JP2018101719A - Drainage mechanism - Google Patents

Drainage mechanism Download PDF

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JP2018101719A
JP2018101719A JP2016247743A JP2016247743A JP2018101719A JP 2018101719 A JP2018101719 A JP 2018101719A JP 2016247743 A JP2016247743 A JP 2016247743A JP 2016247743 A JP2016247743 A JP 2016247743A JP 2018101719 A JP2018101719 A JP 2018101719A
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flat plate
water
plate
cleaning
guide plate
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陽介 加計
Yosuke Kakei
陽介 加計
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Disco Corp
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Disco Abrasive Systems Ltd
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  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Grinding Of Cylindrical And Plane Surfaces (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a drainage mechanism capable of draining water accumulated on a flat plate reliably by a space saving configuration.SOLUTION: A drainage mechanism drains water (W) accumulated on the upper surface of a flat plate (31) by surface tension, and includes guide plates (50, 51) disposed at the outer peripheral part of the flat plate, while separated from the upper surface of the flat plate with a height less than the thickness (T) of the water accumulated by surface tension. The guide plate includes an overhang portion (52) overhanging further outside than the outer peripheral edge of the flat plate, and the water accumulated on the upper surface is introduced to the outside of the flat plate by causing capillary phenomenon at a gap (D1) formed by the upper surface of the flat plate and the lower surface of the guide plate, and the water reached the overhang portion is dropped by own weight thus draining the water accumulated on the upper surface of the flat plate. With such an arrangement, a drainage mechanism for draining water on the flat plate reliably with a space saving configuration is obtained.SELECTED DRAWING: Figure 1

Description

本発明は、平板上に溜まった水を排水するための排水機構に関する。   The present invention relates to a drainage mechanism for draining water accumulated on a flat plate.

半導体デバイス等の製造工程において、被加工物を吸着保持しながら搬送する搬送パッドの吸着面の洗浄や、被加工物の洗浄等を行うための洗浄装置が用いられる(例えば、特許文献1)。この種の洗浄装置では、洗浄水を供給しながら搬送パッドの吸着面や被加工物を洗浄し、洗浄後に搬送パッドの吸着面や被加工物を乾燥させる。   In a manufacturing process of a semiconductor device or the like, a cleaning device is used for cleaning a suction surface of a transport pad that transports a workpiece while sucking and holding the workpiece, cleaning the workpiece, and the like (for example, Patent Document 1). In this type of cleaning apparatus, the suction surface of the transport pad and the workpiece are cleaned while supplying cleaning water, and the suction surface of the transport pad and the workpiece are dried after cleaning.

特開2010−94785号公報JP 2010-94785 A

洗浄装置で洗浄に用いられた水は、所定の流路を通して排水される。ところが、洗浄装置を構成する平板部分の表面に水が付着した場合に、表面張力によって平板部分の表面上に水が溜まる場合がある。こうした平板部分が搬送パッドの吸着面や被加工物に近い位置にある場合、平板部分の表面に溜まった水が何らかの理由で巻き上がって、パッドの吸着面や被加工物を濡らしてしまうおそれがある。例えば、噴出する空気によって搬送パッドの吸着面や被加工物を乾燥させようとした場合に、噴出された空気が原因で、平板上での水の巻き上がりが生じる可能性がある。   The water used for cleaning by the cleaning device is drained through a predetermined flow path. However, when water adheres to the surface of the flat plate portion constituting the cleaning device, water may accumulate on the surface of the flat plate portion due to surface tension. If such a flat plate portion is located near the suction surface of the transport pad or the workpiece, the water accumulated on the surface of the flat plate portion may roll up for some reason and wet the suction surface of the pad or the workpiece. is there. For example, when the suction surface of the transport pad and the workpiece are dried by the air that is ejected, the air that is ejected may cause water to roll up on the flat plate.

上記のような平板部分への水の滞留を防ぐべく、水が付着する可能性のある部分を全て下方に水が流れやすい傾斜面で構成する、平板部分の表面上に特殊な撥水加工を施す、等の対策が考えられる。しかし、傾斜面を用いる構成は、上下方向のスペースが制約される場合に適用が難しいという問題がある。また、撥水加工を行っても、表面張力による水の溜まりが十分に解消されないおそれがあり、コストも高くなる。   In order to prevent the water from staying in the flat plate part as described above, a special water-repellent finish is formed on the surface of the flat plate part, which is composed of inclined surfaces where water can easily flow downward. Measures such as applying can be considered. However, the configuration using the inclined surface has a problem that it is difficult to apply when the vertical space is restricted. Moreover, even if water-repellent processing is performed, there is a possibility that the accumulation of water due to surface tension may not be sufficiently eliminated, resulting in an increase in cost.

本発明はこのような点に鑑みてなされたものであり、平板の上に溜まった水を省スペースな構成で確実に排水可能な排水機構を提供することを目的とする。   This invention is made | formed in view of such a point, and it aims at providing the drainage mechanism which can drain | drain the water collected on the flat plate reliably by a space-saving structure.

本発明は、平板の上面に表面張力で溜まった水を排水する排水機構であって、表面張力で溜まった水の厚み以下の高さで平板の上面から離間させ平板の外周部分に配設する案内板を備え、案内板は、平板の外周縁より外側にはみ出したはみ出し部を備え、平板の上面と案内板の下面とで形成される隙間で毛細管現象を作用させ平板の上面に溜まった水を平板の外側に誘導させ、はみ出し部に到達した水を自重落下させることで平板の上に溜まった水を排水させることを特徴とする。   The present invention is a drainage mechanism for draining water accumulated on the upper surface of a flat plate by surface tension, and is disposed at the outer peripheral portion of the flat plate at a height equal to or less than the thickness of the water accumulated by surface tension and spaced from the upper surface of the flat plate A guide plate is provided, and the guide plate has a protruding portion that protrudes outward from the outer peripheral edge of the flat plate, and water collected on the upper surface of the flat plate is caused by capillary action in a gap formed by the upper surface of the flat plate and the lower surface of the guide plate The water collected on the flat plate is drained by guiding the water to the outside of the flat plate and dropping the water reaching the protruding portion by its own weight.

