WO2016050017A1 - 柔性显示基板的制作方法及柔性显示基板母板 - Google Patents

柔性显示基板的制作方法及柔性显示基板母板 Download PDF

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WO2016050017A1
WO2016050017A1 PCT/CN2015/071001 CN2015071001W WO2016050017A1 WO 2016050017 A1 WO2016050017 A1 WO 2016050017A1 CN 2015071001 W CN2015071001 W CN 2015071001W WO 2016050017 A1 WO2016050017 A1 WO 2016050017A1
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substrate
flexible
bonding layer
carrier substrate
carrier
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PCT/CN2015/071001
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English (en)
French (fr)
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董甜
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京东方科技集团股份有限公司
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping

Definitions

  • the present application relates to the field of display technology, and in particular to a method for fabricating a flexible display substrate and a flexible display substrate motherboard.
  • a flexible display also known as a rollable display, is a bendable display device constructed of a flexible flexible panel made of a flexible material. Whether it is a CRT (Cathode Ray Tube) display that is on the verge of disappearing, or the current mainstream LCD (Liquid Crystal Display), it is essentially a traditional rigid display. Compared with ordinary rigid displays, flexible displays have many advantages, such as: impact resistance, stronger shock resistance; light weight, small size, and more convenient to carry; using a tape-and-reel process similar to the newspaper printing process, the cost is lower, etc. .
  • the technical problem to be solved by the present application is to provide a method of manufacturing a flexible display substrate and a flexible display substrate mother board. Thereby, when the flexible display substrate is separated from the carrier substrate, the flexible display substrate is not damaged.
  • the embodiment of the present application provides the following technical solutions:
  • embodiments of the present application provide a method of making a flexible display substrate. According to an embodiment of the present application, the method comprises:
  • the flexible substrate prepared with the display device is separated from the carrier substrate on which the adhesive layer is formed under heating to obtain a flexible display substrate.
  • the thermal expansion coefficient of the flexible substrate substrate is different from the thermal expansion coefficient of the bonding layer.
  • the step of forming a bonding layer on the carrier substrate further comprises: surface treating the carrier substrate; and coating the bonding layer on the surface treated carrier substrate and bonding the bonding layer The layer is cured such that the binder forms a chemical bond with the surface treated carrier substrate, wherein the chemical bonds formed constitute the irreversible contact.
  • the material of the bonding layer is polydimethylsiloxane.
  • the carrier substrate is a glass substrate, a quartz substrate or a silicon wafer.
  • the step of forming a bonding layer on the carrier substrate further comprises:
  • the polydimethylsiloxane solution is obtained by uniformly mixing a polydimethylsiloxane and a curing agent at a mass ratio of 10:1 to form a mixture; and in a vacuum environment The mixture is degassed.
  • the polydimethylsiloxane layer is cured at a temperature of from about 25 degrees Celsius to about 90 degrees Celsius.
  • the method further comprises: placing the carrier substrate on which the bonding layer is formed in an oxygen plasma environment for activation treatment.
  • the material of the flexible substrate is polyethylene terephthalate or polyethersulfone tree At least one of a grease and a polyimide.
  • the flexible substrate substrate has a thickness of from about 10 microns to about 300 microns.
  • the flexible substrate prepared with the display device is separated from the carrier substrate on which the bonding layer is formed at a temperature of about 100 degrees Celsius to about 150 degrees Celsius.
  • the flexible substrate prepared with the display device is mechanically separated from the carrier substrate on which the bonding layer is formed.
  • the flexible display substrate motherboard includes:
  • the thermal expansion coefficient of the flexible substrate substrate is different from the thermal expansion coefficient of the bonding layer.
  • the material of the bonding layer is polydimethylsiloxane.
  • the surface of the carrier substrate has Si-O bonds
  • the surface of the carrier substrate is formed with an O-Si-O bond with the polydimethylsiloxane, wherein the O-Si-O bond constitutes the carrier Irreversible contact between the substrate and the polydimethylsiloxane layer.
  • the material of the flexible substrate is at least one of polyethylene terephthalate, polyether sulfone resin and polyimide.
  • the flexible substrate substrate has a thickness of from about 10 microns to about 300 microns.
  • the carrier substrate is a glass substrate, a quartz substrate or a silicon wafer.
  • an adhesive layer capable of forming irreversible contact with the carrier substrate is formed on the carrier substrate, a flexible substrate is formed on the adhesive layer, and a display device is prepared on the flexible substrate, and the carrier substrate is heated.
  • the flexible substrate is peeled off from the bonding layer, and the flexible substrate is adhered due to irreversible contact between the bonding layer and the carrier substrate.
  • the rectifying contact between the junction layers is such that when the flexible substrate is peeled off, the bonding layer is still firmly bonded to the carrier substrate, and is not peeled off at the same time, and does not cause adhesion on the peeled flexible display substrate.
  • the method of peeling off the flexible display substrate can In order to simplify the manufacturing process of the flexible display substrate, the manufacturing cost of the flexible display substrate is reduced, and the performance of the flexible display substrate is not affected, and the yield of the flexible display substrate is improved.
  • FIG. 1 is a schematic flow chart of a method of fabricating a flexible display substrate according to an embodiment of the present application
  • FIG. 2 is a schematic flow chart of a method of fabricating a flexible display substrate according to another embodiment of the present application.
  • FIG 3 is a schematic view showing the structure after a display device is fabricated on a flexible substrate according to an embodiment of the present application.
