JP2017183725A5 - - Google Patents

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Publication number
JP2017183725A5
JP2017183725A5 JP2017063572A JP2017063572A JP2017183725A5 JP 2017183725 A5 JP2017183725 A5 JP 2017183725A5 JP 2017063572 A JP2017063572 A JP 2017063572A JP 2017063572 A JP2017063572 A JP 2017063572A JP 2017183725 A5 JP2017183725 A5 JP 2017183725A5
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JP
Japan
Prior art keywords
pressure
steady state
key
key yabiti
yabiti
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JP2017063572A
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English (en)
Japanese (ja)
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JP2017183725A (ja
JP6979779B2 (ja
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Priority claimed from US15/084,947 external-priority patent/US10654216B2/en
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Publication of JP2017183725A5 publication Critical patent/JP2017183725A5/ja
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Publication of JP6979779B2 publication Critical patent/JP6979779B2/ja
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JP2017063572A 2016-03-30 2017-03-28 ナノインプリントリソグラフィのためのシステムおよび方法 Active JP6979779B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US15/084,947 2016-03-30
US15/084,947 US10654216B2 (en) 2016-03-30 2016-03-30 System and methods for nanoimprint lithography

Publications (3)

Publication Number Publication Date
JP2017183725A JP2017183725A (ja) 2017-10-05
JP2017183725A5 true JP2017183725A5 (enExample) 2020-05-07
JP6979779B2 JP6979779B2 (ja) 2021-12-15

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ID=59959065

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JP2017063572A Active JP6979779B2 (ja) 2016-03-30 2017-03-28 ナノインプリントリソグラフィのためのシステムおよび方法

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US (1) US10654216B2 (enExample)
JP (1) JP6979779B2 (enExample)
KR (1) KR102121928B1 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10409178B2 (en) * 2017-12-18 2019-09-10 Canon Kabushiki Kaisha Alignment control in nanoimprint lithography based on real-time system identification
EP3756215B1 (en) * 2018-02-20 2024-08-07 Applied Materials, Inc. Method using a patterned vacuum chuck for double-sided processing
JP7134034B2 (ja) * 2018-09-07 2022-09-09 キヤノン株式会社 成形装置および物品製造方法
CN109049592B (zh) * 2018-09-21 2023-09-15 宁波力劲塑机智造有限公司 一种多物料注塑机模板平行度补偿控制系统
US20220229361A1 (en) * 2019-05-13 2022-07-21 Board Of Regents, The University Of Texas System Roll-to-roll nanoimprint lithography tools and processes
CN110126241B (zh) * 2019-05-17 2022-03-29 鸿泰佛吉亚复合材料(武汉)有限公司 电池壳体模压工艺
JP7419030B2 (ja) * 2019-11-18 2024-01-22 キヤノン株式会社 保持装置、露光装置、及び物品の製造方法
US11590687B2 (en) * 2020-06-30 2023-02-28 Canon Kabushiki Kaisha Systems and methods for reducing pressure while shaping a film
US11728203B2 (en) * 2020-10-13 2023-08-15 Canon Kabushiki Kaisha Chuck assembly, planarization process, apparatus and method of manufacturing an article
US20220197134A1 (en) * 2020-12-23 2022-06-23 Canon Kabushiki Kaisha System and Method of Determining Shaping Parameters Based on Contact Line Motion
JP7682744B2 (ja) * 2021-09-10 2025-05-26 キヤノン株式会社 保持装置、保持装置の吸着異常を判定する方法、リソグラフィー装置、及び、物品の製造方法

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US4737824A (en) * 1984-10-16 1988-04-12 Canon Kabushiki Kaisha Surface shape controlling device
JP2728898B2 (ja) * 1988-10-05 1998-03-18 キヤノン株式会社 露光装置
JPH08125000A (ja) * 1994-10-24 1996-05-17 Nec Kyushu Ltd ウェーハチャック
JPH10270535A (ja) * 1997-03-25 1998-10-09 Nikon Corp 移動ステージ装置、及び該ステージ装置を用いた回路デバイス製造方法
JP4235759B2 (ja) * 1997-08-05 2009-03-11 忠弘 大見 流体制御装置
US6873087B1 (en) 1999-10-29 2005-03-29 Board Of Regents, The University Of Texas System High precision orientation alignment and gap control stages for imprint lithography processes
US20010016302A1 (en) * 1999-12-28 2001-08-23 Nikon Corporation Wafer chucks allowing controlled reduction of substrate heating and rapid substrate exchange
CN1179821C (zh) * 2000-05-12 2004-12-15 多平面技术公司 具有独立限位环和多区域压力控制结构的气动隔膜式抛光头及其使用方法
US20080160129A1 (en) 2006-05-11 2008-07-03 Molecular Imprints, Inc. Template Having a Varying Thickness to Facilitate Expelling a Gas Positioned Between a Substrate and the Template
US6932934B2 (en) 2002-07-11 2005-08-23 Molecular Imprints, Inc. Formation of discontinuous films during an imprint lithography process
US7077992B2 (en) 2002-07-11 2006-07-18 Molecular Imprints, Inc. Step and repeat imprint lithography processes
US6936194B2 (en) 2002-09-05 2005-08-30 Molecular Imprints, Inc. Functional patterning material for imprint lithography processes
US8349241B2 (en) 2002-10-04 2013-01-08 Molecular Imprints, Inc. Method to arrange features on a substrate to replicate features having minimal dimensional variability
US20040065252A1 (en) 2002-10-04 2004-04-08 Sreenivasan Sidlgata V. Method of forming a layer on a substrate to facilitate fabrication of metrology standards
US7179396B2 (en) 2003-03-25 2007-02-20 Molecular Imprints, Inc. Positive tone bi-layer imprint lithography method
US7396475B2 (en) 2003-04-25 2008-07-08 Molecular Imprints, Inc. Method of forming stepped structures employing imprint lithography
US7157036B2 (en) 2003-06-17 2007-01-02 Molecular Imprints, Inc Method to reduce adhesion between a conformable region and a pattern of a mold
US8076386B2 (en) 2004-02-23 2011-12-13 Molecular Imprints, Inc. Materials for imprint lithography
US7635263B2 (en) 2005-01-31 2009-12-22 Molecular Imprints, Inc. Chucking system comprising an array of fluid chambers
US7342237B2 (en) * 2005-02-22 2008-03-11 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
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JP6333031B2 (ja) * 2014-04-09 2018-05-30 キヤノン株式会社 インプリント装置および物品の製造方法
JP6708455B2 (ja) * 2016-03-25 2020-06-10 キヤノン株式会社 保持装置、保持方法、リソグラフィ装置、および物品の製造方法

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