この排水機構によれば、平板の上面へ対向する部分と、平板の外周縁の外側に位置するはみ出し部とを備えた簡単な構成の案内板によって、平板上の水を確実に排水することができる。   According to this drainage mechanism, the water on the flat plate can be surely drained by the guide plate having a simple configuration including the portion facing the upper surface of the flat plate and the protruding portion located outside the outer peripheral edge of the flat plate. it can.

本発明によれば、平板の上に溜まった水を省スペースな構成で確実に排水可能な排水機構を得ることができる。   ADVANTAGE OF THE INVENTION According to this invention, the drainage mechanism which can drain reliably the water collected on the flat plate with a space-saving structure can be obtained.

本実施の形態に係る排水機構を備えた洗浄装置と、搬送機構の断面図である。It is sectional drawing of the washing | cleaning apparatus provided with the drainage mechanism which concerns on this Embodiment, and a conveyance mechanism. 図1の洗浄装置と搬送機構の一部を示す斜視図である。It is a perspective view which shows a part of washing | cleaning apparatus and conveyance mechanism of FIG.

以下、添付図面を参照して、本実施の形態について説明する。図1は、本実施の形態に係る排水機構を備えた洗浄装置10と、洗浄装置10によって洗浄される搬送パッド12を備えた搬送機構11とを示す断面図である。図2は、洗浄装置10と搬送パッド12の関係を示す斜視図である。図2では、本発明に係る構成を見やすくするために、洗浄装置10を構成する洗浄ブラシ20を、図1における実際の位置よりも上方に位置をずらせて一点鎖線で仮想的に示している。   Hereinafter, the present embodiment will be described with reference to the accompanying drawings. FIG. 1 is a cross-sectional view showing a cleaning device 10 having a drainage mechanism according to the present embodiment and a transport mechanism 11 having a transport pad 12 cleaned by the cleaning device 10. FIG. 2 is a perspective view showing the relationship between the cleaning device 10 and the transport pad 12. In FIG. 2, in order to make the configuration according to the present invention easy to see, the cleaning brush 20 configuring the cleaning device 10 is virtually indicated by an alternate long and short dash line with a position shifted from the actual position in FIG. 1.

図1に示すように、搬送パッド12は、枠体13と、枠体13の下面に形成した凹部内に保持される吸着保持部14を備え、吸着保持部14の下面である吸着面15を下方に向けている。吸着保持部14はポーラスセラミックス等の多孔質部材からなり、図1に概念的に示す吸引手段16を作動することにより吸着保持部14に吸引力が作用して、図示を省略する板状の被加工物を吸着面15に吸着保持することができる。   As shown in FIG. 1, the transport pad 12 includes a frame body 13 and a suction holding portion 14 that is held in a recess formed in the lower surface of the frame body 13, and includes a suction surface 15 that is the lower surface of the suction holding portion 14. It faces downward. The suction holding portion 14 is made of a porous member such as porous ceramics, and a suction force acting on the suction holding portion 14 by operating the suction means 16 conceptually shown in FIG. The workpiece can be held by suction on the suction surface 15.

図1に示すように、搬送機構11は、搬送パッド12を支持する作動アーム17を有している。作動アーム17は昇降手段18によって上下方向に移動可能であり、さらに水平駆動手段19によって水平方向に移動可能である。水平駆動手段19による水平方向の移動は、上下方向に向く回転軸を中心とする回転(旋回)や直線移動等、任意のものとすることができる。昇降手段18及び水平駆動手段19による作動アーム17の動作によって、搬送パッド12に保持された状態の被加工物が搬送される。   As shown in FIG. 1, the transport mechanism 11 has an operating arm 17 that supports the transport pad 12. The operating arm 17 can be moved in the vertical direction by the elevating means 18 and can be moved in the horizontal direction by the horizontal driving means 19. The horizontal movement by the horizontal driving means 19 can be arbitrary, such as rotation (turning) or linear movement around a rotation axis oriented in the vertical direction. By the operation of the operating arm 17 by the elevating means 18 and the horizontal driving means 19, the work piece held by the transport pad 12 is transported.

図1に示すように、洗浄装置10は、搬送パッド12の下方に位置する洗浄ブラシ20と、洗浄ブラシ20を回転駆動する回転手段21を備えている。洗浄ブラシ20は、保持部材22上にブラシ部23を保持した構成である。回転手段21は、上方に向けて延びる回転軸24をモータによって回転駆動させる。回転軸24の先端に保持部材22が支持されており、回転軸24の回転に伴って洗浄ブラシ20が回転する。洗浄ブラシ20の近傍には、洗浄水噴射ノズル25が設けられている。洗浄水噴射ノズル25には洗浄水供給源26から洗浄水が供給され、洗浄水噴射ノズル25は、搬送パッド12の吸着面15が位置する斜め上方に向けて洗浄水を噴出する。   As shown in FIG. 1, the cleaning apparatus 10 includes a cleaning brush 20 positioned below the transport pad 12 and a rotating unit 21 that rotationally drives the cleaning brush 20. The cleaning brush 20 is configured to hold the brush portion 23 on the holding member 22. The rotating means 21 rotates a rotating shaft 24 extending upward by a motor. The holding member 22 is supported at the tip of the rotating shaft 24, and the cleaning brush 20 rotates as the rotating shaft 24 rotates. A cleaning water spray nozzle 25 is provided in the vicinity of the cleaning brush 20. Wash water is supplied to the wash water injection nozzle 25 from the wash water supply source 26, and the wash water injection nozzle 25 ejects the wash water toward an obliquely upper position where the suction surface 15 of the transport pad 12 is located.

