JP2018124552A - 感光性樹脂組成物、感光性ドライフィルム、感光性樹脂皮膜、及びパターン形成方法 - Google Patents
感光性樹脂組成物、感光性ドライフィルム、感光性樹脂皮膜、及びパターン形成方法 Download PDFInfo
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- JP2018124552A JP2018124552A JP2018012220A JP2018012220A JP2018124552A JP 2018124552 A JP2018124552 A JP 2018124552A JP 2018012220 A JP2018012220 A JP 2018012220A JP 2018012220 A JP2018012220 A JP 2018012220A JP 2018124552 A JP2018124552 A JP 2018124552A
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- 230000005855 radiation Effects 0.000 description 1
- 229920005604 random copolymer Polymers 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- QBERHIJABFXGRZ-UHFFFAOYSA-M rhodium;triphenylphosphane;chloride Chemical compound [Cl-].[Rh].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 QBERHIJABFXGRZ-UHFFFAOYSA-M 0.000 description 1
- 238000007363 ring formation reaction Methods 0.000 description 1
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- 229920005573 silicon-containing polymer Polymers 0.000 description 1
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- 239000002356 single layer Substances 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229960002317 succinimide Drugs 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
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- 239000000057 synthetic resin Substances 0.000 description 1
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- JAELLLITIZHOGQ-UHFFFAOYSA-N tert-butyl propanoate Chemical compound CCC(=O)OC(C)(C)C JAELLLITIZHOGQ-UHFFFAOYSA-N 0.000 description 1
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- FAGUFWYHJQFNRV-UHFFFAOYSA-N tetraethylenepentamine Chemical compound NCCNCCNCCNCCN FAGUFWYHJQFNRV-UHFFFAOYSA-N 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- 150000007979 thiazole derivatives Chemical class 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 125000002088 tosyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1C([H])([H])[H])S(*)(=O)=O 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- ABVVEAHYODGCLZ-UHFFFAOYSA-N tridecan-1-amine Chemical compound CCCCCCCCCCCCCN ABVVEAHYODGCLZ-UHFFFAOYSA-N 0.000 description 1
- SWZDQOUHBYYPJD-UHFFFAOYSA-N tridodecylamine Chemical compound CCCCCCCCCCCCN(CCCCCCCCCCCC)CCCCCCCCCCCC SWZDQOUHBYYPJD-UHFFFAOYSA-N 0.000 description 1
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- AANIRNIRVXARSN-UHFFFAOYSA-M trifluoromethanesulfonate;trimethylsulfanium Chemical compound C[S+](C)C.[O-]S(=O)(=O)C(F)(F)F AANIRNIRVXARSN-UHFFFAOYSA-M 0.000 description 1
- TUODWSVQODNTSU-UHFFFAOYSA-M trifluoromethanesulfonate;tris[4-[(2-methylpropan-2-yl)oxy]phenyl]sulfanium Chemical compound [O-]S(=O)(=O)C(F)(F)F.C1=CC(OC(C)(C)C)=CC=C1[S+](C=1C=CC(OC(C)(C)C)=CC=1)C1=CC=C(OC(C)(C)C)C=C1 TUODWSVQODNTSU-UHFFFAOYSA-M 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- 125000001889 triflyl group Chemical group FC(F)(F)S(*)(=O)=O 0.000 description 1
