JP2018181950A - 複数のレーザモジュールを備えたレーザ装置 - Google Patents
複数のレーザモジュールを備えたレーザ装置 Download PDFInfo
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
- H01S3/1305—Feedback control systems
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/70—Auxiliary operations or equipment
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
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- H—ELECTRICITY
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/10038—Amplitude control
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- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/102—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
- H01S3/1022—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation by controlling the optical pumping
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
- H01S3/2383—Parallel arrangements
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/10069—Memorized or pre-programmed characteristics, e.g. look-up table [LUT]
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- H—ELECTRICITY
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
- H01S3/1306—Stabilisation of the amplitude
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
- H01S3/131—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
- H01S3/1312—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation by controlling the optical pumping
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- Optics & Photonics (AREA)
- Automation & Control Theory (AREA)
- Mechanical Engineering (AREA)
- Lasers (AREA)
- Laser Beam Processing (AREA)
- Semiconductor Lasers (AREA)
Abstract
【解決手段】レーザ装置10は、複数のレーザモジュール12と、レーザモジュール12からのレーザ光を合波する合波器16と、合波レーザ光についての第1の光出力指令を生成する光出力指令部18と、第1の光出力指令に基づいて、複数のレーザモジュール12のうち駆動すべきレーザモジュールを選択し、選択したレーザモジュールの各々について第2の光出力指令を生成するレーザモジュール選択・指令部20とを有し、レーザモジュール選択・指令部20は、駆動するレーザモジュールの個数を増やすときと減らすときの第1の光出力指令の閾値を互いに異なるように設定する。
【選択図】図1
Description
12 レーザモジュール
14 レーザ電源部
16 合波器
18 光出力指令部
20 レーザモジュール選択・指令部
22 制御部
24 第1の光検出器
26 第2の光検出器
Claims (4)
- 複数のレーザモジュールと、
前記レーザモジュールの各々を駆動するためのレーザ電源部と、
前記複数のレーザモジュールが発振したレーザ光を合波して合波レーザ光として出力する合波器と、
前記合波レーザ光についての第1の光出力指令を生成する光出力指令部と、
前記第1の光出力指令に基づいて、前記複数のレーザモジュールから駆動すべきレーザモジュールを選択するとともに、選択したレーザモジュールへの第2の光出力指令を生成するレーザモジュール選択・指令部と、
前記第2の光出力指令に基づいて、前記レーザモジュール及び前記レーザ電源部を制御する制御部と、を備え、
前記レーザモジュール選択・指令部は、前記第1の光出力指令の変化に応じた、レーザ発振する前記レーザモジュールの個数の切換えに関して、レーザ発振するレーザモジュールの個数をN個から減らすときの基準となる前記第1の光出力指令の第1の閾値よりも、レーザ発振するレーザモジュールの個数を前記N個に増やすときの前記第1の光出力指令の第2の閾値を、所定の値だけ高い値又は低い値に設定する、レーザ装置。 - 前記レーザモジュール選択・指令部は、レーザ発振するレーザモジュールの個数を減らすときに、第2の光出力指令と実際の光出力との差が最小であるか所定の範囲内のレーザモジュールを、レーザ発振を継続させるレーザモジュールとして優先的に選択する、請求項1に記載のレーザ装置。
- 前記レーザモジュール選択・指令部は、レーザ発振するレーザモジュールの個数を減らすときに、累積駆動時間若しくは駆動条件による加速係数を考慮した実効的累積駆動時間が最長であるか所定の値より大きいレーザモジュール、又は光出力特性に基づく残留寿命が最短であるか所定の値より小さいと推定されるレーザモジュールを、レーザ発振を停止するレーザモジュールとして優先的に選択する、請求項1又は2に記載のレーザ装置。
- 前記制御部は、前記レーザモジュールの光出力特性を所定のスケジュールに従って定期的に求めて前記レーザモジュール選択・指令部に送信し、前記レーザモジュール選択・指令部は、前記光出力特性を記憶するとともに、前記制御部から送信された光出力特性データに基づいて光出力特性を逐次更新するように構成されている、請求項1〜3のいずれか1項に記載のレーザ装置。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
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JP2017075825A JP6568136B2 (ja) | 2017-04-06 | 2017-04-06 | 複数のレーザモジュールを備えたレーザ装置 |
CN201810204757.0A CN108695681A (zh) | 2017-04-06 | 2018-03-13 | 具备多个激光模块的激光装置 |
US15/937,170 US10431953B2 (en) | 2017-04-06 | 2018-03-27 | Laser apparatus including plurality of laser modules |
DE102018107797.1A DE102018107797A1 (de) | 2017-04-06 | 2018-04-03 | Laservorrichtung mit mehreren Lasermodulen |
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JP2017075825A JP6568136B2 (ja) | 2017-04-06 | 2017-04-06 | 複数のレーザモジュールを備えたレーザ装置 |
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JP2018181950A true JP2018181950A (ja) | 2018-11-15 |