  • the term "irreversible contact” refers to the manner in which a two layer of material forms a strong chemical bond by chemical reaction (eg, O-Si-O) to form a permanent bond.
  • reversible contact means that two layers of material are bonded to each other by virtue of the bonding force of the materials themselves, and no chemical bonds are formed therebetween.
  • oxygen plasma refers to an ionized gaseous substance composed of a part of an electron which is formed by ionization after being ionized, and an electron and a negative electron generated by ionization of the atom. It is electrically neutral overall and is a good conductor.
  • Embodiments of the present application provide a method of fabricating a flexible display substrate and a flexible display substrate mother board, whereby the flexible display substrate is not damaged when the flexible display substrate is separated from the carrier substrate.
  • Embodiments of the present application provide a method of fabricating a flexible display substrate. According to an embodiment of the present application, as shown in FIG. 1, the method includes:
  • Step 11 forming a bonding layer on the carrier substrate, wherein the bonding layer is in irreversible contact with the carrier substrate;
  • Step 12 forming a flexible substrate on the bonding layer, wherein the flexible substrate is in reversible contact with the bonding layer;
  • Step 13 preparing a display device on the flexible substrate
  • Step 14 The flexible substrate prepared with the display device is separated from the carrier substrate on which the bonding layer is formed under heating to obtain a flexible display substrate.
  • a method of fabricating a flexible display substrate includes first forming an adhesive layer having irreversible contact on a carrier substrate, and then forming a flexible substrate having reversible contact on the bonding layer, and Forming a display device on a flexible substrate, and then separating the flexible substrate from the bonding layer by using a property of the flexible substrate and the bonding layer being reversibly contacted under heating Come down. Since the adhesive layer is irreversibly contacted with the carrier substrate, the flexible substrate substrate is in reversible contact with the bonding layer, so when the flexible substrate substrate is separated, the bonding The layer is still firmly bonded to the carrier substrate and will not be separated at the same time, that is, without causing a separate adhesive layer on the separated flexible display substrate.
  • the method for separating the flexible display substrate can simplify the manufacturing process of the flexible display substrate, reduce the manufacturing cost of the flexible display substrate, and not affect the performance of the flexible display substrate, thereby improving the yield of the flexible display substrate.
  • the flexible display substrate may be a complete display panel or a flexible array substrate.
  • the thermal expansion coefficient of the flexible substrate is different from the thermal expansion coefficient of the bonding layer, so that the flexible substrate can be separated from the bonding layer by thermal stress.
  • the step of forming a bonding layer on the carrier substrate further comprises: surface treating the carrier substrate; and coating the bonding layer on the surface treated carrier substrate and bonding the bonding layer The layer is cured such that the binder forms a chemical bond with the surface treated carrier substrate, wherein the chemical bonds formed constitute the irreversible contact.
  • the material of the bonding layer may be polydimethylsiloxane.
  • the carrier substrate may be a glass substrate, a quartz substrate or a silicon wafer.
  • the step of forming a bonding layer on the carrier substrate further comprises the following steps:
  • Surface treatment refers to surface cleaning, that is, the use of plasma bombardment to remove residual impurity particles from the surface.
  • the preparation process of the polydimethylsiloxane solution for spin coating on the surface of the carrier substrate is as follows: the polydimethylsiloxane and the curing agent are uniformly mixed at a mass ratio of 10 : 1, A mixture is formed and the mixture is degassed in a vacuum environment for use.
  • the curing agent includes, but is not limited to, for example, a small molecule silane having a silanol group or a siloxy group.
  • the vacuum environment refers to an environment below one atmosphere.
  • the polydimethylsiloxane layer is cured at a temperature of from about 25 degrees Celsius to about 90 degrees Celsius.
  • the method further comprises: placing the carrier substrate on which the bonding layer is formed in an oxygen plasma environment for activation treatment to achieve a cleaning bonding layer
  • the purpose of the surface is to provide better adhesion between the bonding layer and the flexible substrate.
  • the material of the flexible substrate may be at least one of polyethylene terephthalate, polyether sulfone resin, and polyimide, and the thickness of the flexible substrate may be, for example, From about 10 microns to about 300 microns.
  • the flexible substrate prepared with the display device is separated from the carrier substrate on which the bonding layer is formed at a temperature of about 100 degrees Celsius to about 150 degrees Celsius.
  • a flexible substrate prepared with a display device is separated from a carrier substrate on which the adhesive layer is formed at a temperature of about 100 degrees Celsius.
  • the flexible substrate prepared with the display device is mechanically separated from the carrier substrate on which the bonding layer is formed.
  • Polydimethylsiloxane is a high molecular silicone compound, commonly referred to as silicone, which is optically transparent and, in general, is considered to be inert and non-toxic.
  • PDMS can not only form irreversible contact with itself, silicon, glass, etc., but also form reversible contact with itself, silicon, glass, and oxidized polymers.
  • the surface of the glass is treated with an oxygen plasma to form a Si-O bond on the surface of the glass, and then the surface of the glass having the Si-O bond is spin-coated with a polydimethylsiloxane solution to form polydimethylsiloxane.
  • this embodiment uses PDMS as the carrier substrate and flexible substrate base. A bonding layer between the plates.