図1に示すように、洗浄ブラシ20の下方には、カバー30と防水ケース40が設けられている。防水ケース40には上下方向に貫通する開口41が形成されており、開口41の下方に回転手段21が位置する。回転軸24は、開口41を通して防水ケース40の上方に突出する。カバー30が開口41を覆っており、回転軸24は、カバー30を貫通すると共にカバー30に対して固定される。従って、カバー30は回転軸24と共に回転する。   As shown in FIG. 1, a cover 30 and a waterproof case 40 are provided below the cleaning brush 20. The waterproof case 40 is formed with an opening 41 penetrating in the vertical direction, and the rotating means 21 is located below the opening 41. The rotating shaft 24 protrudes above the waterproof case 40 through the opening 41. The cover 30 covers the opening 41, and the rotation shaft 24 penetrates the cover 30 and is fixed to the cover 30. Accordingly, the cover 30 rotates together with the rotating shaft 24.

図2に示すように、搬送パッド12の吸着面15は円形である。これに対して洗浄ブラシ20は、円形をなす吸着面15の径方向に細長い直方体形状である。洗浄ブラシ20の長さは吸着面15の直径にほぼ等しい。洗浄装置10により吸着面15を洗浄する際には、回転軸24の回転中心に吸着面15の中心を位置合わせした状態で、昇降手段18によって搬送パッド12を下降させて吸着面15をブラシ部23に接触させる。そして、洗浄水噴射ノズル25から洗浄水を噴出させながら、回転手段21によって洗浄ブラシ20を回転させる。これにより、吸着面15が洗浄される。   As shown in FIG. 2, the suction surface 15 of the transport pad 12 is circular. On the other hand, the cleaning brush 20 has a rectangular parallelepiped shape elongated in the radial direction of the suction surface 15 having a circular shape. The length of the cleaning brush 20 is approximately equal to the diameter of the suction surface 15. When the suction surface 15 is cleaned by the cleaning device 10, the transport pad 12 is lowered by the elevating means 18 in a state where the center of the suction surface 15 is aligned with the rotation center of the rotating shaft 24, and the suction surface 15 is moved to the brush portion 23. Then, the cleaning brush 20 is rotated by the rotating means 21 while the cleaning water is ejected from the cleaning water jet nozzle 25. Thereby, the suction surface 15 is cleaned.

搬送パッド12により保持されて搬送される被加工物は、半導体基板、無機材料基板、デバイスが形成された半導体ウェーハや光デバイスウェーハ等、様々なものを適用可能である。また、搬送機構11による被加工物の搬送は様々な用途に適用可能であり、一例として、被加工物を研削砥石で研削加工する研削装置への搬入及び搬出に搬送機構11を用いることができる。この場合、被加工物の研削加工後に吸着面15に付着した研削屑等を、洗浄装置10によって洗い流すことができる。   Various objects such as a semiconductor substrate, an inorganic material substrate, a semiconductor wafer on which a device is formed, an optical device wafer, and the like can be applied to the workpiece held and conveyed by the conveyance pad 12. Moreover, the conveyance of the workpiece by the conveyance mechanism 11 can be applied to various uses. As an example, the conveyance mechanism 11 can be used for carrying in and out of a grinding apparatus that grinds the workpiece with a grinding wheel. . In this case, grinding scraps or the like adhering to the suction surface 15 after the workpiece is ground can be washed away by the cleaning device 10.

図1及び図2に示すように、カバー30は、洗浄ブラシ20の下方で水平に配置される円板状の平板31と、平板31の外周縁から下方に向けて延びる円筒部32とを有し、円筒部32の底部が開放されている。平板31の中心に、回転軸24が貫通する貫通穴が形成されている。この貫通穴と回転軸24の間は水密状態で塞がれている。   As shown in FIGS. 1 and 2, the cover 30 includes a disk-shaped flat plate 31 that is horizontally disposed below the cleaning brush 20 and a cylindrical portion 32 that extends downward from the outer peripheral edge of the flat plate 31. The bottom portion of the cylindrical portion 32 is open. A through hole through which the rotation shaft 24 passes is formed at the center of the flat plate 31. A space between the through hole and the rotary shaft 24 is closed in a watertight state.

図1及び図2に示すように、防水ケース40は、カバー30の下方で水平に配置される平らな底面部42と、底面部42から上方に向けて突出する円筒部43とを有しており、円筒部43の内周面が、先に述べた開口41を構成している。円筒部43はカバー30の円筒部32よりも径が小さく、円筒部32の内側に円筒部43が位置している。   As shown in FIGS. 1 and 2, the waterproof case 40 has a flat bottom surface portion 42 that is horizontally disposed below the cover 30 and a cylindrical portion 43 that protrudes upward from the bottom surface portion 42. The inner peripheral surface of the cylindrical portion 43 forms the opening 41 described above. The cylindrical portion 43 has a smaller diameter than the cylindrical portion 32 of the cover 30, and the cylindrical portion 43 is located inside the cylindrical portion 32.

