WO2009144072A1 - Arrangement for coating a substrate - Google Patents

Arrangement for coating a substrate Download PDF

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Publication number
WO2009144072A1
WO2009144072A1 PCT/EP2009/054218 EP2009054218W WO2009144072A1 WO 2009144072 A1 WO2009144072 A1 WO 2009144072A1 EP 2009054218 W EP2009054218 W EP 2009054218W WO 2009144072 A1 WO2009144072 A1 WO 2009144072A1
Authority
WO
WIPO (PCT)
Prior art keywords
arrangement
crucible
chamber
vaporizer
valve
Prior art date
Application number
PCT/EP2009/054218
Other languages
French (fr)
Inventor
Stefan Bangert
Jose Manuel Dieguez-Campo
Michael König
Nety M. Krishna
Byung-Sung Leo Kwak
Original Assignee
Applied Materials, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US12/130,118 external-priority patent/US20090293810A1/en
Priority claimed from EP20080009926 external-priority patent/EP2128303B1/en
Application filed by Applied Materials, Inc. filed Critical Applied Materials, Inc.
Priority to CN200980120088.8A priority Critical patent/CN102046832B/en
Priority to KR1020107029839A priority patent/KR101682348B1/en
Priority to JP2011510916A priority patent/JP5512660B2/en
Publication of WO2009144072A1 publication Critical patent/WO2009144072A1/en

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Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00Electrodes
    • H01M4/02Electrodes composed of, or comprising, active material
    • H01M4/13Electrodes for accumulators with non-aqueous electrolyte, e.g. for lithium-accumulators; Processes of manufacture thereof
    • H01M4/139Processes of manufacture
    • H01M4/1395Processes of manufacture of electrodes based on metals, Si or alloys
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00Electrodes
    • H01M4/02Electrodes composed of, or comprising, active material
    • H01M4/36Selection of substances as active materials, active masses, active liquids
    • H01M4/38Selection of substances as active materials, active masses, active liquids of elements or alloys
    • H01M4/381Alkaline or alkaline earth metals elements
    • H01M4/382Lithium
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M10/00Secondary cells; Manufacture thereof
    • H01M10/05Accumulators with non-aqueous electrolyte
    • H01M10/052Li-accumulators
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M6/00Primary cells; Manufacture thereof
    • H01M6/40Printed batteries, e.g. thin film batteries
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/10Energy storage using batteries