  • the method for manufacturing a flexible display substrate includes the following steps:
  • Step 21 providing a carrier substrate 1, surface-treating the carrier substrate 1 with oxygen plasma, forming Si-O bonds on the surface of the carrier substrate 1;
  • the carrier substrate 1 may be a glass substrate, a quartz substrate or a silicon wafer;
  • Step 22 spin-coating a layer of PDMS on the surface of the treated carrier substrate 1, and curing the formed PDMS layer to form the bonding layer 2. Since the surface of the carrier substrate 1 is formed with Si-O bonds, PDMS can be combined with Si- The O bond reacts to form a stable O-Si-O bond, so that after the PDMS is cured, the formed bonding layer 2 can form a permanent bond with the carrier substrate 1, ie, irreversible contact; due to the bond layer 2 and the carrier substrate 1 For irreversible contact, the flexible substrate substrate 3 and the bonding layer 2 are in reversible contact, so that when the flexible substrate substrate 3 is separated, the bonding layer 2 is still firmly bonded to the carrier substrate 1 without being simultaneously separated. Down, the separated flexible display substrate 3 is not attached with the adhesive layer 2.
  • the PDMS layer may be cured at a temperature of about 25 degrees Celsius to about 90 degrees Celsius, and the higher the ambient temperature, the shorter the time required for curing, for example, the PDMS layer may be cured at a temperature of 60 degrees Celsius for two hours;
  • Step 23 cleaning the surface of the carrier substrate 1 on which the bonding layer 2 is formed, so that when the flexible substrate substrate 3 is subsequently formed on the bonding layer 2, the bonding layer 2 and the flexible substrate substrate 3 can be further improved. Good adhesion;
  • the carrier substrate 1 formed with the bonding layer 2 can be placed in an oxygen plasma environment for activation treatment to achieve the purpose of cleaning the surface of the bonding layer 2;
  • Step 24 forming a flexible substrate substrate 3 on the bonding layer 2;
  • the material of the flexible base substrate 3 may be polyimide (PI). Specifically, a polyimide solution may be spin-coated on the surface of the adhesive layer 2, and after being cured, the flexible substrate 3 is formed, and the flexible substrate 3 is formed. Reversible contact with the bonding layer 2 may range from about 10 microns to about 300 microns.
  • polyimide may be spin-coated multiple times on the adhesive layer 2 to form the flexible base substrate 3, and the thermal expansion coefficient and the adhesive layer of the flexible base substrate 3 2 has different coefficients of thermal expansion;
  • Step 25 preparing the display device 4 on the flexible substrate, forming a structure as shown in FIG. 3;
  • Step 26 Under heating conditions, specifically, the carrier substrate 1 subjected to the above step 25 may be The substrate is placed on a heating stage having a temperature of about 100 degrees Celsius to about 150 degrees Celsius, and then the flexible substrate substrate 3 on which the display device 4 is prepared is separated from the carrier substrate 1 on which the bonding layer 2 is formed, to obtain a flexible display substrate. Since the thermal expansion coefficients of both PDMS and PI are different, it is easy to separate the adhesive layer 2 and the flexible base substrate 3 by thermal stress under heating conditions. For example, the adhesive layer 2 and the flexible base substrate 3 are mechanically separated, and for example, the flexible base substrate 3 can be peeled off from the carrier substrate 1 on which the adhesive layer 2 is formed by using tweezers.
  • an adhesive layer 2 capable of permanently bonding with the carrier substrate 1 is formed on the carrier substrate 1, a flexible substrate substrate 3 is formed on the adhesive layer 2, and a display device 4 is prepared on the flexible substrate substrate 3. Then, under heating, according to the characteristics that the contact of the flexible base substrate 3 with the bonding layer 2 is reversible and the thermal expansion coefficient of the flexible substrate substrate 3 is different from the thermal expansion coefficient of the bonding layer 2, the flexible lining is utilized by thermal stress. The bottom substrate 3 is separated from the adhesive layer 2.
  • the method of separating the flexible display substrate can simplify the manufacturing process of the flexible display substrate, reduce the manufacturing cost of the flexible display substrate, and not affect the performance of the flexible display substrate, and improve The yield of the flexible display substrate.
  • the embodiment of the present application further provides a flexible display substrate motherboard, as shown in FIG. 3, including:
  • the display device 4 is formed on the flexible substrate substrate 3.
  • the thermal expansion coefficient of the flexible base substrate 3 is different from the thermal expansion coefficient of the adhesive layer 2.
  • the material of the bonding layer 2 is polydimethylsiloxane.
  • the flexible display substrate can be prepared by using the flexible display substrate mother board of the present application. Since the adhesive layer 2 and the carrier substrate 1 are irreversibly contacted, the flexible substrate substrate 3 and the adhesive layer 2 are reversibly contacted, so that it can be relatively easy.
  • the flexible substrate substrate 3 is separated from the adhesive layer 2 to obtain a flexible display substrate 3.
  • the method for separating the flexible display substrate can simplify the manufacturing process of the flexible display substrate, reduce the manufacturing cost of the flexible display substrate, and not affect the performance of the flexible display substrate, thereby improving the yield of the flexible display substrate.

