JP2017103389A5 - - Google Patents

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Publication number
JP2017103389A5
JP2017103389A5 JP2015236642A JP2015236642A JP2017103389A5 JP 2017103389 A5 JP2017103389 A5 JP 2017103389A5 JP 2015236642 A JP2015236642 A JP 2015236642A JP 2015236642 A JP2015236642 A JP 2015236642A JP 2017103389 A5 JP2017103389 A5 JP 2017103389A5
Authority
JP
Japan
Prior art keywords
substrate body
oxide
electrostatic chuck
der
chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2015236642A
Other languages
English (en)
Japanese (ja)
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JP2017103389A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2015236642A priority Critical patent/JP2017103389A/ja
Priority claimed from JP2015236642A external-priority patent/JP2017103389A/ja
Priority to US15/347,842 priority patent/US20170162416A1/en
Publication of JP2017103389A publication Critical patent/JP2017103389A/ja
Publication of JP2017103389A5 publication Critical patent/JP2017103389A5/ja
Pending legal-status Critical Current

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JP2015236642A 2015-12-03 2015-12-03 静電チャック及び半導体製造装置 Pending JP2017103389A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2015236642A JP2017103389A (ja) 2015-12-03 2015-12-03 静電チャック及び半導体製造装置
US15/347,842 US20170162416A1 (en) 2015-12-03 2016-11-10 Electrostatic chuck and semiconductor manufacturing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015236642A JP2017103389A (ja) 2015-12-03 2015-12-03 静電チャック及び半導体製造装置

Publications (2)

Publication Number Publication Date
JP2017103389A JP2017103389A (ja) 2017-06-08
JP2017103389A5 true JP2017103389A5 (enExample) 2018-10-25

Family

ID=58800353

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015236642A Pending JP2017103389A (ja) 2015-12-03 2015-12-03 静電チャック及び半導体製造装置

Country Status (2)

Country Link
US (1) US20170162416A1 (enExample)
JP (1) JP2017103389A (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7239307B2 (ja) * 2018-12-04 2023-03-14 株式会社アイシン福井 レーザ溶接装置
JP7168430B2 (ja) * 2018-12-04 2022-11-09 株式会社アイシン福井 レーザ溶接装置
JP7312712B2 (ja) * 2020-02-07 2023-07-21 新光電気工業株式会社 セラミックス基板、静電チャック、静電チャックの製造方法
KR20230096465A (ko) 2021-12-23 2023-06-30 주식회사 미코세라믹스 세라믹 서셉터의 제조 방법
WO2025041254A1 (ja) * 2023-08-22 2025-02-27 日本碍子株式会社 半導体製造装置用部材

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6088346B2 (ja) * 2013-05-09 2017-03-01 新光電気工業株式会社 静電チャック及び半導体製造装置

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