JP2017508867A - 横方向に構造形成した蛍光体層を製造するための方法およびそのような蛍光体層を備えたオプトエレクトロニクス半導体部品 - Google Patents
横方向に構造形成した蛍光体層を製造するための方法およびそのような蛍光体層を備えたオプトエレクトロニクス半導体部品 Download PDFInfo
- Publication number
- JP2017508867A JP2017508867A JP2016539048A JP2016539048A JP2017508867A JP 2017508867 A JP2017508867 A JP 2017508867A JP 2016539048 A JP2016539048 A JP 2016539048A JP 2016539048 A JP2016539048 A JP 2016539048A JP 2017508867 A JP2017508867 A JP 2017508867A
- Authority
- JP
- Japan
- Prior art keywords
- conductive layer
- layer
- light emitting
- carrier
- less
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 6
- 239000004065 semiconductor Substances 0.000 title claims description 32
- 230000005693 optoelectronics Effects 0.000 title claims description 12
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 title abstract 3
- 239000000463 material Substances 0.000 claims abstract description 158
- 238000005530 etching Methods 0.000 claims abstract description 26
- 239000011248 coating agent Substances 0.000 claims abstract description 12
- 238000000576 coating method Methods 0.000 claims abstract description 12
- 238000001962 electrophoresis Methods 0.000 claims abstract description 9
- 238000000034 method Methods 0.000 claims description 55
- 239000002245 particle Substances 0.000 claims description 30
- 239000011159 matrix material Substances 0.000 claims description 17
- 238000000059 patterning Methods 0.000 claims description 12
- 230000003287 optical effect Effects 0.000 claims description 10
- 239000000203 mixture Substances 0.000 claims description 7
- 229920001296 polysiloxane Polymers 0.000 claims description 7
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 5
- 238000000151 deposition Methods 0.000 claims description 5
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 4
- 229910052751 metal Inorganic materials 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 3
- 239000004593 Epoxy Substances 0.000 claims description 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 3
- 229910052782 aluminium Inorganic materials 0.000 claims description 3
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 3
- 229920000052 poly(p-xylylene) Polymers 0.000 claims description 3
- 229920001709 polysilazane Polymers 0.000 claims description 3
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 3
- 239000010936 titanium Substances 0.000 claims description 3
- 239000006229 carbon black Substances 0.000 claims description 2
- 229910002804 graphite Inorganic materials 0.000 claims description 2
- 239000010439 graphite Substances 0.000 claims description 2
- 229910052719 titanium Inorganic materials 0.000 claims description 2
- 229910052721 tungsten Inorganic materials 0.000 claims description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims 1
- 239000010410 layer Substances 0.000 description 188
- 229910052761 rare earth metal Inorganic materials 0.000 description 13
- 150000002910 rare earth metals Chemical class 0.000 description 13
- 230000005855 radiation Effects 0.000 description 7
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 6
- 238000000206 photolithography Methods 0.000 description 4
- 238000000926 separation method Methods 0.000 description 4
- 239000012790 adhesive layer Substances 0.000 description 3
