JP2017168714A5 - - Google Patents
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- Publication number
- JP2017168714A5 JP2017168714A5 JP2016053590A JP2016053590A JP2017168714A5 JP 2017168714 A5 JP2017168714 A5 JP 2017168714A5 JP 2016053590 A JP2016053590 A JP 2016053590A JP 2016053590 A JP2016053590 A JP 2016053590A JP 2017168714 A5 JP2017168714 A5 JP 2017168714A5
- Authority
- JP
- Japan
- Prior art keywords
- silicon oxide
- semiconductor device
- manufacturing
- electrode
- bonding
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000004065 semiconductor Substances 0.000 claims 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 7
- 229910052814 silicon oxide Inorganic materials 0.000 claims 7
- 238000004519 manufacturing process Methods 0.000 claims 6
- 238000000034 method Methods 0.000 claims 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims 2
- 229920002050 silicone resin Polymers 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 1
- 229910052786 argon Inorganic materials 0.000 claims 1
- 239000011248 coating agent Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 claims 1
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 claims 1
- 239000007789 gas Substances 0.000 claims 1
- 230000001678 irradiating effect Effects 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- 238000009832 plasma treatment Methods 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 claims 1
- 239000010703 silicon Substances 0.000 claims 1
- 238000004544 sputter deposition Methods 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
- 238000007740 vapor deposition Methods 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016053590A JP6736923B2 (ja) | 2016-03-17 | 2016-03-17 | 発光装置の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016053590A JP6736923B2 (ja) | 2016-03-17 | 2016-03-17 | 発光装置の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2017168714A JP2017168714A (ja) | 2017-09-21 |
| JP2017168714A5 true JP2017168714A5 (enExample) | 2019-04-25 |
| JP6736923B2 JP6736923B2 (ja) | 2020-08-05 |
Family
ID=59913586
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016053590A Active JP6736923B2 (ja) | 2016-03-17 | 2016-03-17 | 発光装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP6736923B2 (enExample) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US12051771B2 (en) | 2020-10-30 | 2024-07-30 | Nichia Corporation | Light emitting device and method of manufacturing light emitting device |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5443827B2 (ja) * | 2009-05-20 | 2014-03-19 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
| JP5874051B2 (ja) * | 2011-11-17 | 2016-03-01 | パナソニックＩｐマネジメント株式会社 | 半導体発光装置の製造方法およびプラズマを利用したクリーニング方法 |
| JP6068175B2 (ja) * | 2013-02-12 | 2017-01-25 | 新光電気工業株式会社 | 配線基板、発光装置、配線基板の製造方法及び発光装置の製造方法 |
-
2016
- 2016-03-17 JP JP2016053590A patent/JP6736923B2/ja active Active
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