Definitions

  • the invention relates to an arrangement for coating a substrate according to the preamble of patent claim 1.
  • Li + ions are exchanged between a graphite (Li x Ce) anode and a layered oxide (Lii -x T M ⁇ 2) cathode, T M being a transition metal - cobalt, nickel or occasionally manganese.
  • T M being a transition metal - cobalt, nickel or occasionally manganese.
  • the energy density is approximately 180 Whkg "1 , which is approximately the fivefold of the considerably older lead-acid battery.
  • Li + batteries which comprise an oxygen cathode and a lithium anode (M. Armand and J.-M. Tarascon: Building Better Batteries, Nature, Vol. 451 , 7 Febr. 2008, pp. 652 - 657).
  • Lithium batteries are also produced as thin-layer batteries (WO 02/099910 A1 , p. 1 , lines 17 - 20).
  • the application of the thin layers takes place by sputtering.
  • ions for example of lithium orthophosphate are deposited on a substrate.
  • electrolyte layer of Li x P y ON z can be applied.
  • PECVD Plasma Enhanced Chemical Vapor Deposition
  • a film formation source for use in a film formation apparatus having a film formation chamber in which a vacuum or a depressurized state is formed and a sublimated or evaporated film formation material is formed into a film on a substrate (EP 1 584 705 A).
  • This film formation source further comprises a discharge outlet disposed within the film formation chamber for discharging the film formation material towards a film formation surface of the substrate, a material accommodating section disposed outside the film formation chamber and including a material container containing the film formation material.
  • a discharge passage air- tightly communicating the discharge outlet with the material accommodating section is also provided in the film formation source.
  • the invention addresses the problem of providing an arrangement for coating a substrate, wherein the coating material can also be a member of the group of chemically reactive alkali- and alkaline earth-metals.
  • the advantage attained with the invention comprises in particular that a vaporizer crucible can readily be replenished or exchanged free of risks. This is of significance in particular for highly reactive materials to be vaporized, for example lithium, since these must not be contacted nor be exposed to normal atmosphere, oxygen or water.
  • the invention consequently relates to an arrangement for the coating of a substrate by means of a vapor distributor.
  • This vapor distributor is connected with a vaporizer crucible via a feed system. Between the crucible and the feed system at least one valve is disposed.
  • the vaporizer crucible is located in a chamber which can be evacuated or flooded via a vacuum valve by means of a gas supply and a vacuum pump.
  • Fig. 1 a vapor feed system with the separating valve closed
  • Fig. 2 the vapor feed system according to Figure 1 with a PID controller with the separating valve open
  • Fig. 3 a vapor feed system with two separating valves
  • Fig. 4 the vapor feed system according to Figure 3, in which the separating valves are closed and a vaporizer crucible is laterally shifted.
  • Figure 1 shows a vapor feed system 1 for a vacuum chamber. Of the vacuum chamber only the chamber wall 2 is evident. In Figures 1 to 3 of DE 102 24 908 A1 such a vacuum chamber is shown in detail.
  • the vapor feed system 1 comprises a vertically oriented vaporizer tube 3, opposite to which is disposed a substrate 4 to be coated.
  • the vaporizer tube 3, which is provided with several, linearly vertically disposed vaporizer nozzles, is connected with an inlet tube 5 which is directed at right angles to the vaporizer tube 3.
  • This vaporizer tube 3, consequently, serves as a vapor distributor.
  • Parallel to the vaporizer tube 3 and perpendicularly to the inlet tube 5 is provided a cylindrical vaporizer crucible 7, which is located in a crucible housing 8. If reactive materials, for example lithium, are vaporized, the crucible 7 is, for example, comprised of stainless steel, titanium or molybdenum.
  • a cylinder 9 Beneath the vaporizer crucible 7 is located a cylinder 9 with a piston 10.
  • the vaporizer crucible 7, which in Figure 1 is in its lower position, can be raised and lowered by means of the piston 10.