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Abstract

提供了制作柔性显示基板的方法及柔性显示基板母板。所述方法包括：在载体基板上形成粘结层，其中所述粘结层与所述载体基板为不可逆接触；在所述粘结层上形成柔性衬底基板，所述柔性衬底基板能与所述粘结层为可逆接触；在所述柔性衬底基板上制备显示器件；在加热条件下，将制备有显示器件的柔性衬底基板从形成有所述粘结层的载体基板上分离下来，得到柔性显示基板。

Description

柔性显示基板的制作方法及柔性显示基板母板
相关申请的交叉引用
本申请主张在2014年09月29日在中国提交的中国专利申请号No.201410513955.7的优先权，其全部内容通过引用包含于此。
技术领域
本申请涉及显示技术领域，特别是指一种柔性显示基板的制作方法及柔性显示基板母板。
背景技术
柔性显示(Flexible Display)技术在近十年有了飞速地发展，由此带动柔性显示器的屏幕尺寸和显示质量都取得了很大进步。柔性显示器，又称为可卷曲显示器，是由采用柔性材料制成的可视柔性面板构成的可弯曲变形的显示装置。无论是濒临消失的CRT(Cathode Ray Tube，阴极射线管)显示器，还是现今主流的LCD(Liquid Crystal Display，液晶显示器)，本质上都属于传统的刚性显示器。与普通的刚性显示器相比，柔性显示器具有诸多优点，例如：耐冲击，抗震能力更强；重量轻、体积小，携带更加方便；采用类似于报纸印刷工艺的卷带式工艺，成本更加低廉等。
目前的几种柔性显示器的制造方法虽然各有特点，但也有一些相同之处，例如它们都需要在一个坚硬而平坦的载体基板上粘合一层柔性衬底基板，再在柔性衬底基板上制作电子元件完成柔性显示基板的制作，然后再把制作好的柔性显示基板从载体基板上分离下来。目前常用的柔性显示基板与载体基板的分离技术包括激光剥离，这种方式的缺点在于激光照射会影响柔性显示基板的性能及显示效果。
发明内容
本申请要解决的技术问题是提供一种制作柔性显示基板的方法及柔性显示基板母板。由此，在将柔性显示基板与载体基板分离时，不会对柔性显示基板造成破坏。
为解决上述技术问题，本申请的实施例提供技术方案如下：
在一方面，本申请的实施例提供了一种制作柔性显示基板的方法。根据本申请的实施例，所述方法包括：
在载体基板上形成粘结层，其中所述粘结层与所述载体基板为不可逆接触；
在所述粘结层上形成柔性衬底基板，其中所述柔性衬底基板与所述粘结层为可逆接触；
在所述柔性衬底基板上制备显示器件；以及
在加热条件下，将制备有显示器件的柔性衬底基板从形成有所述粘结层的载体基板上分离下来，得到柔性显示基板。
可选地，所述柔性衬底基板的热膨胀系数与所述粘结层的热膨胀系数不同。
可选地，在载体基板上形成粘结层的步骤进一步包括：对所述载体基板的进行表面处理；以及在经过表面处理的载体基板上涂覆所述粘结层，并对所述粘结层进行固化，使所述粘结剂与所述经过表面处理的载体基板形成化学键，其中形成的化学键构成所述不可逆接触。
可选地，所述粘结层的材料为聚二甲基硅氧烷。
可选地，所述载体基板为玻璃基板、石英基板或硅片。
可选地，在载体基板上形成粘结层的步骤进一步包括：
用氧等离子体对所述载体基板表面进行处理，在所述载体基板表面形成Si-O键；
在具有所述Si-O键的载体基板表面旋涂聚二甲基硅氧烷溶液，以形成的聚二甲基硅氧烷层并进行固化，使所述聚二甲基硅氧烷层与所述载体基板表面的Si-O键反应形成O-Si-O键，其中所述O-Si-O键构成所述载体基板与所述聚二甲基硅氧烷层之间的不可逆接触。
可选地，所述聚二甲基硅氧烷溶液是按以下获得的：将聚二甲基硅氧烷和固化剂按质量比10∶1进行均匀混合，以形成混合物；以及在真空环境中对所述混合物进行除气。
可选地，在约25摄氏度至约90摄氏度的温度下对所述聚二甲基硅氧烷层进行固化。
可选地，在所述粘结层上形成柔性衬底基板的步骤之前还包括：将形成有所述粘结层的载体基板放入氧等离子体环境中进行活化处理。
可选地，所述柔性衬底基板的材料为聚对苯二甲酸乙二醇酯、聚醚砜树 脂和聚酰亚胺中的至少一种。
可选地，所述柔性衬底基板的厚度为约10微米至约300微米。
可选地，在约100摄氏度至约150摄氏度的温度下，将制备有显示器件的柔性衬底基板从形成有所述粘结层的载体基板上分离下来。
可选地，通过机械方式将制备有显示器件的柔性衬底基板从形成有所述粘结层的载体基板上分离下来。
本申请实施例还提供了一种柔性显示基板母板。根据本申请的实施例，所述柔性显示基板母板包括：
载体基板；
形成在所述载体基板上的粘结层，其中所述粘结层与所述载体基板为不可逆接触；
形成在所述粘结层上的柔性衬底基板，其中所述柔性衬底基板与所述粘结层为可逆接触；以及
形成在所述柔性衬底基板上的显示器件。
可选地，所述柔性衬底基板的热膨胀系数与所述粘结层的热膨胀系数不同。
可选地，所述粘结层的材料为聚二甲基硅氧烷。
可选地，所述载体基板表面具有Si-O键，所述载体基板表面与聚二甲基硅氧烷形成有O-Si-O键，其中所述O-Si-O键构成所述载体基板与所述聚二甲基硅氧烷层之间的不可逆接触。
可选地，所述柔性衬底基板的材料为聚对苯二甲酸乙二醇酯、聚醚砜树脂和聚酰亚胺中的至少一种。
可选地，所述柔性衬底基板的厚度为约10微米至约300微米。
