SG10201810894TA - Cooled process tool adapter for use in substrate processing chambers - Google Patents
Cooled process tool adapter for use in substrate processing chambersInfo
- Publication number
- SG10201810894TA SG10201810894TA SG10201810894TA SG10201810894TA SG10201810894TA SG 10201810894T A SG10201810894T A SG 10201810894TA SG 10201810894T A SG10201810894T A SG 10201810894TA SG 10201810894T A SG10201810894T A SG 10201810894TA SG 10201810894T A SG10201810894T A SG 10201810894TA
- Authority
- SG
- Singapore
- Prior art keywords
- process tool
- annular body
- substrate processing
- processing chambers
- cooled process
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3488—Constructional details of particle beam apparatus not otherwise provided for, e.g. arrangement, mounting, housing, environment; special provisions for cleaning or maintenance of the apparatus
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32458—Vessel
- H01J37/32522—Temperature
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3435—Applying energy to the substrate during sputtering
- C23C14/345—Applying energy to the substrate during sputtering using substrate bias
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3447—Collimators, shutters, apertures
Abstract
COOLED PROCESS TOOL ADAPTER FOR USE IN SUBSTRATE PROCESSING CHAMBERS Embodiments of cooled process tool adapters for use in substrate processing chambers are provided herein. In some embodiments, a cooled process tool adapter includes: an annular body surrounding a central opening; a coolant channel disposed in the annular body; one or more features to facilitate supporting a process tool within the central opening; an inlet and an outlet disposed in the annular body and fluidly coupled to the coolant channel; and a power connection coupled to the annular body having a terminal to couple the annular body to a bias power source. [Figure ] 22
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201462009153P | 2014-06-06 | 2014-06-06 | |
US14/713,386 US20150354054A1 (en) | 2014-06-06 | 2015-05-15 | Cooled process tool adapter for use in substrate processing chambers |
Publications (1)
Publication Number | Publication Date |
---|---|
SG10201810894TA true SG10201810894TA (en) | 2019-01-30 |
Family
ID=54767174
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG10201810894TA SG10201810894TA (en) | 2014-06-06 | 2015-05-18 | Cooled process tool adapter for use in substrate processing chambers |
SG11201609402TA SG11201609402TA (en) | 2014-06-06 | 2015-05-18 | Cooled process tool adapter for use in substrate processing chambers |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201609402TA SG11201609402TA (en) | 2014-06-06 | 2015-05-18 | Cooled process tool adapter for use in substrate processing chambers |
Country Status (7)
Country | Link |
---|---|
US (1) | US20150354054A1 (en) |
JP (1) | JP6702952B2 (en) |
KR (1) | KR102391979B1 (en) |
CN (1) | CN106415786B (en) |
SG (2) | SG10201810894TA (en) |
TW (1) | TWI657520B (en) |
WO (1) | WO2015187354A1 (en) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6105114B1 (en) * | 2016-03-14 | 2017-03-29 | 株式会社東芝 | Film forming apparatus, sputtering apparatus, and collimator |
GB2550897B (en) * | 2016-05-27 | 2020-12-23 | Oxford Instruments Nanotechnology Tools Ltd | Cryogenic cooling system |
CN109390222B (en) * | 2017-08-08 | 2021-01-05 | 宁波江丰电子材料股份有限公司 | Collimator gauge and using method thereof |
