JP2017049587A - ネガ型感光性樹脂組成物及びそれから形成される光硬化性パターン及び当該光硬化性パターンを備える画像表示装置 - Google Patents

ネガ型感光性樹脂組成物及びそれから形成される光硬化性パターン及び当該光硬化性パターンを備える画像表示装置 Download PDF

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Publication number
JP2017049587A
JP2017049587A JP2016170849A JP2016170849A JP2017049587A JP 2017049587 A JP2017049587 A JP 2017049587A JP 2016170849 A JP2016170849 A JP 2016170849A JP 2016170849 A JP2016170849 A JP 2016170849A JP 2017049587 A JP2017049587 A JP 2017049587A
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Japan
Prior art keywords
meth
acrylate
pattern
photosensitive resin
resin composition
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JP2016170849A
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English (en)
Japanese (ja)
Inventor
庸桓 趙
Yokan Cho
庸桓 趙
菩恩 安
Bo-Eun Ahn
菩恩 安
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Dongwoo Fine Chem Co Ltd
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Dongwoo Fine Chem Co Ltd
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Liquid Crystal (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Optical Filters (AREA)
JP2016170849A 2015-09-03 2016-09-01 ネガ型感光性樹脂組成物及びそれから形成される光硬化性パターン及び当該光硬化性パターンを備える画像表示装置 Pending JP2017049587A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2015-0124763 2015-09-03
KR1020150124763A KR20170028016A (ko) 2015-09-03 2015-09-03 네가티브형 감광성 수지 조성물 및 이로부터 형성된 광경화성 패턴

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JP2017049587A true JP2017049587A (ja) 2017-03-09

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JP2016170849A Pending JP2017049587A (ja) 2015-09-03 2016-09-01 ネガ型感光性樹脂組成物及びそれから形成される光硬化性パターン及び当該光硬化性パターンを備える画像表示装置

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JP (1) JP2017049587A (zh)
KR (1) KR20170028016A (zh)
CN (1) CN106502051A (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102371945B1 (ko) * 2017-11-03 2022-03-08 동우 화인켐 주식회사 착색 감광성 수지 조성물, 컬러필터 및 화상표시장치
KR20210150126A (ko) 2020-06-03 2021-12-10 에스케이하이닉스 주식회사 네가티브형 레지스트 중합체 및 이를 포함하는 네가티브형 레지스트 조성물

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009063955A1 (ja) * 2007-11-16 2009-05-22 Fujifilm Corporation スペーサー形成用感放射線性樹脂組成物、スペーサー、スペーサーの形成方法、及び液晶表示素子
JP2009175730A (ja) * 2007-12-28 2009-08-06 Fujifilm Corp 感光性樹脂組成物、フォトスペーサー及びその形成方法、保護膜、着色パターン、表示装置用基板、並びに表示装置
JP2010515098A (ja) * 2006-12-26 2010-05-06 エルジー・ケム・リミテッド 液晶ディスプレイ用ブラックマトリックス高感度感光性樹脂組成物およびそれを用いて製造されるブラックマトリックス
US20130143158A1 (en) * 2011-12-02 2013-06-06 Cheil Industries Inc. Photosensitive Resin Composition for Color Filter and Color Filter Including the Same
JP2014126811A (ja) * 2012-12-27 2014-07-07 Nippon Shokubai Co Ltd 硬化性樹脂組成物及びその用途
WO2014156520A1 (ja) * 2013-03-28 2014-10-02 東レ株式会社 感光性樹脂組成物、保護膜又は絶縁膜、タッチパネル及びその製造方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101302508B1 (ko) 2006-02-03 2013-09-02 주식회사 동진쎄미켐 네가티브 감광성 수지 조성물, 그 경화물을 갖는 액정표시장치, 그를 사용한 액정표시장치의 패턴형성방법

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010515098A (ja) * 2006-12-26 2010-05-06 エルジー・ケム・リミテッド 液晶ディスプレイ用ブラックマトリックス高感度感光性樹脂組成物およびそれを用いて製造されるブラックマトリックス
WO2009063955A1 (ja) * 2007-11-16 2009-05-22 Fujifilm Corporation スペーサー形成用感放射線性樹脂組成物、スペーサー、スペーサーの形成方法、及び液晶表示素子
JP2009175730A (ja) * 2007-12-28 2009-08-06 Fujifilm Corp 感光性樹脂組成物、フォトスペーサー及びその形成方法、保護膜、着色パターン、表示装置用基板、並びに表示装置
US20130143158A1 (en) * 2011-12-02 2013-06-06 Cheil Industries Inc. Photosensitive Resin Composition for Color Filter and Color Filter Including the Same
JP2014126811A (ja) * 2012-12-27 2014-07-07 Nippon Shokubai Co Ltd 硬化性樹脂組成物及びその用途
WO2014156520A1 (ja) * 2013-03-28 2014-10-02 東レ株式会社 感光性樹脂組成物、保護膜又は絶縁膜、タッチパネル及びその製造方法

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CN106502051A (zh) 2017-03-15
KR20170028016A (ko) 2017-03-13

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