  • a vacuum valve 11 Laterally to the piston 10 is provided a vacuum valve 11 , via which a crucible chamber 12 can be evacuated or be flooded, for example with protective gas.
  • the entire vapor feed system must be comprised of a material that is inert relative to these reactive materials.
  • a linear guide 31 which contributes to the stabilization of the crucible chamber 12.
  • a guide element 32 that is connected to the vaporizer crucible 7.
  • the inlet tube 5 includes a downwardly directed connection fitting 14.
  • the connection fitting 14 can be closed by means of an end piece 16 of a piston 17.
  • This connection fitting 14 comprises furthermore a calotte-shaped part 19 into which the upper part 18 of the vaporizer crucible 7 can engage.
  • Piston 17 is connected with a cylinder by means of which the piston 17 can be moved.
  • the cylinder 35 can be a pneumatically operated cylinder.
  • thermocouple 44 is wound from a vacuum-tight power feedthrough 50 in a spiral about the holding arrangement 36 and terminates in an indentation 51 located in the bottom of crucible 7.
  • the spiral winding of the thermocouple 44 that, on the one hand, is fastened on the power feedthrough 50 and, on the other hand, on the holding arrangement 36, permits the necessary lift of crucible 7 from a lower into an upper position. This is illustrated in Figure 2.
  • the thermocouple 44 can be moved in the direction of arrows 33 and 34, respectively, by means of piston 10.
  • Figure 1 is also evident a wall 6 of a glovebox 40, which encompasses the vaporizer crucible 7 and the vaporizer chamber 12. It becomes thereby possible to exchange the vaporizer crucible 7 under protective gas or to fill it with material.
  • protective gas can serve, for example, argon.
  • Figure 1 shows the glovebox 40 only segment-wise and schematically.
  • Figure 1 shows further a pressure gauge head 38 for measuring the pressure in the vaporizer crucible 7.
  • the separating valve 13 is either opened or closed by means of a control not depicted in Figure 1.
  • cooling means port 37 in Figure 1 shown only as a segment.
  • This cooling means port 37 is connected with a supply unit, not shown in Figure 1 , for a cooling means, for example H 2 O. If needed, the housing 41 is cooled with this cooling means.
  • the cooling means port 37 can be connected to the supply unit via an element, for example a tubing of rubber, not shown in Figure 1. If the cooling means is H 2 O, the supply unit can be a conventional water connection.
  • Figure 2 shows the same arrangement as Figure 1 , wherein, however, the vaporizer crucible 7 is raised by the piston 10 and specifically so far that the uppermost part 18 of vaporizer crucible 7 is inserted into the lowermost part 19 of connection fitting 14.
  • the upper part 18 of the vaporizer crucible 7 is here formed spherically while the lower part of connection fitting 14 is implemented in the form of a calotte.
  • the separating valve 13 is herein opened.
  • a crucible heating system that encompasses the vaporizer crucible 7.
  • This crucible heating system 20 is connected with a PID controller 21 which, in turn, is connected with a rate acquisition 22.
  • This rate acquisition 22 can be provided with a measuring instrument 23, for example an oscillating crystal or an emission spectroscope.
  • This measuring instrument 23 acquires the vaporization rate of the material which reaches the substrate 4 from the vaporizer tube 3.
  • a special nozzle 24 is provided which generates a rate signal that is proportional to the coating rate on the substrate 4. Through this nozzle 24 streams the vapor onto the measuring instrument 23.
  • the crucible heating system 20 can be regulated as a function of the coating rate.
  • the PID controller 21 can also be set a nominal value. Instead of a PID controller, another controller can also be provided.
  • the PID controller involves the general basic type of a controller comprised of the parallel circuit of PD controllers and I controllers, whose properties - early detection of disturbances, rapid correction and elimination of regulation deviation - it combines. If the regulated process contains dead times, the PID controller cannot be utilized due to its D component.