洗浄装置10では、洗浄時に洗浄水噴射ノズル25から供給した洗浄水が、洗浄ブラシ20の下方に流れ落ちる。特に、円形の吸着面15の下方に位置しているのが細長い直方体形状の洗浄ブラシ20であるため、洗浄水は、洗浄ブラシ20では止水されずにカバー30の平板31上まで流れやすい。カバー30の平板31上に流れた洗浄水は、平板31の表面から外周側に流れて防水ケース40の底面部42に落ちる。平板31の貫通穴と回転軸24との間が水密状態になっているため、平板31の貫通穴から防水ケース40の開口41内へ洗浄水が入り込むことはない。また、円筒部32の内側位置に円筒部43が設けられているので、円筒部32の外周面に沿って底面部42に向けて流れる洗浄水は、開口41内に流れ込まない。従って、回転手段21が設けられている防水ケース40の内部空間は、水密に保たれている。そして、底面部42上に落ちた洗浄水は、図示を省略する排水路を経て洗浄装置10外に排出される。   In the cleaning device 10, the cleaning water supplied from the cleaning water jet nozzle 25 at the time of cleaning flows down below the cleaning brush 20. In particular, since the cleaning brush 20 having an elongated rectangular parallelepiped shape is positioned below the circular suction surface 15, the cleaning water is not stopped by the cleaning brush 20 and easily flows onto the flat plate 31 of the cover 30. The washing water that has flowed on the flat plate 31 of the cover 30 flows from the surface of the flat plate 31 to the outer peripheral side and falls on the bottom surface portion 42 of the waterproof case 40. Since the space between the through hole of the flat plate 31 and the rotary shaft 24 is in a watertight state, the cleaning water does not enter the opening 41 of the waterproof case 40 from the through hole of the flat plate 31. Further, since the cylindrical portion 43 is provided at the inner position of the cylindrical portion 32, the cleaning water that flows toward the bottom surface portion 42 along the outer peripheral surface of the cylindrical portion 32 does not flow into the opening 41. Therefore, the internal space of the waterproof case 40 provided with the rotating means 21 is kept watertight. And the washing water which fell on the bottom face part 42 is discharged | emitted out of the washing | cleaning apparatus 10 through the drainage path which abbreviate | omits illustration.

洗浄水噴射ノズル25から洗浄水が継続的に供給されている洗浄中は、以上に述べた流れで、洗浄水が洗浄装置10の外側に排水される。しかし、カバー30の平板31上には、表面張力で水が溜まる可能性がある。特に、洗浄装置10による吸着面15の洗浄作業が完了して洗浄水の供給が停止された後に、吸着面15や洗浄ブラシ20に付着した水滴が落下することにより、平板31上に水が溜まりやすい。図1は、平板31の上面に表面張力で水Wが溜まった状態を示している。   During the cleaning in which the cleaning water is continuously supplied from the cleaning water jet nozzle 25, the cleaning water is discharged to the outside of the cleaning device 10 in the above-described flow. However, water may accumulate on the flat plate 31 of the cover 30 due to surface tension. In particular, after the cleaning operation of the suction surface 15 by the cleaning device 10 is completed and the supply of cleaning water is stopped, water drops adhering to the suction surface 15 and the cleaning brush 20 fall, so that water accumulates on the flat plate 31. Cheap. FIG. 1 shows a state where water W has accumulated on the upper surface of the flat plate 31 due to surface tension.

洗浄後の搬送パッド12の吸着面15は、次に被加工物を搬送するときに備えて、乾燥した状態にする必要がある。ここで、噴出する空気を用いて吸着面15を乾燥させようとした場合に、この空気の勢いで、平板31の上面に溜まった水Wが巻き上がり、吸着面15等を濡らしてしまうおそれがある。また、乾燥用の空気の噴出以外の原因によっても、平板31上の水Wが巻き上がる可能性がある。そのため、洗浄の完了後には、平板31上に溜まっている水Wを排水することが求められる。   The suction surface 15 of the transport pad 12 after cleaning needs to be in a dry state in preparation for the next transport of the workpiece. Here, when the suction surface 15 is to be dried using the air that is blown out, there is a possibility that the water W collected on the upper surface of the flat plate 31 will roll up and wet the suction surface 15 or the like due to the momentum of the air. is there. Further, the water W on the flat plate 31 may be rolled up due to causes other than the ejection of drying air. Therefore, it is required to drain the water W collected on the flat plate 31 after the cleaning is completed.

本実施の形態の洗浄装置10は、カバー30の平板31上に溜まった水を確実に排水するために、排水案内板50が設けられている。図1及び図2に示すように、排水案内板50は、平板31の外周縁付近の上方に水平に配置される第1板部51と、平板31よりも径方向の外側に位置して下方向に延びる第2板部52とを有している。第1板部51と第2板部52はそれぞれ矩形の平板形状をなしており、排水案内板50は、第1板部51と第2板部52の互いの端部が接続するL字型の部材である。図2に示すように、排水案内板50は、カバー30の周方向の一部分に一つのみが設けられている。   The washing apparatus 10 of the present embodiment is provided with a drainage guide plate 50 in order to surely drain the water accumulated on the flat plate 31 of the cover 30. As shown in FIGS. 1 and 2, the drainage guide plate 50 includes a first plate portion 51 disposed horizontally above the vicinity of the outer peripheral edge of the flat plate 31, and a lower radial position than the flat plate 31. And a second plate portion 52 extending in the direction. The first plate portion 51 and the second plate portion 52 each have a rectangular flat plate shape, and the drainage guide plate 50 is an L-shape that connects the end portions of the first plate portion 51 and the second plate portion 52. It is a member. As shown in FIG. 2, only one drain guide plate 50 is provided in a part of the cover 30 in the circumferential direction.

なお、排水案内板50における第2板部52は、図示のような平板でなく、円弧板や棒状の形状等でもよい。また、図示の排水案内板50は、第1板部51の端部から第2板部52が下方向に延びるL字型であるが、第2板部52は第1板部51に対して下方向に延びていればよく、第1板部51の端部に第2板部52が接続するL字型に限定されるものではない。   In addition, the 2nd board part 52 in the drainage guide plate 50 may not be a flat plate like illustration, but an arc plate, a rod-shaped shape, etc. In addition, the illustrated drainage guide plate 50 is L-shaped in which the second plate portion 52 extends downward from the end portion of the first plate portion 51, but the second plate portion 52 is relative to the first plate portion 51. What is necessary is just to extend below, and it is not limited to the L-shape which the 2nd board part 52 connects to the edge part of the 1st board part 51. FIG.

