JP2017501553A5 - - Google Patents

Download PDF

Info

Publication number
JP2017501553A5
JP2017501553A5 JP2016544160A JP2016544160A JP2017501553A5 JP 2017501553 A5 JP2017501553 A5 JP 2017501553A5 JP 2016544160 A JP2016544160 A JP 2016544160A JP 2016544160 A JP2016544160 A JP 2016544160A JP 2017501553 A5 JP2017501553 A5 JP 2017501553A5
Authority
JP
Japan
Prior art keywords
cathode
beamlet
electron
structure according
focusing electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2016544160A
Other languages
English (en)
Japanese (ja)
Other versions
JP6590811B2 (ja
JP2017501553A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/EP2014/078993 external-priority patent/WO2015101537A1/en
Publication of JP2017501553A publication Critical patent/JP2017501553A/ja
Publication of JP2017501553A5 publication Critical patent/JP2017501553A5/ja
Priority to JP2019168023A priority Critical patent/JP6929910B2/ja
Application granted granted Critical
Publication of JP6590811B2 publication Critical patent/JP6590811B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2016544160A 2013-12-30 2014-12-22 陰極構成体、電子銃、及びこのような電子銃を有するリソグラフィシステム Active JP6590811B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2019168023A JP6929910B2 (ja) 2013-12-30 2019-09-17 陰極構成体、電子銃、及びこのような電子銃を有するリソグラフィシステム

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201361921546P 2013-12-30 2013-12-30
US61/921,546 2013-12-30
PCT/EP2014/078993 WO2015101537A1 (en) 2013-12-30 2014-12-22 Cathode arrangement, electron gun, and lithography system comprising such electron gun

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2019168023A Division JP6929910B2 (ja) 2013-12-30 2019-09-17 陰極構成体、電子銃、及びこのような電子銃を有するリソグラフィシステム

Publications (3)

Publication Number Publication Date
JP2017501553A JP2017501553A (ja) 2017-01-12
JP2017501553A5 true JP2017501553A5 (enExample) 2018-02-08
JP6590811B2 JP6590811B2 (ja) 2019-10-16

Family

ID=52146507

Family Applications (4)

Application Number Title Priority Date Filing Date
JP2016544063A Active JP6208371B2 (ja) 2013-12-30 2014-12-22 陰極構成体、電子銃、及びこのような電子銃を有するリソグラフィシステム
JP2016544160A Active JP6590811B2 (ja) 2013-12-30 2014-12-22 陰極構成体、電子銃、及びこのような電子銃を有するリソグラフィシステム
JP2017171156A Active JP6462805B2 (ja) 2013-12-30 2017-09-06 陰極構成体、電子銃、及びこのような電子銃を有するリソグラフィシステム
JP2019168023A Active JP6929910B2 (ja) 2013-12-30 2019-09-17 陰極構成体、電子銃、及びこのような電子銃を有するリソグラフィシステム

Family Applications Before (1)

Application Number Title Priority Date Filing Date
JP2016544063A Active JP6208371B2 (ja) 2013-12-30 2014-12-22 陰極構成体、電子銃、及びこのような電子銃を有するリソグラフィシステム

Family Applications After (2)

Application Number Title Priority Date Filing Date
JP2017171156A Active JP6462805B2 (ja) 2013-12-30 2017-09-06 陰極構成体、電子銃、及びこのような電子銃を有するリソグラフィシステム
JP2019168023A Active JP6929910B2 (ja) 2013-12-30 2019-09-17 陰極構成体、電子銃、及びこのような電子銃を有するリソグラフィシステム

Country Status (9)

