JP2017058217A5 - - Google Patents

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Publication number
JP2017058217A5
JP2017058217A5 JP2015182433A JP2015182433A JP2017058217A5 JP 2017058217 A5 JP2017058217 A5 JP 2017058217A5 JP 2015182433 A JP2015182433 A JP 2015182433A JP 2015182433 A JP2015182433 A JP 2015182433A JP 2017058217 A5 JP2017058217 A5 JP 2017058217A5
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JP
Japan
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light
surface treatment
size
spectrum
measurement
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JP2015182433A
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Japanese (ja)
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JP2017058217A (ja
JP6544171B2 (ja
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Publication of JP2017058217A5 publication Critical patent/JP2017058217A5/ja
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JP2015182433A 2015-09-16 2015-09-16 表面処理状況モニタリング装置 Expired - Fee Related JP6544171B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2015182433A JP6544171B2 (ja) 2015-09-16 2015-09-16 表面処理状況モニタリング装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015182433A JP6544171B2 (ja) 2015-09-16 2015-09-16 表面処理状況モニタリング装置

Publications (3)

Publication Number Publication Date
JP2017058217A JP2017058217A (ja) 2017-03-23
JP2017058217A5 true JP2017058217A5 (enExample) 2018-03-08
JP6544171B2 JP6544171B2 (ja) 2019-07-17

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JP2015182433A Expired - Fee Related JP6544171B2 (ja) 2015-09-16 2015-09-16 表面処理状況モニタリング装置

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Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7103906B2 (ja) * 2018-09-28 2022-07-20 株式会社ディスコ 厚み計測装置
KR102659131B1 (ko) * 2024-02-01 2024-04-23 ㈜넥센서 간섭계와 fpm을 이용한 미세홈 측정시스템
CN119618063B (zh) * 2024-12-18 2025-09-12 佛山易事达电容材料有限公司 一种基于光学测量的金属薄膜尺寸测量方法及系统

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4460659B2 (ja) * 1997-10-22 2010-05-12 株式会社ルネサステクノロジ 薄膜の膜厚計測方法及びその装置並びにそれを用いた薄膜デバイスの製造方法及びその製造装置
JP3946470B2 (ja) * 2001-03-12 2007-07-18 株式会社デンソー 半導体層の膜厚測定方法及び半導体基板の製造方法
JP6107353B2 (ja) * 2013-04-12 2017-04-05 株式会社島津製作所 表面処理状況モニタリング装置

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