JP2018507327A5 - - Google Patents
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- Publication number
- JP2018507327A5 JP2018507327A5 JP2017541314A JP2017541314A JP2018507327A5 JP 2018507327 A5 JP2018507327 A5 JP 2018507327A5 JP 2017541314 A JP2017541314 A JP 2017541314A JP 2017541314 A JP2017541314 A JP 2017541314A JP 2018507327 A5 JP2018507327 A5 JP 2018507327A5
- Authority
- JP
- Japan
- Prior art keywords
- macro
- component
- features
- chamber
- engineered
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000463 material Substances 0.000 claims 3
- 125000006850 spacer group Chemical group 0.000 claims 2
- 238000000034 method Methods 0.000 claims 1
- 239000011800 void material Substances 0.000 claims 1
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201562112649P | 2015-02-06 | 2015-02-06 | |
| US62/112,649 | 2015-02-06 | ||
| US201562184114P | 2015-06-24 | 2015-06-24 | |
| US62/184,114 | 2015-06-24 | ||
| PCT/US2016/013583 WO2016126403A1 (en) | 2015-02-06 | 2016-01-15 | 3d printed chamber components configured for lower film stress and lower operating temperature |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2018507327A JP2018507327A (ja) | 2018-03-15 |
| JP2018507327A5 true JP2018507327A5 (enExample) | 2019-02-28 |
| JP6917894B2 JP6917894B2 (ja) | 2021-08-11 |
Family
ID=56564502
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017541314A Active JP6917894B2 (ja) | 2015-02-06 | 2016-01-15 | 膜応力低減および動作温度低減用に構成された３ｄ印刷されたチャンバ部品 |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US10777391B2 (enExample) |
| EP (1) | EP3254305B1 (enExample) |
| JP (1) | JP6917894B2 (enExample) |
| KR (1) | KR102467442B1 (enExample) |
| CN (1) | CN107210179B (enExample) |
| DE (1) | DE202016009201U1 (enExample) |
| SG (2) | SG11201706207QA (enExample) |
| TW (1) | TWI725950B (enExample) |
| WO (1) | WO2016126403A1 (enExample) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN210156345U (zh) | 2016-09-13 | 2020-03-17 | 应用材料公司 | 用于处理腔室的腔室部件、用于处理腔室的屏蔽的设计膜以及处理腔室 |
| US10434604B2 (en) | 2016-10-14 | 2019-10-08 | Applied Materials, Inc. | Texturizing a surface without bead blasting |
| WO2019007488A1 (en) * | 2017-07-04 | 2019-01-10 | Cleanpart Group Gmbh | TREATMENT CHAMBER COMPONENT AND METHOD FOR FORMING SURFACE TEXTURE |
| DE102017126624A1 (de) * | 2017-11-13 | 2019-05-16 | Trumpf Laser- Und Systemtechnik Gmbh | Schichtselektive belichtung im überhangbereich bei der generativen fertigung |
| US11685990B2 (en) * | 2017-12-08 | 2023-06-27 | Applied Materials, Inc. | Textured processing chamber components and methods of manufacturing same |
| CN111788058B (zh) * | 2017-12-14 | 2022-10-25 | 南洋理工大学 | 用于在软材料中生成复杂的三维(3d)结构的定向聚合方法 |
| WO2019203978A1 (en) * | 2018-04-17 | 2019-10-24 | Applied Materials, Inc. | Texturizing a surface without bead blasting |
| JP7138474B2 (ja) * | 2018-05-15 | 2022-09-16 | 東京エレクトロン株式会社 | 部品の修復方法及び基板処理システム |
| JP7319425B2 (ja) * | 2018-05-15 | 2023-08-01 | 東京エレクトロン株式会社 | プラズマ処理装置及びプラズマ処理装置用部品 |
| JP7068921B2 (ja) * | 2018-05-15 | 2022-05-17 | 東京エレクトロン株式会社 | 部品の形成方法及びプラズマ処理装置 |
| DE102019113001A1 (de) * | 2019-05-16 | 2020-11-19 | Wipotec Gmbh | Monolithischer Wägeblock |
| JP7467062B2 (ja) * | 2019-10-15 | 2024-04-15 | 東京エレクトロン株式会社 | シリコン部材の製造方法及び造形装置 |
| US11739411B2 (en) * | 2019-11-04 | 2023-08-29 | Applied Materials, Inc. | Lattice coat surface enhancement for chamber components |
| KR102340823B1 (ko) * | 2020-07-06 | 2021-12-20 | 주식회사 케이제이테크 | 반도체제조공정 건식식각장치의 SiC 포커스링 제조방법 |