- -1 alkaline earth metal sulfide Chemical class 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- 239000011787 zinc oxide Substances 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 2
- 229910003564 SiAlON Inorganic materials 0.000 description 2
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000003486 chemical etching Methods 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000012777 electrically insulating material Substances 0.000 description 2
- 230000001771 impaired effect Effects 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 150000003568 thioethers Chemical class 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 229910002601 GaN Inorganic materials 0.000 description 1
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 229910004283 SiO 4 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- GEIAQOFPUVMAGM-UHFFFAOYSA-N ZrO Inorganic materials [Zr]=O GEIAQOFPUVMAGM-UHFFFAOYSA-N 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 150000004645 aluminates Chemical class 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 239000002041 carbon nanotube Substances 0.000 description 1
- 229910021393 carbon nanotube Inorganic materials 0.000 description 1
- GTDCAOYDHVNFCP-UHFFFAOYSA-N chloro(trihydroxy)silane Chemical compound O[Si](O)(O)Cl GTDCAOYDHVNFCP-UHFFFAOYSA-N 0.000 description 1
- 239000011246 composite particle Substances 0.000 description 1
- 238000000748 compression moulding Methods 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- DXNVUKXMTZHOTP-UHFFFAOYSA-N dialuminum;dimagnesium;barium(2+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[O-2].[O-2].[Mg+2].[Mg+2].[Al+3].[Al+3].[Ba+2].[Ba+2] DXNVUKXMTZHOTP-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000009429 electrical wiring Methods 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000002223 garnet Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 239000001023 inorganic pigment Substances 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052605 nesosilicate Inorganic materials 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 150000004762 orthosilicates Chemical class 0.000 description 1
- SOQBVABWOPYFQZ-UHFFFAOYSA-N oxygen(2-);titanium(4+) Chemical group [O-2].[O-2].[Ti+4] SOQBVABWOPYFQZ-UHFFFAOYSA-N 0.000 description 1
- 229910001404 rare earth metal oxide Inorganic materials 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- 238000001721 transfer moulding Methods 0.000 description 1
- 229910000314 transition metal oxide Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000003631 wet chemical etching Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/50—Wavelength conversion elements
- H01L33/501—Wavelength conversion elements characterised by the materials, e.g. binder
- H01L33/502—Wavelength conversion materials
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
- C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/02—Local etching
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D13/00—Electrophoretic coating characterised by the process
- C25D13/02—Electrophoretic coating characterised by the process with inorganic material
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D13/00—Electrophoretic coating characterised by the process
