JP6045779B2 - 波長変換構造及びその製造方法並びに該波長変換構造を含む発光装置 - Google Patents
波長変換構造及びその製造方法並びに該波長変換構造を含む発光装置 Download PDFInfo
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- JP6045779B2 JP6045779B2 JP2011193419A JP2011193419A JP6045779B2 JP 6045779 B2 JP6045779 B2 JP 6045779B2 JP 2011193419 A JP2011193419 A JP 2011193419A JP 2011193419 A JP2011193419 A JP 2011193419A JP 6045779 B2 JP6045779 B2 JP 6045779B2
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- 238000006243 chemical reaction Methods 0.000 title claims description 43
- 238000004519 manufacturing process Methods 0.000 title description 8
- 239000000843 powder Substances 0.000 claims description 85
- 239000000463 material Substances 0.000 claims description 84
- 239000000758 substrate Substances 0.000 claims description 21
- 150000002484 inorganic compounds Chemical class 0.000 claims description 14
- 229910010272 inorganic material Inorganic materials 0.000 claims description 14
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 18
- 239000002245 particle Substances 0.000 description 17
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 10
- 238000000034 method Methods 0.000 description 10
- 239000011787 zinc oxide Substances 0.000 description 8
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 6
- 238000000151 deposition Methods 0.000 description 6
- 238000007747 plating Methods 0.000 description 6
- 239000000741 silica gel Substances 0.000 description 6
- 229910002027 silica gel Inorganic materials 0.000 description 6
- 238000000605 extraction Methods 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 239000000919 ceramic Substances 0.000 description 3
- 238000001962 electrophoresis Methods 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 229910010413 TiO 2 Inorganic materials 0.000 description 2
- 238000000149 argon plasma sintering Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- JAONJTDQXUSBGG-UHFFFAOYSA-N dialuminum;dizinc;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Al+3].[Al+3].[Zn+2].[Zn+2] JAONJTDQXUSBGG-UHFFFAOYSA-N 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 2
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 239000011253 protective coating Substances 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 239000004408 titanium dioxide Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- 239000004820 Pressure-sensitive adhesive Substances 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- JNDMLEXHDPKVFC-UHFFFAOYSA-N aluminum;oxygen(2-);yttrium(3+) Chemical compound [O-2].[O-2].[O-2].[Al+3].[Y+3] JNDMLEXHDPKVFC-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
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- 229910052733 gallium Inorganic materials 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
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- 150000002894 organic compounds Chemical class 0.000 description 1
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- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 229910019901 yttrium aluminum garnet Inorganic materials 0.000 description 1
Description
101 導電基板
102 蛍光粉層
103 第一材料層
104 第二材料層
105 第一領域
106 第二領域
110 発光ダイオード
111 パッケージ基板
112 筐体
113 導光層
20 発光装置
Claims (8)
- 波長変換構造であって、
第一領域と第二領域とを含む蛍光粉層であって、前記第二領域は前記第一領域の上に位置し、且つ前記第一領域及び前記第二領域は隙間をそれぞれ有する蛍光粉層と、
前記蛍光粉層の前記第一領域の隙間に形成される第一材料層と、
前記蛍光粉層の前記第二領域の隙間に形成される第二材料層と、を含み、
前記第一材料層の屈折率は、前記第二材料層の屈折率より少なくとも0.2大きい、波長変換構造。 - 前記第一材料層の一方側に位置する透明導電基板をさらに含む、請求項1に記載の波長変換構造。
- 前記第一材料層は無機化合物を含み、及び/又は、前記第二材料層は無機化合物を含む、請求項1に記載の波長変換構造。
- 前記第一材料層の屈折率は実質的に1.8〜2.0であり、及び/又は、前記第二材料層の屈折率は実質的に1.3〜1.6である、請求項1に記載の波長変換構造。
- 前記第一領域の厚みは前記蛍光粉層の厚みの0.5〜0.9倍である、請求項1に記載の波長変換構造。
- 前記第二材料層の上表面は前記蛍光粉層の頂面より高い、請求項1に記載の波長変換構造。
- 前記透明導電基板の表面は曲面又は折れ曲がり面である、請求項2に記載の波長変換構造。
- 前記蛍光粉層の屈折率と前記第一材料層の屈折率との差は0.3より小さい、請求項1に記載の波長変換構造。
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JP2011193419A JP6045779B2 (ja) | 2011-09-06 | 2011-09-06 | 波長変換構造及びその製造方法並びに該波長変換構造を含む発光装置 |
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JP2011193419A JP6045779B2 (ja) | 2011-09-06 | 2011-09-06 | 波長変換構造及びその製造方法並びに該波長変換構造を含む発光装置 |
Publications (3)
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JP2013053257A JP2013053257A (ja) | 2013-03-21 |
JP2013053257A5 JP2013053257A5 (ja) | 2014-10-23 |
JP6045779B2 true JP6045779B2 (ja) | 2016-12-14 |
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JP5580866B2 (ja) * | 2012-10-23 | 2014-08-27 | 浜松ホトニクス株式会社 | 紫外光発生用ターゲット、電子線励起紫外光源、及び紫外光発生用ターゲットの製造方法 |
JP6029926B2 (ja) * | 2012-10-23 | 2016-11-24 | 浜松ホトニクス株式会社 | 紫外光発生用ターゲット、電子線励起紫外光源、及び紫外光発生用ターゲットの製造方法 |
JP6204746B2 (ja) * | 2013-08-20 | 2017-09-27 | 株式会社トクヤマ | 中性子シンチレーター及び中性子検出器 |
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DE602005010122D1 (de) * | 2005-01-04 | 2008-11-13 | Philips Intellectual Property | Wellenlängenkonversionsschichten mit eingebetteten kristalliten |
JP5614675B2 (ja) * | 2010-02-16 | 2014-10-29 | 独立行政法人物質・材料研究機構 | 波長変換部材の製造方法 |
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