JP2018026537A5 - - Google Patents
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- Publication number
- JP2018026537A5 JP2018026537A5 JP2017124215A JP2017124215A JP2018026537A5 JP 2018026537 A5 JP2018026537 A5 JP 2018026537A5 JP 2017124215 A JP2017124215 A JP 2017124215A JP 2017124215 A JP2017124215 A JP 2017124215A JP 2018026537 A5 JP2018026537 A5 JP 2018026537A5
- Authority
- JP
- Japan
- Prior art keywords
- concentration
- liquid
- path
- treatment liquid
- calibration
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000007788 liquid Substances 0.000 claims description 497
- 238000012545 processing Methods 0.000 claims description 240
- 230000007246 mechanism Effects 0.000 claims description 56
- 239000012530 fluid Substances 0.000 claims description 54
- 238000005259 measurement Methods 0.000 claims description 52
- 239000000243 solution Substances 0.000 claims description 26
- 239000000758 substrate Substances 0.000 claims description 18
- 239000012482 calibration solution Substances 0.000 claims description 12
- 238000004519 manufacturing process Methods 0.000 claims description 12
- 238000011144 upstream manufacturing Methods 0.000 description 66
- 238000000034 method Methods 0.000 description 59
- 230000008569 process Effects 0.000 description 40
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 38
- 238000004140 cleaning Methods 0.000 description 38
- 238000005530 etching Methods 0.000 description 20
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 19
- 239000000126 substance Substances 0.000 description 15
- 238000011084 recovery Methods 0.000 description 13
- 239000004065 semiconductor Substances 0.000 description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 12
- 238000010586 diagram Methods 0.000 description 5
- 238000010790 dilution Methods 0.000 description 5
- 239000012895 dilution Substances 0.000 description 5
- 239000007864 aqueous solution Substances 0.000 description 3
- 238000001739 density measurement Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 239000003085 diluting agent Substances 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 239000008155 medical solution Substances 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000012544 monitoring process Methods 0.000 description 2
- 239000011368 organic material Substances 0.000 description 2
- 238000004092 self-diagnosis Methods 0.000 description 2
- 230000002159 abnormal effect Effects 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
Images
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW106122352A TWI653661B (zh) | 2016-07-29 | 2017-07-04 | 處理液生成裝置及使用該裝置的基板處理裝置 |
| CN201710624077.XA CN107665839B (zh) | 2016-07-29 | 2017-07-27 | 处理液生成装置和使用该处理液生成装置的基板处理装置 |
| US15/661,480 US11670522B2 (en) | 2016-07-29 | 2017-07-27 | Processing liquid generator and substrate processing apparatus using the same |
| KR1020170096397A KR101967055B1 (ko) | 2016-07-29 | 2017-07-28 | 처리액 생성 장치 및 그것을 이용한 기판 처리 장치 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016150832 | 2016-07-29 | ||
| JP2016150832 | 2016-07-29 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2018026537A JP2018026537A (ja) | 2018-02-15 |
| JP2018026537A5 true JP2018026537A5 (https=) | 2018-07-12 |
| JP6918600B2 JP6918600B2 (ja) | 2021-08-11 |
Family
ID=61193988
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017124215A Active JP6918600B2 (ja) | 2016-07-29 | 2017-06-26 | 処理液生成装置及びそれを用いた基板処理装置 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP6918600B2 (https=) |
| KR (1) | KR101967055B1 (https=) |
| TW (1) | TWI653661B (https=) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7304692B2 (ja) * | 2018-12-13 | 2023-07-07 | 東京エレクトロン株式会社 | 基板処理方法および基板処理装置 |
| JP7264729B2 (ja) * | 2019-05-31 | 2023-04-25 | 株式会社Ｓｃｒｅｅｎホールディングス | 基板処理装置および基板処理方法 |
| KR102374423B1 (ko) * | 2019-06-28 | 2022-03-15 | 홍석진 | 다중 농도 측정 장치를 구비한 현상액 농도 관리 장치 |
| JP7665556B2 (ja) | 2022-03-24 | 2025-04-21 | 芝浦メカトロニクス株式会社 | 処理液供給装置、基板処理装置及び処理液供給装置の検査方法 |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5924794A (en) * | 1995-02-21 | 1999-07-20 | Fsi International, Inc. | Chemical blending system with titrator control |
| JP4456308B2 (ja) | 2001-12-05 | 2010-04-28 | 富士通マイクロエレクトロニクス株式会社 | 薬液供給装置 |
| CN1332741C (zh) * | 2002-07-19 | 2007-08-22 | 动力系统有限公司 | 混合过程原料的方法和设备 |
| JP2005347384A (ja) * | 2004-06-01 | 2005-12-15 | Seiko Epson Corp | 有機物の剥離装置及び有機物の剥離方法 |
| JP2007005472A (ja) * | 2005-06-22 | 2007-01-11 | Sumitomo Electric Ind Ltd | 基板の表面処理方法およびｉｉｉ−ｖ族化合物半導体の製造方法 |
| KR20080011910A (ko) * | 2006-08-01 | 2008-02-11 | 세메스 주식회사 | 약액 혼합 장치 및 방법 |
| JP2008103678A (ja) * | 2006-09-20 | 2008-05-01 | Dainippon Screen Mfg Co Ltd | 基板処理装置 |
| CN103717351A (zh) * | 2011-08-01 | 2014-04-09 | 巴斯夫欧洲公司 | 一种制造半导体装置的方法，其包括在具有3.0至5.5的pH值的CMP组合物的存在下化学机械抛光元素锗及/或Si1-xGex 材料 |
| JP5858770B2 (ja) | 2011-12-19 | 2016-02-10 | 芝浦メカトロニクス株式会社 | 基板処理システム |
| JP5878051B2 (ja) * | 2012-03-21 | 2016-03-08 | 芝浦メカトロニクス株式会社 | 基板処理方法及び基板処理システム |
| TWI619155B (zh) | 2013-05-14 | 2018-03-21 | Shibaura Mechatronics Corporation | 液供給裝置及基板處理裝置 |
-
2017
- 2017-06-26 JP JP2017124215A patent/JP6918600B2/ja active Active
- 2017-07-04 TW TW106122352A patent/TWI653661B/zh active
- 2017-07-28 KR KR1020170096397A patent/KR101967055B1/ko active Active
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