JP2019007082A - 蒸発器、堆積アレンジメント、堆積装置及びこれらを操作する方法 - Google Patents
蒸発器、堆積アレンジメント、堆積装置及びこれらを操作する方法 Download PDFInfo
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
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- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
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- C23C16/45563—Gas nozzles
- C23C16/45565—Shower nozzles
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45563—Gas nozzles
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- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M4/00—Electrodes
- H01M4/02—Electrodes composed of, or comprising, active material
- H01M4/36—Selection of substances as active materials, active masses, active liquids
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Abstract
Description
以上の説明は本発明の実施形態を対象としているが、本発明の基本的な範囲を逸脱することなく本発明の他の追加の実施形態を考案することができ、本発明の範囲は、添付の特許請求の範囲によって定められる。
Claims (15)
- アルカリ金属又はアルカリ土類金属を含む材料の蒸発及び前記材料の基板上への堆積のための堆積アレンジメントであって、
前記材料を液化するために構成された第1のチャンバと、
前記第1のチャンバと流体連通され、且つ前記第1のチャンバの下流にあるバルブであって、前記バルブを通る前記液化された材料の流量を制御するように構成されているバルブと、
前記バルブと流体連通され、且つ前記バルブの下流にある蒸発ゾーンであって、前記液化された材料を気化するように構成された蒸発ゾーンと、
前記気化された材料を前記基板に向けるための一又は複数の排出口と
を備えるアレンジメント。 - 前記一又は複数の排出口を備える蒸気供給シャワーヘッドを更に備え、特に前記蒸気供給シャワーヘッドは直線的な蒸気供給シャワーヘッドである、請求項1に記載のアレンジメント。
- 前記蒸発ゾーンは、チャンバ又は接触面積が1cm2から10cm2である表面によってもたらされる、請求項1又は2に記載のアレンジメント。
- 前記バルブに接続されたコントローラを更に備え、前記コントローラは前記基板上への蒸気の堆積速度を調整するための前記バルブを制御するように構成されている、請求項1から3のいずれか一項に記載のアレンジメント。
- 前記コントローラは比例-積分-微分コントローラであり、前記コントローラは堆積速度モニタシステムの信号を受信するように構成された信号入力を備える、請求項4に記載のアレンジメント。
- 前記第1のチャンバは、前記第1のチャンバの保護ガスの注入口用に構成されたガス注入口を備え、前記アレンジメントは前記第1のチャンバの前記保護ガスの流量を制御するために構成された更なるバルブを更に備える、請求項1から5のいずれか一項に記載のアレンジメント。
- 前記第1のチャンバは、前記更なるバルブと連通している圧力ゲージを更に備える、請求項6に記載のアレンジメント。
- 前記材料は金属リチウムである、請求項1から7のいずれか一項に記載のアレンジメント。
- 少なくとも前記第1のチャンバ及び前記バルブを格納するための筐体を更に備え、前記筐体は保護雰囲気下にある前記第1のチャンバの交換のために構成されている、請求項1から8のいずれか一項に記載のアレンジメント。
- アルカリ金属又はアルカリ土類金属を含む材料の蒸発及び前記材料の基板上への堆積のための堆積装置であって、
前記材料を前記基板上に堆積するための真空チャンバ、及び
請求項1から9のいずれか一項に記載のアレンジメント
を備える堆積装置。 - アルカリ金属又はアルカリ土類金属を含む材料を蒸発させる方法であって、
前記材料を第1のチャンバ内で液化させることと、
前記液化された材料を前記第1のチャンバからコントロールバルブを通って蒸発ゾーンまで導くことと、
前記材料を前記蒸発ゾーン内で蒸発させることと、
前記材料の前記蒸気を基板上に向けることと
を含む方法。 - 前記材料は金属リチウムを含む、請求項11に記載の方法。
- 前記材料は、特に600℃以上の温度で、前記蒸発ゾーン内で瞬間的に蒸発する、請求項11又は12に記載の方法。
- 前記液化された材料は、蒸発される前に、185℃から285℃の温度で維持される、請求項11から13のいずれか一項に記載の方法。
- 前記バルブを通る前記液化された材料の前記流量を調整するための前記バルブを制御するためのクローズドループコントロールを更に備える、請求項11から14のいずれか一項に記載の方法。
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EP12198683.0A EP2746423B1 (en) | 2012-12-20 | 2012-12-20 | Deposition arrangement, deposition apparatus and method of operation thereof |
EP12198683.0 | 2012-12-20 |
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EP (1) | EP2746423B1 (ja) |
JP (2) | JP2016507644A (ja) |
KR (2) | KR102494630B1 (ja) |
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TW (1) | TWI609979B (ja) |
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JP6488397B2 (ja) * | 2014-11-07 | 2019-03-20 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | 真空堆積のための材料源アレンジメント及びノズル |
WO2017121491A1 (en) * | 2016-01-15 | 2017-07-20 | Applied Materials, Inc. | Evaporation source, apparatus and method for depositing organic material |
CN110770365A (zh) * | 2017-06-21 | 2020-02-07 | 皮考逊公司 | 衬底处理装置和方法 |
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CN111304595A (zh) | 2020-06-19 |
US11713506B2 (en) | 2023-08-01 |
JP6639580B2 (ja) | 2020-02-05 |
KR102494630B1 (ko) | 2023-01-31 |
TWI609979B (zh) | 2018-01-01 |
CN104884664A (zh) | 2015-09-02 |
JP2016507644A (ja) | 2016-03-10 |
US20190071772A1 (en) | 2019-03-07 |
US20150299853A1 (en) | 2015-10-22 |
EP2746423B1 (en) | 2019-12-18 |
TW201425611A (zh) | 2014-07-01 |
KR20150095916A (ko) | 2015-08-21 |
WO2014096302A1 (en) | 2014-06-26 |
EP2746423A1 (en) | 2014-06-25 |
KR20210019131A (ko) | 2021-02-19 |
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