JP2018056369A - 半導体装置の製造方法 - Google Patents
半導体装置の製造方法 Download PDFInfo
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- JP2018056369A JP2018056369A JP2016191663A JP2016191663A JP2018056369A JP 2018056369 A JP2018056369 A JP 2018056369A JP 2016191663 A JP2016191663 A JP 2016191663A JP 2016191663 A JP2016191663 A JP 2016191663A JP 2018056369 A JP2018056369 A JP 2018056369A
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- frame
- semiconductor device
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- lead
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Abstract
【解決手段】半導体チップを搭載したリードフレームを準備する工程S1と、放熱板を有する放熱フレームを準備する工程S2と、リードフレームと放熱フレームとを積層した状態で、半導体チップおよび放熱板を樹脂封止する工程S3と、を有する。そして、放熱フレームの枠体を、封止体を有するリードフレームから分離する工程S5の後に、封止体を有するリードフレームに対して、樹脂の未充填領域有無の検査S6を実施する。検査前に、検査領域を遮る放熱フレームの枠体を除去するため、透過光を用いた検査が可能となる。
【選択図】図3
Description
本実施の形態では、QFP(Quad Flat Package)型半導体装置を例に説明する。
まず、本実施の形態の半導体装置SDの構成について、図1および図2を用いて説明する。図1は本実施の形態の半導体装置の平面図である。
次に、本実施の形態の半導体装置SDの製造方法を、図3を用いて説明する。図3は、半導体装置SDのプロセスフロー図である。図4は、図3に示すリードフレーム準備工程のリードフレームの平面図である。図5は、図4のB−B線に沿う断面図である。図6は、図4のC−C線における断面図である。図7は、図3に示す放熱フレーム準備工程の放熱フレームの平面図である。図8は、図7のD−D線に沿う断面図である。図9は、図7のE−E線における断面図である。図10は、図3に示す樹脂封止工程の断面図(図4のB−B線に対応)である。図11は、図3に示す樹脂封止工程の断面図(図4のC−C線に対応)である。図12は、図3に示す樹脂封止工程の平面図である。図13は、図3に示す樹脂封止工程完了後の平面図である。図14は、図13のH−H線における断面図である。図15は、図3に示すゲート部樹脂切断工程における断面図(図4のC−C線に対応)である。図16は、図3に示す放熱フレーム分離工程における断面図(図4のC−C線に対応)である。図17は、図3に示す放熱フレーム分離工程における断面図(図4のB−B線に対応)である。図18は、図3に示す検査工程における断面図である。図19は、図3に示す検査工程における検査領域の一部拡大平面図である。図20は、図3に示すダム部切断工程における平面図である。図21は、図3に示すリード成形工程における平面図である。
半導体チップ2を搭載したリードフレーム10と、放熱板22を有する放熱フレーム20と、を積層した状態で、半導体チップ2を樹脂封止して封止体1を形成する。そして、放熱フレーム20の枠体21を、封止体1を有するリードフレーム10から分離した後に、封止体1を有するリードフレーム10に対して、樹脂の未充填領域有無の検査を実施する。
IL インナーリード部
OL アウターリード部
MB 実装面
P1 突出部
P2 屈曲部
P3 接続部
SD 半導体装置
1 封止体
1a 主面
1b 裏面
1c 側面
2 半導体チップ
2a 主面
2b 裏面
3 パッド電極(端子、外部電極、外部引出電極)
4 ワイヤ(ボンディングワイヤ)
5 接着層
10 リードフレーム
11 枠体
11a 横枠
11b 縦枠
11c 凸部
12 リード
12m 半田メッキ膜
13 ダム部
13a 横ダム
13b 縦ダム
14 吊りリード
15 チップ搭載部(タブ)
16 段差部
17 スリット
20 放熱フレーム
21 枠体
21a 横枠
21b 縦枠
21x、21y 辺
22 放熱板
23 吊りリード
24 段差部
25 スリット
30 金型
31 上型
31b 底面
31f 合せ面
31s 側壁
32 下型
32b 底面
32f 合せ面
32s 側壁
