JP2017207492A5 - - Google Patents
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- Publication number
- JP2017207492A5 JP2017207492A5 JP2017100802A JP2017100802A JP2017207492A5 JP 2017207492 A5 JP2017207492 A5 JP 2017207492A5 JP 2017100802 A JP2017100802 A JP 2017100802A JP 2017100802 A JP2017100802 A JP 2017100802A JP 2017207492 A5 JP2017207492 A5 JP 2017207492A5
- Authority
- JP
- Japan
- Prior art keywords
- irradiation
- incident
- spm
- particles
- detector
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021211903A JP7727155B2 (ja) | 2016-05-20 | 2021-12-27 | 高アスペクト構造からのデブリ除去 |
| JP2023192195A JP2023184753A (ja) | 2016-05-20 | 2023-11-10 | 高アスペクト構造からのデブリ除去 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US15/160,302 | 2016-05-20 | ||
| US15/160,302 US10330581B2 (en) | 2007-09-17 | 2016-05-20 | Debris removal from high aspect structures |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021211903A Division JP7727155B2 (ja) | 2016-05-20 | 2021-12-27 | 高アスペクト構造からのデブリ除去 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2017207492A JP2017207492A (ja) | 2017-11-24 |
| JP2017207492A5 true JP2017207492A5 (enExample) | 2020-08-13 |
| JP7244986B2 JP7244986B2 (ja) | 2023-03-23 |
Family
ID=58772396
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017100802A Active JP7244986B2 (ja) | 2016-05-20 | 2017-05-22 | 高アスペクト構造からのデブリ除去 |
| JP2021211903A Active JP7727155B2 (ja) | 2016-05-20 | 2021-12-27 | 高アスペクト構造からのデブリ除去 |
| JP2023192195A Pending JP2023184753A (ja) | 2016-05-20 | 2023-11-10 | 高アスペクト構造からのデブリ除去 |
Family Applications After (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021211903A Active JP7727155B2 (ja) | 2016-05-20 | 2021-12-27 | 高アスペクト構造からのデブリ除去 |
| JP2023192195A Pending JP2023184753A (ja) | 2016-05-20 | 2023-11-10 | 高アスペクト構造からのデブリ除去 |
Country Status (6)
| Country | Link |
|---|---|
| EP (2) | EP4254065A3 (enExample) |
| JP (3) | JP7244986B2 (enExample) |
| KR (1) | KR102448873B1 (enExample) |
| DE (1) | DE202017007361U1 (enExample) |
| PL (1) | PL3272432T3 (enExample) |
| TW (2) | TWI770024B (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107765038B (zh) * | 2017-09-13 | 2020-04-17 | 上海海洋大学 | 原子力显微镜基底功能化修饰的固定装置 |
| NL2021345A (en) | 2018-04-12 | 2018-08-22 | Asml Netherlands Bv | Lithographic apparatus |
| TW202212829A (zh) * | 2020-06-18 | 2022-04-01 | 美商布魯克奈米公司 | 用於從樣品表面機械性清除奈米尺度碎屑的裝置和製造方法 |
| DE102021201669B4 (de) | 2021-02-22 | 2023-08-17 | Carl Zeiss Smt Gmbh | Verfahren und vorrichtung zum bearbeiten einer probe |
Family Cites Families (32)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW285721B (enExample) * | 1994-12-27 | 1996-09-11 | Siemens Ag | |
| JP3417721B2 (ja) * | 1995-04-04 | 2003-06-16 | 三菱電機株式会社 | 走査プローブ顕微鏡の使用方法 |
| US5824470A (en) * | 1995-05-30 | 1998-10-20 | California Institute Of Technology | Method of preparing probes for sensing and manipulating microscopic environments and structures |
| US6100051A (en) * | 1997-06-27 | 2000-08-08 | The United States Of America As Represented By The Department Of Health And Human Services | Method utilizing convex geometry for laser capture microdissection |
| US6827979B2 (en) * | 1999-01-07 | 2004-12-07 | Northwestern University | Methods utilizing scanning probe microscope tips and products therefor or produced thereby |
| US6353221B1 (en) * | 1999-01-29 | 2002-03-05 | Veeco Instruments Inc. | Method and apparatus for cleaning a tip of a probe of a probe-based measuring instrument |
| US6545492B1 (en) * | 1999-09-20 | 2003-04-08 | Europaisches Laboratorium Fur Molekularbiologie (Embl) | Multiple local probe measuring device and method |
| JP2002243594A (ja) * | 2001-02-14 | 2002-08-28 | Mitsubishi Electric Corp | サンプリング用治具及びそれを用いた赤外分光測定法 |
