JP2018073657A - 加熱素子 - Google Patents
加熱素子 Download PDFInfo
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- JP2018073657A JP2018073657A JP2016213030A JP2016213030A JP2018073657A JP 2018073657 A JP2018073657 A JP 2018073657A JP 2016213030 A JP2016213030 A JP 2016213030A JP 2016213030 A JP2016213030 A JP 2016213030A JP 2018073657 A JP2018073657 A JP 2018073657A
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/10—Heater elements characterised by the composition or nature of the materials or by the arrangement of the conductor
- H05B3/12—Heater elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material
- H05B3/14—Heater elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material the material being non-metallic
- H05B3/141—Conductive ceramics, e.g. metal oxides, metal carbides, barium titanate, ferrites, zirconia, vitrous compounds
- H05B3/143—Conductive ceramics, e.g. metal oxides, metal carbides, barium titanate, ferrites, zirconia, vitrous compounds applied to semiconductors, e.g. wafers heating
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- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/68—Heating arrangements specially adapted for cooking plates or analogous hot-plates
- H05B3/74—Non-metallic plates, e.g. vitroceramic, ceramic or glassceramic hobs, also including power or control circuits
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/20—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67103—Apparatus for thermal treatment mainly by conduction
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68757—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a coating or a hardness or a material
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68785—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the mechanical construction of the susceptor, stage or support
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68792—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the construction of the shaft
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/02—Details
- H05B3/03—Electrodes
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/02—Details
- H05B3/06—Heater elements structurally combined with coupling elements or holders
- H05B3/08—Heater elements structurally combined with coupling elements or holders having electric connections specially adapted for high temperatures
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/10—Heater elements characterised by the composition or nature of the materials or by the arrangement of the conductor
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/20—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater
- H05B3/22—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible
- H05B3/26—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible heating conductor mounted on insulating base
- H05B3/265—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible heating conductor mounted on insulating base the insulating base being an inorganic material, e.g. ceramic
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/40—Heating elements having the shape of rods or tubes
- H05B3/42—Heating elements having the shape of rods or tubes non-flexible
- H05B3/44—Heating elements having the shape of rods or tubes non-flexible heating conductor arranged within rods or tubes of insulating material
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/68—Heating arrangements specially adapted for cooking plates or analogous hot-plates
- H05B3/74—Non-metallic plates, e.g. vitroceramic, ceramic or glassceramic hobs, also including power or control circuits
- H05B3/748—Resistive heating elements, i.e. heating elements exposed to the air, e.g. coil wire heater
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/60—Attaching or detaching leads or other conductive members, to be used for carrying current to or from the device in operation
- H01L2021/60007—Attaching or detaching leads or other conductive members, to be used for carrying current to or from the device in operation involving a soldering or an alloying process
- H01L2021/60022—Attaching or detaching leads or other conductive members, to be used for carrying current to or from the device in operation involving a soldering or an alloying process using bump connectors, e.g. for flip chip mounting
- H01L2021/60097—Applying energy, e.g. for the soldering or alloying process