- RKBCYCFRFCNLTO-UHFFFAOYSA-N triisopropylamine Chemical compound CC(C)N(C(C)C)C(C)C RKBCYCFRFCNLTO-UHFFFAOYSA-N 0.000 description 1
- 239000013638 trimer Substances 0.000 description 1
- 125000003258 trimethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- ODHXBMXNKOYIBV-UHFFFAOYSA-N triphenylamine Chemical compound C1=CC=CC=C1N(C=1C=CC=CC=1)C1=CC=CC=C1 ODHXBMXNKOYIBV-UHFFFAOYSA-N 0.000 description 1
- WLOQLWBIJZDHET-UHFFFAOYSA-N triphenylsulfonium Chemical compound C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 WLOQLWBIJZDHET-UHFFFAOYSA-N 0.000 description 1
- 239000012953 triphenylsulfonium Substances 0.000 description 1
- FAYMLNNRGCYLSR-UHFFFAOYSA-M triphenylsulfonium triflate Chemical compound [O-]S(=O)(=O)C(F)(F)F.C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 FAYMLNNRGCYLSR-UHFFFAOYSA-M 0.000 description 1
- YFTHZRPMJXBUME-UHFFFAOYSA-N tripropylamine Chemical compound CCCN(CCC)CCC YFTHZRPMJXBUME-UHFFFAOYSA-N 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 230000004304 visual acuity Effects 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
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- 239000011995 wilkinson's catalyst Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 125000005023 xylyl group Chemical group 0.000 description 1
Classifications
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/22—Polybenzoxazoles
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0387—Polyamides or polyimides
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
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- G—PHYSICS
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
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- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
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- Polymers & Plastics (AREA)
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- Materials For Photolithography (AREA)
- Silicon Polymers (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
Abstract
Description
1.(A)下記式(1a)で表される繰り返し単位及び下記式(1b)で表される繰り返し単位を含むシリコーン変性ポリベンゾオキサゾール樹脂、及び(B)190〜500nmの光によって分解し、酸を発生する光酸発生剤を含む感光性樹脂組成物。
2.X2が、下記式で表される基から選ばれる基である1の感光性樹脂組成物。
3.更に、(C)架橋剤を含む1又は2の感光性樹脂組成物。
4.(C)架橋剤が、ホルムアルデヒド又はホルムアルデヒド−アルコールにより変性されたアミノ縮合物、1分子中に平均して2個以上のメチロール基又はアルコキシメチロール基を有するフェノール化合物、及び1分子中に平均して2個以上のエポキシ基を有するエポキシ化合物から選ばれる1種以上である3の感光性樹脂組成物。
5.更に、(E)塩基性化合物を含む1〜4のいずれかの感光性樹脂組成物。
6.前記感光性樹脂組成物が、2つの基板を接合するための基板接合用材料である3〜5のいずれかの感光性樹脂組成物。
7.(A)下記式(1a)で表される繰り返し単位及び下記式(1b)で表される繰り返し単位を含むシリコーン変性ポリベンゾオキサゾール樹脂、及び(B)190〜500nmの光によって分解し、酸を発生する光酸発生剤を含む感光性樹脂皮膜。
8.支持フィルムと、該支持フィルム上に7の感光性樹脂皮膜とを備える感光性ドライフィルム。
9.基板と、7の感光性樹脂皮膜とを備える積層体。
10.(i)1〜5のいずれかの感光性樹脂組成物を基板上に塗布し、該基板上に感光性樹脂皮膜を形成する工程、
(ii)前記感光性樹脂皮膜を、フォトマスクを介して露光し、露光後加熱処理を行う工程、及び
