JP2018026566A - ホウ素含有ガスおよびフッ化水素ガスを使用した原子層エッチング - Google Patents
ホウ素含有ガスおよびフッ化水素ガスを使用した原子層エッチング Download PDFInfo
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- 239000007789 gas Substances 0.000 title claims abstract description 70
- 229910052796 boron Inorganic materials 0.000 title claims abstract description 50
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 title claims abstract description 38
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 title claims abstract description 27
- 229910000040 hydrogen fluoride Inorganic materials 0.000 title claims abstract description 22
- 238000005530 etching Methods 0.000 title claims abstract description 16
- 239000000758 substrate Substances 0.000 claims abstract description 65
- 238000000034 method Methods 0.000 claims abstract description 53
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 39
- 150000004706 metal oxides Chemical class 0.000 claims abstract description 39
- 239000002344 surface layer Substances 0.000 claims abstract description 31
- 239000010410 layer Substances 0.000 claims abstract description 15
- -1 boron halide Chemical class 0.000 claims description 12
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 7
- 239000011261 inert gas Substances 0.000 claims description 6
- 229910021193 La 2 O 3 Inorganic materials 0.000 claims description 5
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 5
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 3
- 229910052731 fluorine Inorganic materials 0.000 claims description 3
- 239000011737 fluorine Substances 0.000 claims description 3
- 239000002184 metal Substances 0.000 claims description 2
- 238000010926 purge Methods 0.000 claims 2
- 238000001035 drying Methods 0.000 claims 1
- 230000001590 oxidative effect Effects 0.000 claims 1
- 238000006243 chemical reaction Methods 0.000 description 13
- 238000010586 diagram Methods 0.000 description 10
- 239000006227 byproduct Substances 0.000 description 7
- 239000004065 semiconductor Substances 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 238000003672 processing method Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 238000000231 atomic layer deposition Methods 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical class [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
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- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/3065—Plasma etching; Reactive-ion etching
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- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
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- H01L21/3105—After-treatment
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- C01B7/00—Halogens; Halogen acids
- C01B7/19—Fluorine; Hydrogen fluoride
- C01B7/191—Hydrogen fluoride
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- H01L21/02041—Cleaning
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- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
- H01L21/02263—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase
- H01L21/02271—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition
- H01L21/0228—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition deposition by cyclic CVD, e.g. ALD, ALE, pulsed CVD
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- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
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- H01L21/311—Etching the insulating layers by chemical or physical means