  • the vapor exiting the vaporizer tube 3 through the perpendicularly linearly disposed holes is shown symbolically by arrows 26.
  • the holes are laid out such that high vaporization rates and uniform coating are attained. For example, they have a diameter of 1 mm to 4 mm and a distance of 5 mm to 30 mm.
  • the holes or nozzle bores can here be located more closely to one another and, for example, only have half the distance from one another.
  • elongated holes or other forms of openings are also conceivable.
  • Figure 3 shows the same arrangement as Figure 1 , however, with two separating valves 13 and 27, both of which are closed.
  • the two separating valves 13 and 27 permit an even better exchange of the vaporizer crucible 7 under protective gas.
  • the upper separating valve 13 separates the coating chamber 28 from atmospheric pressure 29, while the lower separating valve 27 separates the crucible chamber 8, fillable with protective gas, from atmospheric pressure 29.
  • This separating valve 27 is disposed on the spacer ring 25.
  • the housing of the separating valve 27 must be implemented such that it is vacuum tight, however, the gate of the valve only needs to be diffusion-tight against gases. Since after flooding of crucible 7 to atmospheric pressure, no pressure difference with respect to the ambient air exists, the gate of the valve 27 does not need to absorb any vacuum forces.
  • the vaporizer crucible 7 is located in its lower position.
  • the crucible chamber 12 can be separately evacuated or flooded, for example with a protective gas.
  • a protective gas for example, argon.
  • the gas supply as well as the vacuum pump can optionally be connected via, for example, a T-piece and appropriately disposed valves with the flexible corrugated tubing leading to the valve 11.
  • the chamber is flooded.
  • the vaporizer crucible 7 can refilled or exchanged, respectively.
  • the glovebox 40 is herein under protective gas, for example argon.
  • the vaporizer crucible 7 is brought along a rail 30 into a position remote from the vaporization chamber. This takes place by movement of the vaporizer chamber 12 in the direction of arrow 39. Preferably in this position is the vaporizer crucible 7 exchanged or refilled.
  • the upper separating valve 13 is herein closed such that the vaporizer chamber continues to be under vacuum. Herewith the vacuum is not broken.
  • the vaporizer crucible 7 is located in its lower position. Via the vacuum valve 11 the crucible chamber 12 can be evacuated or flooded independently of the vacuum chamber. The vaporizer crucible 7, together with the crucible chamber 12, is introduced into the glovebox 40. Here the vaporizer crucible 7 is removed and replaced by a new vaporizer crucible or is refilled.
  • the separating valve 27 is closed and the crucible chamber 12 is evacuated. Subsequently crucible chamber 12 and vaporizer crucible 7 move along rail 30 back into their rearward position by moving in the direction of arrow 42. After the separating valves 13 and 27 have been connected vacuum-tight with one another and the crucible chamber 12 has been evacuated, the separating valves 13, 27 can be opened. The vaporizer crucible 7 is subsequently brought into the upper position by movement in the direction of arrow 33.
  • the glovebox 40 can be located spaced apart from the coating installation.
  • the crucible 7 under protective gas is removed with the valve 27 closed in the pulled-out position shown in Figure 4 from the crucible chamber 12 together with the spacer ring 25 and a suitable, also not shown, locking mechanism, i.e. lifted from the rail 30.
  • This locking mechanism fixes the crucible 7 on the spacer ring 25 or on the flange fastened on spacer ring 25.
  • the crucible 7 in the closed state can be transported to the glovebox 40 located apart.
  • the crucible 7 can optionally be cleaned, refilled again and closed with valve 27.
  • flexible substrates of synthetic material or metal can also be worked in an installation, such as for example depicted in Figure 3 of EP 1 589 130 A1.
  • this known installation only the vapor distributor tube and the vapor exit nozzle would need to be disposed horizontally and parallel to the sheeting.
  • cooling means port pressure gauge head arrow glovebox housing arrow thermocouple feedth rough indentation

