JP2017515301A5 - - Google Patents
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- Publication number
- JP2017515301A5 JP2017515301A5 JP2016558294A JP2016558294A JP2017515301A5 JP 2017515301 A5 JP2017515301 A5 JP 2017515301A5 JP 2016558294 A JP2016558294 A JP 2016558294A JP 2016558294 A JP2016558294 A JP 2016558294A JP 2017515301 A5 JP2017515301 A5 JP 2017515301A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate carrier
- carrier system
- protective layer
- layer stack
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims 9
- 239000000969 carrier Substances 0.000 claims 7
- 239000011241 protective layer Substances 0.000 claims 7
Claims (2)
- 保護層スタックは、２〜１５の間の除去可能な保護層を有する、請求項１記載の基板キャリアシステム。
- 真空処理チャンバと、
基板キャリアシステムであって、
外側取付面及び電極アセンブリを有する基板キャリア本体であって、電極アセンブリは、通電時に基板キャリアシステムに基板を固定するように動作可能である基板キャリア本体と、
外側取付面に結合された保護層スタックであって、保護層スタックは、基板キャリアシステムの基板支持面を画定し、保護層スタックは、複数の除去可能な保護層を有する保護層スタックとを含む基板キャリアシステムと、
外側取付面の鉛直な向きを維持したまま、真空処理チャンバの内外へ基板キャリアシステムを移動させるように動作可能な輸送機構とを含む真空処理システム。
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201461991350P | 2014-05-09 | 2014-05-09 | |
| US61/991,350 | 2014-05-09 | ||
| PCT/US2015/024147 WO2015171226A1 (en) | 2014-05-09 | 2015-04-02 | Substrate carrier system with protective covering |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2017515301A JP2017515301A (ja) | 2017-06-08 |
| JP2017515301A5 true JP2017515301A5 (ja) | 2018-05-17 |
Family
ID=54392836
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016558294A Pending JP2017515301A (ja) | 2014-05-09 | 2015-04-02 | 保護カバーを有する基板キャリアシステム |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US10096509B2 (ja) |
| JP (1) | JP2017515301A (ja) |
| KR (1) | KR20170002603A (ja) |
| CN (1) | CN106575720B (ja) |
| TW (1) | TW201606902A (ja) |
| WO (1) | WO2015171226A1 (ja) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110199384B (zh) * | 2017-01-31 | 2020-08-14 | 应用材料公司 | 处理基板的方法及用于保持基板的基板载体 |
| KR102123482B1 (ko) * | 2017-02-24 | 2020-06-16 | 어플라이드 머티어리얼스, 인코포레이티드 | 진공 시스템에서 사용하기 위한 캐리어, 진공 프로세싱을 위한 시스템, 및 기판의 진공 프로세싱을 위한 방법 |
| CN109792004A (zh) * | 2017-09-05 | 2019-05-21 | 应用材料公司 | 搬运掩模器件的方法、用于更换掩模器件的设备、掩模更换腔室以及真空系统 |
| KR20190062380A (ko) * | 2017-11-23 | 2019-06-05 | 어플라이드 머티어리얼스, 인코포레이티드 | 기판을 지지하기 위한 기판 캐리어, 마스크 척킹 장치, 진공 프로세싱 시스템, 및 기판 캐리어를 동작시키는 방법 |
| KR20190114216A (ko) * | 2018-03-29 | 2019-10-10 | 어플라이드 머티어리얼스, 인코포레이티드 | 정전척 및 기판처리장치 |
| JP2021534558A (ja) | 2018-08-21 | 2021-12-09 | アプライド マテリアルズ インコーポレイテッドApplied Materials, Incorporated | バッテリ用セパレータへの極薄セラミックコーティング |
| US11586160B2 (en) * | 2021-06-28 | 2023-02-21 | Applied Materials, Inc. | Reducing substrate surface scratching using machine learning |
Family Cites Families (33)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3095790B2 (ja) | 1991-01-22 | 2000-10-10 | 富士電機株式会社 | 静電チャック |
| JPH09151362A (ja) * | 1995-11-30 | 1997-06-10 | Honda Electron Co Ltd | 保護用積層粘着フィルム |
| JP3847855B2 (ja) * | 1996-07-31 | 2006-11-22 | 三島 満 | 抗菌、抗カビ、抗汚染性を有する多層剥離再生型保護シート |
| JP3805134B2 (ja) | 1999-05-25 | 2006-08-02 | 東陶機器株式会社 | 絶縁性基板吸着用静電チャック |
| JP2001035907A (ja) * | 1999-07-26 | 2001-02-09 | Ulvac Japan Ltd | 吸着装置 |
| KR20020046214A (ko) | 2000-12-11 | 2002-06-20 | 어드밴스드 세라믹스 인터내셔날 코포레이션 | 정전척 및 그 제조방법 |
| JP2003060020A (ja) * | 2001-06-07 | 2003-02-28 | Komatsu Ltd | 静電チャック装置 |
