JP2016518275A5 - - Google Patents

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Publication number
JP2016518275A5
JP2016518275A5 JP2016509393A JP2016509393A JP2016518275A5 JP 2016518275 A5 JP2016518275 A5 JP 2016518275A5 JP 2016509393 A JP2016509393 A JP 2016509393A JP 2016509393 A JP2016509393 A JP 2016509393A JP 2016518275 A5 JP2016518275 A5 JP 2016518275A5
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JP
Japan
Prior art keywords
nitrogen
oxygen
substrate
ratio
membrane
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2016509393A
Other languages
English (en)
Japanese (ja)
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JP2016518275A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/EP2014/057808 external-priority patent/WO2014173778A2/en
Publication of JP2016518275A publication Critical patent/JP2016518275A/ja
Publication of JP2016518275A5 publication Critical patent/JP2016518275A5/ja
Pending legal-status Critical Current

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JP2016509393A 2013-04-24 2014-04-16 インク受容基材の表面前処理のための方法および装置、印刷方法、ならびにプリンタ Pending JP2016518275A (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
EP13165163 2013-04-24
EP13165163.0 2013-04-24
EP13166468.2 2013-05-03
EP13166468 2013-05-03
PCT/EP2014/057808 WO2014173778A2 (en) 2013-04-24 2014-04-16 Method and apparatus for surface pre-treatment of ink-receiving substrates, printing method and printer

Publications (2)

Publication Number Publication Date
JP2016518275A JP2016518275A (ja) 2016-06-23
JP2016518275A5 true JP2016518275A5 (enExample) 2017-04-27

Family

ID=50513272

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016509393A Pending JP2016518275A (ja) 2013-04-24 2014-04-16 インク受容基材の表面前処理のための方法および装置、印刷方法、ならびにプリンタ

Country Status (4)

Country Link
US (1) US9469126B2 (enExample)
EP (1) EP2988945B1 (enExample)
JP (1) JP2016518275A (enExample)
WO (1) WO2014173778A2 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6151072B2 (ja) * 2013-04-12 2017-06-21 京セラ株式会社 制御システム、制御装置、情報機器及び制御方法
US11087191B2 (en) 2018-03-07 2021-08-10 Hewlett-Packard Development Company, L.P. Selective application of plasma treatment
JP7062566B2 (ja) * 2018-09-19 2022-05-06 ローランドディー．ジー．株式会社 プリンタ
JP7287192B2 (ja) * 2019-08-30 2023-06-06 セイコーエプソン株式会社 媒体搬送装置、画像読取装置、及び、媒体搬送装置における媒体検知方法
EP4538044A1 (en) 2023-10-09 2025-04-16 Canon Production Printing Holding B.V. Transporting a sheet through a plasma treatment unit

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3280740A (en) * 1962-02-15 1966-10-25 Cavitron Ultrasonics Inc Printing methods and apparatus
US3291679A (en) * 1963-10-28 1966-12-13 Monsanto Co Reaction product of a polymeric alpha-olefin-maleic imide-amine and an epihalohydrin and sizing paper therewith
JP2542750B2 (ja) * 1985-12-09 1996-10-09 益弘 小駒 プラスチックの表面エネルギ―制御方法
JP2000301711A (ja) * 1999-02-15 2000-10-31 Konica Corp 表面処理方法、インクジェット記録媒体の製造方法及びインクジェット記録媒体
JP4066628B2 (ja) * 2001-09-13 2008-03-26 凸版印刷株式会社 プラスティックフィルムの表面処理法
ATE389685T1 (de) * 2001-12-27 2008-04-15 Toyo Boseki Use of a heat-shrinkable resin film for labels
US7150901B2 (en) * 2003-12-05 2006-12-19 Eastman Kodak Company Plasma treatment of porous inkjet receivers
JP2006344762A (ja) * 2005-06-09 2006-12-21 Renesas Technology Corp 半導体集積回路装置の製造方法
JP2008101258A (ja) * 2006-10-20 2008-05-01 Mitsubishi Materials Corp 積層基材の製造方法および積層基材の製造装置
JP5193904B2 (ja) * 2009-02-27 2013-05-08 株式会社日立ハイテクノロジーズ プラズマ処理装置
KR20120120264A (ko) * 2010-01-29 2012-11-01 아사히 가라스 가부시키가이샤 불소 수지 성형체의 표면 처리 방법 및 불소 수지 성형체
JP5728876B2 (ja) * 2010-10-08 2015-06-03 セイコーエプソン株式会社 印刷装置
JP2012146749A (ja) * 2011-01-07 2012-08-02 Fuji Electric Co Ltd 半導体基板への有機膜パターンの直接描画プロセスにおける前処理方法
JP5921286B2 (ja) * 2012-03-29 2016-05-24 富士フイルム株式会社 画像形成方法

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