JP2017220410A5 - - Google Patents
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- Publication number
- JP2017220410A5 JP2017220410A5 JP2016115945A JP2016115945A JP2017220410A5 JP 2017220410 A5 JP2017220410 A5 JP 2017220410A5 JP 2016115945 A JP2016115945 A JP 2016115945A JP 2016115945 A JP2016115945 A JP 2016115945A JP 2017220410 A5 JP2017220410 A5 JP 2017220410A5
- Authority
- JP
- Japan
- Prior art keywords
- transfer
- chamber
- substrate
- processed
- transfer machine
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims 42
- 239000012044 organic layer Substances 0.000 claims 15
- 238000004519 manufacturing process Methods 0.000 claims 14
- 230000032258 transport Effects 0.000 claims 11
- 239000010410 layer Substances 0.000 claims 7
- 238000000034 method Methods 0.000 claims 6
- 230000005525 hole transport Effects 0.000 claims 3
- 230000015572 biosynthetic process Effects 0.000 claims 2
- 238000000605 extraction Methods 0.000 claims 1
- 230000009049 secondary transport Effects 0.000 claims 1
Priority Applications (8)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016115945A JP6937549B2 (ja) | 2016-06-10 | 2016-06-10 | 発光素子の製造装置 |
| TW106112151A TWI655799B (zh) | 2016-06-10 | 2017-04-12 | 發光元件之製造裝置及製造方法 |
| US15/599,788 US10269597B2 (en) | 2016-06-10 | 2017-05-19 | Manufacturing apparatus of light-emitting element |
| KR1020170064177A KR101952814B1 (ko) | 2016-06-10 | 2017-05-24 | 발광 소자의 제조 장치 및 그 제조 방법 |
| CN201710391405.6A CN107492602B (zh) | 2016-06-10 | 2017-05-27 | 发光元件的制造装置和制造方法 |
| CN201911155469.1A CN110828349A (zh) | 2016-06-10 | 2017-05-27 | 发光元件的制造装置 |
| CN201910608870.XA CN110246789B (zh) | 2016-06-10 | 2017-05-27 | 发光元件的制造方法 |
| KR1020190020467A KR102059069B1 (ko) | 2016-06-10 | 2019-02-21 | 발광 소자의 제조 장치 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016115945A JP6937549B2 (ja) | 2016-06-10 | 2016-06-10 | 発光素子の製造装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2017220410A JP2017220410A (ja) | 2017-12-14 |
| JP2017220410A5 true JP2017220410A5 (enExample) | 2019-07-11 |
| JP6937549B2 JP6937549B2 (ja) | 2021-09-22 |
Family
ID=60572988
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016115945A Active JP6937549B2 (ja) | 2016-06-10 | 2016-06-10 | 発光素子の製造装置 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US10269597B2 (enExample) |
| JP (1) | JP6937549B2 (enExample) |
| KR (2) | KR101952814B1 (enExample) |
| CN (3) | CN110246789B (enExample) |
| TW (1) | TWI655799B (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6830772B2 (ja) * | 2016-08-04 | 2021-02-17 | 株式会社ジャパンディスプレイ | 積層膜の製造装置、及び積層膜の製造方法 |
| CN110544660B (zh) * | 2018-08-02 | 2022-08-16 | 北京北方华创微电子装备有限公司 | 模块化晶圆传输系统和半导体设备 |
| JP7240980B2 (ja) * | 2019-07-29 | 2023-03-16 | 東京エレクトロン株式会社 | 基板処理装置及び基板搬送方法 |
| TWI867219B (zh) * | 2020-05-12 | 2024-12-21 | 荷蘭商Asm Ip私人控股有限公司 | 半導體處理系統 |
| WO2022137022A1 (ja) * | 2020-12-25 | 2022-06-30 | 株式会社半導体エネルギー研究所 | 表示装置の製造装置 |
Family Cites Families (29)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07211762A (ja) * | 1994-01-13 | 1995-08-11 | Hitachi Ltd | ウエハ搬送処理装置 |
| US5934856A (en) * | 1994-05-23 | 1999-08-10 | Tokyo Electron Limited | Multi-chamber treatment system |
| JP3783099B2 (ja) * | 2000-05-16 | 2006-06-07 | 株式会社豊田中央研究所 | 有機電界発光素子 |
