JP2017523313A5 - - Google Patents
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- Publication number
- JP2017523313A5 JP2017523313A5 JP2017516639A JP2017516639A JP2017523313A5 JP 2017523313 A5 JP2017523313 A5 JP 2017523313A5 JP 2017516639 A JP2017516639 A JP 2017516639A JP 2017516639 A JP2017516639 A JP 2017516639A JP 2017523313 A5 JP2017523313 A5 JP 2017523313A5
- Authority
- JP
- Japan
- Prior art keywords
- process tool
- tool adapter
- adapter
- cooled process
- cooled
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201462009153P | 2014-06-06 | 2014-06-06 | |
| US62/009,153 | 2014-06-06 | ||
| US14/713,386 US20150354054A1 (en) | 2014-06-06 | 2015-05-15 | Cooled process tool adapter for use in substrate processing chambers |
| US14/713,386 | 2015-05-15 | ||
| PCT/US2015/031441 WO2015187354A1 (en) | 2014-06-06 | 2015-05-18 | Cooled process tool adapter for use in substrate processing chambers |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2017523313A JP2017523313A (ja) | 2017-08-17 |
| JP2017523313A5 true JP2017523313A5 (enExample) | 2018-06-28 |
| JP6702952B2 JP6702952B2 (ja) | 2020-06-03 |
Family
ID=54767174
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017516639A Expired - Fee Related JP6702952B2 (ja) | 2014-06-06 | 2015-05-18 | 基板処理チャンバ内で使用するための冷却式プロセスツールアダプタ |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20150354054A1 (enExample) |
| JP (1) | JP6702952B2 (enExample) |
| KR (1) | KR102391979B1 (enExample) |
| CN (1) | CN106415786B (enExample) |
| SG (2) | SG10201810894TA (enExample) |
| TW (1) | TWI657520B (enExample) |
| WO (1) | WO2015187354A1 (enExample) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6105114B1 (ja) * | 2016-03-14 | 2017-03-29 | 株式会社東芝 | 成膜装置、スパッタ装置、及びコリメータ |
| GB2550897B (en) * | 2016-05-27 | 2020-12-23 | Oxford Instruments Nanotechnology Tools Ltd | Cryogenic cooling system |
| US11276559B2 (en) * | 2017-05-17 | 2022-03-15 | Applied Materials, Inc. | Semiconductor processing chamber for multiple precursor flow |
| CN109390222B (zh) * | 2017-08-08 | 2021-01-05 | 宁波江丰电子材料股份有限公司 | 准直器检具及其使用方法 |
| TWI765213B (zh) * | 2019-01-23 | 2022-05-21 | 大陸商北京北方華創微電子裝備有限公司 | 內襯冷卻組件、反應腔室及半導體加工設備 |
| CN115087758A (zh) * | 2020-02-11 | 2022-09-20 | 朗姆研究公司 | 用于控制晶片晶边/边缘上的沉积的承载环设计 |
| US11339466B2 (en) * | 2020-03-20 | 2022-05-24 | Applied Materials, Inc. | Heated shield for physical vapor deposition chamber |
| CN111850501B (zh) * | 2020-07-20 | 2022-09-27 | 江苏集萃有机光电技术研究所有限公司 | 一种基片架结构及真空蒸镀装置 |
| US12183559B2 (en) * | 2021-10-22 | 2024-12-31 | Applied Materials, Inc. | Apparatus for temperature control in a substrate processing chamber |
| USD1038901S1 (en) * | 2022-01-12 | 2024-08-13 | Applied Materials, Inc. | Collimator for a physical vapor deposition chamber |
| USD1026054S1 (en) * | 2022-04-22 | 2024-05-07 | Applied Materials, Inc. | Collimator for a physical vapor deposition (PVD) chamber |
| USD1025935S1 (en) * | 2022-11-03 | 2024-05-07 | Applied Materials, Inc. | Collimator for a physical vapor deposition (PVD) chamber |
