JP2017525840A5 - - Google Patents
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- Publication number
- JP2017525840A5 JP2017525840A5 JP2016572630A JP2016572630A JP2017525840A5 JP 2017525840 A5 JP2017525840 A5 JP 2017525840A5 JP 2016572630 A JP2016572630 A JP 2016572630A JP 2016572630 A JP2016572630 A JP 2016572630A JP 2017525840 A5 JP2017525840 A5 JP 2017525840A5
- Authority
- JP
- Japan
- Prior art keywords
- precursor composition
- liquid precursor
- film
- metal
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR10-2014-0072274 | 2014-06-13 | ||
| KR20140072274 | 2014-06-13 | ||
| PCT/KR2015/005945 WO2015190871A1 (en) | 2014-06-13 | 2015-06-12 | Liquid precursor compositions, preparation methods thereof, and methods for forming layer using the composition |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2017525840A JP2017525840A (ja) | 2017-09-07 |
| JP2017525840A5 true JP2017525840A5 (https=) | 2018-07-19 |
| JP6635950B2 JP6635950B2 (ja) | 2020-01-29 |
Family
ID=54833872
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016572630A Active JP6635950B2 (ja) | 2014-06-13 | 2015-06-12 | 液体前駆体組成物、その製造方法、及び前記組成物を利用した膜の形成方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US10014089B2 (https=) |
| JP (1) | JP6635950B2 (https=) |
| KR (2) | KR101936162B1 (https=) |
| CN (1) | CN106460169B (https=) |
| TW (1) | TWI682051B (https=) |
| WO (1) | WO2015190871A1 (https=) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102487441B1 (ko) * | 2014-09-14 | 2023-01-12 | 엔테그리스, 아이엔씨. | 구리 및 유전체 상의 코발트 침착 선택성 |
| TWI736631B (zh) * | 2016-06-06 | 2021-08-21 | 韋恩州立大學 | 二氮雜二烯錯合物與胺類的反應 |
| US11078224B2 (en) * | 2017-04-07 | 2021-08-03 | Applied Materials, Inc. | Precursors for the atomic layer deposition of transition metals and methods of use |
| KR102103346B1 (ko) * | 2017-11-15 | 2020-04-22 | 에스케이트리켐 주식회사 | 박막 증착용 전구체 용액 및 이를 이용한 박막 형성 방법. |
| KR102123331B1 (ko) * | 2018-12-19 | 2020-06-17 | 주식회사 한솔케미칼 | 코발트 전구체, 이의 제조방법 및 이를 이용한 박막의 제조방법 |
| WO2022211218A1 (ko) | 2021-04-02 | 2022-10-06 | 한국과학기술원 | 액체금속 전구체 용액, 이를 이용한 금속막 제조방법 및 이를 포함하는 전자소자 |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102006000823A1 (de) * | 2006-01-05 | 2007-07-12 | H. C. Starck Gmbh & Co. Kg | Wolfram- und Molybdän-Verbindungen und ihre Verwendung für die Chemical Vapour Deposition (CVD) |
| US8636845B2 (en) * | 2008-06-25 | 2014-01-28 | L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude | Metal heterocyclic compounds for deposition of thin films |
| US8485738B2 (en) * | 2009-07-31 | 2013-07-16 | Hewlett-Packard Development Company, L.P. | Optical fiber connector |
| US9255327B2 (en) * | 2010-08-24 | 2016-02-09 | Wayne State University | Thermally stable volatile precursors |
| US9822446B2 (en) * | 2010-08-24 | 2017-11-21 | Wayne State University | Thermally stable volatile precursors |
| US9353437B2 (en) * | 2010-11-17 | 2016-05-31 | Up Chemical Co., Ltd. | Diazadiene-based metal compound, method for preparing same and method for forming a thin film using same |
| US20140235054A1 (en) | 2011-09-27 | 2014-08-21 | L'Air Liquide, Société Änonyme pour I'Etude et I'Exploitation des Procédés Georges Glaude | Tungsten diazabutadiene precursors, their synthesis, and their use for tungsten containing film depositions |
| WO2013046157A1 (en) * | 2011-09-27 | 2013-04-04 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Nickel bis diazabutadiene precursors, their synthesis, and their use for nickel containing film depositions |
| KR101822884B1 (ko) | 2013-05-24 | 2018-01-29 | 주식회사 유피케미칼 | 텅스텐 화합물을 이용한 텅스텐-함유 막의 증착 방법 및 상기 텅스텐 화합물을 포함하는 텅스텐-함유 막 증착용 전구체 조성물 |
| US9067958B2 (en) * | 2013-10-14 | 2015-06-30 | Intel Corporation | Scalable and high yield synthesis of transition metal bis-diazabutadienes |
| US9236292B2 (en) * | 2013-12-18 | 2016-01-12 | Intel Corporation | Selective area deposition of metal films by atomic layer deposition (ALD) and chemical vapor deposition (CVD) |
-
2015
- 2015-06-12 KR KR1020167012801A patent/KR101936162B1/ko active Active
- 2015-06-12 JP JP2016572630A patent/JP6635950B2/ja active Active
- 2015-06-12 KR KR1020167001280A patent/KR20160017094A/ko not_active Withdrawn
- 2015-06-12 WO PCT/KR2015/005945 patent/WO2015190871A1/en not_active Ceased
- 2015-06-12 CN CN201580031286.2A patent/CN106460169B/zh active Active
- 2015-06-15 TW TW104119200A patent/TWI682051B/zh active
-
2016
- 2016-06-30 US US15/199,705 patent/US10014089B2/en active Active
-
2018
- 2018-06-07 US US16/002,304 patent/US10763001B2/en active Active
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