| US11450514B1 (en) * | 2021-03-17 | 2022-09-20 | Applied Materials, Inc. | Methods of reducing particles in a physical vapor deposition (PVD) chamber |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4031545A1 (de) * | 1990-10-05 | 1992-04-09 | Hell Rudolf Dr Ing Gmbh | Verfahren und vorrichtung zur herstellung einer texturwalze |
| US5614071A (en) * | 1995-06-28 | 1997-03-25 | Hmt Technology Corporation | Sputtering shield |
| KR20000069523A (ko) * | 1997-01-16 | 2000-11-25 | 보텀필드 레인, 에프. | 기상 증착 요소 및 기상 증착 방법 |
| US7116366B1 (en) | 1999-08-31 | 2006-10-03 | Micron Technology, Inc. | CMOS aps pixel sensor dynamic range increase |
| JP2002319520A (ja) * | 2001-04-20 | 2002-10-31 | Murata Mfg Co Ltd | インダクタ及びその製造方法 |
| US6777045B2 (en) * | 2001-06-27 | 2004-08-17 | Applied Materials Inc. | Chamber components having textured surfaces and method of manufacture |
| US6933508B2 (en) * | 2002-03-13 | 2005-08-23 | Applied Materials, Inc. | Method of surface texturizing |
| US6812471B2 (en) * | 2002-03-13 | 2004-11-02 | Applied Materials, Inc. | Method of surface texturizing |
| US20040206804A1 (en) * | 2002-07-16 | 2004-10-21 | Jaeyeon Kim | Traps for particle entrapment in deposition chambers |
| US6955748B2 (en) * | 2002-07-16 | 2005-10-18 | Honeywell International Inc. | PVD target constructions comprising projections |
| WO2005001918A1 (en) * | 2003-06-11 | 2005-01-06 | Honeywell International Inc. | Traps for particle entrapment in deposition chambers |
| CN1806316A (zh) * | 2003-06-11 | 2006-07-19 | 霍尼韦尔国际公司 | 沉积室中用于捕集粒子的阱 |
| TWI342582B (en) * | 2003-07-17 | 2011-05-21 | Applied Materials Inc | Method of surface texturizing |
| US20060292310A1 (en) * | 2005-06-27 | 2006-12-28 | Applied Materials, Inc. | Process kit design to reduce particle generation |
| US7943434B2 (en) * | 2008-03-21 | 2011-05-17 | Occam Portfolio Llc | Monolithic molded flexible electronic assemblies without solder and methods for their manufacture |
| PL2156941T3 (pl) * | 2008-08-21 | 2013-06-28 | Ge Avio Srl | Proces wytwarzania filtra, w szczególności dla separatora obrotowego oraz filtr otrzymany w tym procesie |
| EP2556015B1 (en) * | 2010-04-09 | 2016-08-10 | Frank Niklaus | Free form printing of silicon micro- and nanostructures |
| US20120258280A1 (en) * | 2011-04-11 | 2012-10-11 | Applied Materials, Inc. | Extended life textured chamber components and method for fabricating same |
| JP5989593B2 (ja) * | 2012-04-27 | 2016-09-07 | 日本碍子株式会社 | 半導体製造装置用部材 |
| US9099575B2 (en) * | 2013-07-16 | 2015-08-04 | Cree, Inc. | Solid state lighting devices and fabrication methods including deposited light-affecting elements |
-
2016
- 2016-01-15 CN CN201680008925.8A patent/CN107210179B/zh active Active
- 2016-01-15 KR KR1020177025119A patent/KR102467442B1/ko active Active
- 2016-01-15 JP JP2017541314A patent/JP6917894B2/ja active Active
- 2016-01-15 DE DE202016009201.5U patent/DE202016009201U1/de not_active Expired - Lifetime
- 2016-01-15 SG SG11201706207QA patent/SG11201706207QA/en unknown
- 2016-01-15 EP EP16746946.9A patent/EP3254305B1/en active Active
- 2016-01-15 WO PCT/US2016/013583 patent/WO2016126403A1/en not_active Ceased
- 2016-01-15 SG SG10201907105SA patent/SG10201907105SA/en unknown
- 2016-01-19 TW TW105101562A patent/TWI725950B/zh active
- 2016-02-04 US US15/015,849 patent/US10777391B2/en active Active
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