Country Link
US (3) US9455112B2 (enExample)
EP (2) EP3090438B1 (enExample)
JP (4) JP6208371B2 (enExample)
KR (2) KR102359077B1 (enExample)
CN (3) CN105874555B (enExample)
NL (2) NL2014030B1 (enExample)
RU (1) RU2689391C2 (enExample)
TW (2) TWI608511B (enExample)
WO (2) WO2015101538A1 (enExample)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102359077B1 (ko) 2013-12-30 2022-02-07 에이에스엠엘 네델란즈 비.브이. 캐소드 어레인지먼트, 전자총, 및 그런 전자총을 포함하는 리소그래피 시스템
US10529529B2 (en) * 2016-04-20 2020-01-07 Moxtek, Inc. Electron-beam spot optimization
US10366859B2 (en) * 2016-08-24 2019-07-30 Varian Medical Systems, Inc. Electromagnetic interference containment for accelerator systems
UA113827C2 (xx) * 2016-09-07 2017-03-10 Аксіальна електронна гармата
US10535499B2 (en) * 2017-11-03 2020-01-14 Varian Semiconductor Equipment Associates, Inc. Varied component density for thermal isolation
JP6396618B1 (ja) * 2018-04-03 2018-09-26 グローテクノロジー株式会社 グロー放電システム及びこれを用いたグロー放電質量分析装置
CN111048373B (zh) * 2018-10-12 2021-04-27 中国电子科技集团公司第三十八研究所 一种电子源再生方法
DE112019006988B4 (de) * 2019-04-18 2025-07-24 Hitachi High-Tech Corporation Elektronenquelle und mit einem Strahl geladener Teilchen arbeitende Vorrichtung
CN118180416A (zh) * 2019-09-23 2024-06-14 弗里曼特有限公司 电子枪阴极技术
US10923307B1 (en) * 2020-04-13 2021-02-16 Hamamatsu Photonics K.K. Electron beam generator
US11244800B2 (en) * 2020-06-18 2022-02-08 Axcelis Technologies, Inc. Stepped indirectly heated cathode with improved shielding
JP7554100B2 (ja) * 2020-11-19 2024-09-19 株式会社ニューフレアテクノロジー 電子放出源の動作制御方法、電子ビーム描画方法、及び電子ビーム描画装置
JP7549803B2 (ja) * 2021-02-09 2024-09-12 日新イオン機器株式会社 電子源およびイオン源
US20230154720A1 (en) * 2021-11-16 2023-05-18 Nuflare Technology, Inc. Method for estimating cathode lifetime of electron gun, and electron beam writing apparatus
CN114284121B (zh) * 2021-12-24 2023-09-19 中国科学院空天信息创新研究院 用于行波管的电子枪及其制备方法
JP7752074B2 (ja) * 2022-02-25 2025-10-09 株式会社Ihi ヒートシールド
US11961696B1 (en) * 2022-10-28 2024-04-16 Ion Technology Solutions, Llc Ion source cathode
JP2024090094A (ja) * 2022-12-22 2024-07-04 株式会社日立ハイテク 荷電粒子銃、及び荷電粒子ビーム装置