(iii)前記露光後加熱処理を行った感光性樹脂皮膜を現像液にて現像して非露光部を溶解除去し、パターンを形成する工程
を含むパターン形成方法。
11.(i)8の感光性ドライフィルムの感光性樹脂皮膜を基板に貼り付ける工程、
(ii)前記感光性樹脂皮膜を、フォトマスクを介して露光し、露光後加熱処理を行う工程、及び
(iii)前記露光後加熱処理を行った感光性樹脂皮膜を現像液にて現像して非露光部を溶解除去し、パターンを形成する工程
を含むパターン形成方法。
12.更に、(iv)現像によりパターン形成された皮膜を、100〜250℃の温度で後硬化する工程を含む10又は11のパターン形成方法。
[(A)シリコーン変性ポリベンゾオキサゾール樹脂]
本発明の感光性樹脂組成物は、(A)成分として、下記式(1a)で表される繰り返し単位及び下記式(1b)で表される繰り返し単位を含むシリコーン変性ポリベンゾオキサゾール樹脂を含む。
(A)成分のシリコーン変性ポリベンゾオキサゾール樹脂は、下記式(1−A)で表されるオルガノポリシロキサンと、下記式(1−B)で表される化合物と、下記式(2−A)で表されるベンゾオキサゾール化合物との付加重合反応によって製造することができる。
本発明の感光性樹脂組成物は、更に、(B)成分として190〜500nmの光によって分解し、酸を発生する光酸発生剤を含む。190〜500nmの波長の光によって発生した酸は、硬化触媒となる。本発明の感光性樹脂組成物は、酸発生剤の相溶性が優れるため、幅広い光酸発生剤を使用することができる。そのような光酸発生剤としては、例えば、オニウム塩、ジアゾメタン誘導体、グリオキシム誘導体、β−ケトスルホン誘導体、ジスルホン誘導体、ニトロベンジルスルホネート誘導体、スルホン酸エステル誘導体、イミド−イル−スルホネート誘導体、オキシムスルホネート誘導体、イミノスルホネート誘導体等が挙げられる。
本発明の感光性樹脂組成物は、更に、(C)成分として架橋剤を含んでもよい。前記架橋剤は、(A)成分の式(2)中のR13と縮合反応を起こし、パターンの形成を容易になし得るための成分であるとともに、光硬化後の樹脂皮膜の強度を更に上げるものである。
本発明の感光性樹脂組成物は、更に、(D)成分として溶剤を含んでもよい。前記溶剤としては、前述した各成分や、後述する(E)成分及び添加剤を溶解し得るものであれば、特に限定されない。溶剤を配合することによって、感光性樹脂組成物の塗布性を向上させることができる。
更に、本発明の感光性樹脂組成物は、(E)成分として塩基性化合物を含んでもよい。前記塩基性化合物としては、光酸発生剤より発生した酸が感光性樹脂皮膜内を拡散する際の拡散速度を抑制することができる化合物が適している。前記塩基性化合物を配合することにより、解像度が向上し、露光後の感度変化を抑制し、基板依存性又は環境依存性を小さくし、露光余裕度やパターン形状を向上させることができる。
本発明の感光性樹脂組成物は、前述した各成分以外に、その他の添加剤を含んでもよい。その他の添加剤としては、例えば、塗布性を向上させるために慣用されている界面活性剤が挙げられる。
本発明の感光性樹脂組成物を用いたパターン形成方法は、
(i)前記感光性樹脂組成物を基板上に塗布し、該基板上に感光性樹脂皮膜を形成する工程、
(ii)前記感光性樹脂皮膜を、フォトマスクを介して露光し、露光後加熱処理を行う工程、及び
(iii)前記露光後加熱処理を行った感光性樹脂皮膜を現像液にて現像して非露光部を溶解除去し、パターンを形成する工程
を含むものである。
本発明の感光性樹脂組成物は、2つの基板を接合するための接着剤として使用できる。基板の接合方法としては、熱及び圧力の好適な条件下で、2つの基板間に接着性結合が形成されるように、本発明の組成物で皮膜を形成した基板を第2の基板と接合させる方法が挙げられる。皮膜を形成した基板及び第2の基板のいずれか一方又は両方が、ダイシング加工等によりチップ化されることもある。接合条件として、加熱温度は50〜200℃が好ましく、加熱時間は1〜60分間が好ましい。接合装置として、ウェハボンダ装置を使用し、荷重を加えながら減圧下でのウェハ同士の貼り付け、あるいはフリップチップボンダ装置を用いたチップ−ウェハ又はチップ−チップ接合を行うこともできる。基板間に形成された接着層は、後述する後硬化処理により結合力が高まり、永久接合となる。
本発明の感光性ドライフィルムは、支持フィルムと、該支持フィルム上に前記感光性樹脂皮膜とを備えるものである。
本発明の感光性ドライフィルムを用いたパターン形成方法は、
(i)前記感光性ドライフィルムの感光性樹脂皮膜を基板に貼り付ける工程、
(ii)前記感光性樹脂皮膜を、フォトマスクを介して露光し、露光後加熱処理を行う工程、及び
(iii)前記露光後加熱処理を行った感光性樹脂皮膜を現像液にて現像して非露光部を溶解除去し、パターンを形成する工程
を含むものである。
本発明の積層体は、基板に、本発明の感光性樹脂組成物から得られる樹脂皮膜又は本発明の感光性ドライフィルムから得られる樹脂皮膜が形成されたものである。前記基板としては、通常の平坦な基板のほか、凹凸のある基板(例えば、開口幅が10〜100μmかつ深さが10〜120μmである溝及び孔のいずれか一方又は両方を有する基板)も好適に使用し得る。本発明の積層体は、基板と樹脂皮膜との密着性に優れ、また、基板がこのような凹凸を持つ場合にも高い平坦性を有する。
[合成例1]ベンゾオキサゾール化合物S−1aの合成
窒素気流下、300mL4口フラスコに、化合物A−2を35.6g(0.20mоl)仕込み、γ−ブチロラクトン50gに溶解させた。これに、ジシクロへキシルカルボジイミド41.2g(0.20mоl)をγ−ブチロラクトン50gに溶解させた溶液を5℃で滴下した。その後、温度を5℃に保ったまま20分攪拌した後、γ−ブチロラクトン50gに化合物A−1を36.6g(0.10mоl)溶解させた溶液を5℃で滴下した。その後、5℃で3時間攪拌し、更に室温で10時間攪拌した。攪拌終了後、系内を200℃まで昇温し、閉環脱水反応を20時間行った。なお、閉環脱水反応中は、ディーン・スタークトラップを用いて系内から水を取り除きながら反応を行った。副生成物の尿素を濾過で除去した後、IPA中で再結晶を行い(純水を貧溶剤として添加した。)、最後に結晶を120℃×3時間乾燥させることで、ベンゾオキサゾール化合物S−1aを52.0g得た(収率80.0%)。1H−NMR及び13C−NMR(Bruker社製AV400M、溶剤:重トルエン、以下同じ。)の結果を、それぞれ表1及び2に示す。