- C25D13/12—Electrophoretic coating characterised by the process characterised by the article coated
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D13/00—Electrophoretic coating characterised by the process
- C25D13/22—Servicing or operating apparatus or multistep processes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/50—Wavelength conversion elements
- H01L33/501—Wavelength conversion elements characterised by the materials, e.g. binder
- H01L33/502—Wavelength conversion materials
- H01L33/504—Elements with two or more wavelength conversion materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2933/00—Details relating to devices covered by the group H01L33/00 but not provided for in its subgroups
- H01L2933/0008—Processes
- H01L2933/0033—Processes relating to semiconductor body packages
- H01L2933/0041—Processes relating to semiconductor body packages relating to wavelength conversion elements
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Electrochemistry (AREA)
- Mechanical Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Led Device Packages (AREA)
- Led Devices (AREA)
- Luminescent Compositions (AREA)
Abstract
Description
− キャリア上面上に第1の導電性層を有するキャリアを用意するステップと、
− 第1の導電性層上に絶縁層を、および絶縁層上に第2の導電性層を設けるステップと、
− 第2の導電性層上にエッチングマスクを設け、パターニングするステップと、
− 第2の導電性層および絶縁層をエッチングするステップであって、第1の導電性層が連続層として保たれる、エッチングするステップと、
− 第1の導電性層に電圧を印加して、第1の材料で第1の導電性層を電気泳動法でコーティングするステップと、
− 第2の導電性層に電圧を印加して、第2の材料で第2の導電性層を電気泳動法でコーティングするステップと
を含む。
Claims (13)
- 横方向にパターニングされた層、特に発光材料板(1)を製造するための方法であって、
キャリア上面(20)上に第1の導電性層(21)を有するキャリア(2)を用意するステップと、
前記第1の導電性層(21)上に絶縁層(23)を、および前記絶縁層(23)上に第2の導電性層(22)を設けるステップと、
前記第2の導電性層(22)上にエッチングマスク(3)を設け、かつパターニングするステップと、
前記第2の導電性層(22)および前記絶縁層(23)をエッチングするステップであり、前記第1の導電性層(21)は連続層として保たれる、エッチングするステップと、
前記第1の導電性層(21)に電圧を印加して、第1の材料(4)で前記第1の導電性層(21)を電気泳動法でコーティングするステップと、
前記第2の導電性層(22)に電圧を印加して、第2の材料(5)で前記第2の導電性層(22)を電気泳動法でコーティングするステップと、
を含む、方法。 - 前記発光材料板(1)が、前記横方向にパターニングされた層として製造され、
前記第1の材料(4)は、発光材料または発光材料混合物であり、
前記第2の材料(5)は、可視光を反射もしくは吸収する材料を含有するか、または前記材料であり、
前記エッチングするステップの後で、前記第2の導電性層(22)は、前記第1の導電性層(21)が、平面視においてフレーム状に囲まれた複数の領域に細分化されるように、平面視において格子を形成する、
請求項1に記載の方法。 - 前記第1の材料および前記第2の材料(4、5)は、それぞれ、粒子として堆積され、
前記第2の材料(5)の前記粒子の平均粒径は、前記第1の材料(4)の前記粒子の平均粒径の少なくとも3分の1未満である、
請求項1または2に記載の方法。 - 前記エッチングするステップの後で、前記第1の導電性層および前記第2の導電性層(21、22)は一体として、平面視で、前記キャリア上面(20)を完全に被覆する、
請求項1〜3のいずれか一項に記載の方法。 - 前記第2の導電性層(22)および前記絶縁層(23)は、前記第1の導電性層(21)に対して選択的に湿式化学エッチング可能である、
請求項1〜4のいずれか一項に記載の方法。 - 前記コーティングするステップの後で、前記横方向にパターニングされた層が単一の連続した板(1)であるように、マトリックス材料(6)が前記第1の材料および前記第2の材料(4、5)上に載置され、
前記マトリックス材料(6)は、シリコーン、シリコーン/エポキシハイブリッド材料、ポリシラザンおよび/もしくはパリレンを含有するか、または、シリコーン、シリコーン/エポキシハイブリッド材料、ポリシラザンおよび/もしくはパリレンからなる、
請求項1〜5のいずれか一項に記載の方法。 - 粒子状の第3の材料(60)が、前記マトリックス材料(6)に添加され、前記第3の材料(60)が、発光材料または発光材料混合物である、
請求項6に記載の方法。 - 前記キャリア(2)を用意する前記ステップは、前記キャリア上面(20)上に前記第1の導電性層(21)を堆積するステップを含み、前記キャリア(2)は、電気絶縁性である、
請求項1〜7のいずれか一項に記載の方法。 - 前記第1の導電性層(21)は、透明導電性酸化物を含み、前記第1の導電性層(21)の厚さは、50nm以上400nm以下であり、
前記絶縁層(23)は、酸化シリコンまたは窒化シリコンから形成され、前記絶縁層(23)の厚さは、150nm以上800nm以下であり、
前記第2の導電性層(21)は、Ti、W、Alおよび/またはCaを含む金属層を含み、前記第2の導電性層(21)の厚さは、50nm以上500nm以下であり、
前記第1の材料(4)は、発光材料であり、前記第1の材料(4)の平均粒径は、7μm以上13μm以下であり、
前記第2の材料(5)の平均粒径は、100nm以上500nm以下であり、前記第2の材料(5)は、酸化チタン、酸化シリコン、酸化アルミニウム、カーボンブラックまたはグラファイトであり、
完成後の前記発光材料板(1)の厚さは、20μm以上150μm以下である、
請求項1〜8のいずれか一項に記載の方法。 - 請求項1に記載の方法のステップが、記載された順番で実行される、