TWI765213B (en) * | 2019-01-23 | 2022-05-21 | 大陸商北京北方華創微電子裝備有限公司 | Lined cooling components, reaction chambers and semiconductor processing equipment |
US11339466B2 (en) * | 2020-03-20 | 2022-05-24 | Applied Materials, Inc. | Heated shield for physical vapor deposition chamber |
CN111850501B (en) * | 2020-07-20 | 2022-09-27 | 江苏集萃有机光电技术研究所有限公司 | Substrate frame structure and vacuum evaporation device |
US20230128611A1 (en) * | 2021-10-22 | 2023-04-27 | Applied Materials, Inc. | Apparatus for Temperature Control in a Substrate Processing Chamber |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5690795A (en) * | 1995-06-05 | 1997-11-25 | Applied Materials, Inc. | Screwless shield assembly for vacuum processing chambers |
JPH1190762A (en) * | 1997-05-27 | 1999-04-06 | Chiron Werke Gmbh & Co Kg | Machine tool |
US5953827A (en) * | 1997-11-05 | 1999-09-21 | Applied Materials, Inc. | Magnetron with cooling system for process chamber of processing system |
US7134812B2 (en) * | 2002-07-17 | 2006-11-14 | Kevin Beckington | Tool coolant application and direction assembly |
US7686926B2 (en) * | 2004-05-26 | 2010-03-30 | Applied Materials, Inc. | Multi-step process for forming a metal barrier in a sputter reactor |
US9127362B2 (en) * | 2005-10-31 | 2015-09-08 | Applied Materials, Inc. | Process kit and target for substrate processing chamber |
US7846310B2 (en) * | 2006-12-13 | 2010-12-07 | Applied Materials, Inc. | Encapsulated and water cooled electromagnet array |
US7981262B2 (en) * | 2007-01-29 | 2011-07-19 | Applied Materials, Inc. | Process kit for substrate processing chamber |
US20080257263A1 (en) * | 2007-04-23 | 2008-10-23 | Applied Materials, Inc. | Cooling shield for substrate processing chamber |
JP4994164B2 (en) * | 2007-09-07 | 2012-08-08 | 株式会社牧野フライス製作所 | Method and apparatus for cooling moving body of machine tool |
KR102025330B1 (en) * | 2008-04-16 | 2019-09-25 | 어플라이드 머티어리얼스, 인코포레이티드 | Wafer processing deposition shielding components |
JP5448232B2 (en) * | 2008-04-28 | 2014-03-19 | コムコン・アーゲー | Apparatus and method for pre-processing and coating an object |
US20110036709A1 (en) * | 2009-08-11 | 2011-02-17 | Applied Materials, Inc. | Process kit for rf physical vapor deposition |
US9096927B2 (en) * | 2011-09-02 | 2015-08-04 | Applied Materials, Inc. | Cooling ring for physical vapor deposition chamber target |
US9605341B2 (en) * | 2013-03-06 | 2017-03-28 | Applied Materials, Inc. | Physical vapor deposition RF plasma shield deposit control |
-
2015
- 2015-05-15 US US14/713,386 patent/US20150354054A1/en not_active Abandoned
- 2015-05-18 CN CN201580029964.1A patent/CN106415786B/en active Active
- 2015-05-18 WO PCT/US2015/031441 patent/WO2015187354A1/en active Application Filing
- 2015-05-18 SG SG10201810894TA patent/SG10201810894TA/en unknown
- 2015-05-18 KR KR1020177000380A patent/KR102391979B1/en active IP Right Grant
- 2015-05-18 SG SG11201609402TA patent/SG11201609402TA/en unknown
- 2015-05-18 JP JP2017516639A patent/JP6702952B2/en active Active
- 2015-05-20 TW TW104116145A patent/TWI657520B/en active
Also Published As
Publication number | Publication date |
---|---|
SG11201609402TA (en) | 2016-12-29 |
TWI657520B (en) | 2019-04-21 |
JP2017523313A (en) | 2017-08-17 |
JP6702952B2 (en) | 2020-06-03 |
TW201546937A (en) | 2015-12-16 |
WO2015187354A1 (en) | 2015-12-10 |
US20150354054A1 (en) | 2015-12-10 |
KR102391979B1 (en) | 2022-04-27 |
CN106415786B (en) | 2019-11-22 |
KR20170015980A (en) | 2017-02-10 |
CN106415786A (en) | 2017-02-15 |
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