JP2018082175A5 - - Google Patents
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- Publication number
- JP2018082175A5 JP2018082175A5 JP2017219309A JP2017219309A JP2018082175A5 JP 2018082175 A5 JP2018082175 A5 JP 2018082175A5 JP 2017219309 A JP2017219309 A JP 2017219309A JP 2017219309 A JP2017219309 A JP 2017219309A JP 2018082175 A5 JP2018082175 A5 JP 2018082175A5
- Authority
- JP
- Japan
- Prior art keywords
- template
- substrate
- active region
- imprint
- back pressure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims 52
- 238000001459 lithography Methods 0.000 claims 19
- 238000000034 method Methods 0.000 claims 15
- 229920000642 polymer Polymers 0.000 claims 4
- 238000001514 detection method Methods 0.000 claims 2
- 230000000379 polymerizing effect Effects 0.000 claims 2
- 239000012530 fluid Substances 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US15/350,714 | 2016-11-14 | ||
| US15/350,714 US11454883B2 (en) | 2016-11-14 | 2016-11-14 | Template replication |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2018082175A JP2018082175A (ja) | 2018-05-24 |
| JP2018082175A5 true JP2018082175A5 (enExample) | 2020-12-03 |
| JP6994911B2 JP6994911B2 (ja) | 2022-01-14 |
Family
ID=62108409
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017219309A Active JP6994911B2 (ja) | 2016-11-14 | 2017-11-14 | テンプレート複製 |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US11454883B2 (enExample) |
| JP (1) | JP6994911B2 (enExample) |
| KR (1) | KR102239731B1 (enExample) |
| CN (1) | CN108073036B (enExample) |
| SG (1) | SG10201708703TA (enExample) |
| TW (1) | TWI763728B (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10627715B2 (en) | 2016-10-31 | 2020-04-21 | Canon Kabushiki Kaisha | Method for separating a nanoimprint template from a substrate |
| US10288999B2 (en) | 2016-12-20 | 2019-05-14 | Canon Kabushiki Kaisha | Methods for controlling extrusions during imprint template replication processes |
| JP7171394B2 (ja) * | 2018-11-29 | 2022-11-15 | キヤノン株式会社 | 成形装置、成形方法、および物品の製造方法 |
| JP7431694B2 (ja) * | 2020-07-28 | 2024-02-15 | キヤノン株式会社 | 情報処理装置、膜形成装置、物品の製造方法、およびプログラム |
| US20220035245A1 (en) * | 2020-07-31 | 2022-02-03 | Applied Materials, Inc. | Nano imprint stamps |
| US12085852B2 (en) | 2021-12-27 | 2024-09-10 | Canon Kabushiki Kaisha | Template, method of forming a template, apparatus and method of manufacturing an article |
Family Cites Families (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6873087B1 (en) | 1999-10-29 | 2005-03-29 | Board Of Regents, The University Of Texas System | High precision orientation alignment and gap control stages for imprint lithography processes |
| US7077992B2 (en) | 2002-07-11 | 2006-07-18 | Molecular Imprints, Inc. | Step and repeat imprint lithography processes |
| US6932934B2 (en) | 2002-07-11 | 2005-08-23 | Molecular Imprints, Inc. | Formation of discontinuous films during an imprint lithography process |
| US7019819B2 (en) * | 2002-11-13 | 2006-03-28 | Molecular Imprints, Inc. | Chucking system for modulating shapes of substrates |
| MY133312A (en) * | 2002-11-13 | 2007-11-30 | Molecular Imprints Inc | A chucking system and method for modulation shapes of substrates |
| MY136129A (en) * | 2002-12-13 | 2008-08-29 | Molecular Imprints Inc | Magnification correction employing out-of-plane distortion of a substrate |
| US7179396B2 (en) | 2003-03-25 | 2007-02-20 | Molecular Imprints, Inc. | Positive tone bi-layer imprint lithography method |
| US7396475B2 (en) | 2003-04-25 | 2008-07-08 | Molecular Imprints, Inc. | Method of forming stepped structures employing imprint lithography |
| US7157036B2 (en) | 2003-06-17 | 2007-01-02 | Molecular Imprints, Inc | Method to reduce adhesion between a conformable region and a pattern of a mold |
| US7150622B2 (en) | 2003-07-09 | 2006-12-19 | Molecular Imprints, Inc. | Systems for magnification and distortion correction for imprint lithography processes |
| US8076386B2 (en) | 2004-02-23 | 2011-12-13 | Molecular Imprints, Inc. | Materials for imprint lithography |
| JP2007242893A (ja) * | 2006-03-08 | 2007-09-20 | Toshiba Corp | パターン転写方法およびパターン転写装置 |
| US8215946B2 (en) | 2006-05-18 | 2012-07-10 | Molecular Imprints, Inc. | Imprint lithography system and method |
| US20100015270A1 (en) * | 2008-07-15 | 2010-01-21 | Molecular Imprints, Inc. | Inner cavity system for nano-imprint lithography |
| WO2012164992A1 (ja) | 2011-06-03 | 2012-12-06 | パナソニック株式会社 | 電気接点部品 |
| JP2013074115A (ja) | 2011-09-28 | 2013-04-22 | Fujifilm Corp | ナノインプリント装置およびナノインプリント方法、並びに、歪み付与デバイスおよび歪み付与方法 |
| JP2013110162A (ja) | 2011-11-17 | 2013-06-06 | Canon Inc | インプリント装置及び物品の製造方法 |
| JP6107078B2 (ja) * | 2012-11-21 | 2017-04-05 | 大日本印刷株式会社 | インプリントモールドの製造方法、および、パターン形成方法と半導体装置の製造方法 |
| JP6282069B2 (ja) | 2013-09-13 | 2018-02-21 | キヤノン株式会社 | インプリント装置、インプリント方法、検出方法及びデバイス製造方法 |
| KR102305247B1 (ko) | 2013-12-31 | 2021-09-27 | 캐논 나노테크놀로지즈 인코퍼레이티드 | 국부 필드 임프린팅을 위한 비대칭 템플릿 형상 변조 |
| JP6273860B2 (ja) * | 2014-01-27 | 2018-02-07 | 大日本印刷株式会社 | インプリントモールド及び半導体デバイスの製造方法 |
| JP2016042498A (ja) | 2014-08-13 | 2016-03-31 | キヤノン株式会社 | インプリント装置および物品製造方法 |
| US10627715B2 (en) | 2016-10-31 | 2020-04-21 | Canon Kabushiki Kaisha | Method for separating a nanoimprint template from a substrate |
| US10969680B2 (en) | 2016-11-30 | 2021-04-06 | Canon Kabushiki Kaisha | System and method for adjusting a position of a template |
| US10288999B2 (en) | 2016-12-20 | 2019-05-14 | Canon Kabushiki Kaisha | Methods for controlling extrusions during imprint template replication processes |
-
2016
- 2016-11-14 US US15/350,714 patent/US11454883B2/en active Active
-
2017
- 2017-10-24 SG SG10201708703TA patent/SG10201708703TA/en unknown
- 2017-10-26 TW TW106136871A patent/TWI763728B/zh active
- 2017-11-13 KR KR1020170150384A patent/KR102239731B1/ko active Active
- 2017-11-14 CN CN201711118552.2A patent/CN108073036B/zh active Active
- 2017-11-14 JP JP2017219309A patent/JP6994911B2/ja active Active
-
2022
- 2022-08-17 US US17/820,376 patent/US11604409B2/en active Active
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