JP2017072678A5 - - Google Patents

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Publication number
JP2017072678A5
JP2017072678A5 JP2015198420A JP2015198420A JP2017072678A5 JP 2017072678 A5 JP2017072678 A5 JP 2017072678A5 JP 2015198420 A JP2015198420 A JP 2015198420A JP 2015198420 A JP2015198420 A JP 2015198420A JP 2017072678 A5 JP2017072678 A5 JP 2017072678A5
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JP
Japan
Prior art keywords
mark
exposure
original plate
exposure apparatus
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2015198420A
Other languages
English (en)
Japanese (ja)
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JP2017072678A (ja
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Publication date
Application filed filed Critical
Priority to JP2015198420A priority Critical patent/JP2017072678A/ja
Priority claimed from JP2015198420A external-priority patent/JP2017072678A/ja
Priority to TW105130643A priority patent/TWI655511B/zh
Priority to CN201610870966.XA priority patent/CN106560745A/zh
Priority to KR1020160128189A priority patent/KR20170041145A/ko
Publication of JP2017072678A publication Critical patent/JP2017072678A/ja
Publication of JP2017072678A5 publication Critical patent/JP2017072678A5/ja
Pending legal-status Critical Current

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JP2015198420A 2015-10-06 2015-10-06 露光装置、露光方法、及び物品の製造方法 Pending JP2017072678A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2015198420A JP2017072678A (ja) 2015-10-06 2015-10-06 露光装置、露光方法、及び物品の製造方法
TW105130643A TWI655511B (zh) 2015-10-06 2016-09-22 曝光設備、曝光方法及製造裝置的方法
CN201610870966.XA CN106560745A (zh) 2015-10-06 2016-09-30 曝光装置、曝光方法和器件的制造方法
KR1020160128189A KR20170041145A (ko) 2015-10-06 2016-10-05 노광 장치, 노광 방법 및 디바이스 제조 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015198420A JP2017072678A (ja) 2015-10-06 2015-10-06 露光装置、露光方法、及び物品の製造方法

Publications (2)

Publication Number Publication Date
JP2017072678A JP2017072678A (ja) 2017-04-13
JP2017072678A5 true JP2017072678A5 (enExample) 2019-06-20

Family

ID=58485736

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015198420A Pending JP2017072678A (ja) 2015-10-06 2015-10-06 露光装置、露光方法、及び物品の製造方法

Country Status (4)

Country Link
JP (1) JP2017072678A (enExample)
KR (1) KR20170041145A (enExample)
CN (1) CN106560745A (enExample)
TW (1) TWI655511B (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7453790B2 (ja) * 2020-01-15 2024-03-21 キヤノン株式会社 露光装置、および物品の製造方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2704660B1 (fr) * 1993-04-27 1995-07-13 Sgs Thomson Microelectronics Masques pour une machine d'insolation double face.
JP3467031B2 (ja) * 1993-11-12 2003-11-17 キヤノン株式会社 走査型露光装置及び該走査型露光装置を用いるデバイス製造方法
JPH0883744A (ja) * 1994-09-09 1996-03-26 Nikon Corp 走査型露光装置
JPH11133621A (ja) * 1997-10-29 1999-05-21 Canon Inc 投影露光装置及びそれを用いたデバイスの製造方法
WO1999050712A1 (en) * 1998-03-26 1999-10-07 Nikon Corporation Exposure method and system, photomask, method of manufacturing photomask, micro-device and method of manufacturing micro-device
JP2001215718A (ja) * 1999-11-26 2001-08-10 Nikon Corp 露光装置及び露光方法
JP2006196559A (ja) * 2005-01-12 2006-07-27 Nikon Corp 露光装置及びマイクロデバイスの製造方法
JP5203992B2 (ja) * 2008-03-25 2013-06-05 株式会社ニューフレアテクノロジー 電子ビーム描画装置及び電子ビーム描画方法
US20100092599A1 (en) * 2008-10-10 2010-04-15 Molecular Imprints, Inc. Complementary Alignment Marks for Imprint Lithography
JP5499398B2 (ja) * 2009-05-11 2014-05-21 Ｎｓｋテクノロジー株式会社 露光装置及び露光方法
CN102156392A (zh) * 2010-02-11 2011-08-17 中芯国际集成电路制造(上海)有限公司 光刻机对准参数的检测装置及其检测方法
NL2005996A (en) * 2010-02-19 2011-08-22 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
JP5933289B2 (ja) * 2012-02-23 2016-06-08 三菱電機株式会社 Ｓｏｉウエハおよびその製造方法

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