JP2018082175A5 - - Google Patents

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Publication number
JP2018082175A5
JP2018082175A5 JP2017219309A JP2017219309A JP2018082175A5 JP 2018082175 A5 JP2018082175 A5 JP 2018082175A5 JP 2017219309 A JP2017219309 A JP 2017219309A JP 2017219309 A JP2017219309 A JP 2017219309A JP 2018082175 A5 JP2018082175 A5 JP 2018082175A5
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JP
Japan
Prior art keywords
template
substrate
active region
imprint
back pressure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2017219309A
Other languages
English (en)
Japanese (ja)
Other versions
JP6994911B2 (ja
JP2018082175A (ja
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Publication date
Priority claimed from US15/350,714 external-priority patent/US11454883B2/en
Application filed filed Critical
Publication of JP2018082175A publication Critical patent/JP2018082175A/ja
Publication of JP2018082175A5 publication Critical patent/JP2018082175A5/ja
Application granted granted Critical
Publication of JP6994911B2 publication Critical patent/JP6994911B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2017219309A 2016-11-14 2017-11-14 テンプレート複製 Active JP6994911B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US15/350,714 2016-11-14
US15/350,714 US11454883B2 (en) 2016-11-14 2016-11-14 Template replication

Publications (3)

Publication Number Publication Date
JP2018082175A JP2018082175A (ja) 2018-05-24
JP2018082175A5 true JP2018082175A5 (enExample) 2020-12-03
JP6994911B2 JP6994911B2 (ja) 2022-01-14

Family

ID=62108409

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2017219309A Active JP6994911B2 (ja) 2016-11-14 2017-11-14 テンプレート複製

Country Status (6)

Country Link
US (2) US11454883B2 (enExample)
JP (1) JP6994911B2 (enExample)
KR (1) KR102239731B1 (enExample)
CN (1) CN108073036B (enExample)
SG (1) SG10201708703TA (enExample)
TW (1) TWI763728B (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10627715B2 (en) 2016-10-31 2020-04-21 Canon Kabushiki Kaisha Method for separating a nanoimprint template from a substrate
US10288999B2 (en) 2016-12-20 2019-05-14 Canon Kabushiki Kaisha Methods for controlling extrusions during imprint template replication processes
JP7171394B2 (ja) * 2018-11-29 2022-11-15 キヤノン株式会社 成形装置、成形方法、および物品の製造方法
JP7431694B2 (ja) * 2020-07-28 2024-02-15 キヤノン株式会社 情報処理装置、膜形成装置、物品の製造方法、およびプログラム
US20220035245A1 (en) * 2020-07-31 2022-02-03 Applied Materials, Inc. Nano imprint stamps
US12085852B2 (en) 2021-12-27 2024-09-10 Canon Kabushiki Kaisha Template, method of forming a template, apparatus and method of manufacturing an article

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6873087B1 (en) 1999-10-29 2005-03-29 Board Of Regents, The University Of Texas System High precision orientation alignment and gap control stages for imprint lithography processes
US7077992B2 (en) 2002-07-11 2006-07-18 Molecular Imprints, Inc. Step and repeat imprint lithography processes
US6932934B2 (en) 2002-07-11 2005-08-23 Molecular Imprints, Inc. Formation of discontinuous films during an imprint lithography process
US7019819B2 (en) * 2002-11-13 2006-03-28 Molecular Imprints, Inc. Chucking system for modulating shapes of substrates
MY133312A (en) * 2002-11-13 2007-11-30 Molecular Imprints Inc A chucking system and method for modulation shapes of substrates
MY136129A (en) * 2002-12-13 2008-08-29 Molecular Imprints Inc Magnification correction employing out-of-plane distortion of a substrate
US7179396B2 (en) 2003-03-25 2007-02-20 Molecular Imprints, Inc. Positive tone bi-layer imprint lithography method
US7396475B2 (en) 2003-04-25 2008-07-08 Molecular Imprints, Inc. Method of forming stepped structures employing imprint lithography
US7157036B2 (en) 2003-06-17 2007-01-02 Molecular Imprints, Inc Method to reduce adhesion between a conformable region and a pattern of a mold
US7150622B2 (en) 2003-07-09 2006-12-19 Molecular Imprints, Inc. Systems for magnification and distortion correction for imprint lithography processes
US8076386B2 (en) 2004-02-23 2011-12-13 Molecular Imprints, Inc. Materials for imprint lithography
JP2007242893A (ja) * 2006-03-08 2007-09-20 Toshiba Corp パターン転写方法およびパターン転写装置
US8215946B2 (en) 2006-05-18 2012-07-10 Molecular Imprints, Inc. Imprint lithography system and method
US20100015270A1 (en) * 2008-07-15 2010-01-21 Molecular Imprints, Inc. Inner cavity system for nano-imprint lithography
WO2012164992A1 (ja) 2011-06-03 2012-12-06 パナソニック株式会社 電気接点部品
JP2013074115A (ja) 2011-09-28 2013-04-22 Fujifilm Corp ナノインプリント装置およびナノインプリント方法、並びに、歪み付与デバイスおよび歪み付与方法
JP2013110162A (ja) 2011-11-17 2013-06-06 Canon Inc インプリント装置及び物品の製造方法
JP6107078B2 (ja) * 2012-11-21 2017-04-05 大日本印刷株式会社 インプリントモールドの製造方法、および、パターン形成方法と半導体装置の製造方法
JP6282069B2 (ja) 2013-09-13 2018-02-21 キヤノン株式会社 インプリント装置、インプリント方法、検出方法及びデバイス製造方法
KR102305247B1 (ko) 2013-12-31 2021-09-27 캐논 나노테크놀로지즈 인코퍼레이티드 국부 필드 임프린팅을 위한 비대칭 템플릿 형상 변조
JP6273860B2 (ja) * 2014-01-27 2018-02-07 大日本印刷株式会社 インプリントモールド及び半導体デバイスの製造方法
JP2016042498A (ja) 2014-08-13 2016-03-31 キヤノン株式会社 インプリント装置および物品製造方法
US10627715B2 (en) 2016-10-31 2020-04-21 Canon Kabushiki Kaisha Method for separating a nanoimprint template from a substrate
US10969680B2 (en) 2016-11-30 2021-04-06 Canon Kabushiki Kaisha System and method for adjusting a position of a template
US10288999B2 (en) 2016-12-20 2019-05-14 Canon Kabushiki Kaisha Methods for controlling extrusions during imprint template replication processes

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