図1において、排水案内板50周りの構造を、丸囲み部分に拡大して示した。第1板部51は、平板31の上面に対して上下方向に所定の隙間D1を空けて支持されている。図1中の丸囲み部分に拡大して示すように、第1板部51の下面と平板31の上面とで形成される隙間D1(平板31の上面に対する第1板部51の高さ)は、平板31上に表面張力で溜まる水Wの厚みT以下(T≧D1)に設定されている。   In FIG. 1, the structure around the drainage guide plate 50 is shown enlarged in a circled portion. The first plate portion 51 is supported with a predetermined gap D1 in the vertical direction with respect to the upper surface of the flat plate 31. As shown in an enlarged view of the circled portion in FIG. 1, the gap D <b> 1 (the height of the first plate portion 51 with respect to the upper surface of the flat plate 31) formed between the lower surface of the first plate portion 51 and the upper surface of the flat plate 31 is The thickness W is set to be equal to or less than the thickness T of the water W accumulated by the surface tension on the flat plate 31 (T ≧ D1).

第1板部51は、隙間D1をもって平板31の上面に対向する部分と、平板31の外周縁よりも径方向の外側に突出する部分とを有しており、径方向外側に突出する第1板部51の端部から下方に向けて第2板部52が突出している。第2板部52は、その全体が平板31の外周縁よりも径方向の外側にはみ出して位置するはみ出し部であり、カバー30の円筒部32の外周面に対して所定の隙間D2を空けて対向している。円筒部32の外周面と第2板部52とで形成される隙間D2は、先に述べた第1板部51と平板31との間の隙間D1の間隔よりも大きく設定されている。   The first plate portion 51 has a portion facing the upper surface of the flat plate 31 with a gap D1, and a portion protruding outward in the radial direction from the outer peripheral edge of the flat plate 31, and the first plate protruding outward in the radial direction. A second plate portion 52 projects downward from the end portion of the plate portion 51. The second plate portion 52 is a protruding portion that is positioned so as to protrude outward in the radial direction from the outer peripheral edge of the flat plate 31, and has a predetermined gap D <b> 2 with respect to the outer peripheral surface of the cylindrical portion 32 of the cover 30. Opposite. A gap D2 formed between the outer peripheral surface of the cylindrical portion 32 and the second plate portion 52 is set to be larger than the interval of the gap D1 between the first plate portion 51 and the flat plate 31 described above.

排水案内板50は、第1板部51と平板31を接続する支持部53を介してカバー30に支持されている。支持部53は、第1板部51の幅方向の一部の領域にのみ設けられており、支持部53が存在しない部分では、第1板部51の下面と平板31の上面の間に上記の隙間D1が確保されている。   The drainage guide plate 50 is supported by the cover 30 via a support portion 53 that connects the first plate portion 51 and the flat plate 31. The support portion 53 is provided only in a partial region in the width direction of the first plate portion 51, and the portion where the support portion 53 does not exist is between the lower surface of the first plate portion 51 and the upper surface of the flat plate 31. The gap D1 is secured.

以上の構成を備える洗浄装置10では、平板31の上面に表面張力で水Wが溜まると、排水案内板50の第1板部51の下面と平板31の上面とで形成される隙間D1で毛細管現象が作用して、平板31の上面に溜まった水Wが平板31の外側に誘導される。毛細管現象によって導かれた水Wは、平板31の外縁部を超えて、円筒部32と第2板部52との間を通って下方に自重落下する。このように、平板31の上面に溜まる水Wを、簡単な構成の排水案内板50を用いて底面部42側へ排水することができる。   In the cleaning device 10 having the above configuration, when water W accumulates on the upper surface of the flat plate 31 due to surface tension, the capillary tube is formed in the gap D1 formed by the lower surface of the first plate portion 51 of the drainage guide plate 50 and the upper surface of the flat plate 31. The phenomenon acts and water W collected on the upper surface of the flat plate 31 is guided to the outside of the flat plate 31. The water W guided by the capillary phenomenon passes through the space between the cylindrical portion 32 and the second plate portion 52 over the outer edge portion of the flat plate 31 and falls by its own weight. Thus, the water W collected on the upper surface of the flat plate 31 can be drained to the bottom surface portion 42 side using the drainage guide plate 50 having a simple configuration.

毛細管現象によって狭い隙間D1に誘導された水Wを、隙間D1から自重落下する状態にさせやすくするために、水Wに作用する水圧や重力に加えて、洗浄装置10に加わる振動や、カバー30の回転により生じる遠心力のような外力を用いることができる。   In order to make the water W guided to the narrow gap D1 by the capillary phenomenon easily fall into a state where the water W falls from the gap D1, the vibration applied to the cleaning device 10 in addition to the water pressure and gravity acting on the water W, and the cover 30 An external force such as a centrifugal force generated by the rotation of can be used.

また、円筒部32の外周面と第2板部52との間の隙間D2が、第1板部51の下面と平板31の上面との間の隙間D1よりも大きく設定されているため、自重落下する水Wを停滞させずにスムーズに下方へ流すことができる。   Further, since the gap D2 between the outer peripheral surface of the cylindrical portion 32 and the second plate portion 52 is set to be larger than the gap D1 between the lower surface of the first plate portion 51 and the upper surface of the flat plate 31, the self-weight The falling water W can be smoothly flowed downward without stagnation.