窒素気流下、300mL4口フラスコに、化合物B−1を28.0g(0.10mоl)及び化合物B−2を50.8g(0.20mоl)仕込み、N−メチル−2−ピロリドン(NMP)100gに溶解させ、180℃まで加熱した。なお、反応中は、系中を減圧して副生成物として出たフェノールを取り除きながら行った。3時間加熱した後、常圧に戻し、系内を200℃まで昇温し、閉環脱水反応を20時間行った。なお、閉環脱水反応中は、ディーン・スタークトラップを用いて系内から水を取り除きながら反応を行った。反応溶液を水1,000mLに投入し再沈殿させ、結晶を取り出し、イオン交換水及びメタノールで洗浄し、最後に結晶を120℃×3時間乾燥させることで、ベンゾオキサゾール化合物S−1bを44.5g得た(収率78.9%)。1H−NMR及び13C−NMRの結果を、それぞれ表3及び4に示す。
窒素気流下、300mL4口フラスコに、化合物C−1を25.8g(0.10mоl)及び化合物C−2を62.0g(0.20mоl)仕込み、NMP100gに溶解させ、180℃まで加熱した。なお、反応中は、系中を減圧して副生成物として出たフェノールを取り除きながら行った。3時間加熱した後、常圧に戻し、系内を200℃まで昇温し、閉環脱水反応を20時間行った。なお、閉環脱水反応中は、ディーン・スタークトラップを用いて系内から水を取り除きながら反応を行った。反応溶液を水1,000mLに投入し再沈殿させ、結晶を取り出し、イオン交換水及びメタノールで洗浄し、最後に結晶を120℃×3時間乾燥させることで、ベンゾオキサゾール化合物S−1cを48.9g得た(収率74.7%)。1H−NMR及び13C−NMRの結果を、それぞれ表5及び6に示す。
[合成例4]樹脂Aの合成
攪拌機、温度計、窒素置換装置及び還流冷却器を具備した3Lフラスコに、ベンゾオキサゾール化合物S−1a325.0g(0.5mol)を加えた後、トルエン2,000gを加え、70℃になるまで加熱した。その後、塩化白金酸トルエン溶液(白金濃度0.5質量%)1.0gを投入し、式(S−2)で表される化合物(d=40、信越化学工業(株)製)755.0g(0.25mol)及び式(S−4)で表される化合物(信越化学工業(株)製)48.5g(0.25mol)を1時間かけて滴下した(ヒドロシリル基の合計/アルケニル基の合計=1/1(モル比))。滴下終了後、100℃になるまで加熱し、6時間熟成した後、反応溶液からトルエンを減圧留去し、樹脂Aを得た。樹脂Aは、1H−NMR及び29Si−NMR(Bruker社製)により、式(1a)で表される繰り返し単位及び式(1b)で表される繰り返し単位を含むことを確認した。樹脂AのMwは42,000、シリコーン含有率は66.9質量%、式(1a)及び(1b)におけるa及びbは、a=0.5、b=0.5であった。
攪拌機、温度計、窒素置換装置及び還流冷却器を具備した3Lフラスコに、ベンゾオキサゾール化合物S−1b282.0g(0.5mol)を加えた後、トルエン2,000gを加え、70℃になるまで加熱した。その後、塩化白金酸トルエン溶液(白金濃度0.5質量%)1.0gを投入し、式(S−2)で表される化合物(d=40、信越化学工業(株)製)151.0g(0.05mol)及び式(S−4)で表される化合物(信越化学工業(株)製)87.3g(0.45mol)を1時間かけて滴下した(ヒドロシリル基の合計/アルケニル基の合計=1/1(モル比))。滴下終了後、100℃になるまで加熱し、6時間熟成した後、反応溶液からトルエンを減圧留去し、樹脂Bを得た。樹脂Bは、1H−NMR及び29Si−NMR(Bruker社製)により、式(1a)で表される繰り返し単位及び式(1b)で表される繰り返し単位を含むことを確認した。樹脂BのMwは44,000、シリコーン含有率は66.9質量%、式(1a)及び(1b)におけるa及びbは、a=0.5、b=0.5であった。
攪拌機、温度計、窒素置換装置及び還流冷却器を具備した3Lフラスコに、ベンゾオキサゾール化合物S−1c327.0g(0.5mol)を加えた後、トルエン2,000gを加え、70℃になるまで加熱した。その後、塩化白金酸トルエン溶液(白金濃度0.5質量%)1.0gを投入し、式(S−2)で表される化合物(d=40、信越化学工業(株)製)1057.0g(0.35mol)及び式(S−4)で表される化合物(信越化学工業(株)製)29.1g(0.15mol)を1時間かけて滴下した(ヒドロシリル基の合計/アルケニル基の合計=1/1(モル比))。滴下終了後、100℃になるまで加熱し、6時間熟成した後、反応溶液からトルエンを減圧留去し、樹脂Cを得た。樹脂Cは、1H−NMR及び29Si−NMR(Bruker社製)により、式(1a)で表される繰り返し単位及び式(1b)で表される繰り返し単位を含むことを確認した。樹脂CのMwは45,000、シリコーン含有率は74.8質量%、式(1a)及び(1b)におけるa及びbは、a=0.7、b=0.3であった。
攪拌機、温度計、窒素置換装置及び還流冷却器を具備した3Lフラスコに、ベンゾオキサゾール化合物S−1a325.0g(0.5mol)を加えた後、トルエン2,000gを加え、70℃になるまで加熱した。その後、塩化白金酸トルエン溶液(白金濃度0.5質量%)1.0gを投入し、式(S−2)で表される化合物(d=20、信越化学工業(株)製)396.3g(0.25mol)及び式(S−4)で表される化合物(信越化学工業(株)製)48.5g(0.25mol)を1時間かけて滴下した(ヒドロシリル基の合計/アルケニル基の合計=1/1(モル比))。滴下終了後、100℃になるまで加熱し、6時間熟成した後、反応溶液からトルエンを減圧留去し、樹脂Dを得た。樹脂Dは、1H−NMR及び29Si−NMR(Bruker社製)により、式(1a)で表される繰り返し単位及び式(1b)で表される繰り返し単位を含むことを確認した。樹脂DのMwは40,000、シリコーン含有率は51.5質量%、式(1a)及び(1b)におけるa及びbは、a=0.5、b=0.5であった。
