JP2018538382A5 - - Google Patents
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- JP2018538382A5 JP2018538382A5 JP2018519469A JP2018519469A JP2018538382A5 JP 2018538382 A5 JP2018538382 A5 JP 2018538382A5 JP 2018519469 A JP2018519469 A JP 2018519469A JP 2018519469 A JP2018519469 A JP 2018519469A JP 2018538382 A5 JP2018538382 A5 JP 2018538382A5
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- JP
- Japan
- Prior art keywords
- layer
- alkyl
- coating
- copolymer
- grafted
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14/885,328 | 2015-10-16 | ||
| US14/885,328 US9574104B1 (en) | 2015-10-16 | 2015-10-16 | Compositions and processes for self-assembly of block copolymers |
| PCT/EP2016/074614 WO2017064199A1 (en) | 2015-10-16 | 2016-10-13 | Compositions and processes for self-assembly of block copolymers |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2018538382A JP2018538382A (ja) | 2018-12-27 |
| JP2018538382A5 true JP2018538382A5 (https=) | 2019-09-26 |
| JP6788668B2 JP6788668B2 (ja) | 2020-11-25 |
Family
ID=57133209
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018519469A Active JP6788668B2 (ja) | 2015-10-16 | 2016-10-13 | ブロックコポリマーの自己組織化のための組成物及び方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US9574104B1 (https=) |
| EP (1) | EP3362404B1 (https=) |
| JP (1) | JP6788668B2 (https=) |
| KR (1) | KR102398438B1 (https=) |
| CN (1) | CN108137313B (https=) |
| TW (1) | TWI599582B (https=) |
| WO (1) | WO2017064199A1 (https=) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2016223046A (ja) * | 2015-06-04 | 2016-12-28 | 東京応化工業株式会社 | 表面にパターンを有する繊維の製造方法 |
| KR102402958B1 (ko) * | 2015-11-11 | 2022-05-27 | 삼성전자주식회사 | 반도체 장치의 패턴 형성 방법 및 반도체 장치의 제조 방법 |
| JP6955176B2 (ja) * | 2016-07-06 | 2021-10-27 | Jsr株式会社 | 膜形成用組成物、膜形成方法及び自己組織化リソグラフィープロセス |
| WO2018033559A1 (en) * | 2016-08-18 | 2018-02-22 | AZ Electronic Materials (Luxembourg) S.à.r.l. | Polymer compositions for self-assembly applications |
| US10691019B2 (en) * | 2016-10-07 | 2020-06-23 | Jsr Corporation | Pattern-forming method and composition |
| JP6835969B2 (ja) | 2016-12-21 | 2021-02-24 | メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフツングＭｅｒｃｋ Ｐａｔｅｎｔ Ｇｅｓｅｌｌｓｃｈａｆｔ ｍｉｔ ｂｅｓｃｈｒａｅｎｋｔｅｒ Ｈａｆｔｕｎｇ | ブロックコポリマーの自己組織化のための新規組成物及び方法 |
| US10734239B2 (en) * | 2017-03-01 | 2020-08-04 | Brewer Science, Inc. | High-chi block copolymers with tunable glass transition temperatures for directed self-assembly |
| US10961383B2 (en) | 2018-02-01 | 2021-03-30 | Brewer Science, Inc. | Gradient block copolymers for directed self-assembly |
| JP7081377B2 (ja) * | 2018-08-01 | 2022-06-07 | Jsr株式会社 | 組成物及び基板表面の修飾方法 |
| CN113490696B (zh) * | 2018-12-07 | 2022-12-23 | 默克专利股份有限公司 | 用于聚苯乙烯-b-聚(甲基丙烯酸甲酯)二嵌段共聚物的接触孔自组装的快速可交联中性底层及其配制剂 |
| EP3772370A1 (en) * | 2019-08-05 | 2021-02-10 | Helmholtz-Zentrum Geesthacht Zentrum für Material- und Küstenforschung GmbH | Method of producing a polymeric membrane |
| JP7646684B2 (ja) * | 2020-08-17 | 2025-03-17 | Jsr株式会社 | 下層膜形成用組成物、下層膜、及び、リソグラフィープロセス |
| US20240219829A1 (en) * | 2021-05-18 | 2024-07-04 | Merck Patent Gmbh | Hydrophobic crosslinkable pinning underlayers with improved dry etch capabilities for patterning directed self-assembly of ps-b-pmma type block copolymers |
