JP2017072678A - 露光装置、露光方法、及び物品の製造方法 - Google Patents

露光装置、露光方法、及び物品の製造方法 Download PDF

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Publication number
JP2017072678A
JP2017072678A JP2015198420A JP2015198420A JP2017072678A JP 2017072678 A JP2017072678 A JP 2017072678A JP 2015198420 A JP2015198420 A JP 2015198420A JP 2015198420 A JP2015198420 A JP 2015198420A JP 2017072678 A JP2017072678 A JP 2017072678A
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JP
Japan
Prior art keywords
original
mark
exposure
substrate
optical system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2015198420A
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English (en)
Japanese (ja)
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JP2017072678A5 (enExample
Inventor
伸彦 籔
Nobuhiko Yabu
伸彦 籔
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2015198420A priority Critical patent/JP2017072678A/ja
Priority to TW105130643A priority patent/TWI655511B/zh
Priority to CN201610870966.XA priority patent/CN106560745A/zh
Priority to KR1020160128189A priority patent/KR20170041145A/ko
Publication of JP2017072678A publication Critical patent/JP2017072678A/ja
Publication of JP2017072678A5 publication Critical patent/JP2017072678A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G03F7/70266—Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2015198420A 2015-10-06 2015-10-06 露光装置、露光方法、及び物品の製造方法 Pending JP2017072678A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2015198420A JP2017072678A (ja) 2015-10-06 2015-10-06 露光装置、露光方法、及び物品の製造方法
TW105130643A TWI655511B (zh) 2015-10-06 2016-09-22 曝光設備、曝光方法及製造裝置的方法
CN201610870966.XA CN106560745A (zh) 2015-10-06 2016-09-30 曝光装置、曝光方法和器件的制造方法
KR1020160128189A KR20170041145A (ko) 2015-10-06 2016-10-05 노광 장치, 노광 방법 및 디바이스 제조 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015198420A JP2017072678A (ja) 2015-10-06 2015-10-06 露光装置、露光方法、及び物品の製造方法

Publications (2)

Publication Number Publication Date
JP2017072678A true JP2017072678A (ja) 2017-04-13
JP2017072678A5 JP2017072678A5 (enExample) 2019-06-20

Family

ID=58485736

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015198420A Pending JP2017072678A (ja) 2015-10-06 2015-10-06 露光装置、露光方法、及び物品の製造方法

Country Status (4)

Country Link
JP (1) JP2017072678A (enExample)
KR (1) KR20170041145A (enExample)
CN (1) CN106560745A (enExample)
TW (1) TWI655511B (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20210092130A (ko) 2020-01-15 2021-07-23 캐논 가부시끼가이샤 노광 장치, 및 물품의 제조 방법

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0883744A (ja) * 1994-09-09 1996-03-26 Nikon Corp 走査型露光装置
JPH11133621A (ja) * 1997-10-29 1999-05-21 Canon Inc 投影露光装置及びそれを用いたデバイスの製造方法
JP2001215718A (ja) * 1999-11-26 2001-08-10 Nikon Corp 露光装置及び露光方法
JP2002110541A (ja) * 1993-11-12 2002-04-12 Canon Inc 走査型露光装置及び該走査型露光装置を用いるデバイス製造方法
JP2006196559A (ja) * 2005-01-12 2006-07-27 Nikon Corp 露光装置及びマイクロデバイスの製造方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2704660B1 (fr) * 1993-04-27 1995-07-13 Sgs Thomson Microelectronics Masques pour une machine d'insolation double face.
WO1999050712A1 (en) * 1998-03-26 1999-10-07 Nikon Corporation Exposure method and system, photomask, method of manufacturing photomask, micro-device and method of manufacturing micro-device
JP5203992B2 (ja) * 2008-03-25 2013-06-05 株式会社ニューフレアテクノロジー 電子ビーム描画装置及び電子ビーム描画方法
US20100092599A1 (en) * 2008-10-10 2010-04-15 Molecular Imprints, Inc. Complementary Alignment Marks for Imprint Lithography
JP5499398B2 (ja) * 2009-05-11 2014-05-21 Ｎｓｋテクノロジー株式会社 露光装置及び露光方法
CN102156392A (zh) * 2010-02-11 2011-08-17 中芯国际集成电路制造(上海)有限公司 光刻机对准参数的检测装置及其检测方法
NL2005996A (en) * 2010-02-19 2011-08-22 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
JP5933289B2 (ja) * 2012-02-23 2016-06-08 三菱電機株式会社 Ｓｏｉウエハおよびその製造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002110541A (ja) * 1993-11-12 2002-04-12 Canon Inc 走査型露光装置及び該走査型露光装置を用いるデバイス製造方法
JPH0883744A (ja) * 1994-09-09 1996-03-26 Nikon Corp 走査型露光装置
JPH11133621A (ja) * 1997-10-29 1999-05-21 Canon Inc 投影露光装置及びそれを用いたデバイスの製造方法
JP2001215718A (ja) * 1999-11-26 2001-08-10 Nikon Corp 露光装置及び露光方法
JP2006196559A (ja) * 2005-01-12 2006-07-27 Nikon Corp 露光装置及びマイクロデバイスの製造方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20210092130A (ko) 2020-01-15 2021-07-23 캐논 가부시끼가이샤 노광 장치, 및 물품의 제조 방법
JP2021110905A (ja) * 2020-01-15 2021-08-02 キヤノン株式会社 露光装置、および物品の製造方法
JP7453790B2 (ja) 2020-01-15 2024-03-21 キヤノン株式会社 露光装置、および物品の製造方法

Also Published As

Publication number Publication date
KR20170041145A (ko) 2017-04-14
CN106560745A (zh) 2017-04-12
TWI655511B (zh) 2019-04-01
TW201714024A (zh) 2017-04-16

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