JP2016530453A5 - - Google Patents

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Publication number
JP2016530453A5
JP2016530453A5 JP2016514091A JP2016514091A JP2016530453A5 JP 2016530453 A5 JP2016530453 A5 JP 2016530453A5 JP 2016514091 A JP2016514091 A JP 2016514091A JP 2016514091 A JP2016514091 A JP 2016514091A JP 2016530453 A5 JP2016530453 A5 JP 2016530453A5
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JP
Japan
Prior art keywords
gas
component
container
target
pressure
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JP2016514091A
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English (en)
Japanese (ja)
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JP2016530453A (ja
JP6580032B2 (ja
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Priority claimed from PCT/US2014/038196 external-priority patent/WO2014186575A1/en
Publication of JP2016530453A publication Critical patent/JP2016530453A/ja
Publication of JP2016530453A5 publication Critical patent/JP2016530453A5/ja
Application granted granted Critical
Publication of JP6580032B2 publication Critical patent/JP6580032B2/ja
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JP2016514091A 2013-05-17 2014-05-15 高圧bf3/h2混合物の製造 Active JP6580032B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201361824709P 2013-05-17 2013-05-17
US61/824,709 2013-05-17
PCT/US2014/038196 WO2014186575A1 (en) 2013-05-17 2014-05-15 Preparation of high pressure bf3/h2 mixtures

Publications (3)

Publication Number Publication Date
JP2016530453A JP2016530453A (ja) 2016-09-29
JP2016530453A5 true JP2016530453A5 (https=) 2017-06-22
JP6580032B2 JP6580032B2 (ja) 2019-09-25

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ID=51898869

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016514091A Active JP6580032B2 (ja) 2013-05-17 2014-05-15 高圧bf3/h2混合物の製造

Country Status (8)

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US (1) US9996090B2 (https=)
EP (1) EP2997112B1 (https=)
JP (1) JP6580032B2 (https=)
KR (2) KR102282129B1 (https=)
CN (1) CN105392870B (https=)
SG (1) SG11201509425QA (https=)
TW (1) TWI633252B (https=)
WO (1) WO2014186575A1 (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014186575A1 (en) 2013-05-17 2014-11-20 Advanced Technology Materials, Inc. Preparation of high pressure bf3/h2 mixtures
CN109195910B (zh) * 2016-03-28 2022-05-24 恩特格里斯公司 氢化且富含三氟化硼同位素的掺杂剂来源的气体组合物
US11353951B2 (en) * 2018-06-08 2022-06-07 Hewlett-Packard Development Company, L.P. Computing input devices with sensors concealed in articles of clothing
CN113261073B (zh) * 2018-12-15 2024-07-16 恩特格里斯公司 利用非钨材料的氟离子植入系统和其使用方法
CN111744423B (zh) * 2019-03-29 2022-08-02 中国石油天然气股份有限公司 标准混合气体的制备装置及制备方法
IT202300010056A1 (it) * 2023-05-18 2024-11-18 Antares Vision S P A Apparecchiatura per il riempimento di contenitori di taratura per sistemi di rilevazione della presenza di ossigeno

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