Abstract

The invention relates to an arrangement for coating a substrate (4) by means of a vapor distributor (3). This vapor distributor (3) is connected with a vaporizer crucible (7) via an inlet (5). At least one valve (13) is disposed between the crucible (7) and the inlet (5). The vaporizer crucible (7) is located in a chamber (12) which can be evacuated or flooded by means of a vacuum valve (11).

Description

ARRANGEMENT FOR COATING A SUBSTRATE
Description
The invention relates to an arrangement for coating a substrate according to the preamble of patent claim 1.
Arrangements for coating a substrate with cadmium sulfide or zinc cadmium sulfide or with OLED substances are already known (US 4 401 052, DE 102 24 908 A1 , EP 1 357 200 A1 ). Herein the materials with which the substrate is to be coated are vaporized in vaporizers.
With these arrangements, however, no materials are vaporized which belong to the group alkali- and/or alkaline earth-metals, because these metals are highly reactive and form compounds with glass and water. Of the alkali- and alkaline earth-metals, lithium is in particular of interest since it is suitable for the production of only extremely slowly discharging batteries and accumulators.
Modern lithium batteries came first on the market in 1991. With them, Li+ ions are exchanged between a graphite (LixCe) anode and a layered oxide (Lii-xTMθ2) cathode, TM being a transition metal - cobalt, nickel or occasionally manganese. At an average voltage of 3.8 V the energy density is approximately 180 Whkg"1, which is approximately the fivefold of the considerably older lead-acid battery.
The most recent developments in the field of Li+ batteries involve the use of nanomaterials. Moreover, lithium-oxygen batteries are being investigated, which comprise an oxygen cathode and a lithium anode (M. Armand and J.-M. Tarascon: Building Better Batteries, Nature, Vol. 451 , 7 Febr. 2008, pp. 652 - 657).
Lithium batteries are also produced as thin-layer batteries (WO 02/099910 A1 , p. 1 , lines 17 - 20). The application of the thin layers takes place by sputtering. During the sputtering ions, for example of lithium orthophosphate are deposited on a substrate. Through reactive sputtering an electrolyte layer of LixPyONz can be applied. It is also known to apply thin layers of SiO2 and lithium by means of PECVD (= Plasma Enhanced Chemical Vapor Deposition) onto a substrate (US 6 177 142 B1 ).
Further known is the coating of a substrate with Li-Co-O, wherein an electron beam vaporizer is being utilized (JP 2003-234100).
In another known arrangement for the production of thin layers of lithium or lithium alloys on a substrate, lithium, located in a crucible, is vaporized under vacuum (JP 2002-206160).
Finally, there is known a film formation source for use in a film formation apparatus having a film formation chamber in which a vacuum or a depressurized state is formed and a sublimated or evaporated film formation material is formed into a film on a substrate (EP 1 584 705 A). This film formation source further comprises a discharge outlet disposed within the film formation chamber for discharging the film formation material towards a film formation surface of the substrate, a material accommodating section disposed outside the film formation chamber and including a material container containing the film formation material. A discharge passage air- tightly communicating the discharge outlet with the material accommodating section is also provided in the film formation source.
The invention addresses the problem of providing an arrangement for coating a substrate, wherein the coating material can also be a member of the group of chemically reactive alkali- and alkaline earth-metals.
This problem is solved according to the features of patent claim 1.
The advantage attained with the invention comprises in particular that a vaporizer crucible can readily be replenished or exchanged free of risks. This is of significance in particular for highly reactive materials to be vaporized, for example lithium, since these must not be contacted nor be exposed to normal atmosphere, oxygen or water.
The invention consequently relates to an arrangement for the coating of a substrate by means of a vapor distributor. This vapor distributor is connected with a vaporizer crucible via a feed system. Between the crucible and the feed system at least one valve is disposed. The vaporizer crucible is located in a chamber which can be evacuated or flooded via a vacuum valve by means of a gas supply and a vacuum pump.
Embodiment examples of the invention are shown in the Figures and will be described in further detail in the following. In the drawing depict:
Fig. 1 a vapor feed system with the separating valve closed,
Fig. 2 the vapor feed system according to Figure 1 with a PID controller with the separating valve open,
Fig. 3 a vapor feed system with two separating valves,
Fig. 4 the vapor feed system according to Figure 3, in which the separating valves are closed and a vaporizer crucible is laterally shifted.
Figure 1 shows a vapor feed system 1 for a vacuum chamber. Of the vacuum chamber only the chamber wall 2 is evident. In Figures 1 to 3 of DE 102 24 908 A1 such a vacuum chamber is shown in detail.
The vapor feed system 1 comprises a vertically oriented vaporizer tube 3, opposite to which is disposed a substrate 4 to be coated. The vaporizer tube 3, which is provided with several, linearly vertically disposed vaporizer nozzles, is connected with an inlet tube 5 which is directed at right angles to the vaporizer tube 3. This vaporizer tube 3, consequently, serves as a vapor distributor. Parallel to the vaporizer tube 3 and perpendicularly to the inlet tube 5 is provided a cylindrical vaporizer crucible 7, which is located in a crucible housing 8. If reactive materials, for example lithium, are vaporized, the crucible 7 is, for example, comprised of stainless steel, titanium or molybdenum. Beneath the vaporizer crucible 7 is located a cylinder 9 with a piston 10. The vaporizer crucible 7, which in Figure 1 is in its lower position, can be raised and lowered by means of the piston 10. Laterally to the piston 10 is provided a vacuum valve 11 , via which a crucible chamber 12 can be evacuated or be flooded, for example with protective gas.
