JP2018529847A - 金メッキ溶液 - Google Patents
金メッキ溶液 Download PDFInfo
- Publication number
- JP2018529847A JP2018529847A JP2018517544A JP2018517544A JP2018529847A JP 2018529847 A JP2018529847 A JP 2018529847A JP 2018517544 A JP2018517544 A JP 2018517544A JP 2018517544 A JP2018517544 A JP 2018517544A JP 2018529847 A JP2018529847 A JP 2018529847A
- Authority
- JP
- Japan
- Prior art keywords
- gold
- plating solution
- substituted
- gold plating
- article
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/42—Coating with noble metals
- C23C18/44—Coating with noble metals using reducing agents
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/42—Coating with noble metals
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/54—Contact plating, i.e. electroless electrochemical plating
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electrochemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Chemically Coating (AREA)
Abstract
Description
表1に示される溶液を、実施例1から4に使用した。表2に示される溶液を、比較例1及び2に使用した。
Claims (8)
- 1つ以上の金イオン源と、式(1):
式中、Rは、直鎖または分岐鎖の置換または非置換C1−C20アルキル;置換または非置換C6−C10アリール及び−A−X−A′−Yから選択され、式中、Xは、O、N(R′)またはSから選択され、Yは、−CN、アミド、アミノ及びカルボキシルから選択され、A及びA′は、同じまたは異なり得、直鎖または分岐鎖の置換または非置換C1−C20アルキレンであり、R′は、水素、または置換もしくは非置換の直鎖もしくは分岐鎖C1−C20アルキルであり;但し、−CNに対してアルファ位の炭素原子は、ヒドロキシルで置換されず、−CNに対してアルファ位の炭素がアミン基で置換される場合、アルファ炭素の残りの水素はさらに置換される、シアン化物不含無電解金めっき溶液。 - 前記有機化合物が、式(2)から(14)
- 亜硫酸ナトリウムをさらに含む、請求項1または2に記載の金めっき溶液。
- 金源が、塩化金、亜硫酸金及びチオ亜硫酸金から選択される、請求項1から3のいずれか一項に記載の金めっき溶液。
- 式(1)で表される前記有機化合物の濃度が、0.1から5g/Lである、請求項1から4のいずれか一項に記載の金めっき溶液。
- 物品上に金フィルムを形成するための方法であって、前記物品を、1つ以上の金イオン源と、式(1)により表される有機化合物とを含む溶液と接触させるステップを含む、方法。
- その金属表面上に金フィルムを有する物品であって、前記金フィルムは、請求項1から5に記載の金メッキ溶液から形成される、物品。
- 前記金属表面が、銅、ニッケル、コバルト、銀、パラジウム、ならびに銅、ニッケル、コバルト、銀及びパラジウムを含有する金属合金からなる群から選択される、請求項7に記載の物品。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/CN2015/097794 WO2017101092A1 (en) | 2015-12-18 | 2015-12-18 | Gold plating solution |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2018529847A true JP2018529847A (ja) | 2018-10-11 |
Family
ID=59055517
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2018517544A Ceased JP2018529847A (ja) | 2015-12-18 | 2015-12-18 | 金メッキ溶液 |
Country Status (7)
Country | Link |
---|---|
US (1) | US20180327908A1 (ja) |
EP (1) | EP3394319A4 (ja) |
JP (1) | JP2018529847A (ja) |
KR (1) | KR20180051630A (ja) |
CN (1) | CN108350575A (ja) |
TW (1) | TWI624564B (ja) |
WO (1) | WO2017101092A1 (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102163334B1 (ko) * | 2019-02-07 | 2020-10-08 | 주식회사 라디안큐바이오 | 금 나노구조체의 제조방법 및 제조장치 |
JP7457537B2 (ja) * | 2020-03-06 | 2024-03-28 | 関東化学株式会社 | 無電解金めっき用組成物 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6134181A (ja) * | 1984-07-25 | 1986-02-18 | Hitachi Ltd | 無電解金めつき液 |
JP2007246955A (ja) * | 2006-03-14 | 2007-09-27 | Okuno Chem Ind Co Ltd | 無電解金めっき浴 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2028950B2 (de) * | 1970-06-12 | 1976-05-13 | Shipley Co., Inc., Newton, Mass. (V.SLA.) | Waessrige loesung zum stromlosen abschneiden von nickel, kobalt oder legierungen davon |
DE2803147C2 (de) * | 1978-01-25 | 1984-03-08 | W.C. Heraeus Gmbh, 6450 Hanau | Tauchgoldbad |
JP2004190075A (ja) * | 2002-12-10 | 2004-07-08 | Kanto Chem Co Inc | 無電解金めっき液 |
JP4078977B2 (ja) * | 2002-12-27 | 2008-04-23 | 日立化成工業株式会社 | 無電解金めっき液及び無電解金めっき方法 |
JP5066691B2 (ja) * | 2006-03-14 | 2012-11-07 | 奥野製薬工業株式会社 | 無電解金めっき浴を安定化させる方法 |
CN101671839A (zh) * | 2009-08-31 | 2010-03-17 | 三门峡恒生科技研发有限公司 | 一种镀金用柠檬酸金钾及其制备方法 |
CN102383154A (zh) * | 2011-11-21 | 2012-03-21 | 福州大学 | 一种无氰镀金电镀液 |
CN103290439A (zh) * | 2012-02-22 | 2013-09-11 | 江涛 | 一种环保型镀金新材料-柠檬酸亚金钾及其制备方法 |
CN104514021A (zh) * | 2013-09-27 | 2015-04-15 | 江涛 | 一种无氰的镀金新材料-乙二胺柠檬酸金及其制备方法 |
-
2015
- 2015-12-18 US US15/775,023 patent/US20180327908A1/en not_active Abandoned
- 2015-12-18 CN CN201580083826.1A patent/CN108350575A/zh active Pending
- 2015-12-18 JP JP2018517544A patent/JP2018529847A/ja not_active Ceased
- 2015-12-18 EP EP15910563.4A patent/EP3394319A4/en not_active Withdrawn
- 2015-12-18 WO PCT/CN2015/097794 patent/WO2017101092A1/en active Application Filing
- 2015-12-18 KR KR1020187010383A patent/KR20180051630A/ko active IP Right Grant
-
2016
- 2016-12-15 TW TW105141648A patent/TWI624564B/zh not_active IP Right Cessation
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6134181A (ja) * | 1984-07-25 | 1986-02-18 | Hitachi Ltd | 無電解金めつき液 |
JP2007246955A (ja) * | 2006-03-14 | 2007-09-27 | Okuno Chem Ind Co Ltd | 無電解金めっき浴 |
Also Published As
Publication number | Publication date |
---|---|
EP3394319A4 (en) | 2019-09-18 |
WO2017101092A1 (en) | 2017-06-22 |
US20180327908A1 (en) | 2018-11-15 |
KR20180051630A (ko) | 2018-05-16 |
TWI624564B (zh) | 2018-05-21 |
TW201723225A (zh) | 2017-07-01 |
EP3394319A1 (en) | 2018-10-31 |
CN108350575A (zh) | 2018-07-31 |
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