JP2016519218A5 - - Google Patents

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Publication number
JP2016519218A5
JP2016519218A5 JP2016508033A JP2016508033A JP2016519218A5 JP 2016519218 A5 JP2016519218 A5 JP 2016519218A5 JP 2016508033 A JP2016508033 A JP 2016508033A JP 2016508033 A JP2016508033 A JP 2016508033A JP 2016519218 A5 JP2016519218 A5 JP 2016519218A5
Authority
JP
Japan
Prior art keywords
target
compound
ceramic compound
powder
deposition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2016508033A
Other languages
English (en)
Japanese (ja)
Other versions
JP2016519218A (ja
Filing date
Publication date
Priority claimed from DE102013006633.6A external-priority patent/DE102013006633A1/de
Application filed filed Critical
Publication of JP2016519218A publication Critical patent/JP2016519218A/ja
Publication of JP2016519218A5 publication Critical patent/JP2016519218A5/ja
Pending legal-status Critical Current

Links

JP2016508033A 2013-04-18 2014-04-14 Ａｌ−Ｃｒ−Ｎコーティングを生成するための金属、金属間化合物及びセラミックターゲット材料のアーク蒸着 Pending JP2016519218A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102013006633.6A DE102013006633A1 (de) 2013-04-18 2013-04-18 Funkenverdampfen von metallischen, intermetallischen und keramischen Targetmaterialien um Al-Cr-N Beschichtungen herzustellen
DE102013006633.6 2013-04-18
PCT/EP2014/000989 WO2014170003A1 (de) 2013-04-18 2014-04-14 Funkenverdampfen von metallischen, intermetallischen und keramischen targetmaterialien um al-cr-n beschichtungen herzustellen

Publications (2)

Publication Number Publication Date
JP2016519218A JP2016519218A (ja) 2016-06-30
JP2016519218A5 true JP2016519218A5 (OSRAM) 2017-05-25

Family

ID=50513881

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016508033A Pending JP2016519218A (ja) 2013-04-18 2014-04-14 Ａｌ−Ｃｒ−Ｎコーティングを生成するための金属、金属間化合物及びセラミックターゲット材料のアーク蒸着

Country Status (8)

Country Link
US (1) US20160053364A1 (OSRAM)
EP (1) EP2986753B8 (OSRAM)
JP (1) JP2016519218A (OSRAM)
KR (1) KR20150143783A (OSRAM)
CN (1) CN105164306A (OSRAM)
AR (1) AR095879A1 (OSRAM)
DE (1) DE102013006633A1 (OSRAM)
WO (1) WO2014170003A1 (OSRAM)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102877458B1 (ko) * 2023-03-09 2025-10-29 주식회사 이엠엘 다중 타겟을 이용한 코팅 방법 및 그에 따른 코팅재

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2275585A (en) * 1937-10-08 1942-03-10 Clad Metals Ind Inc Method of making composite metal
US3625848A (en) * 1968-12-26 1971-12-07 Alvin A Snaper Arc deposition process and apparatus
US3836451A (en) * 1968-12-26 1974-09-17 A Snaper Arc deposition apparatus
LU78204A1 (de) * 1977-09-29 1979-05-25 Bleichert Foerderanlagen Gmbh Einschienenfoerderanlage
US5342571A (en) * 1992-02-19 1994-08-30 Tosoh Smd, Inc. Method for producing sputtering target for deposition of titanium, aluminum and nitrogen coatings, sputtering target made thereby, and method of sputtering with said targets
CH693035A5 (de) * 1994-06-24 2003-01-31 Unaxis Balzers Ag Verfahren zur Herstellung eines Targets, nach dem Verfahren hergestelltes Target und Verwendung desselben.
JPH09249966A (ja) * 1996-03-13 1997-09-22 Mitsubishi Materials Corp 金属間化合物分散型焼結Ａｌ合金製スパッタリングターゲット
JP2001226764A (ja) * 2000-02-10 2001-08-21 Shin Etsu Chem Co Ltd スパッタリングのターゲット材用焼結体、その製造方法、及びスパッタリング用ターゲット
US20070189916A1 (en) * 2002-07-23 2007-08-16 Heraeus Incorporated Sputtering targets and methods for fabricating sputtering targets having multiple materials
US6759005B2 (en) * 2002-07-23 2004-07-06 Heraeus, Inc. Fabrication of B/C/N/O/Si doped sputtering targets
EP2275585A1 (de) * 2003-04-28 2011-01-19 Oerlikon Trading AG, Trübbach Wekstück mit ALCR-haltiger Hartstoffschicht und Verfahren zur Herstellung
US7575039B2 (en) * 2003-10-15 2009-08-18 United Technologies Corporation Refractory metal core coatings
JP5192642B2 (ja) * 2005-11-11 2013-05-08 三菱重工業株式会社 表面被覆部材及びその製造方法ならびに工具及び工作装置
JP2008179853A (ja) * 2007-01-24 2008-08-07 Hitachi Tool Engineering Ltd ホウ化物含有ターゲット材
SE531749C2 (sv) * 2007-09-17 2009-07-28 Seco Tools Ab Metod att utfälla slitstarka skikt på hårdmetall med bågförångning och katod med Ti3SiC2 som huvudbeståndsdel
EP2326742B8 (de) * 2008-08-17 2018-12-26 Oerlikon Surface Solutions AG, Pfäffikon Verwendung eines targets für das funkenverdampfen und verfahren zum herstellen eines für diese verwendung geeigneten targets
ES2377225T3 (es) * 2008-09-19 2012-03-23 OERLIKON TRADING AG, TRÜBBACH Método para producir capas de óxido metálico mediante vaporización por arco
JP5051168B2 (ja) * 2009-03-31 2012-10-17 日立ツール株式会社 窒化物分散Ｔｉ−Ａｌ系ターゲット及びその製造方法
EP2363509A1 (en) * 2010-02-28 2011-09-07 Oerlikon Trading AG, Trübbach Synthesis of metal oxides by reactive cathodic arc evaporation
DE102010042828A1 (de) * 2010-10-22 2012-04-26 Walter Ag Target für Lichtbogenverfahren

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