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Abstract
【解決手段】 本発明の実施形態は、基板の原子層エッチング(ALE)の方法を提供する。一実施形態によると、方法は、基板を提供するステップと、基板をフッ化水素(HF)ガスおよびホウ素含有ガスに曝露して、基板をエッチングするステップとを含む。別の実施形態によると、方法は、金属酸化物膜を含む基板を提供するステップと、基板をHFガスに曝露して、金属酸化物膜上にフッ素化表面層を形成するステップと、基板をホウ素含有ガスに曝露して、フッ素化表面層を金属酸化物膜から除去するステップとを含む。金属酸化物膜をさらにエッチングするために、曝露は少なくとも1回繰り返され得る。
【選択図】 図1
Description
本出願は、2016年8月10日に出願された米国仮特許出願第62/373,232号明細書(その内容全体が参照により本明細書に援用される)に関連し、およびそれに対する優先権を主張する。
2 プロセスフロー
3 基板
4 プロセスフロー
5 基板
300 層
302 金属酸化物膜
304 フッ素化表面層
306 HFガス
308 ホウ素含有ガス
404〜410 曝露
412 矢印
500 基板
502 金属酸化物膜
504 第1のフッ素化表面層
506 第1のホウ素含有ガス
508 HFガス
510 第2のフッ素化表面層
512 第2のホウ素含有ガス
Claims (20)
- 原子層エッチング(ALE)の方法であって、
基板を提供するステップと;
前記基板をフッ化水素(HF)ガスおよびホウ素含有ガスに曝露して、前記基板をエッチングするステップと
を含む、方法。 - 前記基板をさらにエッチングするために、前記交互の曝露が少なくとも1回繰り返される、請求項1に記載の方法。
- 前記ホウ素含有ガスが水素化ホウ素、ハロゲン化ホウ素、ホウ素アミド、有機ホウ化物、またはそれらの組合せを含有する、請求項1に記載の方法。
- 前記ホウ素含有ガスが、BH3、BCl3、B(CH3)3、およびB(N(CH3)2)3からなる群から選択される、請求項3に記載の方法。
- 原子層エッチング(ALE)の方法であって、
金属酸化物膜を含む基板を提供するステップと;
前記基板をフッ化水素(HF)ガスに曝露して、前記金属酸化物膜上にフッ素化表面層を形成するステップと;
前記基板をホウ素含有ガスに曝露して、前記フッ素化表面層を前記金属酸化物膜から除去するステップと
を含む、方法。 - 前記金属酸化物膜をさらにエッチングするために、前記曝露が少なくとも1回繰り返される、請求項5に記載の方法。
- 前記ホウ素含有ガスが水素化ホウ素、ハロゲン化ホウ素、ホウ素アミド、有機ホウ化物、またはそれらの組合せを含有する、請求項5に記載の方法。
- 前記ホウ素含有ガスが、BH3、BCl3、B(CH3)3、およびB(N(CH3)2)3からなる群から選択される、請求項7に記載の方法。
- 前記金属酸化物膜が、Al2O3、HfO2、TiO2、ZrO2、Y2O3、La2O3、UO2、Lu2O3、Ta2O5、Nb2O5、ZnO、MgO、CaO、BeO、V2O5、FeO、FeO2、CrO、Cr2O3、CrO2、MnO、Mn2O3、RuO、CoO、WO3、およびそれらの組合せからなる群から選択される、請求項5に記載の方法。
- 不活性ガスでガスパージするステップを前記曝露ステップの間にさらに含む、請求項5に記載の方法。
- 原子層エッチング(ALE)の方法であって、
第1のフッ素化表面層を有する金属酸化物膜を含む基板を提供するステップと;
前記基板を第1のホウ素含有ガスに曝露して、前記第1のフッ素化表面層を前記金属酸化物膜から除去するステップと;
前記基板をフッ化水素(HF)ガスに曝露して、前記金属酸化物膜上に第2のフッ素化表面層を形成するステップと;
前記基板を第2のホウ素含有ガスに曝露して、前記第2のフッ素化表面層を前記金属酸化物膜から除去するステップと
を含む、方法。 - 前記金属酸化物膜をさらにエッチングするために、前記HFガスおよび前記第2のホウ素含有ガスへの前記曝露が少なくとも1回繰り返される、請求項11に記載の方法。
- 前記第1および第2のホウ素含有ガスが水素化ホウ素、ハロゲン化ホウ素、ホウ素アミド、有機ホウ化物、またはそれらの組合せを含有する、請求項11に記載の方法。
- 前記第1および第2のホウ素含有ガスが、BH3、BCl3、B(CH3)3、およびB(N(CH3)2)3からなる群から選択される、請求項13に記載の方法。
- 前記金属酸化物膜が、Al2O3、HfO2、TiO2、ZrO2、Y2O3、La2O3、UO2、Lu2O3、Ta2O5、Nb2O5、ZnO、MgO、CaO、BeO、V2O5、FeO、FeO2、CrO、Cr2O3、CrO2、MnO、Mn2O3、RuO、CoO、WO3、およびそれらの組合せからなる群から選択される、請求項11に記載の方法。
- 前記金属酸化物膜が金属層を酸化させることによって形成される、請求項11に記載の方法。
- 不活性ガスでガスパージするステップを前記曝露ステップの間にさらに含む、請求項11に記載の方法。
- 前記第1のフッ素化表面層が水性HFによる湿式処理を使用して形成される、請求項11に記載の方法。
- 前記第1のフッ素化表面層が乾式処理によって形成される、請求項11に記載の方法。
- 前記乾式処理がHFガスまたは有機フッ素含有エッチングガスを含む、請求項19に記載の方法。
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US201662373232P | 2016-08-10 | 2016-08-10 | |
US62/373,232 | 2016-08-10 |
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WO2020054476A1 (ja) * | 2018-09-13 | 2020-03-19 | セントラル硝子株式会社 | シリコン酸化物のエッチング方法及びエッチング装置 |
JP2021158142A (ja) * | 2020-03-25 | 2021-10-07 | 株式会社Kokusai Electric | 半導体装置の製造方法、基板処理装置、およびプログラム |
JPWO2022003803A1 (ja) * | 2020-06-30 | 2022-01-06 | ||
JP2022536475A (ja) * | 2019-06-11 | 2022-08-17 | アプライド マテリアルズ インコーポレイテッド | フッ素および金属ハロゲン化物を使用した金属酸化物のエッチング |
WO2023282191A1 (ja) | 2021-07-05 | 2023-01-12 | 東京エレクトロン株式会社 | 基板処理方法及び基板処理装置 |
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US11387112B2 (en) | 2018-10-04 | 2022-07-12 | Tokyo Electron Limited | Surface processing method and processing system |
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JP7174016B2 (ja) | 2020-07-16 | 2022-11-17 | 株式会社Kokusai Electric | 基板処理方法、半導体装置の製造方法、基板処理装置、およびプログラム |
KR20230057348A (ko) | 2020-09-01 | 2023-04-28 | 가부시키가이샤 아데카 | 에칭 방법 |
US11488835B2 (en) * | 2020-11-20 | 2022-11-01 | Applied Materials, Inc. | Systems and methods for tungsten-containing film removal |
