JP2017207755A5 - - Google Patents

Download PDF

Info

Publication number
JP2017207755A5
JP2017207755A5 JP2017100801A JP2017100801A JP2017207755A5 JP 2017207755 A5 JP2017207755 A5 JP 2017207755A5 JP 2017100801 A JP2017100801 A JP 2017100801A JP 2017100801 A JP2017100801 A JP 2017100801A JP 2017207755 A5 JP2017207755 A5 JP 2017207755A5
Authority
JP
Japan
Prior art keywords
irradiation
spm
detector
collector
chip
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2017100801A
Other languages
English (en)
Japanese (ja)
Other versions
JP2017207755A (ja
JP7042039B2 (ja
Filing date
Publication date
Priority claimed from US15/160,263 external-priority patent/US10384238B2/en
Application filed filed Critical
Publication of JP2017207755A publication Critical patent/JP2017207755A/ja
Publication of JP2017207755A5 publication Critical patent/JP2017207755A5/ja
Application granted granted Critical
Publication of JP7042039B2 publication Critical patent/JP7042039B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2017100801A 2016-05-20 2017-05-22 高アスペクト構造からのデブリ除去 Active JP7042039B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US15/160,263 US10384238B2 (en) 2007-09-17 2016-05-20 Debris removal in high aspect structures
US15/160,263 2016-05-20

Publications (3)

Publication Number Publication Date
JP2017207755A JP2017207755A (ja) 2017-11-24
JP2017207755A5 true JP2017207755A5 (enExample) 2020-08-13
JP7042039B2 JP7042039B2 (ja) 2022-03-25

Family

ID=58772394

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2017100801A Active JP7042039B2 (ja) 2016-05-20 2017-05-22 高アスペクト構造からのデブリ除去

Country Status (4)

Country Link
EP (1) EP3251760B1 (enExample)
JP (1) JP7042039B2 (enExample)
KR (1) KR102433627B1 (enExample)
TW (3) TWI841110B (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3964841A1 (de) 2020-09-02 2022-03-09 Siltronic AG Messapparatur und verfahren zum untersuchen eines bereichs einer oberfläche eines substrats mit hilfe einer kraft-messsonde
DE102021201669B4 (de) * 2021-02-22 2023-08-17 Carl Zeiss Smt Gmbh Verfahren und vorrichtung zum bearbeiten einer probe

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05164512A (ja) * 1991-12-13 1993-06-29 Toshiba Corp 表面測定装置
TW285721B (enExample) * 1994-12-27 1996-09-11 Siemens Ag
JP2005084582A (ja) * 2003-09-11 2005-03-31 Sii Nanotechnology Inc フォトマスクのパーティクル除去方法
CA2580115C (en) * 2004-09-03 2011-04-05 Honeywell International Inc. Drawn gel-spun polyethylene yarns and process for drawing
JP2006339472A (ja) * 2005-06-03 2006-12-14 Matsushita Electric Ind Co Ltd プローブカード触針のクリーニング装置およびクリーニング方法
JP4820740B2 (ja) * 2006-12-08 2011-11-24 エスアイアイ・ナノテクノロジー株式会社 加工用ダイヤモンド探針の加工方法
JP2008209544A (ja) * 2007-02-26 2008-09-11 Sii Nanotechnology Inc フォトマスク上の異物の組成分析方法
JP2009006378A (ja) * 2007-06-29 2009-01-15 Sii Nanotechnology Inc 微細加工方法及び微細加工装置
US8287653B2 (en) * 2007-09-17 2012-10-16 Rave, Llc Debris removal in high aspect structures
JP5031509B2 (ja) * 2007-10-23 2012-09-19 キヤノン株式会社 近接場光散乱用プローブおよびその製造方法
JP2009265176A (ja) * 2008-04-22 2009-11-12 Toshiba Corp 異物除去方法、異物除去装置および半導体装置の作製方法
JP2011133296A (ja) * 2009-12-24 2011-07-07 Yamaha Corp クリーニング装置、及び、プローブ針のクリーニング方法
CN102798735B (zh) * 2012-08-14 2015-03-04 厦门大学 针尖增强暗场显微镜、电化学测试装置和调平系统
JP6215677B2 (ja) * 2013-12-05 2017-10-18 株式会社日立ハイテクマニファクチャ&サービス 顕微ラマン分光装置および顕微ラマン分光システム

Similar Documents

Publication Publication Date Title
JP6018645B2 (ja) 測定装置
KR102430158B1 (ko) 오버레이 오차를 결정하는 방법, 다층 반도체 디바이스를 제조하는 방법, 원자력 현미경 디바이스, 리소그래피 시스템 및 반도체 디바이스
US7928409B2 (en) Real-time, active picometer-scale alignment, stabilization, and registration in one or more dimensions
JP2017207755A5 (enExample)
JP6949573B2 (ja) 近接場走査プローブ顕微鏡、走査プローブ顕微鏡用プローブおよび試料観察方法
JPWO2015033681A1 (ja) 走査プローブ顕微鏡およびこれを用いた試料の観察方法
KR102280558B1 (ko) 라만-원자간력 현미경
US9063168B2 (en) Scanning probe microscope and measurement method using same
EP3272432A3 (en) Debris removal from high aspect structures
CN103529643A (zh) 一种纳米图形化系统及其光响应特性检测装置
KR100859819B1 (ko) 극초단 펄스 레이저 가공 장치
KR101497208B1 (ko) 금속 나노 입자를 이용하는 라만 분광 시스템과 주사탐침 현미경 및 나노 스케일에서 편광 의존도를 측정하는 방법
CN117434303A (zh) 基于微悬臂-微球探针的超分辨拉曼/荧光/光电流二维扫描成像联合表征系统
CN104181110A (zh) 一种基于显微镜的激光双调制反射光谱检测系统
CN202710465U (zh) 一种纳米图形化系统及其光响应特性检测装置
JP6669759B2 (ja) ラマン散乱光測定装置
US20190361356A1 (en) Thermal nanolithography method and system
CN106546324A (zh) 测量任意偏振态小光束内部三维光强分布的方法
JP4929106B2 (ja) 近接場ファイバープローブ、及び近接場光学顕微鏡
WO2016067398A1 (ja) 走査プローブ顕微鏡およびこれを用いた試料の観察方法
JP3866225B2 (ja) 表面微小領域原子発光分析装置
CN112611890B (zh) Stm针尖增强光信号空间成像装置及其成像方法
US7397030B1 (en) Integrated local and global optical metrology for samples having miniature features
US20100154084A1 (en) Method and apparatus for performing apertureless near-field scanning optical microscopy
JP2014006314A (ja) 異物除去装置及び異物除去方法