JP2018125481A - 搬送機構 - Google Patents
搬送機構 Download PDFInfo
- Publication number
- JP2018125481A JP2018125481A JP2017018386A JP2017018386A JP2018125481A JP 2018125481 A JP2018125481 A JP 2018125481A JP 2017018386 A JP2017018386 A JP 2017018386A JP 2017018386 A JP2017018386 A JP 2017018386A JP 2018125481 A JP2018125481 A JP 2018125481A
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- claw member
- outer peripheral
- claw
- chuck table
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 230000007246 mechanism Effects 0.000 title claims abstract description 57
- 210000000078 claw Anatomy 0.000 claims abstract description 114
- 230000002093 peripheral effect Effects 0.000 claims abstract description 67
- 238000001514 detection method Methods 0.000 claims description 17
- 238000003860 storage Methods 0.000 claims description 7
- 238000013459 approach Methods 0.000 claims description 3
- 238000012545 processing Methods 0.000 abstract description 38
- 230000003247 decreasing effect Effects 0.000 abstract 1
- 235000012431 wafers Nutrition 0.000 description 185
- 238000004140 cleaning Methods 0.000 description 25
- 238000012546 transfer Methods 0.000 description 25
- 238000005520 cutting process Methods 0.000 description 24
- 230000007723 transport mechanism Effects 0.000 description 17
- 238000000034 method Methods 0.000 description 13
- 239000000758 substrate Substances 0.000 description 11
- 239000004065 semiconductor Substances 0.000 description 8
- 230000008569 process Effects 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 230000006870 function Effects 0.000 description 4
- 238000000227 grinding Methods 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- 238000009966 trimming Methods 0.000 description 4
- 229910010272 inorganic material Inorganic materials 0.000 description 3
- 239000011147 inorganic material Substances 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229910052594 sapphire Inorganic materials 0.000 description 2
- 239000010980 sapphire Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- WSMQKESQZFQMFW-UHFFFAOYSA-N 5-methyl-pyrazole-3-carboxylic acid Chemical compound CC1=CC(C(O)=O)=NN1 WSMQKESQZFQMFW-UHFFFAOYSA-N 0.000 description 1
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- GQYHUHYESMUTHG-UHFFFAOYSA-N lithium niobate Chemical compound [Li+].[O-][Nb](=O)=O GQYHUHYESMUTHG-UHFFFAOYSA-N 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Robotics (AREA)
Abstract
Description
26 ポジションテーブル
31 チャックテーブル
41 切削機構
48 切削ブレード
51 搬送機構
52 保持手段
53 移動機構(移動手段)
61 支持部(移動手段)
65 爪部材
68 爪部材作動手段
71 駆動負荷検出手段
72 位置検出手段
75 制御手段
76 記憶部
77 算出部
W ウェーハ
Claims (1)
- ウェーハの外周部を保持する保持手段と、該保持手段を鉛直方向及び水平方向に移動させる移動手段と、を備えウェーハをチャックテーブル上に搬送する搬送機構であって、
該保持手段は、
ウェーハの外周部を保持する複数の爪部材と、
該複数の爪部材をウェーハの外周部から離間した待機位置と該複数の爪部材を互いに半径方向に接近しウェーハの外周部を保持する作用位置との間で該複数の爪部材をそれぞれ独立して半径方向に作動させる爪部材作動手段と、該爪部材作動手段の駆動負荷をそれぞれ検出する駆動負荷検出手段と、各該爪部材の位置をそれぞれ検出する位置検出手段と、少なくとも該爪部材作動手段を制御する制御手段と、を備え、
該制御手段は、
各該爪部材がウェーハの外周部に当接した際の該爪部材作動手段の駆動負荷の値を閾値として記憶する記憶部と、
該駆動負荷検出手段からの該閾値を超えた駆動負荷を検出すると停止され該位置検出手段により検出された各該爪部材の位置からウェーハ中心位置を算出する算出部とを備え、
該保持手段で保持されたウェーハは、該算出部で算出された該ウェーハ中心位置をチャックテーブル中心位置に位置付けて該チャックテーブル上に載置されること、を特徴とする搬送機構。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017018386A JP6811951B2 (ja) | 2017-02-03 | 2017-02-03 | 搬送機構 |