| USD1026839S1 (en) * | 2022-12-16 | 2024-05-14 | Applied Materials, Inc. | Collimator for a physical vapor deposition (PVD) chamber |
| USD1024149S1 (en) * | 2022-12-16 | 2024-04-23 | Applied Materials, Inc. | Collimator for a physical vapor deposition (PVD) chamber |
| USD1025936S1 (en) * | 2022-12-16 | 2024-05-07 | Applied Materials, Inc. | Collimator for a physical vapor deposition (PVD) chamber |
| US20250293008A1 (en) * | 2024-03-18 | 2025-09-18 | Applied Materials, Inc. | External Cooling Assembly for Substrate Support |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5690795A (en) * | 1995-06-05 | 1997-11-25 | Applied Materials, Inc. | Screwless shield assembly for vacuum processing chambers |
| JPH1190762A (ja) * | 1997-05-27 | 1999-04-06 | Chiron Werke Gmbh & Co Kg | 工作機械 |
| US5953827A (en) * | 1997-11-05 | 1999-09-21 | Applied Materials, Inc. | Magnetron with cooling system for process chamber of processing system |
| US7134812B2 (en) * | 2002-07-17 | 2006-11-14 | Kevin Beckington | Tool coolant application and direction assembly |
| US7686926B2 (en) * | 2004-05-26 | 2010-03-30 | Applied Materials, Inc. | Multi-step process for forming a metal barrier in a sputter reactor |
| US9127362B2 (en) * | 2005-10-31 | 2015-09-08 | Applied Materials, Inc. | Process kit and target for substrate processing chamber |
| US7846310B2 (en) * | 2006-12-13 | 2010-12-07 | Applied Materials, Inc. | Encapsulated and water cooled electromagnet array |
| US7981262B2 (en) * | 2007-01-29 | 2011-07-19 | Applied Materials, Inc. | Process kit for substrate processing chamber |
| US20080257263A1 (en) * | 2007-04-23 | 2008-10-23 | Applied Materials, Inc. | Cooling shield for substrate processing chamber |
| JP4994164B2 (ja) * | 2007-09-07 | 2012-08-08 | 株式会社牧野フライス製作所 | 工作機械の移動体の冷却方法及び装置 |
| KR101571558B1 (ko) * | 2008-04-16 | 2015-11-24 | 어플라이드 머티어리얼스, 인코포레이티드 | 웨이퍼 프로세싱 증착 차폐 컴포넌트들 |
| CN102027564B (zh) * | 2008-04-28 | 2013-05-22 | 塞梅孔公司 | 对物体进行预处理和涂覆的装置和方法 |
| JP5611350B2 (ja) * | 2009-08-11 | 2014-10-22 | アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ | Ｒｆ物理気相堆積用のプロセスキット |
| US9096927B2 (en) * | 2011-09-02 | 2015-08-04 | Applied Materials, Inc. | Cooling ring for physical vapor deposition chamber target |
| US9605341B2 (en) * | 2013-03-06 | 2017-03-28 | Applied Materials, Inc. | Physical vapor deposition RF plasma shield deposit control |
-
2015
- 2015-05-15 US US14/713,386 patent/US20150354054A1/en not_active Abandoned
- 2015-05-18 SG SG10201810894TA patent/SG10201810894TA/en unknown
- 2015-05-18 SG SG11201609402TA patent/SG11201609402TA/en unknown
- 2015-05-18 KR KR1020177000380A patent/KR102391979B1/ko active Active
- 2015-05-18 WO PCT/US2015/031441 patent/WO2015187354A1/en not_active Ceased
- 2015-05-18 JP JP2017516639A patent/JP6702952B2/ja not_active Expired - Fee Related
- 2015-05-18 CN CN201580029964.1A patent/CN106415786B/zh not_active Expired - Fee Related
- 2015-05-20 TW TW104116145A patent/TWI657520B/zh not_active IP Right Cessation
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