JP2019121630A - 被加工物の加工方法および加工装置 - Google Patents
被加工物の加工方法および加工装置 Download PDFInfo
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- JP2019121630A JP2019121630A JP2017253566A JP2017253566A JP2019121630A JP 2019121630 A JP2019121630 A JP 2019121630A JP 2017253566 A JP2017253566 A JP 2017253566A JP 2017253566 A JP2017253566 A JP 2017253566A JP 2019121630 A JP2019121630 A JP 2019121630A
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- resin
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- grinding
- grinding wheel
- chuck table
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- 238000003672 processing method Methods 0.000 title claims abstract 5
- 238000000227 grinding Methods 0.000 claims abstract description 216
- 239000011347 resin Substances 0.000 claims abstract description 180
- 229920005989 resin Polymers 0.000 claims abstract description 180
- 239000004575 stone Substances 0.000 claims abstract description 22
- 238000004140 cleaning Methods 0.000 claims abstract description 18
- 239000011248 coating agent Substances 0.000 claims abstract description 18
- 238000000576 coating method Methods 0.000 claims abstract description 18
- 230000001678 irradiating effect Effects 0.000 claims abstract description 5
- 238000005406 washing Methods 0.000 claims description 33
- 238000000034 method Methods 0.000 claims description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 13
- 230000007306 turnover Effects 0.000 claims description 2
- 230000032258 transport Effects 0.000 description 38
- 230000008569 process Effects 0.000 description 8
- 230000007246 mechanism Effects 0.000 description 4
- 230000009471 action Effects 0.000 description 3
- 238000002347 injection Methods 0.000 description 3
- 239000007924 injection Substances 0.000 description 3
- 238000003754 machining Methods 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02002—Preparing wafers
- H01L21/02005—Preparing bulk and homogeneous wafers
- H01L21/02008—Multistep processes
- H01L21/0201—Specific process step
- H01L21/02013—Grinding, lapping
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
- B24B53/017—Devices or means for dressing, cleaning or otherwise conditioning lapping tools
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B3/00—Spraying or sprinkling apparatus with moving outlet elements or moving deflecting elements
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/07—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool
- B24B37/08—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for double side lapping
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/34—Accessories
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/34—Accessories
- B24B37/345—Feeding, loading or unloading work specially adapted to lapping
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B24B41/005—Feeding or manipulating devices specially adapted to grinding machines
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B24B49/02—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation according to the instantaneous size and required size of the workpiece acted upon, the measuring or gauging being continuous or intermittent
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
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- B24B49/03—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation according to the instantaneous size and required size of the workpiece acted upon, the measuring or gauging being continuous or intermittent according to the final size of the previously ground workpiece
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B24B49/02—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation according to the instantaneous size and required size of the workpiece acted upon, the measuring or gauging being continuous or intermittent
- B24B49/04—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation according to the instantaneous size and required size of the workpiece acted upon, the measuring or gauging being continuous or intermittent involving measurement of the workpiece at the place of grinding during grinding operation
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B24B55/00—Safety devices for grinding or polishing machines; Accessories fitted to grinding or polishing machines for keeping tools or parts of the machine in good working condition