請求項1〜9のいずれか一項に記載の方法。 - 前記第1の材料および前記第2の材料(4、5)でコーティングするステップの後で、前記キャリア(2)は、製造された前記横方向にパターニングされた層(1)から取り除かれ、前記第1の導電性層(21)、前記第2の導電性層(22)および/または前記絶縁層(23)は、前記横方向にパターニングされた層(1)上に部分的にまたは完全に残る、
請求項1〜10のいずれか一項に記載の方法。 - 少なくとも1つの発光ダイオードチップ(7)と、
請求項1〜11のいずれか一項に記載の方法によって製造され、前記発光ダイオードチップ(7)上に設けられた少なくとも1つの前記発光材料板(1)と、を有し、
前記発光ダイオードチップ(7)は、複数の個別のピクセル(70)を含む、
オプトエレクトロニクス半導体部品(10)。 - 前記発光ダイオードチップ(7)の前記ピクセル(70)へのパターニングは、前記第1の材料(4)を有する1つの領域が正確に各ピクセル(70)に関係付けられ、かつ前記第2の材料(5)が隣接する前記ピクセル(70)間の光クロストークを低減するかまたは防止するように、前記第1の材料および前記第2の材料(4、5)を有する領域内の前記発光材料板(1)のパターニングであり、
隣接する前記ピクセル(70)間のピクセル間隔(D)が、平面視で、2μm以上30μm以下であり、前記第2の材料(5)を有する前記領域の幅は、2倍以下の許容誤差で前記ピクセル間隔(D)に等しく、
前記発光ダイオードチップ(7)は、単一の連続して成長した半導体層積層体(71)から製造されている、
請求項12に記載のオプトエレクトロニクス半導体部品(10)。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102014100542.2 | 2014-01-20 | ||
DE102014100542.2A DE102014100542A1 (de) | 2014-01-20 | 2014-01-20 | Verfahren zur Herstellung einer lateral strukturierten Schicht und optoelektronisches Halbleiterbauteil mit einer solchen Schicht |
PCT/EP2015/050976 WO2015107211A1 (de) | 2014-01-20 | 2015-01-20 | Verfahren zur herstellung einer lateral strukturierten phosphorschicht und optoelektronisches halbleiterbauteil mit einer solchen phosphorschicht |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2017508867A true JP2017508867A (ja) | 2017-03-30 |
JP6268295B2 JP6268295B2 (ja) | 2018-01-24 |
Family
ID=52354996
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016539048A Expired - Fee Related JP6268295B2 (ja) | 2014-01-20 | 2015-01-20 | 横方向に構造形成した蛍光体層を製造するための方法およびそのような蛍光体層を備えたオプトエレクトロニクス半導体部品 |
Country Status (6)
Country | Link |
---|---|
US (1) | US9698316B2 (ja) |
JP (1) | JP6268295B2 (ja) |
KR (1) | KR20160111383A (ja) |
CN (1) | CN106605013B (ja) |
DE (2) | DE102014100542A1 (ja) |
WO (1) | WO2015107211A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2023211083A1 (ko) * | 2022-04-28 | 2023-11-02 | 고려대학교 산학협력단 | 나노 입자가 적용된 led 로드 정렬 구조, 및 나노 입자가 적용된 led 로드 정렬 구조의 제조 방법 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10497838B2 (en) * | 2018-04-12 | 2019-12-03 | Osram Opto Semiconductors Gmbh | Method for producing an optic device, optic device and assembly comprising such an optic device |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51118959A (en) * | 1975-04-11 | 1976-10-19 | Ise Electronics Corp | Manufacturing method of fluorescent display tube |
US6120339A (en) * | 1998-10-26 | 2000-09-19 | Micron Technology, Inc. | Methods of fabricating flat panel evacuated displays |
JP2001110303A (ja) * | 1999-08-12 | 2001-04-20 | Samsung Sdi Co Ltd | 電気泳動法を利用したカーボンナノチューブフィールドエミッタの製造方法 |
JP2001236026A (ja) * | 2000-02-21 | 2001-08-31 | Ricoh Co Ltd | 表示用蛍光体、表示用蛍光体の製造方法、および該表示用蛍光体を使用した電界放出表示素子 |
JP2002243929A (ja) * | 2001-02-16 | 2002-08-28 | Fuji Xerox Co Ltd | 光電着法および光触媒法によるカラーフィルターの製造方法、カラーフィルター、液晶表示装置およびカラーフィルターの製造装置 |
JP2002313565A (ja) * | 2001-04-17 | 2002-10-25 | Sharp Corp | 発光表示素子の製造方法 |
JP2005519201A (ja) * | 2001-11-30 | 2005-06-30 | ザ ユニバーシティ オブ ノース カロライナ アット チャペル ヒル | ナノ構造材料のための堆積方法 |
JP2007095627A (ja) * | 2005-09-30 | 2007-04-12 | Dainippon Printing Co Ltd | スクリーン版とこれを用いた正孔注入層の形成方法および有機発光デバイス |