However, since not only the crucible 7 is exposed to the reactive material, it is obvious that the entire vapor feed system must be comprised of a material that is inert relative to these reactive materials.
In this crucible chamber 12 is located a linear guide 31 which contributes to the stabilization of the crucible chamber 12. On this linear guide 31 is disposed a guide element 32 that is connected to the vaporizer crucible 7. By moving the guide element 32 along the linear guide 31 the vaporizer crucible 7 is also moved along the linear guide 31 , i.e. in the direction of arrows 33 and 34.
With the aid of a separating valve 13, shown in Figure 1 in the closed state, the crucible chamber 12 together with the crucible 7 can be separated from the inlet tube 5. This separating valve 13 is disposed on a spacer ring 25. The inlet tube 5 includes a downwardly directed connection fitting 14. In Figure 1 can further be seen a heating jacket 15. The connection fitting 14 can be closed by means of an end piece 16 of a piston 17. This connection fitting 14 comprises furthermore a calotte-shaped part 19 into which the upper part 18 of the vaporizer crucible 7 can engage. Piston 17 is connected with a cylinder by means of which the piston 17 can be moved. The cylinder 35 can be a pneumatically operated cylinder.
Within the crucible chamber 12 is further evident a holding arrangement 36 that is placed onto the piston 10. A thermocouple 44 is wound from a vacuum-tight power feedthrough 50 in a spiral about the holding arrangement 36 and terminates in an indentation 51 located in the bottom of crucible 7. By means of the thermocouple 44 the temperature at the bottom of the vaporizer crucible 7 can be measured. The spiral winding of the thermocouple 44, that, on the one hand, is fastened on the power feedthrough 50 and, on the other hand, on the holding arrangement 36, permits the necessary lift of crucible 7 from a lower into an upper position. This is illustrated in Figure 2. Therewith the thermocouple 44 can be moved in the direction of arrows 33 and 34, respectively, by means of piston 10.
In Figure 1 is also evident a wall 6 of a glovebox 40, which encompasses the vaporizer crucible 7 and the vaporizer chamber 12. It becomes thereby possible to exchange the vaporizer crucible 7 under protective gas or to fill it with material. As protective gas can serve, for example, argon. Figure 1 shows the glovebox 40 only segment-wise and schematically.
Figure 1 shows further a pressure gauge head 38 for measuring the pressure in the vaporizer crucible 7. When the pressure in the vaporizer crucible 7 reaches the desired value, the separating valve 13 is either opened or closed by means of a control not depicted in Figure 1.
Evident is also a cooling means port 37, in Figure 1 shown only as a segment. This cooling means port 37 is connected with a supply unit, not shown in Figure 1 , for a cooling means, for example H2O. If needed, the housing 41 is cooled with this cooling means. The cooling means port 37 can be connected to the supply unit via an element, for example a tubing of rubber, not shown in Figure 1. If the cooling means is H2O, the supply unit can be a conventional water connection.
Figure 2 shows the same arrangement as Figure 1 , wherein, however, the vaporizer crucible 7 is raised by the piston 10 and specifically so far that the uppermost part 18 of vaporizer crucible 7 is inserted into the lowermost part 19 of connection fitting 14. The upper part 18 of the vaporizer crucible 7 is here formed spherically while the lower part of connection fitting 14 is implemented in the form of a calotte. The separating valve 13 is herein opened.
By 20 is denoted a crucible heating system that encompasses the vaporizer crucible 7. This crucible heating system 20 is connected with a PID controller 21 which, in turn, is connected with a rate acquisition 22. This rate acquisition 22 can be provided with a measuring instrument 23, for example an oscillating crystal or an emission spectroscope. This measuring instrument 23 acquires the vaporization rate of the material which reaches the substrate 4 from the vaporizer tube 3. For this purpose in the vaporizer tube 3 a special nozzle 24 is provided which generates a rate signal that is proportional to the coating rate on the substrate 4. Through this nozzle 24 streams the vapor onto the measuring instrument 23. In this manner, the crucible heating system 20 can be regulated as a function of the coating rate. On the PID controller 21 can also be set a nominal value. Instead of a PID controller, another controller can also be provided. The PID controller involves the general basic type of a controller comprised of the parallel circuit of PD controllers and I controllers, whose properties - early detection of disturbances, rapid correction and elimination of regulation deviation - it combines. If the regulated process contains dead times, the PID controller cannot be utilized due to its D component.
The vapor exiting the vaporizer tube 3 through the perpendicularly linearly disposed holes is shown symbolically by arrows 26. The holes are laid out such that high vaporization rates and uniform coating are attained. For example, they have a diameter of 1 mm to 4 mm and a distance of 5 mm to 30 mm. To compensate the layer thickness decreases in the margin regions of substrate 4, the holes or nozzle bores can here be located more closely to one another and, for example, only have half the distance from one another. Instead of cylindrical holes, elongated holes or other forms of openings are also conceivable.