Family Cites Families (71)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1201138A (en) * 1915-05-12 1916-10-10 Wagner Mfg Company Griddle.
US2983842A (en) * 1959-06-23 1961-05-09 Zenith Radio Corp Electrode system
US3040205A (en) * 1960-05-31 1962-06-19 Harold R Walker Electrostatic vidicon
US3175115A (en) 1960-08-25 1965-03-23 Sylvania Electric Prod Cathode assembly
US3154711A (en) * 1961-06-19 1964-10-27 Gen Electric Electron beam focusing by means of contact differences of potential
US3157308A (en) 1961-09-05 1964-11-17 Clark Mfg Co J L Canister type container and method of making the same
US3159408A (en) 1961-10-05 1964-12-01 Grace W R & Co Chuck
US3154171A (en) 1962-04-02 1964-10-27 Vicon Instr Company Noise suppressing filter for microphone
US3227906A (en) * 1962-05-02 1966-01-04 Eitel Mccullough Inc Cathode support and heat shielding structure for electron gun
DE1514490A1 (de) 1965-06-30 1969-06-26 Siemens Ag Elektronenstrahlerzeugungssystem fuer elektrische Entladungsgefaesse
NL6513665A (enExample) 1965-10-22 1967-04-24
US3462629A (en) 1966-05-09 1969-08-19 Stromberg Carlson Corp Self-aligning electron gun construction
US3500110A (en) * 1967-08-23 1970-03-10 Raytheon Co Noncurrent intercepting electron beam control element
US3573533A (en) 1968-11-12 1971-04-06 Hughes Aircraft Co Gun-supporting cylinder centered in art neck by springs connected internally of cylinder
US3594885A (en) 1969-06-16 1971-07-27 Varian Associates Method for fabricating a dimpled concave dispenser cathode incorporating a grid
USRE30082E (en) 1972-08-30 1979-08-21 Picker Corporation X-ray tube having focusing cup with non-emitting coating
JPS5242591B2 (enExample) 1972-12-08 1977-10-25
JPS5533719A (en) * 1978-08-31 1980-03-10 Toshiba Corp Electron gun
US4254357A (en) * 1979-09-14 1981-03-03 The United States Of America As Represented By The Secretary Of The Navy Multi-arrayed micro-patch emitter with integral control grid
US4354357A (en) * 1979-11-05 1982-10-19 Hofstetter Robert W Conveyor system with cooling means
US4379979A (en) * 1981-02-06 1983-04-12 The United States Of America As Represented By The Secretary Of The Navy Controlled porosity sheet for thermionic dispenser cathode and method of manufacture
JPS5842141A (ja) * 1981-09-08 1983-03-11 Nec Corp ピアス形電子銃
JPS5851438A (ja) * 1981-09-22 1983-03-26 Nippon Telegr & Teleph Corp <Ntt> 電子線源
DE3407434A1 (de) 1984-02-29 1985-08-29 Siemens AG, 1000 Berlin und 8000 München Strahlerzeugersystem fuer elektronenroehren, insbesondere wanderfeldroehren
US4524308A (en) 1984-06-01 1985-06-18 Sony Corporation Circuits for accomplishing electron beam convergence in color cathode ray tubes
JPH01176641A (ja) * 1987-12-29 1989-07-13 Matsushita Electron Corp 電子銃
US4994709A (en) * 1989-03-22 1991-02-19 Varian Associates, Inc. Method for making a cathader with integral shadow grid
US4954745A (en) * 1989-03-22 1990-09-04 Tektronix, Inc. Cathode structure
US5218263A (en) * 1990-09-06 1993-06-08 Ceradyne, Inc. High thermal efficiency dispenser-cathode and method of manufacture therefor
US5293410A (en) 1991-11-27 1994-03-08 Schlumberger Technology Corporation Neutron generator
AU6449994A (en) 1993-04-30 1994-11-21 Board Of Regents, The University Of Texas System Megavoltage scanning imager and method for its use
JP3341367B2 (ja) * 1993-06-25 2002-11-05 ソニー株式会社 電子銃カソード構造体
JP3264775B2 (ja) * 1994-06-29 2002-03-11 電気化学工業株式会社 熱電界放射電子銃
JP2787899B2 (ja) * 1995-03-20 1998-08-20 日本電気株式会社 冷陰極およびこれを用いた電子銃とマイクロ波管
US5623183A (en) * 1995-03-22 1997-04-22 Litton Systems, Inc. Diverging beam electron gun for a toxic remediation device with a dome-shaped focusing electrode
EP0766405A1 (en) 1995-09-29 1997-04-02 STMicroelectronics S.r.l. Successive approximation register without redundancy
US5814939A (en) * 1996-02-12 1998-09-29 Chu; Kwo R. Mechanically tunable magnetron injection gun (MIG)
JPH10255679A (ja) * 1997-03-12 1998-09-25 Sony Corp 電子銃カソード構造体
US6455990B1 (en) * 1998-12-11 2002-09-24 United Technologies Corporation Apparatus for an electron gun employing a thermionic electron source
US6196889B1 (en) * 1998-12-11 2001-03-06 United Technologies Corporation Method and apparatus for use an electron gun employing a thermionic source of electrons
US6229876B1 (en) * 1999-07-29 2001-05-08 Kevex X-Ray, Inc. X-ray tube
WO2001039243A1 (en) * 1999-11-23 2001-05-31 Ion Diagnostics, Inc. Electron optics for multi-beam electron beam lithography tool
FR2833750A1 (fr) 2001-12-19 2003-06-20 Thomson Licensing Sa Canon a electrons pour tube a vide
DE10218913B4 (de) * 2002-04-27 2005-05-04 Bruker Daltonik Gmbh Vorrichtung und Verfahren zur Bewegung einer Elektronenquelle in einem Magnetfeld
JP3996442B2 (ja) * 2002-05-27 2007-10-24 Necマイクロ波管株式会社 電子銃
US7233101B2 (en) * 2002-12-31 2007-06-19 Samsung Electronics Co., Ltd. Substrate-supported array having steerable nanowires elements use in electron emitting devices
US6958804B2 (en) 2002-10-25 2005-10-25 Mapper Lithography Ip B.V. Lithography system
CN101414126B (zh) 2002-10-30 2012-02-15 迈普尔平版印刷Ip有限公司 电子束曝光系统
US6891321B2 (en) * 2002-11-12 2005-05-10 Ge Medical Systems Global Technology Company, Llc Oil-free electron source having cathode and anode members adjustable with five degrees of freedom
US6952466B2 (en) * 2002-11-12 2005-10-04 Ge Medical Systems Global Technology Company, Llc Oil-free electron source for an EBT scanner
EP2267747B1 (en) * 2003-02-14 2014-05-14 Mapper Lithography Ip B.V. Lithography system comprising dispenser cathode
KR101068607B1 (ko) 2003-03-10 2011-09-30 마퍼 리쏘그라피 아이피 비.브이. 복수 개의 빔렛 발생 장치
EP1627412B1 (en) 2003-05-28 2007-04-04 Mapper Lithography Ip B.V. Charged particle beamlet exposure system
JP4298399B2 (ja) * 2003-06-26 2009-07-15 キヤノン株式会社 電子線装置及び該電子線装置を用いた電子線描画装置
JP4664293B2 (ja) 2003-07-30 2011-04-06 マッパー・リソグラフィー・アイピー・ビー.ブイ. 変調器回路
JP4349964B2 (ja) * 2003-09-10 2009-10-21 株式会社日立ハイテクノロジーズ 小型電子銃
JP2006012663A (ja) 2004-06-28 2006-01-12 Hitachi Displays Ltd 陰極線管
JP4134000B2 (ja) * 2004-10-28 2008-08-13 Necマイクロ波管株式会社 電子銃
JP2006221983A (ja) * 2005-02-10 2006-08-24 Nuflare Technology Inc 荷電粒子発生装置と荷電粒子発生装置用エミッタ温度決定方法
US7709815B2 (en) 2005-09-16 2010-05-04 Mapper Lithography Ip B.V. Lithography system and projection method
US8159118B2 (en) 2005-11-02 2012-04-17 United Technologies Corporation Electron gun
JP5065903B2 (ja) 2005-11-08 2012-11-07 株式会社アドバンテスト 露光方法
RU2321096C1 (ru) * 2006-08-21 2008-03-27 Федеральное государственное унитарное предприятие "Научно-производственное предприятие "Исток" (ФГУП "НПП "Исток") Катодный узел для электронной пушки с протяженным электронным потоком
US20090108192A1 (en) * 2007-10-25 2009-04-30 Schulumberger Technology Corporation Tritium-Tritium Neutron Generator Logging Tool
JP2009187767A (ja) * 2008-02-06 2009-08-20 Sumitomo Electric Ind Ltd 電子源構造体及び電子源構造体駆動装置
JP2009205904A (ja) * 2008-02-27 2009-09-10 Hitachi High-Technologies Corp 冷陰極型電界放出電子銃及びそれを用いた電子線装置
JP5005087B2 (ja) * 2008-03-04 2012-08-22 パナソニック株式会社 マトリックス型冷陰極電子源装置
WO2010070837A1 (ja) * 2008-12-16 2010-06-24 株式会社日立ハイテクノロジーズ 電子線装置およびそれを用いた電子線応用装置
NL2010797C2 (en) * 2012-05-14 2014-08-21 Mapper Lithography Ip Bv Charged particle lithography system and beam generator.
KR102359077B1 (ko) 2013-12-30 2022-02-07 에이에스엠엘 네델란즈 비.브이. 캐소드 어레인지먼트, 전자총, 및 그런 전자총을 포함하는 리소그래피 시스템
US10168208B2 (en) 2015-04-03 2019-01-01 Hitachi High-Technologies Corporation Light amount detection device, immune analyzing apparatus and charged particle beam apparatus that each use the light amount detection device