| WO2023099534A1 (en) | 2021-12-02 | 2023-06-08 | Merck Patent Gmbh | Neutral layer and hydrophobic pinning mat materials for use in dsa with improved substrate compatibility |
| JP2024063959A (ja) * | 2022-10-27 | 2024-05-14 | 東京応化工業株式会社 | 組成物及び重合体 |
| CN115826359A (zh) * | 2022-11-22 | 2023-03-21 | 西南科技大学 | 用于光刻图案化的全碳氢低介电损耗光敏树脂的制备及应用 |
| JP2026511349A (ja) | 2023-02-14 | 2026-04-14 | メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフツング | 誘導自己集合用途における自己集合化形状の改善のためのブロックコポリマー調合物 |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4101658B2 (ja) * | 2001-02-23 | 2008-06-18 | エーエムエス−ケミエ アーゲー | ポリアルキル（メタ）アクリレートセグメントおよびポリアミドセグメントからなる熱可塑性ブロックコポリマーならびにその使用 |
| US20090286927A1 (en) * | 2005-06-27 | 2009-11-19 | Niels Dan Anders Sodergard | Hyperbranched Polymers |
| KR100926697B1 (ko) * | 2007-06-12 | 2009-11-17 | 연세대학교 산학협력단 | 온도와 조성에 의한 부피 수축 원리를 이용한 다공성 나노구조체의 기공 크기 조절 |
| US7521094B1 (en) | 2008-01-14 | 2009-04-21 | International Business Machines Corporation | Method of forming polymer features by directed self-assembly of block copolymers |
| US8425982B2 (en) * | 2008-03-21 | 2013-04-23 | Micron Technology, Inc. | Methods of improving long range order in self-assembly of block copolymer films with ionic liquids |
| US8114301B2 (en) * | 2008-05-02 | 2012-02-14 | Micron Technology, Inc. | Graphoepitaxial self-assembly of arrays of downward facing half-cylinders |
| US7560141B1 (en) | 2008-11-11 | 2009-07-14 | International Business Machines Corporation | Method of positioning patterns from block copolymer self-assembly |
| US8569427B2 (en) * | 2009-10-08 | 2013-10-29 | University Of South Carolina | Polymers derived from rosin and their methods of preparation |
| US8691925B2 (en) * | 2011-09-23 | 2014-04-08 | Az Electronic Materials (Luxembourg) S.A.R.L. | Compositions of neutral layer for directed self assembly block copolymers and processes thereof |
| US8835581B2 (en) * | 2012-06-08 | 2014-09-16 | Az Electronic Materials (Luxembourg) S.A.R.L. | Neutral layer polymer composition for directed self assembly and processes thereof |
| CN105264642B (zh) * | 2013-04-03 | 2018-03-09 | 布鲁尔科技公司 | 用于定向自组装的嵌段共聚物中的高度耐蚀刻的聚合物嵌段 |
| US9291909B2 (en) | 2013-05-17 | 2016-03-22 | Az Electronic Materials (Luxembourg) S.A.R.L. | Composition comprising a polymeric thermal acid generator and processes thereof |
| TWI573808B (zh) * | 2013-12-31 | 2017-03-11 | 陶氏全球科技責任有限公司 | 經引導之自組裝圖案形成方法及組成物 |
| JP6558894B2 (ja) * | 2013-12-31 | 2019-08-14 | ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ | コポリマーの設計、その製造方法およびそれを含む物品 |
| CN106104754B (zh) * | 2014-01-16 | 2020-07-28 | 布鲁尔科技公司 | 用于直接自组装的高chi嵌段共聚物 |
-
2015
- 2015-10-16 US US14/885,328 patent/US9574104B1/en active Active
-
2016
- 2016-09-02 TW TW105128328A patent/TWI599582B/zh active
- 2016-10-13 EP EP16781447.4A patent/EP3362404B1/en active Active
- 2016-10-13 KR KR1020187013963A patent/KR102398438B1/ko active Active
- 2016-10-13 CN CN201680058211.8A patent/CN108137313B/zh active Active
- 2016-10-13 JP JP2018519469A patent/JP6788668B2/ja active Active
- 2016-10-13 WO PCT/EP2016/074614 patent/WO2017064199A1/en not_active Ceased
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