JP2014146793A5 - - Google Patents
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- Publication number
- JP2014146793A5 JP2014146793A5 JP2014007690A JP2014007690A JP2014146793A5 JP 2014146793 A5 JP2014146793 A5 JP 2014146793A5 JP 2014007690 A JP2014007690 A JP 2014007690A JP 2014007690 A JP2014007690 A JP 2014007690A JP 2014146793 A5 JP2014146793 A5 JP 2014146793A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- film
- carrier
- thermosetting adhesive
- adhesive film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000000758 substrate Substances 0.000 claims description 120
- 229920001187 thermosetting polymer Polymers 0.000 claims description 97
- 239000002313 adhesive film Substances 0.000 claims description 61
- 239000010410 layer Substances 0.000 claims description 31
- 238000003672 processing method Methods 0.000 claims description 22
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 claims description 20
- 238000000034 method Methods 0.000 claims description 20
- 239000004205 dimethyl polysiloxane Substances 0.000 claims description 12
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 claims description 12
- 239000002243 precursor Substances 0.000 claims description 12
- 239000000463 material Substances 0.000 claims description 10
- -1 polydimethylsiloxane Polymers 0.000 claims description 7
- 239000011248 coating agent Substances 0.000 claims description 6
- 238000000576 coating method Methods 0.000 claims description 6
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims description 5
- 239000012528 membrane Substances 0.000 claims description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 4
- 238000005229 chemical vapour deposition Methods 0.000 claims description 4
- 238000004140 cleaning Methods 0.000 claims description 4
- 230000008878 coupling Effects 0.000 claims description 4
- 238000010168 coupling process Methods 0.000 claims description 4
- 238000005859 coupling reaction Methods 0.000 claims description 4
- 239000001301 oxygen Substances 0.000 claims description 4
- 229910052760 oxygen Inorganic materials 0.000 claims description 4
- 239000012495 reaction gas Substances 0.000 claims description 4
- 239000012790 adhesive layer Substances 0.000 claims description 2
- 229910052786 argon Inorganic materials 0.000 claims description 2
- 239000011521 glass Substances 0.000 claims description 2
- 229910052757 nitrogen Inorganic materials 0.000 claims description 2
- 239000004065 semiconductor Substances 0.000 claims description 2
- 239000000126 substance Substances 0.000 claims description 2
- 239000013543 active substance Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 102000012498 secondary active transmembrane transporter activity proteins Human genes 0.000 description 1
- 108040003878 secondary active transmembrane transporter activity proteins Proteins 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020130008695A KR102077248B1 (ko) | 2013-01-25 | 2013-01-25 | 기판 가공 방법 |
| KR10-2013-0008695 | 2013-01-25 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2014146793A JP2014146793A (ja) | 2014-08-14 |
| JP2014146793A5 true JP2014146793A5 (enExample) | 2017-03-30 |
| JP6385677B2 JP6385677B2 (ja) | 2018-09-05 |
Family
ID=51223376
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014007690A Active JP6385677B2 (ja) | 2013-01-25 | 2014-01-20 | 基板加工方法 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US9595446B2 (enExample) |