JP2011049199A (ja) * | 2009-08-25 | 2011-03-10 | Sumitomo Chemical Co Ltd | 有機エレクトロルミネッセンス素子 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5354695A (en) * | 1992-04-08 | 1994-10-11 | Leedy Glenn J | Membrane dielectric isolation IC fabrication |
US6288561B1 (en) * | 1988-05-16 | 2001-09-11 | Elm Technology Corporation | Method and apparatus for probing, testing, burn-in, repairing and programming of integrated circuits in a closed environment using a single apparatus |
JP2633680B2 (ja) * | 1989-03-29 | 1997-07-23 | 株式会社リコー | 導体パターン接続体とその接続方法 |
US6642652B2 (en) | 2001-06-11 | 2003-11-04 | Lumileds Lighting U.S., Llc | Phosphor-converted light emitting device |
JP2005197190A (ja) | 2004-01-09 | 2005-07-21 | Seiko Epson Corp | 回路基板及び電気光学装置の製造方法、電気光学装置、及び電子機器 |
EP1933393A1 (en) * | 2006-12-13 | 2008-06-18 | Samsung SDI Co., Ltd. | Method of manufacturing a substrate for an electronic device |
DE102007043877A1 (de) * | 2007-06-29 | 2009-01-08 | Osram Opto Semiconductors Gmbh | Verfahren zur Herstellung von optoelektronischen Bauelementen und optoelektronisches Bauelement |
US7807484B2 (en) * | 2008-10-15 | 2010-10-05 | Visera Technologies Company Limited | Light-emitting diode device and method for fabricating the same |
DE102008062933B4 (de) | 2008-12-23 | 2021-05-12 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Optoelektronische Projektionsvorrichtung |
US8642363B2 (en) * | 2009-12-09 | 2014-02-04 | Nano And Advanced Materials Institute Limited | Monolithic full-color LED micro-display on an active matrix panel manufactured using flip-chip technology |
CN102468231B (zh) * | 2010-11-10 | 2014-03-26 | 京东方科技集团股份有限公司 | 阵列基板及其制造方法和有源显示器 |
US9599293B2 (en) | 2012-04-05 | 2017-03-21 | Koninklijke Philips N.V. | Full spectrum light emitting arrangement |
DE102012208287A1 (de) * | 2012-05-16 | 2013-11-21 | Osram Gmbh | Verfahren zur herstellung eines optischen elements |
DE102012105691B4 (de) | 2012-06-28 | 2018-10-25 | Osram Opto Semiconductors Gmbh | Verfahren zur Abscheidung einer elektrophoretisch abgeschiedenen partikulären Schicht, strahlungsemittierendes Halbleiterbauelement und optisches Element |
DE102012106859B4 (de) | 2012-07-27 | 2019-01-03 | Osram Opto Semiconductors Gmbh | Verfahren zur Herstellung eines mehrfarbigen LED-Displays |
DE102012109460B4 (de) | 2012-10-04 | 2024-03-07 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Verfahren zur Herstellung eines Leuchtdioden-Displays und Leuchtdioden-Display |
-
2014
- 2014-01-20 DE DE102014100542.2A patent/DE102014100542A1/de not_active Withdrawn
-
2015
- 2015-01-20 JP JP2016539048A patent/JP6268295B2/ja not_active Expired - Fee Related
- 2015-01-20 US US15/100,062 patent/US9698316B2/en active Active
- 2015-01-20 KR KR1020167019146A patent/KR20160111383A/ko not_active Application Discontinuation
- 2015-01-20 WO PCT/EP2015/050976 patent/WO2015107211A1/de active Application Filing
- 2015-01-20 CN CN201580005166.5A patent/CN106605013B/zh not_active Expired - Fee Related
- 2015-01-20 DE DE112015000428.9T patent/DE112015000428A5/de not_active Withdrawn
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51118959A (en) * | 1975-04-11 | 1976-10-19 | Ise Electronics Corp | Manufacturing method of fluorescent display tube |
US6120339A (en) * | 1998-10-26 | 2000-09-19 | Micron Technology, Inc. | Methods of fabricating flat panel evacuated displays |