| JP2002357838A (ja) | 2001-05-31 | 2002-12-13 | Hitachi Industries Co Ltd | 基板貼り合わせ方法及びその装置 |
| JP4166449B2 (ja) * | 2001-07-30 | 2008-10-15 | 株式会社アルバック | 真空処理装置 |
| JP2003179128A (ja) | 2001-12-11 | 2003-06-27 | Ngk Spark Plug Co Ltd | 静電チャック |
| JP2003243493A (ja) | 2002-02-15 | 2003-08-29 | Taiheiyo Cement Corp | 双極型静電チャック |
| US7916447B2 (en) | 2003-07-08 | 2011-03-29 | Future Vision Inc. | Electrostatic chuck for substrate stage, electrode used for the chuck, and treating system having the chuck and electrode |
| DE112005000621B4 (de) | 2004-03-19 | 2019-01-31 | Creative Technology Corporation | Bipolare elektrostatische Haltevorrichtung |
| TWI267940B (en) * | 2004-06-28 | 2006-12-01 | Kyocera Corp | Electrostatic chuck |
| CN101326627B (zh) | 2005-12-06 | 2010-06-09 | 创意科技股份有限公司 | 静电卡盘用电极片以及静电卡盘 |
| TW200735254A (en) * | 2006-03-03 | 2007-09-16 | Ngk Insulators Ltd | Electrostatic chuck and producing method thereof |
| US20080062609A1 (en) | 2006-08-10 | 2008-03-13 | Shinji Himori | Electrostatic chuck device |
| JP5059450B2 (ja) * | 2007-03-06 | 2012-10-24 | 東京エレクトロン株式会社 | 基板載置台及び基板処理装置 |
| US7989022B2 (en) | 2007-07-20 | 2011-08-02 | Micron Technology, Inc. | Methods of processing substrates, electrostatic carriers for retaining substrates for processing, and assemblies comprising electrostatic carriers having substrates electrostatically bonded thereto |
| JP5112808B2 (ja) | 2007-10-15 | 2013-01-09 | 筑波精工株式会社 | 静電型補強装置 |
| JP2010034510A (ja) * | 2008-07-02 | 2010-02-12 | Murata Mfg Co Ltd | 静電チャック |
| US8730644B2 (en) | 2008-07-08 | 2014-05-20 | Creative Technology Corporation | Bipolar electrostatic chuck |
| JP2009088558A (ja) * | 2008-12-22 | 2009-04-23 | Canon Anelva Corp | 静電チャック装置 |
| KR101001454B1 (ko) | 2009-01-23 | 2010-12-14 | 삼성모바일디스플레이주식회사 | 정전척 및 이를 구비한 유기전계발광 소자의 제조장치 |
| WO2011137371A2 (en) * | 2010-04-30 | 2011-11-03 | Applied Materials, Inc. | Vertical inline cvd system |
| EP2649218B1 (en) * | 2010-12-08 | 2017-08-23 | Evatec AG | Apparatus and method for depositing a layer onto a substrate |
| US20120227886A1 (en) | 2011-03-10 | 2012-09-13 | Taipei Semiconductor Manufacturing Company, Ltd. | Substrate Assembly Carrier Using Electrostatic Force |
| JP5665679B2 (ja) | 2011-07-14 | 2015-02-04 | 住友重機械工業株式会社 | 不純物導入層形成装置及び静電チャック保護方法 |
| JP2013163837A (ja) * | 2012-02-09 | 2013-08-22 | Canon Tokki Corp | 蒸着装置並びに蒸着装置を用いた成膜方法 |
| JP2013197465A (ja) * | 2012-03-22 | 2013-09-30 | Toshiba Corp | 静電チャック装置および露光装置 |
| KR102047001B1 (ko) | 2012-10-16 | 2019-12-03 | 삼성디스플레이 주식회사 | 정전 척 |
| US9740111B2 (en) | 2014-05-16 | 2017-08-22 | Applied Materials, Inc. | Electrostatic carrier for handling substrates for processing |
| US10978334B2 (en) | 2014-09-02 | 2021-04-13 | Applied Materials, Inc. | Sealing structure for workpiece to substrate bonding in a processing chamber |
-
2015
- 2015-04-02 US US15/123,231 patent/US10096509B2/en not_active Expired - Fee Related
- 2015-04-02 CN CN201580024181.4A patent/CN106575720B/zh not_active Expired - Fee Related
- 2015-04-02 KR KR1020167034479A patent/KR20170002603A/ko unknown
- 2015-04-02 WO PCT/US2015/024147 patent/WO2015171226A1/en active Application Filing
- 2015-04-02 JP JP2016558294A patent/JP2017515301A/ja active Pending
- 2015-04-14 TW TW104111860A patent/TW201606902A/zh unknown
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