| JP (1) | JP6385677B2 (enExample) |
| KR (1) | KR102077248B1 (enExample) |
Families Citing this family (18)
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| US9064686B2 (en) | 2010-04-15 | 2015-06-23 | Suss Microtec Lithography, Gmbh | Method and apparatus for temporary bonding of ultra thin wafers |
| KR20120082165A (ko) * | 2011-01-13 | 2012-07-23 | 삼성전기주식회사 | 그린 시트 및 이의 제조방법 |
| KR102046534B1 (ko) * | 2013-01-25 | 2019-11-19 | 삼성전자주식회사 | 기판 가공 방법 |
| JP6023737B2 (ja) * | 2014-03-18 | 2016-11-09 | 信越化学工業株式会社 | ウエハ加工体、ウエハ加工用仮接着材、及び薄型ウエハの製造方法 |
| US10157766B2 (en) | 2014-03-19 | 2018-12-18 | Samsung Electronics Co., Ltd. | Method of fabricating a semiconductor device |
| JP6193813B2 (ja) * | 2014-06-10 | 2017-09-06 | 信越化学工業株式会社 | ウエハ加工用仮接着材料、ウエハ加工体及びこれらを使用する薄型ウエハの製造方法 |
| DE102015000451A1 (de) * | 2015-01-15 | 2016-07-21 | Siltectra Gmbh | Unebener Wafer und Verfahren zum Herstellen eines unebenen Wafers |
| US10894935B2 (en) | 2015-12-04 | 2021-01-19 | Samsung Electronics Co., Ltd. | Composition for removing silicone resins and method of thinning substrate by using the same |
| PL4296340T3 (pl) | 2016-02-18 | 2025-08-04 | Ecolab Usa Inc. | Zastosowanie rozpuszczalnika podczas mycia butelek z wykorzystaniem preparatów na bazie amidyny |
| JP6691504B2 (ja) * | 2016-05-12 | 2020-04-28 | 信越化学工業株式会社 | ウエハ加工体及びその製造方法並びにウエハ上における有機膜の被覆性確認方法 |
| EP3477685A4 (en) * | 2016-06-22 | 2020-07-01 | Nissan Chemical Corporation | POLYDIMETHYLSILOXANE ADHESIVE |
| WO2018125673A2 (en) * | 2016-12-28 | 2018-07-05 | Invensas Bonding Technologies, Inc | Processing stacked substrates |
| JP7262468B2 (ja) * | 2017-12-29 | 2023-04-21 | スリーエム イノベイティブ プロパティズ カンパニー | 熱硬化性２剤型加工用接着剤組成物 |
| US10964664B2 (en) | 2018-04-20 | 2021-03-30 | Invensas Bonding Technologies, Inc. | DBI to Si bonding for simplified handle wafer |
| JP7424969B2 (ja) * | 2018-05-01 | 2024-01-30 | 日産化学株式会社 | 耐熱性重合禁止剤を含むポリシロキサンを含有する仮接着剤 |
| CN112602174B (zh) | 2018-10-16 | 2023-12-08 | 株式会社力森诺科 | 组合物、粘接性聚合物的清洗方法、器件晶圆的制造方法和支撑晶圆的再生方法 |
| JP7759027B2 (ja) * | 2020-08-27 | 2025-10-23 | 日産化学株式会社 | 積層体及び剥離剤組成物 |
| TW202303826A (zh) * | 2021-02-15 | 2023-01-16 | 美商布魯爾科技公司 | 防止熱壓結合中金屬連接變形的臨時結合和脫結製程 |
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| US5863832A (en) | 1996-06-28 | 1999-01-26 | Intel Corporation | Capping layer in interconnect system and method for bonding the capping layer onto the interconnect system |
| US6230569B1 (en) | 1999-05-24 | 2001-05-15 | Micron Technology, Inc. | Use of a stream of compressed gas to detect semiconductor interconnect problems |
| JP4137310B2 (ja) * | 1999-09-06 | 2008-08-20 | リンテック株式会社 | 両面粘着シートに固定された物品の剥離方法および剥離装置 |
| US20030107927A1 (en) | 2001-03-12 | 2003-06-12 | Yeda Research And Development Co. Ltd. | Method using a synthetic molecular spring device in a system for dynamically controlling a system property and a corresponding system thereof |
| US7534498B2 (en) * | 2002-06-03 | 2009-05-19 | 3M Innovative Properties Company | Laminate body, method, and apparatus for manufacturing ultrathin substrate using the laminate body |
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| US20040265531A1 (en) | 2003-06-30 | 2004-12-30 | Mckean Dennis R. | Sliders bonded by a debondable silicon-based encapsulant |
| US20050066995A1 (en) * | 2003-09-30 | 2005-03-31 | International Business Machines Corporation | Non-hermetic encapsulant removal for module rework |