Figure 3 shows the same arrangement as Figure 1 , however, with two separating valves 13 and 27, both of which are closed. The two separating valves 13 and 27 permit an even better exchange of the vaporizer crucible 7 under protective gas. The upper separating valve 13 separates the coating chamber 28 from atmospheric pressure 29, while the lower separating valve 27 separates the crucible chamber 8, fillable with protective gas, from atmospheric pressure 29. This separating valve 27 is disposed on the spacer ring 25.
The housing of the separating valve 27 must be implemented such that it is vacuum tight, however, the gate of the valve only needs to be diffusion-tight against gases. Since after flooding of crucible 7 to atmospheric pressure, no pressure difference with respect to the ambient air exists, the gate of the valve 27 does not need to absorb any vacuum forces.
In the representation of Figure 3 the vaporizer crucible 7 is located in its lower position. Via the vacuum valve 11 the crucible chamber 12 can be separately evacuated or flooded, for example with a protective gas. Not shown is the connection of the vacuum valve 11 to a gas supply and a vacuum pump. The gas supply as well as the vacuum pump can optionally be connected via, for example, a T-piece and appropriately disposed valves with the flexible corrugated tubing leading to the valve 11. For removing the vaporizer crucible 7 from the crucible chamber 12, the chamber is flooded. In the glovebox 40 the vaporizer crucible 7 can refilled or exchanged, respectively. The glovebox 40 is herein under protective gas, for example argon.
In the depiction of Figure 4 the vaporizer crucible 7 is brought along a rail 30 into a position remote from the vaporization chamber. This takes place by movement of the vaporizer chamber 12 in the direction of arrow 39. Preferably in this position is the vaporizer crucible 7 exchanged or refilled. The upper separating valve 13 is herein closed such that the vaporizer chamber continues to be under vacuum. Herewith the vacuum is not broken.
It is understood that exchanging the crucible 7 or also filling it is only possible with the valve 27 open. The vaporizer crucible 7 must therefore be encompassed by the glovebox 40 filled with the protective gas.
As is shown in Figure 4, the vaporizer crucible 7 is located in its lower position. Via the vacuum valve 11 the crucible chamber 12 can be evacuated or flooded independently of the vacuum chamber. The vaporizer crucible 7, together with the crucible chamber 12, is introduced into the glovebox 40. Here the vaporizer crucible 7 is removed and replaced by a new vaporizer crucible or is refilled.
After filling the crucible 7 with the vaporization material, the separating valve 27 is closed and the crucible chamber 12 is evacuated. Subsequently crucible chamber 12 and vaporizer crucible 7 move along rail 30 back into their rearward position by moving in the direction of arrow 42. After the separating valves 13 and 27 have been connected vacuum-tight with one another and the crucible chamber 12 has been evacuated, the separating valves 13, 27 can be opened. The vaporizer crucible 7 is subsequently brought into the upper position by movement in the direction of arrow 33.
According to a further embodiment example, which is not depicted, the glovebox 40 can be located spaced apart from the coating installation. In this case the crucible 7 under protective gas is removed with the valve 27 closed in the pulled-out position shown in Figure 4 from the crucible chamber 12 together with the spacer ring 25 and a suitable, also not shown, locking mechanism, i.e. lifted from the rail 30. This locking mechanism fixes the crucible 7 on the spacer ring 25 or on the flange fastened on spacer ring 25. In this manner the crucible 7 in the closed state can be transported to the glovebox 40 located apart. Here the crucible 7 can optionally be cleaned, refilled again and closed with valve 27.
The above described processes can be utilized for the coating of glass substrates. However, using them, it is also possible to coat silicon wafers of 200 mm or 300 mm diameter, wherein a substrate carrier can be equipped with one or with several wafers. A substrate carrier is, however, not shown in Figure 4. The necessary coatable substrate height h for the uniform coating of all substrates placed onto the carrier, can be adapted via the length of the vaporizer tube 3.
Moreover, flexible substrates of synthetic material or metal can also be worked in an installation, such as for example depicted in Figure 3 of EP 1 589 130 A1. In this known installation only the vapor distributor tube and the vapor exit nozzle would need to be disposed horizontally and parallel to the sheeting.
It is understood that, instead of one crucible, several crucibles can also be provided and be interconnected in the manner described in EP 1 357 200 A1.
Those skilled in the art can readily recognize that numerous variations and substitutions may be made in the invention, its use and its configuration to achieve substantially the same results as achieved by the embodiments described herein. Accordingly, there is no intention to limit the invention to the disclosed exemplary forms. Many variations, modifications and alternative constructions fall within the scope and spirit of the disclosed invention as expressed in the claims. Reference numerals
1 vapor feed system
2 wall
3 vaporizer tube
4 substrate
5 inlet tube
6 wall
7 vaporizer crucible
8 crucible housing
9 cylinder
10 piston
11 vacuum valve
12 crucible chamber
13 separating valve
14 connection fitting
15 heating jacket
16 end piece
17 piston
18 part
19 part
20 crucible heating system
21 PID controller
22 rate acquisition
23 measuring instrument
24 nozzle
25 spacer ring
26 arrows
27 separating valve
28 coating chamber
29 atmospheric pressure
30 rail
31 linear guide
32 guide element arrow arrow cylinder holding arrangement cooling means port pressure gauge head arrow glovebox housing arrow thermocouple feedth rough indentation

