directions along the Y direction. The cover member 88 may be configured to cover a part of the liquid supply port 83 as well as to cover the entire liquid supply port 83 as shown in FIG. In addition, the cover member 88 is not limited to a U-shaped cross section downward as long as it covers part or all of the liquid supply port 83.
Thus, by providing the cover member 88 so as to cover the liquid supply port 83, the water flowing from the liquid supply port 83 is dispersed by the cover member 88, and the unevenness of the flow velocity in the first liquid storage chamber S1 is further alleviated. can do.

<Effect of this embodiment>
According to the cutting apparatus 100 of the present embodiment, the cleaning roller 82 rotates in a state in which the cleaning roller 82 is partially immersed in the water in the liquid storage tank 81 and contacts the cut substrate W ′ to clean it. The chips attached to the water are removed by water.
In particular, in the present embodiment, since the liquid supply port 83 and the liquid discharge port 84 are disposed with the cleaning roller 82 interposed therebetween, the flow of water from the liquid supply port 83 to the liquid discharge port 84 with respect to the cleaning roller 82 Is formed. As a result, water strikes the cleaning roller 82 from one direction, and then the water is discharged from the liquid discharge port 84 to the outside, so the scrap removed from the cleaning roller 82 in the liquid storage tank 81 is It will be discharged with the water. By this, it is possible to make it difficult for the processing debris in the liquid storage tank 81 to adhere to the cleaning roller 82.

  In the present embodiment, since the liquid discharge port 84 is formed in the bottom 81 a of the liquid storage tank 81, the processing waste that has settled on the bottom 81 a of the liquid storage tank 81 can be efficiently discharged to the cleaning roller 82. Can reduce reattachment of

  Further, in the present embodiment, since the cover member 88 that covers the liquid supply port 83 is provided, it is possible to prevent the water from flowing from the liquid supply port 83 and to disperse the water that has flowed from the liquid supply port 83, and to wash the liquid. The flow rate of the water flowing through the roller 82 can be made even more uniform.

  In addition, the liquid storage tank 81 is partitioned into a first liquid storage chamber S1 and a second liquid storage chamber S2 by a partition plate 87, and water is allowed to overflow from the first liquid storage chamber S1 to the second liquid storage chamber S2. Therefore, by making the water flowing to the cleaning roller 82 more even, it is possible to uniformly remove the processing debris attached to the cleaning roller 82.

<Other Modified Embodiments>
The present invention is not limited to the above embodiment.

  For example, the positions of the liquid supply port 83 and the liquid discharge port 84 may be the side wall 81 b of the liquid storage tank 81. In this case, it is desirable that the liquid discharge port 84 be located as close as possible to the bottom 81 a in order to facilitate discharge of the sunken cuttings.

  Further, without providing the liquid supply port 83 and the liquid discharge port 84 at the bottom or side wall portion 81b of the liquid storage tank 81, the liquid supply pipe 8A and the liquid discharge provided separately from the liquid storage tank 81 as shown in FIG. You may comprise by the pipe | tube 8B. In this case, the opening on the liquid storage tank 81 side in the liquid supply pipe 8A is the liquid supply port 83, and the opening in the liquid discharge pipe 8B is the liquid discharge port 84 on the liquid storage tank 81 side. In this case, it is desirable that the liquid outlet 84 be disposed as close as possible to the bottom 81 a of the liquid storage tank 81. Further, a suction pump (not shown) is provided in the liquid discharge pipe 8B, and the water in the liquid storage tank 81 is suctioned.

  Further, the height dimension of the partition plate 87 may not be substantially the same, and the height dimension may be configured to be different in the longitudinal direction in plan view. For example, by making the height dimension of the central part of the partition plate 87 lower than both end parts, the flow of the cleaning liquid in the central part can be made faster, or vice versa. Can be faster. Furthermore, it is conceivable to set the height dimension in accordance with the positional relationship with the liquid supply port 83. For example, it is conceivable to make the flow uniform by increasing the height of the portion close to the liquid supply port 83 and decreasing the height of the portion far from the liquid supply port 83.

  In addition, as shown in FIG. 5, the bottom 81 a of the liquid storage tank 81 may have an inclined portion 81 a 1 that descends from the liquid supply port 83 side toward the liquid discharge port 84 side. In FIG. 5, the partition plate 87 is provided, and the inclined portion 81a1 is configured to descend from the partition plate 87 toward the liquid discharge port 84 side. The inclined portion 81a1 is not limited to a flat (straight) shape, and may be a curved shape with a concave in the center in the width direction, and forms a flow of cleaning liquid toward the liquid discharge port 84. It is good if it is. By this inclined portion 81a1, the processing waste can be efficiently discharged from the liquid discharge port 84.

  In addition, as shown in FIG. 5, the cleaning mechanism 8 further includes a removing member 89 that contacts the cleaning roller 82 above the liquid storage tank 81 and removes processing waste adhering to the cleaning roller 82. Also good. As shown in FIG. 5, the removing member 89 has a rod shape provided along the central axis 82x of the cleaning roller 82, and contacts the cleaning roller 82 that rotates during cleaning. In the case where the cleaning roller 82 is a rotating brush, it can be considered that the cleaning roller 82 has a comb shape having a plurality of protrusions 89a in order to easily remove the processing debris that has entered between the bristles. The removing member 89 has a function of removing water contained in the cleaning roller 82 in addition to the function of removing the processing dust attached to the cleaning roller 82. The removing member 89 is provided on the way from the cleaning liquid 82 to the cut substrate W ′, but may be provided on the way from the cut substrate W ′ to the cleaning liquid.