なお、洗浄ブラシ20を回転させる際にカバー30が共に回転するが、洗浄時の洗浄ブラシ20の回転速度は高速でないため、カバー30に働く遠心力は小さい。従って、回転手段21の駆動力に基づく遠心力のみで、平板31上の水Wを全て振り落とすことは難しい。これに対して、本実施の形態の排水機構によれば、排水案内板50を用いて平板31の外周縁まで水Wを導くことができるので、カバー30の回転速度のような条件に依存せずに、確実に平板31上から水Wを排出させることができる。   Note that the cover 30 rotates together with the cleaning brush 20 when rotating, but since the rotation speed of the cleaning brush 20 during cleaning is not high, the centrifugal force acting on the cover 30 is small. Therefore, it is difficult to shake off all the water W on the flat plate 31 only by the centrifugal force based on the driving force of the rotating means 21. On the other hand, according to the drainage mechanism of the present embodiment, the water W can be guided to the outer peripheral edge of the flat plate 31 using the drainage guide plate 50, so that it depends on conditions such as the rotational speed of the cover 30. The water W can be surely discharged from the flat plate 31 without any problem.

仮に、本実施の形態とは異なり、平板31の上面を、中心から外周側に向けて底面部42からの高さが小さくなるような傾斜面にすることで、水が溜まりにくくなる。しかし、このような傾斜面は水平面に比して上下方向に占める範囲が大きくなるため、上下方向のスペースに余裕が無い構造では採用が難しい。特に、水をスムーズに流すためには傾斜面の傾斜角を大きくする必要があり、上下方向により大きなスペースを要する。   Temporarily, unlike this Embodiment, it becomes difficult for water to collect by making the upper surface of the flat plate 31 into the inclined surface where the height from the bottom face part 42 becomes small toward the outer peripheral side from the center. However, since such an inclined surface occupies a larger range in the vertical direction than the horizontal plane, it is difficult to adopt in a structure in which there is no room in the vertical direction. In particular, in order to flow water smoothly, it is necessary to increase the inclination angle of the inclined surface, and a larger space is required in the vertical direction.

また、本実施の形態とは異なり、平板31の上面に溜まる水を、空気の噴射等を用いて吹き飛ばす手段を設けると、構造が複雑になってしまう。加えて、吹き飛ばされた水滴が、吸着面15等の意図しない箇所に付着するリスクもある。   Unlike the present embodiment, if a means for blowing off the water accumulated on the upper surface of the flat plate 31 by using air injection or the like is provided, the structure becomes complicated. In addition, there is a risk that the water droplets blown off adhere to unintended locations such as the suction surface 15.

これらの構成に対して、本実施の形態に係る洗浄装置10では、カバー30上に排水案内板50を設けた簡単な構成で、平板31の上面から下方へのスムーズな排水を実現することができる。平板31に対する排水案内板50の上方への突出量は、ごく狭い隙間D1(平板31上に表面張力で溜まる水Wの厚みT以下)に対応する小さいものである。そのため、平板31の上面を傾斜面とする上記の構成に比べて、狭い上下方向のスペースに配設することが可能である。加えて、排水案内板50はカバー30の周方向の一部分にのみ設けられているので(図2参照)、周方向に占めるスペースも小さくて済む。従って、小型軽量で省スペースな排水機構とすることができる。また、排水案内板50を備えた排水機構は、毛細管現象を利用して平板31上の水Wを誘導して自由落下させるものであるため、排水に際して水滴が大きく飛び散る等のリスクもない。   In contrast to these configurations, in the cleaning apparatus 10 according to the present embodiment, smooth drainage from the upper surface of the flat plate 31 downward can be realized with a simple configuration in which the drainage guide plate 50 is provided on the cover 30. it can. The amount of upward protrusion of the drainage guide plate 50 relative to the flat plate 31 is small corresponding to a very narrow gap D1 (less than the thickness T of the water W accumulated on the flat plate 31 by surface tension). Therefore, it can be arranged in a narrow space in the vertical direction compared to the above configuration in which the upper surface of the flat plate 31 is an inclined surface. In addition, since the drainage guide plate 50 is provided only in a part of the cover 30 in the circumferential direction (see FIG. 2), the space occupied in the circumferential direction can be small. Therefore, it can be a small, lightweight and space saving drainage mechanism. Further, the drainage mechanism provided with the drainage guide plate 50 induces the water W on the flat plate 31 to freely fall by utilizing the capillary phenomenon, so that there is no risk of water droplets greatly scattering during drainage.

上記実施の形態とは異なる変形例を採用することも可能である。例えば、上記実施の形態では、排水案内板50の第1板部51の下面は、カバー30の平板31の上面と平行な平面形状であるが、先に述べた条件T≧D1(平板31上に表面張力で溜まる水Wの厚みT≧隙間D1)を満たすものであれば、このような平面以外の構成を選択してもよい。一例として、第1板部51の下面を、平板31の上面に対して傾斜する面や、一部に凹凸を有する面、等にすることも可能である。こうした第1板部51の下面に関する変形例は、毛細管現象による水の誘導作用を向上させる形態を選択することが好ましい。   It is also possible to adopt a modified example different from the above embodiment. For example, in the above embodiment, the lower surface of the first plate portion 51 of the drainage guide plate 50 has a planar shape parallel to the upper surface of the flat plate 31 of the cover 30, but the above-described condition T ≧ D1 (on the flat plate 31). As long as the thickness T of the water W accumulated due to the surface tension T ≧ the gap D1) is satisfied, a configuration other than such a plane may be selected. As an example, the lower surface of the first plate portion 51 can be a surface that is inclined with respect to the upper surface of the flat plate 31, a surface that is partially uneven, or the like. It is preferable that the modification regarding the lower surface of the 1st board part 51 selects the form which improves the guidance effect | action of the water by a capillary phenomenon.

