JP2016518699A5 - - Google Patents

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Publication number
JP2016518699A5
JP2016518699A5 JP2016500800A JP2016500800A JP2016518699A5 JP 2016518699 A5 JP2016518699 A5 JP 2016518699A5 JP 2016500800 A JP2016500800 A JP 2016500800A JP 2016500800 A JP2016500800 A JP 2016500800A JP 2016518699 A5 JP2016518699 A5 JP 2016518699A5
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JP
Japan
Prior art keywords
substrate support
substrate
recess
lift pin
support
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JP2016500800A
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English (en)
Japanese (ja)
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JP2016518699A (ja
JP6873696B2 (ja
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Priority claimed from US14/197,699 external-priority patent/US9799548B2/en
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Publication of JP2016518699A publication Critical patent/JP2016518699A/ja
Publication of JP2016518699A5 publication Critical patent/JP2016518699A5/ja
Application granted granted Critical
Publication of JP6873696B2 publication Critical patent/JP6873696B2/ja
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JP2016500800A 2013-03-15 2014-03-07 強化されたプロセスの均一性および低減された基板の滑りのためのサセプタ Active JP6873696B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201361788920P 2013-03-15 2013-03-15
US61/788,920 2013-03-15
US14/197,699 2014-03-05
US14/197,699 US9799548B2 (en) 2013-03-15 2014-03-05 Susceptors for enhanced process uniformity and reduced substrate slippage
PCT/US2014/021639 WO2014149957A1 (en) 2013-03-15 2014-03-07 Susceptors for enhanced process uniformity and reduced substrate slippage

Publications (3)

Publication Number Publication Date
JP2016518699A JP2016518699A (ja) 2016-06-23
JP2016518699A5 true JP2016518699A5 (cg-RX-API-DMAC7.html) 2017-04-13
JP6873696B2 JP6873696B2 (ja) 2021-05-19

Family

ID=51524050

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016500800A Active JP6873696B2 (ja) 2013-03-15 2014-03-07 強化されたプロセスの均一性および低減された基板の滑りのためのサセプタ

Country Status (6)

Country Link
US (1) US9799548B2 (cg-RX-API-DMAC7.html)
JP (1) JP6873696B2 (cg-RX-API-DMAC7.html)
KR (1) KR102335921B1 (cg-RX-API-DMAC7.html)
CN (2) CN105009272A (cg-RX-API-DMAC7.html)
TW (1) TWI631660B (cg-RX-API-DMAC7.html)
WO (1) WO2014149957A1 (cg-RX-API-DMAC7.html)

Families Citing this family (9)

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JP6403106B2 (ja) * 2016-09-05 2018-10-10 信越半導体株式会社 気相成長装置
KR102540125B1 (ko) * 2017-08-30 2023-06-05 주성엔지니어링(주) 기판안치수단 및 기판처리장치
US10755955B2 (en) * 2018-02-12 2020-08-25 Applied Materials, Inc. Substrate transfer mechanism to reduce back-side substrate contact
KR102640172B1 (ko) 2019-07-03 2024-02-23 삼성전자주식회사 기판 처리 장치 및 이의 구동 방법
CN115704108A (zh) * 2021-08-09 2023-02-17 广州集成电路技术研究院有限公司 预热环和基板处理装置
JP7774416B2 (ja) * 2021-10-20 2025-11-21 東京エレクトロン株式会社 基板載置方法および基板載置機構

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JPH08335583A (ja) * 1995-06-08 1996-12-17 Murata Mfg Co Ltd ウエハ加熱装置
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