JP6568136B2 JP6568136B2 (ja) | 2019-08-28 |
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JP2017075825A Expired - Fee Related JP6568136B2 (ja) | 2017-04-06 | 2017-04-06 | 複数のレーザモジュールを備えたレーザ装置 |
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US (1) | US10431953B2 (ja) |
JP (1) | JP6568136B2 (ja) |
CN (1) | CN108695681A (ja) |
DE (1) | DE102018107797A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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WO2020241592A1 (ja) * | 2019-05-28 | 2020-12-03 | 三菱電機株式会社 | レーザ光発生装置およびそれを備えたレーザ加工装置 |
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Publication number | Priority date | Publication date | Assignee | Title |
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WO2019215798A1 (ja) * | 2018-05-07 | 2019-11-14 | 三菱電機株式会社 | レーザ装置、レーザ加工機およびレーザ装置の出力制御方法 |
CN109244821B (zh) * | 2018-11-08 | 2020-12-29 | 深圳市杰普特光电股份有限公司 | 激光器及激光生成方法 |
CN110137795A (zh) * | 2019-06-11 | 2019-08-16 | 深圳市创鑫激光股份有限公司 | 万瓦级别的超高功率全光纤连续光纤激光器系统 |
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JP2005317841A (ja) * | 2004-04-30 | 2005-11-10 | Matsushita Electric Ind Co Ltd | 半導体レーザ装置 |
WO2016060933A1 (en) * | 2014-10-15 | 2016-04-21 | Lumentum Operations Llc | Laser system and method of tuning the output power of the laser system |
US20160322777A1 (en) * | 2013-04-29 | 2016-11-03 | Nuburu, Inc. | Applications, methods and systems for a laser deliver addressable array |
JP2017054931A (ja) * | 2015-09-09 | 2017-03-16 | ファナック株式会社 | 複数のレーザダイオードモジュールを有する長寿命高効率レーザ装置 |
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JP2006012888A (ja) | 2004-06-22 | 2006-01-12 | Fuji Photo Film Co Ltd | 合波レーザ光照射方法および装置 |
JP5729107B2 (ja) * | 2011-04-20 | 2015-06-03 | 村田機械株式会社 | レーザ発振器制御装置 |
WO2014133013A1 (ja) | 2013-02-27 | 2014-09-04 | コマツ産機株式会社 | ファイバレーザ加工機の出力制御方法及びファイバレーザ加工機 |
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- 2017-04-06 JP JP2017075825A patent/JP6568136B2/ja not_active Expired - Fee Related
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- 2018-03-13 CN CN201810204757.0A patent/CN108695681A/zh active Pending
- 2018-03-27 US US15/937,170 patent/US10431953B2/en active Active
- 2018-04-03 DE DE102018107797.1A patent/DE102018107797A1/de not_active Withdrawn
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2005317841A (ja) * | 2004-04-30 | 2005-11-10 | Matsushita Electric Ind Co Ltd | 半導体レーザ装置 |
US20160322777A1 (en) * | 2013-04-29 | 2016-11-03 | Nuburu, Inc. | Applications, methods and systems for a laser deliver addressable array |
WO2016060933A1 (en) * | 2014-10-15 | 2016-04-21 | Lumentum Operations Llc | Laser system and method of tuning the output power of the laser system |
US20170279246A1 (en) * | 2014-10-15 | 2017-09-28 | Lumentum Operations Llc | Laser system and method of tuning the output power of the laser system |
JP2018503966A (ja) * | 2014-10-15 | 2018-02-08 | ルーメンタム オペレーションズ エルエルシーLumentum Operations LLC | レーザシステム、及び、レーザシステムの出力パワーを調整する方法 |
JP2017054931A (ja) * | 2015-09-09 | 2017-03-16 | ファナック株式会社 | 複数のレーザダイオードモジュールを有する長寿命高効率レーザ装置 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2020241592A1 (ja) * | 2019-05-28 | 2020-12-03 | 三菱電機株式会社 | レーザ光発生装置およびそれを備えたレーザ加工装置 |
JPWO2020241592A1 (ja) * | 2019-05-28 | 2020-12-03 | ||
JP7258132B2 (ja) | 2019-05-28 | 2023-04-14 | 三菱電機株式会社 | レーザ光発生装置およびそれを備えたレーザ加工装置 |
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Publication number | Publication date |
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US20180294619A1 (en) | 2018-10-11 |
DE102018107797A1 (de) | 2018-10-11 |
JP6568136B2 (ja) | 2019-08-28 |
US10431953B2 (en) | 2019-10-01 |
CN108695681A (zh) | 2018-10-23 |
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