Similar Documents

Publication Publication Date Title
JP2017501553A5 (enExample)
RU2016131081A (ru) Катодное устройство, электронная пушка и установка литографии, содержащая такую электронную пушку
JP2017502469A5 (enExample)
WO2008120412A1 (ja) 電子銃及び電子ビーム露光装置
WO2013184213A3 (en) A distributed, field emission-based x-ray source for phase contrast imaging
JP5540033B2 (ja) X線管
JP2015516690A5 (enExample)
JP2012252831A5 (ja) X線発生管及び、x線発生装置
US9099280B2 (en) X-ray tube and method of controlling X-ray focal spot using the same
JP2016103451A5 (enExample)
RU2016102389A (ru) Источник электронов, источник рентгеновского излучения и устройство, в котором используется источник рентгеновского излучения
WO2019157386A3 (en) Monochromatic x-ray imaging systems and methods
JP2016511924A5 (enExample)
WO2012119009A3 (en) Electron beam source system and method
IL273564B1 (en) Device for using charged particle beams
JP2014154499A5 (enExample)
WO2012047914A3 (en) Grid providing beamlet steering
WO2013175232A3 (en) Exposure device for photographic media
JP5370967B2 (ja) X線管
JP2017135082A5 (ja) 電子銃、x線発生管、x線発生装置およびx線撮影システム
DE602004016320D1 (de) Fluoreszens-röntgenquelle
WO2012139872A3 (de) Elektronenquelle zur erzeugung eines elektronenstrahls sowie röntgenquelle zur erzeugung von röntgenstrahlung
JP2017168216A5 (enExample)
KR20160061247A (ko) 전계방출 장치
US2647220A (en) Electron tube structure for the production of annular beams of electrons