| DE10061882C1 (de) * | 2000-12-12 | 2002-05-29 | Georg Bollig | Dünnband-Gießanlage |
| JP4078813B2 (ja) * | 2001-06-12 | 2008-04-23 | ソニー株式会社 | 成膜装置および成膜方法 |
| US8900366B2 (en) * | 2002-04-15 | 2014-12-02 | Samsung Display Co., Ltd. | Apparatus for depositing a multilayer coating on discrete sheets |
| US20040035360A1 (en) * | 2002-05-17 | 2004-02-26 | Semiconductor Energy Laboratory Co., Ltd. | Manufacturing apparatus |
| US20040040504A1 (en) * | 2002-08-01 | 2004-03-04 | Semiconductor Energy Laboratory Co., Ltd. | Manufacturing apparatus |
| JP2004288463A (ja) | 2003-03-20 | 2004-10-14 | Semiconductor Energy Lab Co Ltd | 製造装置 |
| US20040206307A1 (en) * | 2003-04-16 | 2004-10-21 | Eastman Kodak Company | Method and system having at least one thermal transfer station for making OLED displays |
| EP1717339A2 (de) * | 2005-04-20 | 2006-11-02 | Applied Films GmbH & Co. KG | Kontinuierliche Beschichtungsanlage |
| JP5051870B2 (ja) * | 2006-06-14 | 2012-10-17 | 東京エレクトロン株式会社 | 発光素子の製造装置および発光素子の製造方法 |
| JP5051869B2 (ja) * | 2006-06-14 | 2012-10-17 | 東京エレクトロン株式会社 | 発光素子および発光素子の製造方法 |
| JP4712731B2 (ja) * | 2007-01-25 | 2011-06-29 | 株式会社アルバック | 搬送ロボット、真空装置 |
| CN101674893B (zh) * | 2007-05-09 | 2012-08-08 | 应用材料公司 | 用真空延伸室储放遮盘的传输室及包含该传输室的主框架及设备组 |
| KR20100132517A (ko) * | 2008-03-05 | 2010-12-17 | 어플라이드 머티어리얼스, 인코포레이티드 | 회전 모듈을 갖는 코팅 장치 |
| US9353436B2 (en) | 2008-03-05 | 2016-05-31 | Applied Materials, Inc. | Coating apparatus with rotation module |
| JP4934619B2 (ja) * | 2008-03-17 | 2012-05-16 | 株式会社アルバック | 有機el製造装置及び有機el製造方法 |
| US8070408B2 (en) * | 2008-08-27 | 2011-12-06 | Applied Materials, Inc. | Load lock chamber for large area substrate processing system |
| JP4954162B2 (ja) | 2008-08-29 | 2012-06-13 | 東京エレクトロン株式会社 | 処理システム |
| TW201408133A (zh) * | 2008-09-04 | 2014-02-16 | Hitachi High Tech Corp | 有機電激發光裝置製造裝置及其製造方法以及成膜裝置及成膜方法 |
| JP5476171B2 (ja) * | 2010-03-16 | 2014-04-23 | 株式会社日立ハイテクノロジーズ | 真空処理装置 |
| JP5427099B2 (ja) * | 2010-04-23 | 2014-02-26 | 西部電機株式会社 | 板状物の搬送システム |
| JP5551625B2 (ja) * | 2011-01-13 | 2014-07-16 | 東京エレクトロン株式会社 | 基板処理装置及び基板処理方法 |
| US9862554B2 (en) * | 2011-10-26 | 2018-01-09 | Brooks Automation, Inc. | Semiconductor wafer handling and transport |
| KR20130074307A (ko) * | 2011-12-26 | 2013-07-04 | 엘아이지에이디피 주식회사 | 척킹 및 디척킹 장치부를 갖는 유기발광소자 양산 시스템 |
| JP2013251416A (ja) * | 2012-05-31 | 2013-12-12 | Tokyo Electron Ltd | 積層膜の製造方法及び真空処理装置 |
| KR101971199B1 (ko) * | 2012-09-21 | 2019-08-14 | 삼성디스플레이 주식회사 | 유기층 증착 장치, 유기 발광 표시 장치 및 유기 발광 표시 장치 제조 방법 |
| WO2015139776A1 (en) * | 2014-03-21 | 2015-09-24 | Applied Materials, Inc. | Evaporation source for organic material |
-
2016
- 2016-06-10 JP JP2016115945A patent/JP6937549B2/ja active Active
-
2017
- 2017-04-12 TW TW106112151A patent/TWI655799B/zh active
- 2017-05-19 US US15/599,788 patent/US10269597B2/en active Active
- 2017-05-24 KR KR1020170064177A patent/KR101952814B1/ko active Active
- 2017-05-27 CN CN201910608870.XA patent/CN110246789B/zh active Active
- 2017-05-27 CN CN201911155469.1A patent/CN110828349A/zh active Pending
- 2017-05-27 CN CN201710391405.6A patent/CN107492602B/zh active Active
-
2019
- 2019-02-21 KR KR1020190020467A patent/KR102059069B1/ko active Active
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