JP2020002458A5 - - Google Patents

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Publication number
JP2020002458A5
JP2020002458A5 JP2018221513A JP2018221513A JP2020002458A5 JP 2020002458 A5 JP2020002458 A5 JP 2020002458A5 JP 2018221513 A JP2018221513 A JP 2018221513A JP 2018221513 A JP2018221513 A JP 2018221513A JP 2020002458 A5 JP2020002458 A5 JP 2020002458A5
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JP
Japan
Prior art keywords
film forming
cluster
substrate
chamber
organic
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JP2018221513A
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English (en)
Japanese (ja)
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JP2020002458A (ja
JP7296204B2 (ja
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Priority claimed from KR1020180075533A external-priority patent/KR20200002242A/ko
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Publication of JP2020002458A publication Critical patent/JP2020002458A/ja
Publication of JP2020002458A5 publication Critical patent/JP2020002458A5/ja
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Publication of JP7296204B2 publication Critical patent/JP7296204B2/ja
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JP2018221513A 2018-06-29 2018-11-27 成膜装置、有機デバイスの製造装置および有機デバイスの製造方法 Active JP7296204B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020180075533A KR20200002242A (ko) 2018-06-29 2018-06-29 성막 장치, 유기 디바이스의 제조 장치, 및 유기 디바이스의 제조 방법
KR10-2018-0075533 2018-06-29

Publications (3)

Publication Number Publication Date
JP2020002458A JP2020002458A (ja) 2020-01-09
JP2020002458A5 true JP2020002458A5 (enExample) 2021-12-09
JP7296204B2 JP7296204B2 (ja) 2023-06-22

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ID=69028813

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2018221513A Active JP7296204B2 (ja) 2018-06-29 2018-11-27 成膜装置、有機デバイスの製造装置および有機デバイスの製造方法

Country Status (3)

Country Link
JP (1) JP7296204B2 (enExample)
KR (2) KR20200002242A (enExample)
CN (1) CN110656310B (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102527120B1 (ko) * 2020-03-31 2023-04-27 캐논 톡키 가부시키가이샤 성막 장치, 성막 방법, 및 전자 디바이스의 제조 방법
US20240266195A1 (en) * 2021-07-16 2024-08-08 Semiconductor Energy Laboratory Co., Ltd. Equipment For Manufacturing Light-Emitting Device
JP7723531B2 (ja) * 2021-08-23 2025-08-14 キヤノントッキ株式会社 真空装置、電子デバイスの製造装置

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4547599B2 (ja) * 2003-10-15 2010-09-22 奇美電子股▲ふん▼有限公司 画像表示装置
JP4393402B2 (ja) * 2004-04-22 2010-01-06 キヤノン株式会社 有機電子素子の製造方法および製造装置
JP4429789B2 (ja) * 2004-04-28 2010-03-10 株式会社アルバック 有機薄膜製造方法、有機薄膜製造装置
JP4789551B2 (ja) * 2005-09-06 2011-10-12 株式会社半導体エネルギー研究所 有機ｅｌ成膜装置
JP2009071214A (ja) * 2007-09-18 2009-04-02 Seiko Epson Corp 基板処理装置
JP2009139678A (ja) * 2007-12-07 2009-06-25 Seiko Epson Corp 発光装置及び電子機器並びに成膜方法
FR2956869B1 (fr) * 2010-03-01 2014-05-16 Alex Hr Roustaei Systeme de production de film flexible a haute capacite destine a des cellules photovoltaiques et oled par deposition cyclique des couches
TW201346050A (zh) * 2012-02-06 2013-11-16 Tokyo Electron Ltd 成膜裝置及成膜方法
KR20140010303A (ko) * 2012-07-16 2014-01-24 삼성디스플레이 주식회사 유기층 증착 장치, 이를 이용한 유기 발광 디스플레이 장치의 제조 방법 및 이에 따라 제조된 유기 발광 디스플레이 장치
KR102141205B1 (ko) * 2013-08-16 2020-08-05 삼성디스플레이 주식회사 박막 봉지 제조 장치 및 이를 이용한 표시 장치의 제조 방법
JP2015115229A (ja) 2013-12-12 2015-06-22 パナソニックＩｐマネジメント株式会社 平面発光体製造装置及び平面発光体製造方法
KR101685095B1 (ko) * 2015-04-16 2016-12-09 주식회사 유진테크 기판 버퍼링 장치, 기판처리설비, 및 기판처리방법
JP6830772B2 (ja) * 2016-08-04 2021-02-17 株式会社ジャパンディスプレイ 積層膜の製造装置、及び積層膜の製造方法

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