可选地，所述载体基板为玻璃基板、石英基板或硅片。
本申请的实施例具有以下有益效果：
上述方案中，首先在载体基板上形成能够与载体基板形成不可逆接触的粘结层，在粘结层上形成柔性衬底基板，并在柔性衬底基板上制备显示器件，对载体基板进行加热，根据柔性衬底基板与粘结层的接触为可逆的这一特性，将柔性衬底基板从粘结层上剥离下来，由于粘结层与载体基板之间为不可逆接触，柔性衬底基板与粘结层之间为可逆接触，因此在剥离柔性衬底基板时，粘结层仍然会与载体基板牢固结合在一起，不会被同时剥离下来，不会导致剥离下来的柔性显示基板上连带有粘结层。这种剥离柔性显示基板的方法可 以简化柔性显示基板的制作工艺，降低柔性显示基板的制作成本，并且不会对柔性显示基板的性能产生影响，提高了柔性显示基板的成品率。
附图说明
图1为根据本申请一个实施例的制作柔性显示基板的方法的流程示意图；
图2为根据本申请另一个实施例的制作柔性显示基板的方法的流程示意图；
图3为根据本申请一个实施例在柔性衬底基板上制备显示器件之后的结构示意图。
具体实施方式
为使本申请的实施例要解决的技术问题、技术方案和优点更加清楚，下面将结合附图及具体实施例进行详细描述。
本文所使用的术语“不可逆接触”是指两层材料之间通过化学反应形成牢固化学键的方式(例如O-Si-O)构成永久性结合。
本文所使用的术语“可逆接触”是指两层材料之间依靠材料本身的粘结力而相互结合，二者之间并没有形成化学键。
本文所使用的术语“氧等离子”是指氧原子被电离之后形成的部分电子被剥夺后的原子及原子被电离后产生的正负电子组成的离子化气体状物质。它整体上呈现电中性，是很好的导体。
本申请的实施例提供了一种制作柔性显示基板的方法及柔性显示基板母板，由此，在将柔性显示基板与载体基板分离时，不会对柔性显示基板造成破坏。
本申请实施例提供了一种制作柔性显示基板的方法。根据本申请的实施例，如图1所示，所述方法包括：
步骤11：在载体基板上形成粘结层，其中所述粘结层与所述载体基板为不可逆接触；
步骤12：在所述粘结层上形成柔性衬底基板，其中所述柔性衬底基板与所述粘结层为可逆接触；
步骤13：在所述柔性衬底基板上制备显示器件；
步骤14：在加热条件下，将制备有显示器件的柔性衬底基板从形成有所述粘结层的载体基板上分离下来，得到柔性显示基板。
根据本申请实施例的制作柔性显示基板的方法包括：首先在载体基板上形成具有不可逆接触的粘结层，然后在所述粘结层上形成具有可逆接触的柔性衬底基板，并在所述柔性衬底基板上制备显示器件，继而在加热条件下，利用所述柔性衬底基板与所述粘结层为可逆接触这一特性，将所述柔性衬底基板从所述粘结层上分离下来。由于所述粘结层与所述载体基板之间为不可逆接触，所述柔性衬底基板与所述粘结层之间为可逆接触，因此在分离所述柔性衬底基板时，所述粘结层仍然与所述载体基板牢固结合在一起，不会被同时分离下来，即不会导致分离下来的柔性显示基板上连带有粘结层。这种分离柔性显示基板的方法可以简化柔性显示基板的制作工艺，降低柔性显示基板的制作成本，并且不会对柔性显示基板的性能产生影响，进而提高了柔性显示基板的成品率。
其中，上述柔性显示基板可以是完整的显示面板也可以是柔性阵列基板。
可选地，所述柔性衬底基板的热膨胀系数与所述粘结层的热膨胀系数不同，这样可以利用热应力将柔性衬底基板从粘结层上分离下来。
可选地，在载体基板上形成粘结层的步骤进一步包括：对所述载体基板的进行表面处理；以及在经过表面处理的载体基板上涂覆所述粘结层，并对所述粘结层进行固化，使所述粘结剂与所述经过表面处理的载体基板形成化学键，其中形成的化学键构成所述不可逆接触。
具体地，所述粘结层的材料可以为聚二甲基硅氧烷。
可选地，所述载体基板可以为玻璃基板、石英基板或硅片。
根据本申请的一个具体实施例，当所述粘结层的材料为聚二甲基硅氧烷，在载体基板上形成粘结层的步骤进一步包括以下步骤：
用氧等离子体对所述载体基板进行表面处理，使所述载体基板的表面形成Si-O键；
在具有所述Si-O键的载体基板表面旋涂一层聚二甲基硅氧烷，并对形成的聚二甲基硅氧烷层进行固化，使聚二甲基硅氧烷层与所述载体基板表面的Si-O键反应形成O-Si-O键，其中所述O-Si-O键构成所述载体基板与聚二甲基硅氧烷之间的不可逆接触。
本文所述表面处理是指表面清洁，即利用等离子体的轰击去除表面的残留杂质颗粒。
根据本申请的实施例，用于在载体基板表面旋涂的聚二甲基硅氧烷溶液的制备过程如下：将聚二甲基硅氧烷和固化剂按质量比10∶1进行均匀混合，形成混合物，在真空环境中对所述混合物进行除气，备用。所述固化剂包括但不限于，例如可以为：带硅羟基或是硅烷氧基的小分子硅烷。其中，真空环境是指低于一个大气压的环境。
可选地，在约25摄氏度至约90摄氏度的温度下对所述聚二甲基硅氧烷层进行固化。
可选地，在所述粘结层上形成柔性衬底基板的步骤之前还包括：将形成有所述粘结层的载体基板放入氧等离子体环境中进行活化处理，以达到清洁粘结层表面的目的，使得粘结层与柔性衬底基板之间有更好的粘附性。
可选地，所述柔性衬底基板的材料可以为聚对苯二甲酸乙二醇酯、聚醚砜树脂和聚酰亚胺中的至少一种，所述柔性衬底基板的厚度例如可以为约10微米至约300微米。
可选地，在约100摄氏度至约150摄氏度的温度下，将制备有显示器件的柔性衬底基板从形成有所述粘结层的载体基板上分离下来。例如，在约100摄氏度的温度下，将制备有显示器件的柔性衬底基板从形成有所述粘结层的载体基板上分离下来。
