JP2018037468A5 - - Google Patents

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Publication number
JP2018037468A5
JP2018037468A5 JP2016167346A JP2016167346A JP2018037468A5 JP 2018037468 A5 JP2018037468 A5 JP 2018037468A5 JP 2016167346 A JP2016167346 A JP 2016167346A JP 2016167346 A JP2016167346 A JP 2016167346A JP 2018037468 A5 JP2018037468 A5 JP 2018037468A5
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JP
Japan
Prior art keywords
photoelectric conversion
conversion device
impurity region
atoms
satisfied
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JP2016167346A
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English (en)
Japanese (ja)
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JP2018037468A (ja
JP6862129B2 (ja
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Priority to JP2016167346A priority Critical patent/JP6862129B2/ja
Priority claimed from JP2016167346A external-priority patent/JP6862129B2/ja
Priority to US15/683,660 priority patent/US10319757B2/en
Publication of JP2018037468A publication Critical patent/JP2018037468A/ja
Publication of JP2018037468A5 publication Critical patent/JP2018037468A5/ja
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JP2016167346A 2016-08-29 2016-08-29 光電変換装置および撮像システム Expired - Fee Related JP6862129B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2016167346A JP6862129B2 (ja) 2016-08-29 2016-08-29 光電変換装置および撮像システム
US15/683,660 US10319757B2 (en) 2016-08-29 2017-08-22 Photoelectric conversion device and imaging system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2016167346A JP6862129B2 (ja) 2016-08-29 2016-08-29 光電変換装置および撮像システム

Publications (3)

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JP2018037468A JP2018037468A (ja) 2018-03-08
JP2018037468A5 true JP2018037468A5 (https=) 2019-09-19
JP6862129B2 JP6862129B2 (ja) 2021-04-21

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JP2016167346A Expired - Fee Related JP6862129B2 (ja) 2016-08-29 2016-08-29 光電変換装置および撮像システム

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US (1) US10319757B2 (https=)
JP (1) JP6862129B2 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11114491B2 (en) 2018-12-12 2021-09-07 Kla Corporation Back-illuminated sensor and a method of manufacturing a sensor
CN109979955B (zh) * 2019-04-03 2021-06-18 上海华力微电子有限公司 一种半导体结构及其制造方法
US11848350B2 (en) 2020-04-08 2023-12-19 Kla Corporation Back-illuminated sensor and a method of manufacturing a sensor using a silicon on insulator wafer

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3423102B2 (ja) 1995-03-24 2003-07-07 三洋電機株式会社 光起電力素子
JPH11145147A (ja) * 1997-11-11 1999-05-28 Nec Corp 半導体装置および半導体装置の製造方法
JP4710603B2 (ja) * 2000-04-14 2011-06-29 信越半導体株式会社 アニールウエーハとその製造方法
JP3931606B2 (ja) * 2001-09-20 2007-06-20 ソニー株式会社 撮像装置およびノイズ除去方法
JP3723124B2 (ja) * 2001-12-14 2005-12-07 株式会社東芝 固体撮像装置
JP4174468B2 (ja) * 2003-12-12 2008-10-29 キヤノン株式会社 光電変換装置及び撮像システム
US7323731B2 (en) * 2003-12-12 2008-01-29 Canon Kabushiki Kaisha Photoelectric conversion device, method of manufacturing photoelectric conversion device, and image pickup system
JP4667030B2 (ja) * 2004-12-10 2011-04-06 キヤノン株式会社 固体撮像装置用の半導体基板とその製造方法
JP2006189823A (ja) * 2004-12-10 2006-07-20 Canon Inc 電子写真感光体
WO2006062256A1 (ja) * 2004-12-10 2006-06-15 Canon Kabushiki Kaisha 電子写真感光体
JP2007251074A (ja) * 2006-03-20 2007-09-27 Ricoh Co Ltd 固体撮像素子及び装置
KR101315282B1 (ko) * 2006-04-27 2013-10-08 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치 및 이를 사용한 전자기기
JP5567259B2 (ja) * 2008-07-28 2014-08-06 グローバルウェーハズ・ジャパン株式会社 シリコンウェーハおよびその製造方法
JP2013106231A (ja) * 2011-11-15 2013-05-30 Canon Inc 撮像装置
KR102034482B1 (ko) * 2013-03-04 2019-10-21 삼성전자주식회사 이미지 센서 및 이의 형성 방법
JP6355311B2 (ja) * 2013-10-07 2018-07-11 キヤノン株式会社 固体撮像装置、その製造方法及び撮像システム
JP6302216B2 (ja) * 2013-11-08 2018-03-28 ルネサスエレクトロニクス株式会社 半導体装置およびその製造方法
JP6347621B2 (ja) * 2014-02-13 2018-06-27 キヤノン株式会社 固体撮像素子及び撮像装置
JP2015176896A (ja) * 2014-03-13 2015-10-05 株式会社東芝 固体撮像装置用基板、固体撮像装置、固体撮像装置用基板の製造方法、および固体撮像装置の製造方法
JP6427946B2 (ja) * 2014-05-13 2018-11-28 株式会社Sumco エピタキシャルシリコンウェーハの製造方法、エピタキシャルシリコンウェーハ、および固体撮像素子の製造方法
KR20150134543A (ko) * 2014-05-22 2015-12-02 삼성전자주식회사 소자 제조용 기판 및 반도체 소자
KR102359180B1 (ko) * 2014-06-09 2022-02-08 가부시키가이샤 한도오따이 에네루기 켄큐쇼 촬상 장치
JP2016076647A (ja) 2014-10-08 2016-05-12 キヤノン株式会社 光電変換装置
JP2016092035A (ja) 2014-10-29 2016-05-23 株式会社東芝 固体撮像装置及び固体撮像装置の製造方法

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