攪拌機、温度計、窒素置換装置及び還流冷却器を具備した3Lフラスコに、ベンゾオキサゾール化合物S−1b282.0g(0.5mol)を加えた後、トルエン2,000gを加え、70℃になるまで加熱した。その後、塩化白金酸トルエン溶液(白金濃度0.5質量%)1.0gを投入し、式(S−2)で表される化合物(d=20、信越化学工業(株)製)396.3g(0.25mol)及び式(S−4)で表される化合物(信越化学工業(株)製)48.5g(0.25mol)を1時間かけて滴下した(ヒドロシリル基の合計/アルケニル基の合計=1/1(モル比))。滴下終了後、100℃になるまで加熱し、6時間熟成した後、反応溶液からトルエンを減圧留去し、樹脂Eを得た。樹脂Eは、1H−NMR及び29Si−NMR(Bruker社製)により、式(1a)で表される繰り返し単位及び式(1b)で表される繰り返し単位を含むことを確認した。樹脂EのMwは39,000、シリコーン含有率は54.5質量%、式(1a)及び(1b)におけるa及びbは、a=0.5、b=0.5であった。
攪拌機、温度計、窒素置換装置及び還流冷却器を具備した3Lフラスコに、ベンゾオキサゾール化合物S−1c327.0g(0.5mol)を加えた後、トルエン2,000gを加え、70℃になるまで加熱した。その後、塩化白金酸トルエン溶液(白金濃度0.5質量%)1.0gを投入し、式(S−2)で表される化合物(d=20、信越化学工業(株)製)396.3g(0.25mol)及び式(S−4)で表される化合物(信越化学工業(株)製)48.5g(0.25mol)を1時間かけて滴下した(ヒドロシリル基の合計/アルケニル基の合計=1/1(モル比))。滴下終了後、100℃になるまで加熱し、6時間熟成した後、反応溶液からトルエンを減圧留去し、樹脂Fを得た。樹脂Fは、1H−NMR及び29Si−NMR(Bruker社製)により、式(1a)で表される繰り返し単位及び式(1b)で表される繰り返し単位を含むことを確認した。樹脂FのMwは41,000、シリコーン含有率は51.3質量%、式(1a)及び(1b)におけるa及びbは、a=0.5、b=0.5であった。
[比較合成例1]樹脂Gの合成
攪拌機、温度計、窒素置換装置及び還流冷却器を具備した3Lフラスコに、式(S−3a)で表される化合物215.0g(0.5mol)を加えた後、トルエン2,000gを加え、70℃になるまで加熱した。その後、塩化白金酸トルエン溶液(白金濃度0.5質量%)1.0gを投入し、式(S−2)で表される化合物(d=40、信越化学工業(株)製)906.0g(0.30mol)及び式(S−4)で表される化合物(信越化学工業(株)製)38.8g(0.20mol)を1時間かけて滴下した(ヒドロシリル基の合計/アルケニル基の合計=1/1(モル比))。滴下終了後、100℃になるまで加熱し、6時間熟成した後、反応溶液からトルエンを減圧留去し、樹脂Gを得た。樹脂GのMwは44,000、シリコーン含有率は78.1質量%であった。
攪拌機、温度計、窒素置換装置及び還流冷却器を具備した3Lフラスコに、式(S−3b)で表される化合物196.0g(0.5mol)を加えた後、トルエン2,000gを加え、70℃になるまで加熱した。その後、塩化白金酸トルエン溶液(白金濃度0.5質量%)1.0gを投入し、式(S−2)で表される化合物(d=20、信越化学工業(株)製)317.0g(0.20mol)及び式(S−4)で表される化合物(信越化学工業(株)製)58.2g(0.30mol)を1時間かけて滴下した(ヒドロシリル基の合計/アルケニル基の合計=1/1(モル比))。滴下終了後、100℃になるまで加熱し、6時間熟成した後、反応溶液からトルエンを減圧留去し、樹脂Hを得た。樹脂HのMwは41,000、シリコーン含有率は55.5質量%であった。
[実施例1〜11、比較例1〜2]
下記表7に記載の組成になるように、合成例で合成した各樹脂、光酸発生剤、架橋剤、溶剤及び塩基性化合物を混合し、その後、常温にて攪拌して溶解した後、テフロン(登録商標)製1.0μmフィルターで精密濾過を行い、感光性樹脂組成物を調製した。
フィルムコーターとしてダイコーター、支持フィルムとしてポリエチレンテレフタレートフィルム(厚さ38μm)を用いて、表7に記載した感光性樹脂組成物をそれぞれ前記支持フィルム上に塗布した。次いで、100℃に設定された熱風循環オーブン(長さ4m)を5分間で通過させることにより乾燥し、支持フィルム上に感光性樹脂皮膜を形成し、感光性ドライフィルムを得た。前記感光性樹脂皮膜の上から、保護フィルムとしてのポリエチレンフィルム(厚さ50μm)をラミネートロールで圧力1MPaにて貼り合わせ、保護フィルム付き感光性ドライフィルムを作製した。各感光性樹脂皮膜の膜厚は表8に記載した。なお、感光性樹脂皮膜の膜厚は光干渉式厚膜測定機により測定した。
(1)パターン形成及びその評価
前記保護フィルム付き感光性ドライフィルムは、保護フィルムを剥離し、真空ラミネーターTEAM-100RF((株)タカトリ製)を用いて、真空チャンバー内の真空度を80Paに設定し、支持フィルム上の感光性樹脂皮膜をマイグレーション試験用基板(導電材料が銅、導電部間隔及び導電部幅が20μm、導電部厚み4μmの櫛形電極基板)に密着させた。温度条件は110℃とした。常圧に戻した後、前記基板を真空ラミネーターから取り出し、支持フィルムを剥離した。次に、基板との密着性を高めるため、ホットプレートにより130℃で5分間予備加熱を行った。得られた感光性樹脂皮膜に対してラインアンドスペースパターン及びコンタクトホールパターンを形成するためにマスクを介し、405nmの露光条件でコンタクトアライナ型露光装置を使用して露光した。光照射後、ホットプレートにより120℃で5分間PEBを行った後冷却し、前記基板をPGMEA(プロピレングリコールモノメチルエーテルアセテート)にてスプレー300秒現像を行い、パターンを形成した。
感光性樹脂組成物からなる感光性樹脂皮膜の絶縁破壊強さを評価するため、表7に記載した各感光性樹脂組成物を13cm×15cm、厚さ0.7mmの鉄板上にバーコーターにて塗布し、180℃のオーブンで2時間加熱して、感光性樹脂皮膜を得た。感光性樹脂組成物は、得られる皮膜の膜厚が0.2μmとなるよう塗布した。この感光性樹脂皮膜を使用して、絶縁破壊試験機TM−5031AM(多摩電測(株)製)により、各皮膜の絶縁破壊強さを測定した。
前述したパターン形成した硬化後の実施例1〜11及び比較例1〜2の感光性樹脂フィルム付ウェハをダイシングブレードを備えるダイシングソー(DAD685、DISCO社製、スピンドル回転数は40,000rpm、切断速度は20mm/sec)を使用して10mm×10mm角の試験片を得た。得られた試験片(各10片づつ)をヒートサイクル試験(−25℃で10分間保持、125℃で10分間保持を1,000サイクル繰り返す)に供し、ヒートサイクル試験後の樹脂フィルムのウェハからの剥離状態、クラックの有無を確認した。全く剥離・クラックを生じなかったものを良好、1つでも剥離を生じたものを剥離、一つでもクラックが生じたものをクラックとした。