| US6840374B2 (en) * | 2002-01-18 | 2005-01-11 | Igor Y. Khandros | Apparatus and method for cleaning test probes |
| JP2006513048A (ja) * | 2002-12-09 | 2006-04-20 | ザ ユニバーシティ オブ ノース カロライナ アット チャペル ヒル | ナノ構造を含む材料を集めるおよび分類する方法および関連する物品 |
| US20050208304A1 (en) * | 2003-02-21 | 2005-09-22 | California Institute Of Technology | Coatings for carbon nanotubes |
| US7528947B2 (en) * | 2003-07-10 | 2009-05-05 | Yissum Research Development Company Of The Hebrew University Of Jerusalem | Nanoparticles functionalized probes and methods for preparing such probes |
| US6840668B1 (en) * | 2003-07-25 | 2005-01-11 | Waters Investment Limited | Thermogravimetrical analyzer autosampler sealed sample pan |
| WO2005068137A1 (en) * | 2004-01-05 | 2005-07-28 | Lewis & Clark College | Self-cleaning adhesive structure and methods |
| JP2005326250A (ja) * | 2004-05-14 | 2005-11-24 | Sumitomo Electric Ind Ltd | プローブ用クリーニングシート及びクリーニング方法 |
| CN100484867C (zh) * | 2004-10-22 | 2009-05-06 | 中国科学院上海应用物理研究所 | 分离并再放置纳米颗粒的方法 |
| JP2006339472A (ja) * | 2005-06-03 | 2006-12-14 | Matsushita Electric Ind Co Ltd | プローブカード触針のクリーニング装置およびクリーニング方法 |
| EP2017610B1 (en) * | 2006-04-28 | 2014-10-01 | University of Yamanashi | Ionizing method and device by electrospray |
| JP2007298858A (ja) * | 2006-05-02 | 2007-11-15 | Hoya Corp | マスクブランク用基板の製造方法、マスクブランクの製造方法、及び露光用マスクの製造方法、並びに、マスクブランク、及び露光用マスク |
| JP4820740B2 (ja) * | 2006-12-08 | 2011-11-24 | エスアイアイ・ナノテクノロジー株式会社 | 加工用ダイヤモンド探針の加工方法 |
| JP2008209544A (ja) * | 2007-02-26 | 2008-09-11 | Sii Nanotechnology Inc | フォトマスク上の異物の組成分析方法 |
| JP2009006378A (ja) * | 2007-06-29 | 2009-01-15 | Sii Nanotechnology Inc | 微細加工方法及び微細加工装置 |
| US7770231B2 (en) * | 2007-08-02 | 2010-08-03 | Veeco Instruments, Inc. | Fast-scanning SPM and method of operating same |
| US8287653B2 (en) * | 2007-09-17 | 2012-10-16 | Rave, Llc | Debris removal in high aspect structures |
| JP2009160689A (ja) * | 2008-01-07 | 2009-07-23 | Sii Nanotechnology Inc | 走査型プローブ顕微鏡を用いた異物除去方法 |
| US8003283B2 (en) * | 2008-06-18 | 2011-08-23 | Rave Llc | System and a method for improved crosshatch nanomachining of small high aspect three dimensional structures by creating alternating superficial surface channels |
| JP2010170019A (ja) * | 2009-01-26 | 2010-08-05 | Toshiba Corp | リソグラフィ原版の異物除去方法及びリソグラフィ原版の製造方法 |
| DE102009015713A1 (de) * | 2009-03-31 | 2010-10-14 | Globalfoundries Dresden Module One Llc & Co. Kg | Verfahren und System zur Teilchenanalyse in Mikrostrukturbauelementen durch eine Isolierung von Teilchen |
| DE102011079382B4 (de) * | 2011-07-19 | 2020-11-12 | Carl Zeiss Smt Gmbh | Verfahren und Vorrichtung zum Analysieren und zum Beseitigen eines Defekts einer EUV Maske |
| JP2013068786A (ja) * | 2011-09-22 | 2013-04-18 | Toppan Printing Co Ltd | フォトマスクの洗浄方法 |
| US8819859B1 (en) * | 2013-02-01 | 2014-08-26 | Taiwan Semiconductor Manufacturing Company, Ltd. | Apparatus of analyzing a sample and a method for the same |
| GB201402318D0 (en) | 2014-02-11 | 2014-03-26 | Oxford Instr Nanotechnology Tools Ltd | Method for materials analysis |
-
2017
- 2017-05-10 TW TW106115392A patent/TWI770024B/zh active
- 2017-05-10 TW TW111122279A patent/TWI829197B/zh active
- 2017-05-19 KR KR1020170062373A patent/KR102448873B1/ko active Active
- 2017-05-22 DE DE202017007361.7U patent/DE202017007361U1/de active Active
- 2017-05-22 JP JP2017100802A patent/JP7244986B2/ja active Active
- 2017-05-22 EP EP23191761.8A patent/EP4254065A3/en active Pending
- 2017-05-22 PL PL17172136.8T patent/PL3272432T3/pl unknown
- 2017-05-22 EP EP17172136.8A patent/EP3272432B1/en active Active
-
2021
- 2021-12-27 JP JP2021211903A patent/JP7727155B2/ja active Active
-
2023
- 2023-11-10 JP JP2023192195A patent/JP2023184753A/ja active Pending
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