Claims

Patent Claims
1. Arrangement for the coating of a substrate (4) by means of a vapor distributor (3) connectable via an inlet (5) with a vaporizer crucible (7), wherein between the crucible (7) and inlet (5) at least one valve (13) is disposed, and wherein the vaporizer crucible (7) is located in a chamber (12) that can be evacuated or vented by means of a vacuum valve (11 ), characterized in that a separate chamber (40) is provided for filling or exchanging the vaporizer crucible (7).
2. Arrangement as claimed in claim 1 , characterized in that the vapor distributor (3) is a linear vapor distributor.
3. Arrangement as claimed in claim 1 , characterized in that the vaporizer crucible (7) is movable toward the inlet (5) and away from it.
4. Arrangement as claimed in claim 1 , characterized in that the valve (13) provided between crucible (7) and inlet (5) is associated with the inlet (5).
5. Arrangement as claimed in claim 1 , characterized in that a second valve (27) is provided that is associated with the crucible chamber (12).
6. Arrangement as claimed in claim 5, characterized in that the second valve (27) is movable together with the vaporizer crucible (7) and the chamber (12).
7. Arrangement as claimed in claim 1 , characterized in that a measuring instrument (23) is provided which measures the vaporization rate and that this measuring instrument (23) is connected with a regulator (21 ) regulating a heating system (20) which heats the vaporizer crucible (7).
8. Arrangement as claimed in claim 1 , characterized in that the substrate (4) is located within a vacuum chamber.
9. Arrangement as claimed in claim 1 , characterized in that the vaporizer crucible (7) is located outside of a vacuum chamber.
10. Arrangement as claimed in claim 1 , characterized in that the vapor distributor (3) comprises at least one nozzle (24) through which streams vapor onto a measuring instrument (23).
11. Arrangement as claimed in claim 1 , characterized in that the vapor feed system (1 ) as well as the crucible (7) are comprised of a material that does not react chemically with the material to be vaporized.
12. Arrangement as claimed in claim 6, characterized in that the movement takes place along a rail (30).
13. Arrangement as claimed in claim 1 , characterized in that the chamber (40) is a glovebox (40).
14. Arrangement as claimed in claim 7, characterized in that the regulator (21 ) is a PID controller.
15. Arrangement as claimed in claim 2, characterized in that the linear vapor distributor (3) has several openings, disposed on at least one line, with a diameter of approximately 1 to 4 mm.
16. Arrangement as claimed in claim 6, characterized in that the crucible (7) closed by the separating valve (27) can be removed from the rail (30).
17. Arrangement as claimed in claim 15, characterized in that the openings are holes.
18. Arrangement as claimed in claim 15, characterized in that the openings are slits.
19. Arrangement as claimed in claim 15, characterized in that the openings are located more closely to one another in the margin region of the vapor distributor (3).
20. Arrangement as claimed in claim 1 , characterized in that the substrates are comprised of silicon or glass or synthetic material or metal.
21. Method for the production of coated substrates with the arrangement as claimed in claims 1 to 20.
22. Application of the coated substrates as claimed in claim 21 for the production of lithium batteries.
23. Arrangement for the coating of the substrate (4) by means of a vapor distributor (3) connectable via an inlet (5) with a vapor crucible (7), wherein between the crucible (7) and inlet (5) at least one valve (13) is disposed and wherein the vaporizer crucible (7) is located in the chamber that can be evacuated or vented by means of a vacuum valve (11 ), characterized in that a second valve (13) is provided that is associated with the crucible chamber (12).
PCT/EP2009/054218 2008-05-30 2009-04-08 Arrangement for coating a substrate WO2009144072A1 (en)

Priority Applications (3)

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CN200980120088.8A CN102046832B (en) 2008-05-30 2009-04-08 Arrangement for coating a substrate
KR1020107029839A KR101682348B1 (en) 2008-05-30 2009-04-08 Arrangement for coating a substrate
JP2011510916A JP5512660B2 (en) 2008-05-30 2009-04-08 Equipment for coating substrates

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US12/130,118 2008-05-30
US12/130,118 US20090293810A1 (en) 2008-05-30 2008-05-30 Arrangement for coating a substrate
EP08009926.0 2008-05-30
EP20080009926 EP2128303B1 (en) 2008-05-30 2008-05-30 Arrangement for coating a substrate

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Publication Number Publication Date
WO2009144072A1 true WO2009144072A1 (en) 2009-12-03

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KR (1) KR101682348B1 (en)
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EP2746423B1 (en) * 2012-12-20 2019-12-18 Applied Materials, Inc. Deposition arrangement, deposition apparatus and method of operation thereof
JP6741594B2 (en) * 2014-02-04 2020-08-19 アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated System for depositing one or more layers on a substrate supported by a carrier, and methods of using the system

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JP5932867B2 (en) 2016-06-08
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CN102046832A (en) 2011-05-04
TWI527925B (en) 2016-04-01
KR20110020878A (en) 2011-03-03
KR101682348B1 (en) 2016-12-12
TW201005115A (en) 2010-02-01
JP2011522118A (en) 2011-07-28
CN102046832B (en) 2014-07-23

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