前述した信頼性評価で作製した試験片の試験前質量を測定し、その後、試験片を200℃に加熱したオーブンに1,000時間放置した後、試験片をオーブンから取り出し、試験後質量を測定した。試験前後の質量変化率が0.5%未満だった場合を良好、試験前後の重量変化率が0.5%以上だった場合を不良として判定した。
感光性樹脂皮膜の耐薬品性、特に半導体素子等を形成する場合に多用されるNMPに対する耐溶剤性を調査するため、各組成物につき、(3)信頼性の評価と同様の方法で、10mm×10mmのパターンをウェハ上に形成した。このウェハをNMP中に室温で1時間浸漬したのち、膜厚変化、外観を調査し、耐薬品性を評価した。外観や膜厚に変化がなかったものを○とし、膜厚増加や膨潤がみられたものは×として判定した。
Claims (12)
- (A)下記式(1a)で表される繰り返し単位及び下記式(1b)で表される繰り返し単位を含むシリコーン変性ポリベンゾオキサゾール樹脂、及び(B)190〜500nmの光によって分解し、酸を発生する光酸発生剤を含む感光性樹脂組成物。
- 更に、(C)架橋剤を含む請求項1又は2記載の感光性樹脂組成物。
- (C)架橋剤が、ホルムアルデヒド又はホルムアルデヒド−アルコールにより変性されたアミノ縮合物、1分子中に平均して2個以上のメチロール基又はアルコキシメチロール基を有するフェノール化合物、及び1分子中に平均して2個以上のエポキシ基を有するエポキシ化合物から選ばれる1種以上である請求項3記載の感光性樹脂組成物。
- 更に、(E)塩基性化合物を含む請求項1〜4のいずれか1項記載の感光性樹脂組成物。
- 前記感光性樹脂組成物が、2つの基板を接合するための基板接合用材料である請求項3〜5のいずれか1項記載の感光性樹脂組成物。
- (A)下記式(1a)で表される繰り返し単位及び下記式(1b)で表される繰り返し単位を含むシリコーン変性ポリベンゾオキサゾール樹脂、及び(B)190〜500nmの光によって分解し、酸を発生する光酸発生剤を含む感光性樹脂皮膜。
- 支持フィルムと、該支持フィルム上に請求項7記載の感光性樹脂皮膜とを備える感光性ドライフィルム。
- 基板と、請求項7記載の感光性樹脂皮膜とを備える積層体。
- (i)請求項1〜5のいずれか1項記載の感光性樹脂組成物を基板上に塗布し、該基板上に感光性樹脂皮膜を形成する工程、
(ii)前記感光性樹脂皮膜を、フォトマスクを介して露光し、露光後加熱処理を行う工程、及び
(iii)前記露光後加熱処理を行った感光性樹脂皮膜を現像液にて現像して非露光部を溶解除去し、パターンを形成する工程
を含むパターン形成方法。 - (i)請求項8記載の感光性ドライフィルムの感光性樹脂皮膜を基板に貼り付ける工程、
(ii)前記感光性樹脂皮膜を、フォトマスクを介して露光し、露光後加熱処理を行う工程、及び
(iii)前記露光後加熱処理を行った感光性樹脂皮膜を現像液にて現像して非露光部を溶解除去し、パターンを形成する工程
を含むパターン形成方法。 - 更に、(iv)現像によりパターン形成された皮膜を、100〜250℃の温度で後硬化する工程を含む請求項10又は11記載のパターン形成方法。
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Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11262655B2 (en) | 2018-05-17 | 2022-03-01 | Shin-Etsu Chemical Co., Ltd. | Photosensitive resin composition, photosensitive dry film, and pattern forming process |
WO2022059621A1 (ja) * | 2020-09-16 | 2022-03-24 | 富士フイルム株式会社 | 樹脂組成物、硬化物、積層体、硬化物の製造方法、及び、半導体デバイス |
US11402756B2 (en) | 2017-08-09 | 2022-08-02 | Shin-Etsu Chemical Co., Ltd. | Silicone structure-containing polymer, photosensitive resin composition, photosensitive resin coating, photosensitive dry film, laminate, and pattern forming process |
US11460774B2 (en) | 2018-12-19 | 2022-10-04 | Shin-Etsu Chemical Co., Ltd. | Photosensitive resin composition, photosensitive dry film, and pattern forming process |
US11526078B2 (en) | 2017-08-09 | 2022-12-13 | Shin-Etsu Chemical Co., Ltd. | Photosensitive resin composition, photosensitive resin coating, photosensitive dry film, laminate, and pattern forming process |
US11548985B2 (en) | 2018-11-28 | 2023-01-10 | Shin-Etsu Chemical Co., Ltd. | Siloxane polymer containing isocyanuric acid and polyether skeletons, photosensitive resin composition, pattern forming process, and fabrication of opto-semiconductor device |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6856037B2 (ja) * | 2017-02-03 | 2021-04-07 | 信越化学工業株式会社 | シリコーン変性ポリベンゾオキサゾール樹脂及びその製造方法 |
