JP2018037468A5 - - Google Patents
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- JP2018037468A5 JP2018037468A5 JP2016167346A JP2016167346A JP2018037468A5 JP 2018037468 A5 JP2018037468 A5 JP 2018037468A5 JP 2016167346 A JP2016167346 A JP 2016167346A JP 2016167346 A JP2016167346 A JP 2016167346A JP 2018037468 A5 JP2018037468 A5 JP 2018037468A5
- Authority
- JP
- Japan
- Prior art keywords
- photoelectric conversion
- conversion device
- impurity region
- atoms
- satisfied
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016167346A JP6862129B2 (ja) | 2016-08-29 | 2016-08-29 | 光電変換装置および撮像システム |
| US15/683,660 US10319757B2 (en) | 2016-08-29 | 2017-08-22 | Photoelectric conversion device and imaging system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016167346A JP6862129B2 (ja) | 2016-08-29 | 2016-08-29 | 光電変換装置および撮像システム |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2018037468A JP2018037468A (ja) | 2018-03-08 |
| JP2018037468A5 true JP2018037468A5 (https=) | 2019-09-19 |
| JP6862129B2 JP6862129B2 (ja) | 2021-04-21 |
Family
ID=61243379
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016167346A Expired - Fee Related JP6862129B2 (ja) | 2016-08-29 | 2016-08-29 | 光電変換装置および撮像システム |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US10319757B2 (https=) |
| JP (1) | JP6862129B2 (https=) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11114491B2 (en) | 2018-12-12 | 2021-09-07 | Kla Corporation | Back-illuminated sensor and a method of manufacturing a sensor |
| CN109979955B (zh) * | 2019-04-03 | 2021-06-18 | 上海华力微电子有限公司 | 一种半导体结构及其制造方法 |
| US11848350B2 (en) | 2020-04-08 | 2023-12-19 | Kla Corporation | Back-illuminated sensor and a method of manufacturing a sensor using a silicon on insulator wafer |
Family Cites Families (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3423102B2 (ja) | 1995-03-24 | 2003-07-07 | 三洋電機株式会社 | 光起電力素子 |
| JPH11145147A (ja) * | 1997-11-11 | 1999-05-28 | Nec Corp | 半導体装置および半導体装置の製造方法 |
| JP4710603B2 (ja) * | 2000-04-14 | 2011-06-29 | 信越半導体株式会社 | アニールウエーハとその製造方法 |
| JP3931606B2 (ja) * | 2001-09-20 | 2007-06-20 | ソニー株式会社 | 撮像装置およびノイズ除去方法 |
| JP3723124B2 (ja) * | 2001-12-14 | 2005-12-07 | 株式会社東芝 | 固体撮像装置 |
| JP4174468B2 (ja) * | 2003-12-12 | 2008-10-29 | キヤノン株式会社 | 光電変換装置及び撮像システム |
| US7323731B2 (en) * | 2003-12-12 | 2008-01-29 | Canon Kabushiki Kaisha | Photoelectric conversion device, method of manufacturing photoelectric conversion device, and image pickup system |
| JP4667030B2 (ja) * | 2004-12-10 | 2011-04-06 | キヤノン株式会社 | 固体撮像装置用の半導体基板とその製造方法 |
| JP2006189823A (ja) * | 2004-12-10 | 2006-07-20 | Canon Inc | 電子写真感光体 |
| WO2006062256A1 (ja) * | 2004-12-10 | 2006-06-15 | Canon Kabushiki Kaisha | 電子写真感光体 |
| JP2007251074A (ja) * | 2006-03-20 | 2007-09-27 | Ricoh Co Ltd | 固体撮像素子及び装置 |
| KR101315282B1 (ko) * | 2006-04-27 | 2013-10-08 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 장치 및 이를 사용한 전자기기 |
| JP5567259B2 (ja) * | 2008-07-28 | 2014-08-06 | グローバルウェーハズ・ジャパン株式会社 | シリコンウェーハおよびその製造方法 |
| JP2013106231A (ja) * | 2011-11-15 | 2013-05-30 | Canon Inc | 撮像装置 |
| KR102034482B1 (ko) * | 2013-03-04 | 2019-10-21 | 삼성전자주식회사 | 이미지 센서 및 이의 형성 방법 |
| JP6355311B2 (ja) * | 2013-10-07 | 2018-07-11 | キヤノン株式会社 | 固体撮像装置、その製造方法及び撮像システム |
| JP6302216B2 (ja) * | 2013-11-08 | 2018-03-28 | ルネサスエレクトロニクス株式会社 | 半導体装置およびその製造方法 |
| JP6347621B2 (ja) * | 2014-02-13 | 2018-06-27 | キヤノン株式会社 | 固体撮像素子及び撮像装置 |
| JP2015176896A (ja) * | 2014-03-13 | 2015-10-05 | 株式会社東芝 | 固体撮像装置用基板、固体撮像装置、固体撮像装置用基板の製造方法、および固体撮像装置の製造方法 |
| JP6427946B2 (ja) * | 2014-05-13 | 2018-11-28 | 株式会社Sumco | エピタキシャルシリコンウェーハの製造方法、エピタキシャルシリコンウェーハ、および固体撮像素子の製造方法 |
| KR20150134543A (ko) * | 2014-05-22 | 2015-12-02 | 삼성전자주식회사 | 소자 제조용 기판 및 반도체 소자 |
| KR102359180B1 (ko) * | 2014-06-09 | 2022-02-08 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 촬상 장치 |
| JP2016076647A (ja) | 2014-10-08 | 2016-05-12 | キヤノン株式会社 | 光電変換装置 |
| JP2016092035A (ja) | 2014-10-29 | 2016-05-23 | 株式会社東芝 | 固体撮像装置及び固体撮像装置の製造方法 |
-
2016
- 2016-08-29 JP JP2016167346A patent/JP6862129B2/ja not_active Expired - Fee Related
-
2017
- 2017-08-22 US US15/683,660 patent/US10319757B2/en not_active Expired - Fee Related
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