  In the embodiment, when the sealed substrate W sealed with the resin is cut, the sealed substrate W is transferred with the surface on the resin side up. At this time, the cleaning mechanism 7 cleans the resin-side surface of the cut substrate W ′, and the cleaning mechanism 8 cleans the substrate-side surface of the cut substrate W ′.

  The cleaning roller may be made of a sponge-like or other water-permeable material other than the rotating brush.

  In addition, in the above embodiment, the single-cut table type twin-spindle cutting apparatus has been described. However, the present invention is not limited thereto, and the single-cut table type single-spindle-type cutting apparatus and twin-cut table are used. The method may be a cutting apparatus having a single spindle configuration or a twin-cut table system, a cutting apparatus having a twin spindle configuration, or the like.

  In addition, the processing apparatus of the present invention may perform processing other than cutting, and may perform other machining such as cutting and grinding.

  In addition, it goes without saying that the present invention is not limited to the above embodiment, and various modifications can be made without departing from the scope of the invention.

100 ... Cutting device (processing device)
W ... Sealed substrate (Sealed plate member, workpiece)
W '... Cut substrate (cut plate member)
P ··· Product A · · · Plate-like member supply unit B · · · Plate-like member cutting unit C · · · · · · · · · · · · · · Inspection unit D · · · accommodation unit CTL · · · control unit 2 · · · plate-like member supply mechanism 3 ... Cutting table 4 ... Moving mechanism 5 ... Rotating mechanism 6A ... Spindle (processing mechanism)
61A ··· Rotary blade 6B · · · Spindle (machining mechanism)
61B ··· Rotary blade 7 ··· Cleaning mechanism 71 ··· Spray cleaning mechanism 72 ··· Drying mechanism 8 ··· Cleaning mechanism 9 ··· Transport mechanism 10 ··· Stage for inspection 11 ··· Camera 12 · · · Index table 13 · · · Transfer mechanism 14 · · · · · Good tray 15 · · · Defective tray 80 · · · Support 81 · · · Storage tank 81 H · · · Opening 81a · · · · Bottom 81b ··· Side wall 82 · · · · Cleaning roller 82a · · · Shaft portion 82b · · · Brush bristles 82x · · · Center axis 83 · · · Liquid supply port 84 ··· Liquid discharge port 85 ··· Supply pipe 87 ... Partition plate S1 ... First liquid storage chamber S2 ... Second liquid storage chamber 88 ... Cover member 8A ... Liquid supply pipe 8B ... Liquid discharge pipe 81 a1 ... Inclined portion 86 · · · Draining member 89 · · · Removal member

Claims (12)

A processing mechanism for processing the workpiece, and a cleaning mechanism for cleaning the workpiece subjected to the processing,
The cleaning mechanism is a liquid storage tank for storing the cleaning liquid, and is rotated in a state where the cleaning liquid is partly immersed in the cleaning liquid in the liquid storage tank. Cleaning rollers that come into contact with objects,
A processing apparatus, wherein a liquid supply port for supplying a cleaning liquid into the liquid storage tank and a liquid discharge port for discharging a cleaning liquid from the liquid storage tank are disposed sandwiching the cleaning roller.   The processing apparatus according to claim 1, wherein the liquid discharge port is formed at a bottom of the liquid storage tank. The liquid supply port is formed at the bottom of the liquid storage tank,
The processing apparatus according to claim 1, wherein the cleaning mechanism further includes a cover member provided to cover the liquid supply port. The cleaning roller has a cylindrical shape and rotates around its central axis,
The processing apparatus according to any one of claims 1 to 3, wherein the liquid supply port and the liquid discharge port are disposed to sandwich the central axis.   The liquid storage tank is provided between the cleaning roller and the liquid supply port, and is divided into a first liquid storage chamber on the liquid supply port side and a second liquid storage chamber on the cleaning roller side, and the cleaning liquid The processing apparatus according to any one of claims 1 to 4, further comprising a partition plate which causes the second storage chamber to overflow from the first storage chamber.   The processing apparatus according to any one of claims 1 to 5, wherein a bottom portion of the liquid storage tank includes an inclined portion that descends from the liquid supply port side toward the liquid discharge port side.   The processing according to any one of claims 1 to 6, wherein the cleaning mechanism further includes a removing member that contacts the cleaning roller above the liquid storage tank and removes processing waste attached to the cleaning roller. apparatus. A processing step of processing a workpiece;
And d) cleaning the processed workpiece.
The cleaning step is performed using a cleaning mechanism,
The cleaning mechanism is a liquid storage tank for storing a cleaning liquid, and is rotated while partially immersed in the cleaning liquid in the liquid storage tank, and the processed workpiece is located above the liquid storage tank. Cleaning rollers that come into contact with objects,
A method of manufacturing a product, wherein a liquid supply port for supplying a cleaning liquid into the liquid storage tank and a liquid discharge port for discharging the cleaning liquid from the liquid storage tank are disposed with the cleaning roller interposed therebetween. The liquid supply port is formed at the bottom of the liquid storage tank,
The product manufacturing method according to claim 8, wherein the cleaning mechanism further includes a cover member provided to cover the liquid supply port.   The liquid storage tank is provided between the cleaning roller and the liquid supply port, and is divided into a first liquid storage chamber on the liquid supply port side and a second liquid storage chamber on the cleaning roller side, and the cleaning liquid The manufacturing method of the product of Claim 8 or 9 including the partition plate which makes it flow from said 1st storage chamber to said 2nd storage chamber.   The product manufacturing method according to any one of claims 8 to 10, wherein a bottom portion of the liquid storage tank includes an inclined portion that descends from the liquid supply port side toward the liquid discharge port side.   The product according to any one of claims 8 to 11, wherein the cleaning mechanism further includes a removing member that contacts the cleaning roller above the liquid storage tank and removes processing waste adhering to the cleaning roller. Manufacturing method.