TW107100040A TWI759394B (zh) | 2017-02-03 | 2018-01-02 | 搬送機構 |
CN201810076529.XA CN108389810B (zh) | 2017-02-03 | 2018-01-26 | 搬送机构 |
KR1020180009880A KR102272440B1 (ko) | 2017-02-03 | 2018-01-26 | 반송 기구 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017018386A JP6811951B2 (ja) | 2017-02-03 | 2017-02-03 | 搬送機構 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2018125481A true JP2018125481A (ja) | 2018-08-09 |
JP6811951B2 JP6811951B2 (ja) | 2021-01-13 |
Family
ID=63076535
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017018386A Active JP6811951B2 (ja) | 2017-02-03 | 2017-02-03 | 搬送機構 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6811951B2 (ja) |
KR (1) | KR102272440B1 (ja) |
CN (1) | CN108389810B (ja) |
TW (1) | TWI759394B (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7274350B2 (ja) * | 2019-05-28 | 2023-05-16 | 東京エレクトロン株式会社 | 搬送システム、検査システム及び検査方法 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010021257A (ja) * | 2008-07-09 | 2010-01-28 | Hitachi High-Tech Control Systems Corp | ウェーハアライメント装置及びそれを用いたウェーハ搬送装置 |
JP2011258925A (ja) * | 2010-05-12 | 2011-12-22 | Tokyo Electron Ltd | 基板処理装置、基板処理方法及びプログラムを記録した記憶媒体 |
JP2013165119A (ja) * | 2012-02-09 | 2013-08-22 | Tokyo Electron Ltd | 基板処理装置及び基板処理方法 |
JP2015176922A (ja) * | 2014-03-13 | 2015-10-05 | 東京エレクトロン株式会社 | 剥離方法、プログラム、コンピュータ記憶媒体、剥離装置及び剥離システム |
JP2015216191A (ja) * | 2014-05-09 | 2015-12-03 | 株式会社ディスコ | 搬送装置 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3515917B2 (ja) | 1998-12-01 | 2004-04-05 | シャープ株式会社 | 半導体装置の製造方法 |
JP4547524B2 (ja) | 2000-12-05 | 2010-09-22 | 川崎重工業株式会社 | ワーク処理方法、ワーク処理装置およびロボット |
JP2006093333A (ja) | 2004-09-22 | 2006-04-06 | Disco Abrasive Syst Ltd | 切削方法 |
CN102117736B (zh) * | 2006-02-22 | 2013-06-05 | 株式会社荏原制作所 | 基板处理装置、基板搬运装置、基板把持装置以及药液处理装置 |
TW201044487A (en) * | 2009-03-30 | 2010-12-16 | Automation Tooling Syst | Systems and methods for handling wafers |
JP5959216B2 (ja) * | 2012-02-06 | 2016-08-02 | 日東電工株式会社 | 基板搬送方法および基板搬送装置 |
JP6091867B2 (ja) * | 2012-12-04 | 2017-03-08 | 株式会社ディスコ | 搬送機構 |
JP6292155B2 (ja) * | 2015-03-19 | 2018-03-14 | 東京エレクトロン株式会社 | 基板処理装置、基板処理方法及び記憶媒体 |
-
2017
- 2017-02-03 JP JP2017018386A patent/JP6811951B2/ja active Active
-
2018
- 2018-01-02 TW TW107100040A patent/TWI759394B/zh active
- 2018-01-26 CN CN201810076529.XA patent/CN108389810B/zh active Active
- 2018-01-26 KR KR1020180009880A patent/KR102272440B1/ko active IP Right Grant
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010021257A (ja) * | 2008-07-09 | 2010-01-28 | Hitachi High-Tech Control Systems Corp | ウェーハアライメント装置及びそれを用いたウェーハ搬送装置 |
JP2011258925A (ja) * | 2010-05-12 | 2011-12-22 | Tokyo Electron Ltd | 基板処理装置、基板処理方法及びプログラムを記録した記憶媒体 |
JP2013165119A (ja) * | 2012-02-09 | 2013-08-22 | Tokyo Electron Ltd | 基板処理装置及び基板処理方法 |
JP2015176922A (ja) * | 2014-03-13 | 2015-10-05 | 東京エレクトロン株式会社 | 剥離方法、プログラム、コンピュータ記憶媒体、剥離装置及び剥離システム |
JP2015216191A (ja) * | 2014-05-09 | 2015-12-03 | 株式会社ディスコ | 搬送装置 |
Also Published As
Publication number | Publication date |
---|---|
TWI759394B (zh) | 2022-04-01 |
JP6811951B2 (ja) | 2021-01-13 |
CN108389810B (zh) | 2022-10-04 |
KR102272440B1 (ko) | 2021-07-01 |
KR20200067251A (ko) | 2020-06-12 |
TW201830567A (zh) | 2018-08-16 |
CN108389810A (zh) | 2018-08-10 |
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