可选地，通过机械方式将制备有显示器件的柔性衬底基板从形成有所述粘结层的载体基板上分离下来。
下面结合附图以及具体的实施例对本申请的柔性显示基板的制作方法进行详细介绍：
聚二甲基硅氧烷(PDMS)是一种高分子有机硅化合物，通常被称为有机硅，它具有光学透明性，且在一般情况下，被认为是惰性、无毒的。PDMS不仅能与其自身、硅、玻璃等形成不可逆接触，也可以与自身、硅、玻璃以及氧化型多聚物等形成可逆接触。比如用氧等离子体对玻璃进行表面处理，在玻璃表面形成Si-O键，之后具有所述Si-O键的玻璃表面旋涂聚二甲基硅氧烷溶液，以形成的聚二甲基硅氧烷层并进行固化，这样能够使所述聚二甲基硅氧烷与所述玻璃表面的Si-O键反应形成O-Si-O键，从而形成所述玻璃与所述聚二甲基硅氧烷层之间的不可逆接触；如果不对玻璃进行表面处理，直接将在所述玻璃表面形成聚二甲基硅氧烷层，则所述玻璃与所述聚二甲基硅氧烷之间将形成可逆接触。
利用PDMS这一特性，本实施例采用PDMS作为载体基板与柔性衬底基 板之间的粘结层。
具体地，如图2所示，在本实施例中，制作柔性显示基板的方法包括以下步骤：
步骤21：提供载体基板1，用氧等离子体对载体基板1进行表面处理，在载体基板1表面形成Si-O键；
具体地，该载体基板1可以为玻璃基板、石英基板或硅片；
步骤22：在处理后的载体基板1表面旋涂一层PDMS，并对形成的PDMS层进行固化，以形成粘结层2，由于载体基板1表面形成有Si-O键，PDMS可与Si-O键反应形成稳固的O-Si-O键，因此在PDMS固化之后，形成的粘结层2可以与载体基板1形成永久性结合，即不可逆接触；由于粘结层2与载体基板1之间为不可逆接触，柔性衬底基板3与粘结层2之间为可逆接触，因此在分离柔性衬底基板3时，粘结层2仍然会与载体基板1牢固结合在一起，不会被同时分离下来，不会导致分离下来的柔性显示基板3上连带有粘结层2。
具体地，可以在约摄氏度25至约90摄氏度的温度下对PDMS层进行固化，环境温度越高，固化需要的时间越短，例如，可以在60摄氏度的温度下对PDMS层固化两小时；
步骤23：对形成有粘结层2的载体基板1表面进行清洁，这样后续在粘结层2上形成柔性衬底基板3时，可以使得粘结层2与柔性衬底基板3之间有更好的粘附性；
具体地，可以将形成有粘结层2的载体基板1放入氧等离子体环境中进行活化处理以达到清洁粘结层2表面的目的；
步骤24：在粘结层2上形成柔性衬底基板3；
柔性衬底基板3的材料可以采用聚酰亚胺(PI)，具体地，可以在粘结层2的表面旋涂聚酰亚胺溶液，固化之后形成柔性衬底基板3，柔性衬底基板3与粘结层2之间为可逆接触，柔性衬底基板3的厚度可以为约10微米至约300微米。
如果需要形成的柔性衬底基板3的厚度比较大，可以在粘结层2上多次旋涂聚酰亚胺，以形成柔性衬底基板3，柔性衬底基板3的热膨胀系数与粘结层2的热膨胀系数不同；
步骤25：在柔性衬底基板上制备显示器件4，形成如图3所示的结构；
步骤26：在加热条件下，具体地，可以将经过上述步骤25的载体基板1 放置在温度为约100摄氏度至约150摄氏度的加热台上，之后将制备有显示器件4的柔性衬底基板3从形成有粘结层2的载体基板1上分离下来，得到柔性显示基板。由于PDMS与PI两者的热膨胀系数不同，因此在加热的条件下，很容易利用热应力使粘结层2和柔性衬底基板3分离。例如，采用机械方式将粘结层2和柔性衬底基板3分离，比如可以采用镊子将柔性衬底基板3从形成有粘结层2的载体基板1上剥离下来。
本实施例首先在所述载体基板1上形成能够与载体基板1永久结合的粘结层2，在粘结层2上形成柔性衬底基板3，并在柔性衬底基板3上制备显示器件4，之后在加热条件下，根据柔性衬底基板3与粘结层2的接触为可逆的且柔性衬底基板3的热膨胀系数与粘结层2的热膨胀系数不同这些特性，利用热应力将柔性衬底基板3从粘结层2上分离下来，这种分离柔性显示基板的方法可以简化柔性显示基板的制作工艺，降低柔性显示基板的制作成本，并且不会对柔性显示基板的性能产生影响，提高了柔性显示基板的成品率。
本申请实施例还提供了一种柔性显示基板母板，如图3所示，包括：
载体基板1；
形成在载体基板1上的粘结层2，其中粘结层2与载体基板1为不可逆接触；
形成在粘结层2上的柔性衬底基板3，其中柔性衬底基板3与粘结层2为可逆接触；
形成在柔性衬底基板3上的显示器件4。
可选地，柔性衬底基板3的热膨胀系数与粘结层2的热膨胀系数不同。具体地，粘结层2的材料为聚二甲基硅氧烷。
利用本申请的柔性显示基板母板可以制备柔性显示基板，由于粘结层2与载体基板1之间为不可逆接触，柔性衬底基板3与粘结层2之间为可逆接触，因此可以比较容易将柔性衬底基板3从粘结层2上分离下来，得到柔性显示基板3。这种分离柔性显示基板的方法可以简化柔性显示基板的制作工艺，降低柔性显示基板的制作成本，并且不会对柔性显示基板的性能产生影响，提高了柔性显示基板的成品率。
以上所述是本申请的优选实施方式，应当指出，对于本技术领域的普通技术人员来说，在不脱离本申请所述原理的前提下，还可以作出若干改进和润饰，这些改进和润饰也应视为本申请的保护范围。

Claims (20)

  1. 一种制作柔性显示基板的方法，包括以下步骤：