JP6919626B2 (ja) | 2018-05-17 | 2021-08-18 | 信越化学工業株式会社 | シルフェニレン骨格及びポリエーテル骨格を含むポリマー |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009134282A (ja) * | 2007-10-29 | 2009-06-18 | Hitachi Chemical Dupont Microsystems Ltd | ポジ型感光性樹脂組成物、パタ−ンの製造方法及び電子部品 |
JP2010097220A (ja) * | 2008-10-20 | 2010-04-30 | Cheil Industries Inc | ポジティブ型感光性樹脂組成物 |
KR20100080343A (ko) * | 2008-12-30 | 2010-07-08 | 제일모직주식회사 | 포지티브형 감광성 수지 조성물 |
JP2011138133A (ja) * | 2009-12-29 | 2011-07-14 | Cheil Industries Inc | ポジティブ型感光性樹脂組成物 |
JP2013205801A (ja) * | 2012-03-29 | 2013-10-07 | Sumitomo Bakelite Co Ltd | 感光性樹脂組成物及びその硬化膜、保護膜、絶縁膜並びに半導体装置及び表示体装置 |
JP2014015507A (ja) * | 2012-07-06 | 2014-01-30 | Jsr Corp | 樹脂組成物、パターン化樹脂膜の製造方法、重合体および半導体装置 |
US20150177617A1 (en) * | 2013-12-19 | 2015-06-25 | Samsung Sdi Co., Ltd. | Positive Photosensitive Resin Composition, Photosensitive Resin Film Prepared by Using the Same, and Display Device |
JP2016023226A (ja) * | 2014-07-18 | 2016-02-08 | 旭化成イーマテリアルズ株式会社 | パワー半導体素子用保護膜、及びその形成方法 |
JP2018123316A (ja) * | 2017-02-03 | 2018-08-09 | 信越化学工業株式会社 | シリコーン変性ポリベンゾオキサゾール樹脂及びその製造方法 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3220972A (en) | 1962-07-02 | 1965-11-30 | Gen Electric | Organosilicon process using a chloroplatinic acid reaction product as the catalyst |
US3159601A (en) | 1962-07-02 | 1964-12-01 | Gen Electric | Platinum-olefin complex catalyzed addition of hydrogen- and alkenyl-substituted siloxanes |
US3159662A (en) | 1962-07-02 | 1964-12-01 | Gen Electric | Addition reaction |
US3775452A (en) | 1971-04-28 | 1973-11-27 | Gen Electric | Platinum complexes of unsaturated siloxanes and platinum containing organopolysiloxanes |
JP3767676B2 (ja) | 2000-09-12 | 2006-04-19 | 信越化学工業株式会社 | オルガノシロキサン系高分子化合物及び光硬化性樹脂組成物並びにパターン形成方法及び基板保護用皮膜 |
WO2007004345A1 (ja) * | 2005-06-30 | 2007-01-11 | Toray Industries, Inc. | 感光性樹脂組成物および接着改良剤 |
JP4336999B2 (ja) | 2007-01-31 | 2009-09-30 | 信越化学工業株式会社 | シルフェニレン骨格含有高分子化合物及び光硬化性樹脂組成物並びにパターン形成方法及び基板回路保護用皮膜 |
JP5469062B2 (ja) * | 2008-05-20 | 2014-04-09 | 株式会社カネカ | 新規なポリイミド前駆体組成物、その利用及びそれらの製造方法 |
JP5207907B2 (ja) * | 2008-10-03 | 2013-06-12 | 旭化成イーマテリアルズ株式会社 | 感光性樹脂組成物、パターン形成方法、並びに半導体装置及びその製造方法 |
JP5608437B2 (ja) * | 2009-08-28 | 2014-10-15 | 富士フイルム株式会社 | 感活性光線性又は感放射線性樹脂組成物並びに該組成物を用いたレジスト膜及びパターン形成方法 |
JP5482553B2 (ja) * | 2010-08-04 | 2014-05-07 | Jnc株式会社 | 感光性組成物、この組成物から得られる硬化膜、及びこの硬化膜を有する表示素子 |
WO2015087832A1 (ja) * | 2013-12-11 | 2015-06-18 | 富士フイルム株式会社 | 感光性樹脂組成物、硬化膜の製造方法、硬化膜、液晶表示装置および有機el表示装置 |
JP2015200819A (ja) | 2014-04-09 | 2015-11-12 | 日立化成デュポンマイクロシステムズ株式会社 | ポジ型感光性樹脂組成物及びそれを用いたパターン硬化膜とその製造方法 |
JP6468137B2 (ja) * | 2014-10-01 | 2019-02-13 | 信越化学工業株式会社 | 化学増幅型ネガ型レジスト材料、光硬化性ドライフィルム及びその製造方法、パターン形成方法並びに電気・電子部品保護用皮膜 |
JP6502754B2 (ja) * | 2015-06-08 | 2019-04-17 | 信越化学工業株式会社 | 光硬化性樹脂組成物及びこれを用いた光硬化性ドライフィルム |