JP2001110303A (ja) * | 1999-08-12 | 2001-04-20 | Samsung Sdi Co Ltd | 電気泳動法を利用したカーボンナノチューブフィールドエミッタの製造方法 |
US6616497B1 (en) * | 1999-08-12 | 2003-09-09 | Samsung Sdi Co., Ltd. | Method of manufacturing carbon nanotube field emitter by electrophoretic deposition |
JP2001236026A (ja) * | 2000-02-21 | 2001-08-31 | Ricoh Co Ltd | 表示用蛍光体、表示用蛍光体の製造方法、および該表示用蛍光体を使用した電界放出表示素子 |
JP2002243929A (ja) * | 2001-02-16 | 2002-08-28 | Fuji Xerox Co Ltd | 光電着法および光触媒法によるカラーフィルターの製造方法、カラーフィルター、液晶表示装置およびカラーフィルターの製造装置 |
JP2002313565A (ja) * | 2001-04-17 | 2002-10-25 | Sharp Corp | 発光表示素子の製造方法 |
JP2005519201A (ja) * | 2001-11-30 | 2005-06-30 | ザ ユニバーシティ オブ ノース カロライナ アット チャペル ヒル | ナノ構造材料のための堆積方法 |
JP2007095627A (ja) * | 2005-09-30 | 2007-04-12 | Dainippon Printing Co Ltd | スクリーン版とこれを用いた正孔注入層の形成方法および有機発光デバイス |
JP2011049199A (ja) * | 2009-08-25 | 2011-03-10 | Sumitomo Chemical Co Ltd | 有機エレクトロルミネッセンス素子 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2023211083A1 (ko) * | 2022-04-28 | 2023-11-02 | 고려대학교 산학협력단 | 나노 입자가 적용된 led 로드 정렬 구조, 및 나노 입자가 적용된 led 로드 정렬 구조의 제조 방법 |
Also Published As
Publication number | Publication date |
---|---|
CN106605013B (zh) | 2019-03-22 |
KR20160111383A (ko) | 2016-09-26 |
DE102014100542A1 (de) | 2015-07-23 |
WO2015107211A1 (de) | 2015-07-23 |
US9698316B2 (en) | 2017-07-04 |
CN106605013A (zh) | 2017-04-26 |
JP6268295B2 (ja) | 2018-01-24 |
US20170040500A1 (en) | 2017-02-09 |
DE112015000428A5 (de) | 2016-10-06 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP7136834B2 (ja) | 小型光源を有する波長変換発光デバイス | |
TWI691103B (zh) | 光源裝置及發光裝置 | |
KR102422362B1 (ko) | 향상된 콘트라스트와 광도를 가지는 화소들을 구비하는 광전자장치 | |
US9947846B2 (en) | Light emitting device having a reflecting member and method of manufacturing the same | |
TWI754711B (zh) | 包括光阻的光致發光墊的光電裝置的製造方法 | |
US8698386B2 (en) | Wavelength conversion structure, manufacturing methods thereof, and lighting emitting device including the wavelength conversion structure | |
KR102422146B1 (ko) | 광전자 반도체 컴포넌트들을 제조하기 위한 방법 및 광전자 반도체 컴포넌트 | |
US10283685B2 (en) | Light emitting device and method of fabricating the same | |
CN111684591A (zh) | 光电半导体芯片、光电器件及其制造方法 | |
TW201318230A (zh) | 半導體發光裝置及其製造方法 | |
JP6511809B2 (ja) | 発光装置及びその実装方法、並びに光源装置の製造方法 | |
TWI546988B (zh) | 製造發光二極體之方法 | |
JP6268295B2 (ja) | 横方向に構造形成した蛍光体層を製造するための方法およびそのような蛍光体層を備えたオプトエレクトロニクス半導体部品 | |
KR101765183B1 (ko) | 발광장치용 광추출층 및 그 형성방법 | |
TW201242105A (en) | Semiconductor light emitting device wafer and method for manufacturing semiconductor light emitting device | |
EP2642539A1 (en) | Light emitting device and method for manufacturing the same | |
JP6045779B2 (ja) | 波長変換構造及びその製造方法並びに該波長変換構造を含む発光装置 | |
KR102421288B1 (ko) | 광전자 반도체 부품을 제조하기 위한 방법, 및 광전자 반도체 부품 | |
JP2022007638A (ja) | 成形体、発光装置及び成形体の製造方法 | |
KR20130014950A (ko) | 반도체 발광소자 제조방법 | |
KR20130110381A (ko) | 파장변환층을 구비한 반도체 발광소자 제조방법 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20170724 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20170801 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20171003 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20171205 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6268295 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
LAPS | Cancellation because of no payment of annual fees |