    在载体基板上形成粘结层，其中所述粘结层与所述载体基板为不可逆接触；
    在所述粘结层上形成柔性衬底基板，其中所述柔性衬底基板与所述粘结层为可逆接触；
    在所述柔性衬底基板上制备显示器件；以及
    在加热条件下，将制备有显示器件的柔性衬底基板从形成有所述粘结层的载体基板上分离下来，得到柔性显示基板。
  2. 根据权利要求1所述的方法，其中所述柔性衬底基板的热膨胀系数与所述粘结层的热膨胀系数不同。
  3. 根据权利要求1或2所述的方法，其中在载体基板上形成粘结层的步骤进一步包括：
    对所述载体基板的进行表面处理；以及
    在经过表面处理的载体基板上涂覆所述粘结层，并对所述粘结层进行固化，使所述粘结剂与所述经过表面处理的载体基板形成化学键，其中形成的化学键构成所述不可逆接触。
  4. 根据权利要求1-3所述的方法，其中所述粘结层的材料为聚二甲基硅氧烷。
  5. 根据权利要求1-4中任一项所述的方法，其中所述载体基板为玻璃基板、石英基板或硅片。
  6. 根据权利要求5所述的方法，其中在载体基板上形成粘结层的步骤进一步包括：
    用氧等离子体对所述载体基板进行表面处理，使所述载体基板的表面形成Si-O键；
    在具有所述Si-O键的载体基板表面旋涂聚二甲基硅氧烷溶液，以形成聚二甲基硅氧烷层并进行固化，使所述聚二甲基硅氧烷层与所述载体基板表面的Si-O键反应形成O-Si-O键，其中所述O-Si-O键构成所述载体基板与所述聚二甲基硅氧烷层之间的不可逆接触。
  7. 根据权利要求6所述的方法，其中所述聚二甲基硅氧烷溶液是按以下获得的：
    将聚二甲基硅氧烷和固化剂按质量比10∶1进行均匀混合，以形成混合物；以及
    在真空环境中对所述混合物进行除气。
  8. 根据权利要求6或7所述的方法，其中在约25摄氏度至约90摄氏度的温度下对所述聚二甲基硅氧烷层进行固化。
  9. 根据权利要求1-8任一项所述的方法，其中在所述粘结层上形成柔性衬底基板的步骤之前还包括：
    将形成有所述粘结层的载体基板放入氧等离子体环境中进行活化处理。
  10. 根据权利要求1-9任一项所述的方法，其中所述柔性衬底基板的材料为聚对苯二甲酸乙二醇酯、聚醚砜树脂和聚酰亚胺中的至少一种。
  11. 根据权利要求1-10任一项所述的方法，其中所述柔性衬底基板的厚度为约10微米至约300微米。
  12. 根据权利要求1-11任一项所述的方法，其中在约100摄氏度至约150摄氏度的温度下，将制备有显示器件的柔性衬底基板从形成有所述粘结层的载体基板上分离下来。
  13. 根据权利要求1-12任一项所述的方法，其中通过机械方式将制备有显示器件的柔性衬底基板从形成有所述粘结层的载体基板上分离下来。
  14. 一种柔性显示基板母板，包括：
    载体基板；
    形成在所述载体基板上的粘结层，其中所述粘结层与所述载体基板为不可逆接触；
    形成在所述粘结层上的柔性衬底基板，其中所述柔性衬底基板与所述粘结层为可逆接触；以及
    形成在所述柔性衬底基板上的显示器件。
  15. 根据权利要求14所述的柔性显示基板母板，其中所述柔性衬底基板的热膨胀系数与所述粘结层的热膨胀系数不同。
  16. 根据权利要求14或15所述的柔性显示基板母板，其中所述粘结层的材料为聚二甲基硅氧烷。
  17. 根据权利要求14-16任一项所述的柔性显示基板母板，其中所述载体基板为玻璃基板、石英基板或硅片。
  18. 根据权利要求17所述的柔性显示基板母板，其中所述载体基板表面具有Si-O键，所述载体基板表面与聚二甲基硅氧烷形成有O-Si-O键，其中 所述O-Si-O键构成所述载体基板与所述聚二甲基硅氧烷层之间的不可逆接触。
  19. 根据权利要求14-18任一项所述的柔性显示基板母板，其中所述柔性衬底基板的材料为聚对苯二甲酸乙二醇酯、聚醚砜树脂和聚酰亚胺中的至少一种。
  20. 根据权利要求14-19任一项所述的柔性显示基板母板，其中所述柔性衬底基板的厚度为约10微米至约300微米。
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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108963101A (zh) * 2017-11-30 2018-12-07 广东聚华印刷显示技术有限公司 用于柔性显示器件的制作的离型层及复合基板
CN111352266A (zh) * 2020-04-08 2020-06-30 深圳市华星光电半导体显示技术有限公司 显示面板的制备方法
CN112510167A (zh) * 2020-12-18 2021-03-16 重庆莱宝科技有限公司 显示面板及其制备方法

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3388888A4 (en) * 2015-12-11 2019-07-03 Shenzhen Royole Technologies Co., Ltd. METHOD FOR FASTENING FLEXIBLE DISPLAY MODULE
KR102649238B1 (ko) * 2016-10-26 2024-03-21 삼성디스플레이 주식회사 표시패널, 이를 포함하는 적층 기판, 및 표시패널 제조방법