上記実施の形態における排水案内板50の第2板部52は、平板31の外縁部まで到達した水Wを自重落下させる流路を形成する部分であり、水Wを滞りなく自重落下させることができれば、任意の構成を選択できる。例えば、上記実施の形態では、第2板部52が平板形状であるが、第2板部52を、先に述べたような円弧板(カバー30の円筒部32に沿う円筒形状等)や棒状の形状にしてもよい。さらに、第2板部52を、下方に進むにつれて径を大きくする円錐形状等に変更してもよい。   The 2nd board part 52 of the drainage guide plate 50 in the said embodiment is a part which forms the flow path in which the water W which reached | attained the outer edge part of the flat plate 31 falls by its own weight, and can drop the water W by its own weight without delay. If possible, any configuration can be selected. For example, in the above embodiment, the second plate portion 52 has a flat plate shape. However, the second plate portion 52 may be a circular plate (such as a cylindrical shape along the cylindrical portion 32 of the cover 30) or a rod shape as described above. You may make it the shape. Furthermore, you may change the 2nd board part 52 to the cone shape etc. which become large in diameter as it progresses below.

また、上記実施の形態とは異なり、排水案内板50の第2板部52とカバー30の円筒部32との間の隙間D2を、第1板部51と平板31との間の隙間D1と同程度の大きさにしてもよい。この構成では、毛細管現象による水Wの誘導が第2板部52の下端の位置まで行われ、第2板部52の下端位置を超えたところで水Wが自重落下する。   Unlike the above embodiment, the gap D2 between the second plate portion 52 of the drainage guide plate 50 and the cylindrical portion 32 of the cover 30 is changed to the gap D1 between the first plate portion 51 and the flat plate 31. It may be the same size. In this configuration, the water W is guided to the lower end position of the second plate portion 52 by the capillary phenomenon, and the water W falls by its own weight when the lower end position of the second plate portion 52 is exceeded.

上記実施の形態では、排水案内板50の支持を支持部53によって行っているが、これ以外の箇所によって排水案内板50を支持してもよい。例えば、カバー30の円筒部32に接続する支持部を第2板部52に設けたり、回転軸24から延ばした支持アームにより排水案内板50を支持させたりすることも可能である。   In the above-described embodiment, the drainage guide plate 50 is supported by the support portion 53, but the drainage guide plate 50 may be supported by other locations. For example, a support portion connected to the cylindrical portion 32 of the cover 30 can be provided on the second plate portion 52, or the drainage guide plate 50 can be supported by a support arm extending from the rotating shaft 24.

上記実施の形態では、洗浄ブラシ20と共に回転するカバー30の平板31の上面からの排水を対象としているが、表面張力によって平板の上面に水が溜まる構成であれば、平板が回転するか否かを問わずに本発明を適用することができる。例えば、本発明の排水機構は、平板が水平方向に直線移動を行うタイプ、平板が固定されていて移動しないタイプ等にも適用可能である。   In the above embodiment, drainage from the upper surface of the flat plate 31 of the cover 30 that rotates together with the cleaning brush 20 is targeted. However, if water is accumulated on the upper surface of the flat plate by surface tension, whether or not the flat plate rotates. The present invention can be applied regardless of the case. For example, the drainage mechanism of the present invention can be applied to a type in which the flat plate moves linearly in the horizontal direction, a type in which the flat plate is fixed and does not move, and the like.

上記実施の形態では、円形状の平板31に対して周方向の一箇所に排水案内板50を設けているが、排水機構の構成はこれに限定されない。案内板の数や配置は、要求される排水性能や周辺の構造に応じて適宜選択可能である。例えば、周方向の複数箇所に排水用の案内板を設ける形態や、図示の排水案内板50よりも周方向に幅広または幅狭な排水用の案内板を設ける形態にすることもできる。   In the said embodiment, although the drainage guide plate 50 is provided in one place of the circumferential direction with respect to the circular flat plate 31, the structure of a drainage mechanism is not limited to this. The number and arrangement of the guide plates can be appropriately selected according to the required drainage performance and the surrounding structure. For example, a drain guide plate may be provided at a plurality of locations in the circumferential direction, or a drain guide plate that is wider or narrower in the circumferential direction than the drain guide plate 50 shown in the figure.

また、排水案内板50における、平板31の径方向への第1板部51の長さや、上下方向への第2板部52の長さについても、適宜変更可能である。   Further, the length of the first plate portion 51 in the radial direction of the flat plate 31 and the length of the second plate portion 52 in the vertical direction in the drainage guide plate 50 can be appropriately changed.

本発明は、排水の対象となる水が溜まる平板として、上記実施の形態の平板31のような円板形状以外にも、矩形などの任意の形状の平板に適用が可能である。   The present invention can be applied to a flat plate having an arbitrary shape such as a rectangle as well as a circular plate shape like the flat plate 31 of the above embodiment as a flat plate on which water to be drained is collected.

上記実施の形態は、搬送パッド12の吸着面15を洗浄ブラシ20で洗浄する洗浄装置10に適用したものである。これと異なり、搬送パッドの吸着面に吸引保持される被加工物(例えば、半導体基板、無機材料基板、デバイスが形成された半導体ウェーハや光デバイスウェーハ等)を洗浄の対象とする洗浄装置にも、本発明の排水機構を適用することもできる。この変形例では、上記実施の形態の洗浄ブラシ20に代えて、スポンジ等の洗浄部材を用いて被加工物を洗浄する。そして、本発明に係る排水機構を適用することにより、上記実施の形態と同様に、平板の上面から被加工物への水の巻き上がりを防ぐことができる。   The above embodiment is applied to the cleaning device 10 that cleans the suction surface 15 of the transport pad 12 with the cleaning brush 20. In contrast, a cleaning apparatus for cleaning a workpiece (for example, a semiconductor substrate, an inorganic material substrate, a semiconductor wafer on which a device is formed, an optical device wafer, or the like) sucked and held on the suction surface of the transfer pad is also used. The drainage mechanism of the present invention can also be applied. In this modification, the workpiece is cleaned using a cleaning member such as a sponge instead of the cleaning brush 20 of the above embodiment. Then, by applying the drainage mechanism according to the present invention, it is possible to prevent the water from rolling up from the upper surface of the flat plate to the workpiece as in the above embodiment.