- B24B55/02—Equipment for cooling the grinding surfaces, e.g. devices for feeding coolant
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- B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
- B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
- B24B7/228—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding thin, brittle parts, e.g. semiconductors, wafers
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
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- H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
- H01L21/02052—Wet cleaning only
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- H01L21/02057—Cleaning during device manufacture
- H01L21/0206—Cleaning during device manufacture during, before or after processing of insulating layers
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- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
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- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
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- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
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- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
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Abstract
Description
図1に示す加工装置1は、被加工物Wの研削加工に用いる研削装置の一例である。被加工物Wは、円形板状の被加工物の一例であって、その表面Waには格子状に形成された複数の分割予定ラインSによって区画された複数の領域にそれぞれデバイスDが形成されている。被加工物Wの表面Waと反対側の裏面Wbは、研削加工が施される被加工面となっている。本実施形態に示す被加工物Wは、例えば、シリコンウェーハによって構成されている。
また、研削砥石46で被加工物Wの表面Waに被覆された樹脂を研削するときは、洗浄ノズル60から研削砥石46に向けて洗浄水を噴射し、研削砥石46に付着した樹脂を洗浄しながら研削を実施するため、被加工物Wの表面Waの被覆された樹脂を研削して平坦化させても、研削砥石46に樹脂が残存しない。そのため、同一の研削砥石46を用いて被加工物Wの裏面Wbを研削することが可能となる。
次に、被加工物Wの表面Waに被覆した樹脂と、被加工物Wの裏面Wbとに研削を行う被加工物の加工方法について説明する。本実施形態では、上記の加工装置1を用いながら被加工物の加工方法を実施するものとする。加工装置1のカセット4aには、加工前の被加工物Wが複数収容されている。搬出入手段5は、カセット4aから加工前の被加工物Wを引き出し、位置合わせ手段6に搬送し被加工物Wを所定の位置に位置合わせする。
第1の搬送ユニット31は、位置合わせ手段6で所定の位置に位置合わせされた被加工物Wを搬出し、図3に示すように、被加工物Wの裏面Wb側をスピンナーテーブル11の保持面11aに載置して、被加工物Wの表面Waを上向きに露出させる。図示しない吸引源の吸引作用によりスピンナーテーブル11の保持面11aで被加工物Wを吸引保持したら、回転手段13によって、スピンナーテーブル11を例えば矢印A方向に回転させる。
図1に示したスピンナーテーブル11を樹脂硬化手段20の処理室200の開口201から内部に進入させる。その後、処理室200の内部に配設された複数のUVランプによって樹脂100に向けて紫外線を照射する。紫外線の外的刺激により樹脂100を硬化させることにより、図4に示すように、被加工物Wの表面Waの全面において硬化した樹脂100aを形成する。
樹脂硬化ステップを実施した後、図1に示した処理室200からスピンナーテーブル11を退出させる。第1の搬送ユニット31は、スピンナーテーブル11から被加工物Wを搬出し、図5に示すように、被加工物Wの裏面Wb側をチャックテーブル8の保持面8aに載置して、表面Waに被覆された樹脂100aを上向きに露出させる。図示しない吸引源の吸引作用によりチャックテーブル8の保持面8aで被加工物Wを吸引保持したら、チャックテーブル8を例えば矢印A方向に回転させながら、研削ユニット40の下方に移動させる。研削ユニット40は、研削ホイール45を例えば矢印A方向に回転させながら、所定の研削送り速度で下降させ、回転する研削砥石46で樹脂100aを押圧しながら研削して平坦化させる。なお、予めに、チャックテーブル8またはスピンドル41を所定角度傾けることにより、研削砥石46の研削面とチャックテーブル8の保持面8aとが平行な位置関係となるように調整しておくとよい。
図1に示した第2の搬送ユニット32によってチャックテーブル8から被加工物Wを洗浄手段7に搬送する。洗浄手段7で被加工物Wを洗浄したのち、表裏反転用搬送ユニット33は、搬送パッド330で被加工物Wの表面Waに被覆された樹脂100a側を保持し、水平支持部331を反転させることで被加工物Wの表裏を反転させ、被加工物Wの裏面Wbを上向きにさせる。かかる状態において、第2の搬送ユニット32は、表裏反転用搬送ユニット33から引き継いで被加工物Wを保持する。
また、樹脂研削ステップでは、洗浄ノズル60から研削砥石46に向けて洗浄水62を噴射し、研削砥石46に付着した樹脂100aを洗浄しながら樹脂100aの研削を実施するため、樹脂研削ステップ完了後に研削砥石46に樹脂100aが残存しない。これにより、同一の研削砥石46を用いて被加工物研削ステップを実施することが可能となり、加工効率が向上する。
6:位置合わせ手段 7:洗浄手段 8:チャックテーブル 9:カバー
10:樹脂被覆手段 11:スピンナーテーブル 12:樹脂ノズル 13:回転手段
20:樹脂硬化手段
30:搬送ユニット 31:第1の搬送ユニット 32:第2の搬送ユニット
33:表裏反転用搬送ユニット
40:研削ユニット 41:スピンドル 42:スピンドルハウジング 43:モータ
44:マウント 45:研削ホイール 46:研削砥石
50:昇降手段 51:ボールネジ 52:モータ 53:ガイドレール 54:昇降部
60:洗浄ノズル 61:供給源 62:洗浄水 70:測定手段
Claims (7)
- 表面に格子状に形成された複数の分割予定ラインに区画された領域にデバイスが形成された被加工物の該表面に被覆した樹脂の研削と、被加工物の裏面の研削とを行う被加工物の加工方法であって、
被加工物の該表面に該樹脂を被覆する樹脂被覆ステップと、
被覆した該樹脂に紫外線を照射して硬化させる樹脂硬化ステップと、
硬化した該樹脂を研削砥石で研削して平坦化させる樹脂研削ステップと、
平坦化した被加工物の該樹脂側をチャックテーブルで保持し、被加工物の該裏面を研削砥石で研削する被加工物研削ステップと、を備え、
該樹脂研削ステップでは、該研削砥石に付着した該樹脂を洗浄しながら研削を実施する被加工物の加工方法。 - 前記樹脂研削ステップでは、洗浄ノズルから前記研削砥石に向けて洗浄水を噴射し、該研削砥石に付着した前記樹脂を洗浄しながら該研削砥石で該樹脂を研削することを特徴とする請求項1に記載の被加工物の加工方法。
- 前記樹脂研削ステップを実施した後、チャックテーブルに対して被加工物を搬入出および該チャックテーブルから搬出した被加工物を表裏反転させる搬送ユニットを用いて被加工物の表裏を反転させ、
該樹脂研削ステップと前記被加工物研削ステップとで、同一の研削砥石を使用することを特徴とする請求項1または請求項2に記載の被加工物の加工方法。 - 表面に格子状に形成された複数の分割予定ラインに区画された領域にデバイスが形成された被加工物の加工に用いる加工装置であって、
被加工物を保持するチャックテーブルと、
表面に樹脂が被覆された被加工物の裏面と該表面に被覆された樹脂とを研削する研削砥石を備える研削ユニットと、
該チャックテーブルに対して被加工物を搬入出および該チャックテーブルから搬出した被加工物を表裏反転させる搬送ユニットと、を備える加工装置。 - 前記研削砥石によって研削した後の前記樹脂の樹脂厚みを測定し、被加工物の裏面を所定の厚みへと薄化することを特徴とする請求項4に記載の加工装置。
- 前記研削砥石に向けて洗浄水を噴射する洗浄ノズルを備え、
該研削砥石に付着した前記樹脂を洗浄しながら該研削砥石で該樹脂を研削することを特徴とする請求項4または請求項5に記載の加工装置。 - 前記搬送ユニットを用いて被加工物の表裏を反転させ、
前記樹脂の研削と被加工物の前記裏面の研削とを同一の研削砥石を使用して実施することを特徴とする請求項4乃至請求項6のいずれかに記載の加工装置。
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