JP2017018353A (ja) | 2015-07-10 | 2017-01-26 | 株式会社ユニバーサルエンターテインメント | 遊技機 |
-
2018
- 2018-01-29 JP JP2018012220A patent/JP6798513B2/ja active Active
- 2018-01-30 US US15/883,265 patent/US10503067B2/en active Active
- 2018-01-31 KR KR1020180011936A patent/KR102453575B1/ko active IP Right Grant
- 2018-02-01 TW TW107103570A patent/TWI738966B/zh active
- 2018-02-01 EP EP18154606.0A patent/EP3358412B1/en active Active
- 2018-02-02 CN CN201810104013.1A patent/CN108388082B/zh active Active
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009134282A (ja) * | 2007-10-29 | 2009-06-18 | Hitachi Chemical Dupont Microsystems Ltd | ポジ型感光性樹脂組成物、パタ−ンの製造方法及び電子部品 |
JP2010097220A (ja) * | 2008-10-20 | 2010-04-30 | Cheil Industries Inc | ポジティブ型感光性樹脂組成物 |
KR20100080343A (ko) * | 2008-12-30 | 2010-07-08 | 제일모직주식회사 | 포지티브형 감광성 수지 조성물 |
JP2011138133A (ja) * | 2009-12-29 | 2011-07-14 | Cheil Industries Inc | ポジティブ型感光性樹脂組成物 |
JP2013205801A (ja) * | 2012-03-29 | 2013-10-07 | Sumitomo Bakelite Co Ltd | 感光性樹脂組成物及びその硬化膜、保護膜、絶縁膜並びに半導体装置及び表示体装置 |
JP2014015507A (ja) * | 2012-07-06 | 2014-01-30 | Jsr Corp | 樹脂組成物、パターン化樹脂膜の製造方法、重合体および半導体装置 |
US20150177617A1 (en) * | 2013-12-19 | 2015-06-25 | Samsung Sdi Co., Ltd. | Positive Photosensitive Resin Composition, Photosensitive Resin Film Prepared by Using the Same, and Display Device |
JP2016023226A (ja) * | 2014-07-18 | 2016-02-08 | 旭化成イーマテリアルズ株式会社 | パワー半導体素子用保護膜、及びその形成方法 |
JP2018123316A (ja) * | 2017-02-03 | 2018-08-09 | 信越化学工業株式会社 | シリコーン変性ポリベンゾオキサゾール樹脂及びその製造方法 |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11402756B2 (en) | 2017-08-09 | 2022-08-02 | Shin-Etsu Chemical Co., Ltd. | Silicone structure-containing polymer, photosensitive resin composition, photosensitive resin coating, photosensitive dry film, laminate, and pattern forming process |
US11526078B2 (en) | 2017-08-09 | 2022-12-13 | Shin-Etsu Chemical Co., Ltd. | Photosensitive resin composition, photosensitive resin coating, photosensitive dry film, laminate, and pattern forming process |
US11262655B2 (en) | 2018-05-17 | 2022-03-01 | Shin-Etsu Chemical Co., Ltd. | Photosensitive resin composition, photosensitive dry film, and pattern forming process |
US11548985B2 (en) | 2018-11-28 | 2023-01-10 | Shin-Etsu Chemical Co., Ltd. | Siloxane polymer containing isocyanuric acid and polyether skeletons, photosensitive resin composition, pattern forming process, and fabrication of opto-semiconductor device |
US11460774B2 (en) | 2018-12-19 | 2022-10-04 | Shin-Etsu Chemical Co., Ltd. | Photosensitive resin composition, photosensitive dry film, and pattern forming process |
WO2022059621A1 (ja) * | 2020-09-16 | 2022-03-24 | 富士フイルム株式会社 | 樹脂組成物、硬化物、積層体、硬化物の製造方法、及び、半導体デバイス |
JPWO2022059621A1 (ja) * | 2020-09-16 | 2022-03-24 |
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