また、洗浄装置に限定されず、切削装置のチャックテーブルや研削装置のチャックテーブルにおける排水機構や、その他各種の加工装置における排水機構等にも、本発明は適用が可能である。   Further, the present invention is not limited to the cleaning device, and the present invention can be applied to a drainage mechanism in a chuck table of a cutting device, a chuck table of a grinding device, a drainage mechanism in other various processing devices, and the like.

また、本発明の実施の形態を説明したが、本発明の他の実施の形態として、上記実施の形態や変形例を全体的又は部分的に組み合わせたものでもよい。   Moreover, although the embodiment of the present invention has been described, as another embodiment of the present invention, the above embodiment and modifications may be combined in whole or in part.

また、本発明の実施の形態は上記の実施の形態に限定されるものではなく、本発明の技術的思想の趣旨を逸脱しない範囲において様々に変更、置換、変形されてもよい。さらには、技術の進歩又は派生する別技術によって、本発明の技術的思想を別の仕方で実現することができれば、その方法を用いて実施されてもよい。したがって、特許請求の範囲は、本発明の技術的思想の範囲内に含まれ得る全ての実施態様をカバーしている。   The embodiments of the present invention are not limited to the above-described embodiments, and various changes, substitutions, and modifications may be made without departing from the spirit of the technical idea of the present invention. Furthermore, if the technical idea of the present invention can be realized in another way by technological advancement or another derived technique, the method may be used. Accordingly, the claims cover all embodiments that can be included within the scope of the technical idea of the present invention.

以上説明したように、本発明は、平板の上面に溜まった水を省スペースで確実に排出することができるという効果を有し、特に、洗浄装置や各種の加工装置等に搭載される排水機構に有用である。   As described above, the present invention has an effect that the water accumulated on the upper surface of the flat plate can be surely discharged in a space-saving manner, and in particular, a drainage mechanism mounted on a cleaning device or various processing devices. Useful for.

10 洗浄装置
11 搬送機構
12 搬送パッド
14 吸着保持部
15 吸着面
20 洗浄ブラシ
21 回転手段
25 洗浄水噴射ノズル
30 カバー
31 平板
32 円筒部
40 防水ケース
41 開口
42 底面部
43 円筒部
50 排水案内板
51 第1板部
52 第2板部(はみ出し部)
53 支持部
D1 隙間
D2 隙間
W 水
DESCRIPTION OF SYMBOLS 10 Cleaning apparatus 11 Conveyance mechanism 12 Conveyance pad 14 Adsorption holding | maintenance part 15 Adsorption surface 20 Cleaning brush 21 Rotating means 25 Washing water injection nozzle 30 Cover 31 Flat plate 32 Cylindrical part 40 Waterproofing case 41 Opening 42 Bottom part 43 Cylindrical part 50 Drainage guide plate 51 First plate part 52 Second plate part (extrusion part)
53 Support D1 Gap D2 Gap W Water

Claims (1)

平板の上面に表面張力で溜まった水を、排水する排水機構であって、
表面張力で溜まった水の厚み以下の高さで該平板の上面から離間させ該平板の外周部分に配設する案内板を備え、
該案内板は、該平板の外周縁より外側にはみ出したはみ出し部を備え、
該平板の上面と該案内板の下面とで形成される隙間で毛細管現象を作用させ該平板の上面に溜まった水を該平板の外側に誘導させ、該はみ出し部に到達した水を自重落下させることで該平板の上に溜まった水を排水させることを特徴とする排水機構。
A drainage mechanism for draining water accumulated by surface tension on the upper surface of a flat plate,
A guide plate disposed at an outer peripheral portion of the flat plate separated from the upper surface of the flat plate at a height equal to or less than the thickness of water accumulated by surface tension;
The guide plate includes a protruding portion that protrudes outward from the outer peripheral edge of the flat plate,
Capillary action is caused by a gap formed between the upper surface of the flat plate and the lower surface of the guide plate to induce water accumulated on the upper surface of the flat plate to the outside of the flat plate, and the water reaching the protruding portion is dropped by its own weight. A drainage mechanism characterized by draining water accumulated on the flat plate.
JP2016247743A 2016-12-21 2016-12-21 Drainage mechanism Pending JP2018101719A (en)

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Publications (1)

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JP2018101719A true JP2018101719A (en) 2018-06-28

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Country Link
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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001189298A (en) * 1999-12-28 2001-07-10 Kaijo Corp Rotary processing device
JP2004183414A (en) * 2002-12-06 2004-07-02 Tostem Corp Opening device
JP2005303316A (en) * 2004-04-14 2005-10-27 Asml Netherlands Bv Lithographic equipment and method of manufacturing device
JP2012084607A (en) * 2010-10-07 2012-04-26 Tokyo Electron Ltd Liquid processing apparatus

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001189298A (en) * 1999-12-28 2001-07-10 Kaijo Corp Rotary processing device
JP2004183414A (en) * 2002-12-06 2004-07-02 Tostem Corp Opening device
JP2005303316A (en) * 2004-04-14 2005-10-27 Asml Netherlands Bv Lithographic equipment and method of manufacturing device
JP2012084607A (en) * 2010-10-07 2012-04-26 Tokyo Electron Ltd Liquid processing apparatus

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