CN106505152B (zh) * 2016-10-31 2019-07-12 武汉华星光电技术有限公司 柔性oled面板制作方法及柔性oled面板
CN107516666B (zh) * 2017-08-18 2020-01-10 武汉华星光电技术有限公司 一种柔性oled显示器件剥离方法及柔性oled显示器件
CN108232012B (zh) * 2018-02-02 2021-07-06 Tcl华星光电技术有限公司 柔性显示面板的制作方法及柔性显示装置的制作方法
CN108539016B (zh) 2018-03-29 2022-01-25 京东方科技集团股份有限公司 柔性衬底及其制备方法、显示面板的制备方法和显示装置
CN108519833B (zh) * 2018-04-03 2024-03-15 京东方科技集团股份有限公司 触控显示面板的形成方法和触控显示母板
CN108828863B (zh) * 2018-08-23 2020-09-18 深圳市华星光电半导体显示技术有限公司 一种柔性液晶面板的tft阵列基板及其制作方法
CN110085127B (zh) * 2019-05-23 2021-01-26 云谷（固安）科技有限公司 柔性显示母板及柔性显示屏制作方法
CN111554186B (zh) * 2020-04-29 2022-05-17 昆山国显光电有限公司 离型层结构和显示面板的制备方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1706044A (zh) * 2002-10-18 2005-12-07 株式会社半导体能源研究所 半导体设备及其制作方法
CN101082523A (zh) * 2007-06-27 2007-12-05 中国科学院上海微系统与信息技术研究所 一种柔性温度传感器的制作方法
CN101454912A (zh) * 2006-05-29 2009-06-10 皇家飞利浦电子股份有限公司 用于发光二极管的无机磷光体主体
CN101479835A (zh) * 2006-06-27 2009-07-08 3M创新有限公司 制备分割芯片的方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1168282A1 (en) * 2000-06-20 2002-01-02 3M Innovative Properties Company Label for affixing to a garment
WO2007055142A1 (en) * 2005-11-11 2007-05-18 Semiconductor Energy Laboratory Co., Ltd. Layer having functionality, method for forming flexible substrate having the same, and method for manufacturing semiconductor device
JP5355618B2 (ja) * 2011-03-10 2013-11-27 三星ディスプレイ株式會社 可撓性表示装置及びこの製造方法
CN103681486B (zh) * 2013-12-06 2018-07-17 京东方科技集团股份有限公司 一种柔性显示基板的制造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1706044A (zh) * 2002-10-18 2005-12-07 株式会社半导体能源研究所 半导体设备及其制作方法
CN101454912A (zh) * 2006-05-29 2009-06-10 皇家飞利浦电子股份有限公司 用于发光二极管的无机磷光体主体
CN101479835A (zh) * 2006-06-27 2009-07-08 3M创新有限公司 制备分割芯片的方法
CN101082523A (zh) * 2007-06-27 2007-12-05 中国科学院上海微系统与信息技术研究所 一种柔性温度传感器的制作方法

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108963101A (zh) * 2017-11-30 2018-12-07 广东聚华印刷显示技术有限公司 用于柔性显示器件的制作的离型层及复合基板
CN111352266A (zh) * 2020-04-08 2020-06-30 深圳市华星光电半导体显示技术有限公司 显示面板的制备方法
CN111352266B (zh) * 2020-04-08 2023-01-24 深圳市华星光电半导体显示技术有限公司 显示面板的制备方法
CN112510167A (zh) * 2020-12-18 2021-03-16 重庆莱宝科技有限公司 显示面板及其制备方法
CN112510167B (zh) * 2020-12-18 2023-08-15 重庆莱宝科技有限公司 显示面板及其制备方法

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