US11462414B2 (en) * | 2021-03-08 | 2022-10-04 | Tokyo Electron Limited | Atomic layer etching of metal oxides |
US11631589B2 (en) * | 2021-05-04 | 2023-04-18 | Applied Materials, Inc. | Metal etch in high aspect-ratio features |
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WO2023164367A1 (en) * | 2022-02-22 | 2023-08-31 | Lam Research Corporation | Atomic layer etching using an inhibitor |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09246581A (ja) * | 1996-03-01 | 1997-09-19 | Canon Inc | 光起電力素子 |
JP2009064991A (ja) * | 2007-09-07 | 2009-03-26 | Hitachi High-Technologies Corp | High−k膜のドライエッチング方法 |
WO2016100873A1 (en) * | 2014-12-18 | 2016-06-23 | The Regents Of The University Of Colorado, A Body Corporate | Novel methods of atomic layer etching (ale) using sequential, self-limiting thermal reactions |
JP2016131238A (ja) * | 2015-01-12 | 2016-07-21 | ラム リサーチ コーポレーションLam Research Corporation | 原子スケールのald(原子層堆積)プロセスとale(原子層エッチング)プロセスとの統合 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0368732B1 (en) * | 1988-11-04 | 1995-06-28 | Fujitsu Limited | Process for forming resist mask pattern |
US5041362A (en) * | 1989-07-06 | 1991-08-20 | Texas Instruments Incorporated | Dry developable resist etch chemistry |
US7012027B2 (en) * | 2004-01-27 | 2006-03-14 | Taiwan Semiconductor Manufacturing Company, Ltd. | Zirconium oxide and hafnium oxide etching using halogen containing chemicals |
US20140179106A1 (en) * | 2012-12-21 | 2014-06-26 | Lam Research Corporation | In-situ metal residue clean |
US9773683B2 (en) * | 2014-06-09 | 2017-09-26 | American Air Liquide, Inc. | Atomic layer or cyclic plasma etching chemistries and processes |
US9837304B2 (en) * | 2015-06-24 | 2017-12-05 | Tokyo Electron Limited | Sidewall protection scheme for contact formation |
US10283369B2 (en) * | 2016-08-10 | 2019-05-07 | Tokyo Electron Limited | Atomic layer etching using a boron-containing gas and hydrogen fluoride gas |
-
2017
- 2017-08-08 US US15/671,404 patent/US10283369B2/en active Active
- 2017-08-09 JP JP2017154337A patent/JP6924648B2/ja active Active
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- 2019-05-07 US US16/405,462 patent/US10790156B2/en active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09246581A (ja) * | 1996-03-01 | 1997-09-19 | Canon Inc | 光起電力素子 |
JP2009064991A (ja) * | 2007-09-07 | 2009-03-26 | Hitachi High-Technologies Corp | High−k膜のドライエッチング方法 |
WO2016100873A1 (en) * | 2014-12-18 | 2016-06-23 | The Regents Of The University Of Colorado, A Body Corporate | Novel methods of atomic layer etching (ale) using sequential, self-limiting thermal reactions |
JP2016131238A (ja) * | 2015-01-12 | 2016-07-21 | ラム リサーチ コーポレーションLam Research Corporation | 原子スケールのald(原子層堆積)プロセスとale(原子層エッチング)プロセスとの統合 |
Cited By (16)
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WO2020054476A1 (ja) * | 2018-09-13 | 2020-03-19 | セントラル硝子株式会社 | シリコン酸化物のエッチング方法及びエッチング装置 |
JP6700571B1 (ja) * | 2018-09-13 | 2020-05-27 | セントラル硝子株式会社 | シリコン酸化物のエッチング方法及びエッチング装置 |
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US20190267249A1 (en) | 2019-08-29 |
KR102510736B1 (ko) | 2023-03-15 |
US10790156B2 (en) | 2020-09-29 |
KR20180018413A (ko) | 2018-02-21 |
US20180047577A1 (en) | 2018-02-15 |
US10283369B2 (en) | 2019-05-07 |
TW201820459A (zh) | 2018-06-01 |
JP6924648B2 (ja) | 2021-08-25 |
TWI717544B (zh) | 2021-02-01 |
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