33 ゲート部
33r ゲート部樹脂
34 キャビティ
35 樹脂(封止樹脂)
40 薄膜樹脂
41 照明装置
42 カメラ
Claims (13)
- 以下の工程を含む半導体装置の製造方法、
(a)第1主面と、前記第1主面と反対側の第1裏面と、を有する第1リードフレームを準備する工程であって、前記第1リードフレームは、その前記第1主面上に半導体チップが搭載されたチップ搭載部と、前記チップ搭載部の周囲に配置され、一端と他端とを有する複数のリードと、前記複数のリードの前記他端が接続される第1枠体と、前記複数のリードの前記一端と前記第1枠体との間に位置し、前記複数のリードを互いに連結するダム部と、前記チップ搭載部を前記第1枠体に連結する第1吊りリードと、を有する、
(b)第2主面と、前記第2主面と反対側の第2裏面と、を有する第2リードフレームを準備する工程であって、前記第2リードフレームは、その前記第2主面上に前記チップ搭載部が搭載される放熱板と、前記放熱板の周囲を囲む第2枠体と、前記放熱板を前記第2枠体に連結する第2吊りリードと、を有する、
(c)前記第2主面と前記第1裏面とが向き合うように、前記第1リードフレームと前記第2リードフレームとを重ねた状態で、前記第1リードフレームと前記第2リードフレームとを、キャビティ部を有する金型に配置し、前記半導体チップと、前記チップ搭載部と、前記放熱板と、を樹脂で封止し、封止体を形成する工程であって、前記キャビティ部を構成する前記金型の側壁は、前記ダム部よりも前記チップ搭載部側に位置しており、
(d)前記封止体を前記金型から取り出し、前記第2枠体を前記封止体から切り離す工程、
(e)前記(d)工程後に、前記封止体、前記ダム部および前記複数のリードに囲まれた領域に、前記樹脂が充填されているかどうかを検査する工程、
を有する。 - 請求項1に記載の半導体装置の製造方法において、
前記(e)工程は、前記封止体の全周に渡って実施する、半導体装置の製造方法。 - 請求項1に記載の半導体装置の製造方法において、
前記封止体は、前記第1主面側に位置する上面と、前記上面の反対側であり、かつ、前記第2裏面側に位置する下面を有し、
前記(e)工程において、前記封止体の前記下面に面するように照明を、前記封止体の前記上面に面するようにカメラを配置する、半導体装置の製造方法。 - 請求項1に記載の半導体装置の製造方法において、
前記封止体は、照明とカメラの間に配置されている、半導体装置の製造方法。 - 請求項1に記載の半導体装置の製造方法において、
前記(c)工程において、前記第2枠体の前記放熱板側の第1辺は、前記ダム部と前記金型の側壁との間に位置しており、
前記(e)工程において、前記封止体は、照明とカメラの間に配置されている、半導体装置の製造方法。 - 請求項5に記載の半導体装置の製造方法において、
前記(c)工程において、前記ダム部は、前記第2枠体に重なっている、半導体装置の製造方法。 - 請求項6に記載の半導体装置の製造方法において、
前記ダム部は、平面視における第1方向にて、互いに対向する第1ダム部および第2ダム部を有し、
前記第2枠体は、前記第1方向にて、互いに対向する前記第1辺および第2辺を有し、
前記第1方向にて、前記第1辺と前記第2辺との第1間隔は、前記第1ダム部と前記第2ダム部との第2間隔よりも小さい、半導体装置の製造方法。 - 請求項5に記載の半導体装置の製造方法において、
前記第2枠体の前記放熱板側の第1辺は、前記金型の側壁が前記リードの前記第1主面と接触する位置と一致している、半導体装置の製造方法。 - 請求項1に記載の半導体装置の製造方法において、
前記(c)工程において、前記金型は、前記キャビティ部に前記樹脂を注入するためのゲート部を有し、
前記(d)工程では、前記封止体を前記金型から取り出した後、前記ゲート部の前記樹脂を、前記封止体から分離し、その後に、前記第2枠体を前記封止体から切り離す、半導体装置の製造方法。 - 請求項1に記載の半導体装置の製造方法において、
前記(e)工程の後に、さらに、
(f)前記ダム部を切断し、前記複数のリード間を分離する工程、
を有する、半導体装置の製造方法。 - 請求項10に記載の半導体装置の製造方法において、
前記(f)工程の後に、さらに、
(g)前記複数のリードの前記他端を前記第1枠体から切断した後、前記複数のリードを成形する工程、
を有する、半導体装置の製造方法。 - 請求項1に記載の半導体装置の製造方法において、
平面視にて、前記放熱板の面積は、前記チップ搭載部の面積よりも広い、半導体装置の製造方法。 - 請求項1に記載の半導体装置の製造方法において、
前記(d)工程において、前記封止体の外側で、前記第2吊りリードを切断することにより、前記第2枠体を前記封止体から切り離す、半導体装置の製造方法。
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