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| JP2005129653A (ja) | 2003-10-22 | 2005-05-19 | Fuji Electric Holdings Co Ltd | 半導体装置の製造方法 |
| US7226812B2 (en) * | 2004-03-31 | 2007-06-05 | Intel Corporation | Wafer support and release in wafer processing |
| US7196872B2 (en) | 2004-04-29 | 2007-03-27 | Hitachi Global Storage Netherlands, B.V. | Sliders bonded by a debondable encapsulant comprising different polymers formed via in situ polymerization |
| JP4613709B2 (ja) | 2005-06-24 | 2011-01-19 | セイコーエプソン株式会社 | 半導体装置の製造方法 |
| CN101536172B (zh) | 2006-10-30 | 2012-05-30 | 住友电木株式会社 | 液体树脂组合物、具粘合剂层的半导体晶片、具粘合剂层的半导体元件、封装件及其制法 |
| JP5196838B2 (ja) * | 2007-04-17 | 2013-05-15 | リンテック株式会社 | 接着剤付きチップの製造方法 |
| DE102007020655A1 (de) * | 2007-04-30 | 2008-11-06 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zum Herstellen dünner Schichten und entsprechende Schicht |
| US20080302481A1 (en) | 2007-06-07 | 2008-12-11 | Tru-Si Technologies, Inc. | Method and apparatus for debonding of structures which are bonded together, including (but not limited to) debonding of semiconductor wafers from carriers when the bonding is effected by double-sided adhesive tape |
| JP2009141070A (ja) * | 2007-12-05 | 2009-06-25 | Lintec Corp | 剥離装置及び剥離方法 |
| JP2009209345A (ja) | 2008-02-06 | 2009-09-17 | Hitachi Chem Co Ltd | 粘接着シート |
| US8092628B2 (en) | 2008-10-31 | 2012-01-10 | Brewer Science Inc. | Cyclic olefin compositions for temporary wafer bonding |
| WO2010121068A2 (en) | 2009-04-16 | 2010-10-21 | Suss Microtec, Inc. | Improved apparatus for temporary wafer bonding and debonding |
| US8871609B2 (en) | 2009-06-30 | 2014-10-28 | Taiwan Semiconductor Manufacturing Company, Ltd. | Thin wafer handling structure and method |
| US8236118B2 (en) | 2009-08-07 | 2012-08-07 | Guardian Industries Corp. | Debonding and transfer techniques for hetero-epitaxially grown graphene, and products including the same |
| US9847243B2 (en) | 2009-08-27 | 2017-12-19 | Corning Incorporated | Debonding a glass substrate from carrier using ultrasonic wave |
| US8398804B2 (en) | 2010-01-11 | 2013-03-19 | Navaid Baqai | Pressure sensitive textile adhesive |
| US8017439B2 (en) | 2010-01-26 | 2011-09-13 | Texas Instruments Incorporated | Dual carrier for joining IC die or wafers to TSV wafers |
| US8852391B2 (en) | 2010-06-21 | 2014-10-07 | Brewer Science Inc. | Method and apparatus for removing a reversibly mounted device wafer from a carrier substrate |
| JP5583080B2 (ja) | 2010-07-07 | 2014-09-03 | 古河電気工業株式会社 | ウエハ加工用テープおよびそれを用いた半導体加工方法 |
| US9263314B2 (en) | 2010-08-06 | 2016-02-16 | Brewer Science Inc. | Multiple bonding layers for thin-wafer handling |
| FR2964048B1 (fr) * | 2010-08-30 | 2012-09-21 | Commissariat Energie Atomique | Procédé de réalisation d'un film, par exemple monocristallin, sur un support en polymère |
| US8313982B2 (en) | 2010-09-20 | 2012-11-20 | Texas Instruments Incorporated | Stacked die assemblies including TSV die |
| US9029269B2 (en) * | 2011-02-28 | 2015-05-12 | Dow Corning Corporation | Wafer bonding system and method for bonding and debonding thereof |
| KR20130000211A (ko) * | 2011-06-22 | 2013-01-02 | 삼성전자주식회사 | 기판 가공 방법 |
-
2013
- 2013-01-25 KR KR1020130008695A patent/KR102077248B1/ko active Active
-
2014
- 2014-01-09 US US14/150,906 patent/US9595446B2/en active Active
- 2014-01-20 JP JP2014007690A patent/JP6385677B2/ja active Active
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