- H01L2021/6015—Applying energy, e.g. for the soldering or alloying process using conduction, e.g. chuck heater, thermocompression
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
- H05B2203/002—Heaters using a particular layout for the resistive material or resistive elements
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
- H05B2203/013—Heaters using resistive films or coatings
Abstract
Description
以下、図2を参照しながら本発明の加熱素子における棒状部についてさらに詳しく説明する。
まず、直径130mm、厚さ10mmのグラファイト製の支持基板(板状体)を準備して、予めヒーター端子となる位置にボルトが挿入される貫通穴を設けた。この支持基板に熱分解窒化硼素の絶縁層を約100μmコートした。
◎:ΔTが15℃以下のもの
〇:ΔTが15℃を超え25℃以下のもの
△:ΔTが25℃を超え50℃以下のもの
×:ΔTが50℃を超えたもの
◎:ΔTが15℃以下のもの
〇:ΔTが15℃を超え50℃以下のもの、又はΔTが15℃以下であったがクラックが少し発生したもの
×:ΔTが50℃を超えたもの
棒状部として、空洞部を設けなかったもの(空洞部の断面積の割合が0%)を用いた以外は実施例1〜9と同様にして加熱素子を作製し、評価を行った。
実施例1〜9と同様に熱分解窒化硼素の絶縁層を約100μmコートしたグラファイト製の支持基板と、グラファイト製の棒状部を準備した。なお、棒状部に設けた空洞部の断面積の割合は、棒状部の通電方向に対し垂直な方向での断面積に対して81%とした。
実施例1〜9と同様に熱分解窒化硼素の絶縁層を約100μmコートしたグラファイト製の支持基板と、グラファイト製の棒状部を準備した。棒状部に設けた空洞部の断面積の割合は、実施例6と同様に棒状部の通電方向に対し垂直な方向での断面積に対して81%とした。
5…棒状部、 6…締結ボルト、 7…絶縁層、 8,8’…導電層、
9…保護層、 10…接続部、 11…接続手段、 12…給電端子、
13…固定手段、 14…空洞部、 15…絶縁層。
Claims (8)
- 支持基板にヒーターパターンが形成された発熱体と、該発熱体の片面に接続され、前記発熱体に通電するための棒状部とを有する加熱素子であって、
前記棒状部の前記発熱体との接続部には、前記棒状部の前記発熱体と接続される面に接続手段が設けられており、
前記棒状部の前記接続手段が設けられた面と反対側の面に前記加熱素子に給電するための給電端子が形成されており、該給電端子には、前記加熱素子を固定するための固定手段を有し、
前記棒状部は、前記接続手段と前記固定手段との間に空洞部を有するものであることを特徴とする加熱素子。 - 前記接続手段は接続用穴であり、前記固定手段は固定用穴であることを特徴とする請求項1に記載の加熱素子。
- 前記空洞部は、前記接続用穴の断面積及び前記固定用穴の断面積よりも大きい断面積を有するものであることを特徴とする請求項2に記載の加熱素子。
- 前記接続用穴又は前記固定用穴あるいはこれらの両方は、前記棒状部の前記空洞部まで貫通し、前記空洞部と連通しているものであることを特徴とする請求項2又は請求項3に記載の加熱素子。
- 前記支持基板及び前記棒状部の外側には、熱分解グラファイト、又はホウ素を含む熱分解グラファイトからなる層が形成されており、さらに前記給電端子から連通して前記棒状部の前記空洞部内まで熱分解グラファイト、又はホウ素を含む熱分解グラファイトからなる層が形成されたものであることを特徴とする請求項4に記載の加熱素子。
- 前記棒状部の断面積全体に対する前記空洞部の断面積の割合は、25%以上95%以下であることを特徴とする請求項1から請求項5のいずれか一項に記載の加熱素子。
- 前記加熱素子は、前記給電端子から、前記棒状部の側面及び前記発熱体の側面を経由して、前記ヒーターパターンまで接続される導電路が形成されたものであることを特徴とする請求項1から請求項6のいずれか一項に記載の加熱素子。
- 前記支持基板及び前記棒状部は、ステンレス、インコネル、モリブデン、タングステン、タンタル、アルミナ、窒化アルミニウム、窒化ホウ素、窒化アルミニウムと窒化ホウ素との複合体、熱分解窒化ホウ素、熱分解窒化ホウ素を被覆したグラファイト、グラファイトから選択される材料及びこれらの組み合わせで構成されるものであることを特徴とする請求項1から請求項7のいずれか一項に記載の加熱素子。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016213030A JP6837806B2 (ja) | 2016-10-31 | 2016-10-31 | 加熱素子 |
KR1020170137289A KR20180048324A (ko) | 2016-10-31 | 2017-10-23 | 가열 소자 |
TW106136993A TW201830487A (zh) | 2016-10-31 | 2017-10-27 | 加熱元件 |
CN201711047285.4A CN108012351A (zh) | 2016-10-31 | 2017-10-31 | 加热元件 |
US15/799,218 US20180124873A1 (en) | 2016-10-31 | 2017-10-31 | Heating element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016213030A JP6837806B2 (ja) | 2016-10-31 | 2016-10-31 | 加熱素子 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2018073657A true JP2018073657A (ja) | 2018-05-10 |
JP6837806B2 JP6837806B2 (ja) | 2021-03-03 |
Family
ID=62019977
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016213030A Active JP6837806B2 (ja) | 2016-10-31 | 2016-10-31 | 加熱素子 |
Country Status (5)
Country | Link |
---|---|
US (1) | US20180124873A1 (ja) |
JP (1) | JP6837806B2 (ja) |
KR (1) | KR20180048324A (ja) |
CN (1) | CN108012351A (ja) |
TW (1) | TW201830487A (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110726320A (zh) * | 2019-10-08 | 2020-01-24 | 沈阳工程学院 | 一种固体电蓄热炉用电热保护套管 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108863443B (zh) * | 2018-07-10 | 2021-05-14 | 山东国晶新材料有限公司 | 一种平面复合加热器的制备方法 |
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JP2005085657A (ja) * | 2003-09-10 | 2005-03-31 | Ibiden Co Ltd | セラミックヒータ |
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JP5245268B2 (ja) * | 2006-06-16 | 2013-07-24 | 東京エレクトロン株式会社 | 載置台構造及び熱処理装置 |
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2016
- 2016-10-31 JP JP2016213030A patent/JP6837806B2/ja active Active
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2017
- 2017-10-23 KR KR1020170137289A patent/KR20180048324A/ko unknown
- 2017-10-27 TW TW106136993A patent/TW201830487A/zh unknown
- 2017-10-31 CN CN201711047285.4A patent/CN108012351A/zh active Pending
- 2017-10-31 US US15/799,218 patent/US20180124873A1/en not_active Abandoned
Patent Citations (14)
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JPH11343571A (ja) * | 1998-05-29 | 1999-12-14 | Ngk Insulators Ltd | サセプター |
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JP6837806B2 (ja) | 2021-03-03 |
US20180124873A1 (en) | 2018-05-03 |
KR20180048324A (ko) | 2018-05-10 |
CN108012351A (zh) | 2018-05-08 |
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